1:1 catadioptric deep-UV optics with a full-circle available field [2197-84] (Englisch)
- Neue Suche nach: Zhang, Y.
- Neue Suche nach: SPIE
- Neue Suche nach: Zhang, Y.
- Neue Suche nach: Brunner, T. A.
- Neue Suche nach: SPIE
In:
Optical/laser microlithography VII
2197
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894-907
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1994
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:1:1 catadioptric deep-UV optics with a full-circle available field [2197-84]
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Beteiligte:
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Kongress:Conference, Optical/laser microlithography VII ; 1994 ; San Jose; CA
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Erschienen in:Optical/laser microlithography VII , 2197 ; 894-907PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , 2197 ; 894-907
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.1994
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Format / Umfang:14 pages
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2
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Overlay and lens distortion in a modified illumination stepperLee, Chul-Seung / Kim, Jeong Soo / Hur, Ikboum / Ham, Young-Mog / Choi, Soo-Han / Seo, YeonSeon / Ashkenaz, Scott M. et al. | 1994
- 2
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Overlay and lens distortion in a modified illumination stepper [2197-01]Lee, C. S. / Kim, J. S. / Hur, I. / Ham, Y. M. / SPIE et al. | 1994
- 9
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Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratingsOh, Yong-Ho / Park, Byung-Sun / Chung, Hai Bin / Choi, Sang-Soo / Choi, Seong-Hak / Yoo, Hyung Joun / Park, Sin-Chong et al. | 1994
- 9
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Zone-by-zone optimization of the dummy diffraction mask with auxiliary phase gratings [2197-02]Oh, Y.-H. / Park, B.-S. / Chung, H. B. / Choi, S.-S. / SPIE et al. | 1994
- 19
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Effective light source optimization with the modified beam for depth-of-focus enhancementsOgawa, Tohru / Uematsu, Masaya / Ishimaru, Toshiyuki / Kimura, Mitsumori / Tsumori, Toshiro et al. | 1994
- 19
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Effective light source optimization with the modified beam for depth-of-focus enhancements [2197-03]Ogawa, T. / Uematsu, M. / Ishimaru, T. / Kimura, M. / SPIE et al. | 1994
- 31
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Optimization of modified illumination for 0.25-um resist patterningTounai, Keiichiro / Hashimoto, Shuichi / Shiraki, Seiichi / Kasama, Kunihiko et al. | 1994
- 31
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Optimization of modified illumination for 0.25-m resist patterning [2197-04]Tounai, K. / Hashimoto, S. / Shiraki, S. / Kasama, K. / SPIE et al. | 1994
- 42
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Characteristics of standing-wave effect of off-axis illumination depending on two different resist systems and the polarization effect of stepper [2197-05]Kim, K. H. / Han, W. S. / Kim, C. H. / Kang, H. Y. / SPIE et al. | 1994
- 42
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Characteristics of standing-wave effect of off-axis illumination depending on two different resist systems and the polarization effect of stepperKim, Keeho / Han, Woo-Sung / Kim, Chul Hong / Kang, Hoyoung / Park, Choon-Geun / Koh, Young-Bum et al. | 1994
- 54
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Quarter-micrometer i-line lithography using an alternating phase-shift maskKim, Hung-Eil / Kim, YoungSik / Lee, Chul-Seung / Ham, Young-Mog / Ahn, Dong-Jun / Choi, Soo-Han et al. | 1994
- 54
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Quarter-micrometer i-line lithography using an alternating phase-shift mask [2197-06]Kim, H.-E. / Kim, Y.-S. / Lee, C.-S. / Ham, Y.-M. / SPIE et al. | 1994
- 65
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Improvement of the focus exposure latitude using optimized illumination and mask designPforr, Rainer / Ronse, Kurt G. / Jaenen, Patrick / Jonckheere, Rik M. / Van den Hove, Luc / van Oorschot, Peter / Luehrmann, Paul F. et al. | 1994
- 65
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Improvement of the focus exposure latitude using optimized illumination and mask design [2197-07]Pforr, R. / Ronse, K. / Jaenen, P. / Jonckheere, R. / SPIE et al. | 1994
- 86
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Optimization of the optical phase shift in attenuated phase-shifting masks and application to quarter-micrometer deep-UV lithography for logicsRonse, Kurt G. / Pforr, Rainer / Baik, Ki-Ho / Jonckheere, Rik M. / Van den Hove, Luc et al. | 1994
- 86
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Optimization of the optical phase shift in attenuated phase-shifting masks and application to quarter-micrometer deep-UV lithography for logics [2197-08]Ronse, K. / Pforr, R. / Baik, K.-H. / Jonckheere, R. / SPIE et al. | 1994
- 99
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Optimization of optical properties for single-layer halftone masks [2197-09]Ito, S. / Hazama, H. / Kamo, T. / Miyazaki, H. / SPIE et al. | 1994
- 99
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Optimization of optical properties for single-layer halftone masksIto, Shinichi / Hazama, Hiroaki / Kamo, Takashi / Miyazaki, Hideya / Sato, Hiroyuki / Hayashi, Kenji / Shigemitsu, Fumiaki / Mori, Ichiro et al. | 1994
- 111
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Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON film [2197-10]Nakajima, M. / Yoshioka, N. / Miyazaki, J. / Kusunose, H. / SPIE et al. | 1994
- 111
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Attenuated phase-shifting mask with a single-layer absorptive shifter of CrO, CrON, MoSiO, and MoSiON filmNakajima, Masayuki / Yoshioka, Nobuyuki / Miyazaki, Junji / Kusunose, Haruhiko / Hosono, Kunihiro / Morimoto, Hiroaki / Wakamiya, Wataru / Murayama, Keiichi / Watakabe, Yaichiro / Tsukamoto, Katsuhiro et al. | 1994
- 122
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Phase-shifter edge effects on attenuated phase-shifting mask image quality [2197-11]Wong, A. K. / Ferguson, R. A. / Neureuther, A. R. / SPIE et al. | 1994
- 122
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Phase-shifter edge effects on attenuated phase-shifting mask image qualityWong, Alfred K. K. / Ferguson, Richard A. / Neureuther, Andrew R. et al. | 1994
- 130
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Impact of attenuated mask topography on lithographic performanceFerguson, Richard A. / Adair, William J. / O'Grady, David S. / Martino, Ronald M. / Molless, Antoinette F. / Grenon, Brian J. / Wong, Alfred K. K. / Liebmann, Lars W. / Callegari, Alessandro / LaTulipe, Douglas C. et al. | 1994
- 130
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Impact of attenuated mask topography on lithographic performance [2197-12]Ferguson, R. A. / Adair, W. J. / O'Grady, D. S. / Martino, R. M. / SPIE et al. | 1994
- 140
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Overcoming global topography and improving lithographic performance using a transmittance controlled maskHan, Woo-Sung / Sohn, Chang-Jin / Kang, Hoyoung / Koh, Young-Bum / Lee, Moon-Yong et al. | 1994
- 140
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Overcoming global topography and improving lithographic performance using a transmittance controlled mask [2197-13]Han, W.-S. / Sohn, C.-J. / Kang, H.-Y. / Koh, Y.-B. / SPIE et al. | 1994
- 150
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Combination of transmission and absorption mask for 0.3-m lithography [2197-14]Bauch, L. / Bauer, J. J. / Boettcher, M. / Jagdhold, U. A. / SPIE et al. | 1994
- 150
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Combination of transmission and absorption mask for 0.3-um lithographyBauch, Lothar / Bauer, Joachim J. / Boettcher, Monika / Jagdhold, Ulrich A. / Haak, Ulrich / Spiess, Walter et al. | 1994
- 158
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Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift method [2197-15]Nakatani, M. / Matsuoka, H. / Nakano, H. / Kamon, K. / SPIE et al. | 1994
- 158
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Effect of shifter edge angle and lens aberration on the pattern profile in the edge-line phase-shift methodNakatani, Mitsunori / Matsuoka, Hiroshi / Nakano, Hirofumi / Kamon, Kazuya / Sato, Kazuhiko / Ishihara, Osamu / Mitsui, Shigeru et al. | 1994
- 169
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Techniques for improving overlay on multilayer phase-shift masks [2197-16]Hamaker, H. C. / Bohan, M. J. / Buck, P. D. / Geller, C. H. / SPIE et al. | 1994
- 169
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Techniques for improving overlay on multilayer phase-shift masksHamaker, Henry Chris / Bohan, Michael J. / Buck, Peter D. / Geller, Claudia H. / Makiyama, Takashi / Mathew, Francis P. / Neeland, William S. et al. | 1994
- 181
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Fabrication of phase-shifting masks employing multilayer filmsChieu, T. C. / Shih, Kwang K. / Dove, Derek B. et al. | 1994
- 181
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Fabrication of phase-shifting masks employing multilayer films [2197-17]Chieu, T. C. / Shih, K. K. / Dove, D. B. / SPIE et al. | 1994
- 194
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Attenuating phase-shift mask by thermal oxidation of chrome [2197-18]O'Grady, D. S. / Wilber, P. B. / SPIE et al. | 1994
- 194
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Attenuating phase-shift mask by thermal oxidation of chromeO'Grady, David S. / Wilber, Phil B. et al. | 1994
- 201
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Phase-shift mask issues for 193-nm lithography [2197-19]Smith, B. W. / Turgut, S. / SPIE et al. | 1994
- 201
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Phase-shift mask issues for 193-nm lithographySmith, Bruce W. / Turgut, Suleyman et al. | 1994
- 211
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Estimation of attenuated phase-shifting mask fabrication latitude using an optical exposure-defocus methodologySugawara, Minoru / Kawahira, Hiroichi / Tsudaka, Keisuke / Ogura, Akihiro / Nozawa, Satoru / Uesawa, Fumikatsu / Shimizu, Hideo et al. | 1994
- 211
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Estimation of attenuated phase-shifting mask fabrication latitude using an optical exposure-defocus methodology [2197-20]Sugawara, M. / Kawahira, H. / Tsudaka, K. / Ogura, A. / SPIE et al. | 1994
- 223
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Effects of transparent and transmission reduction reticle defectsZurbrick, Larry S. / Schuda, Steven J. / Wiley, James N. et al. | 1994
- 223
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Effects of transparent and transmission reduction reticle defects [2197-21]Zurbrick, L. S. / Schuda, S. / Wiley, J. N. / SPIE et al. | 1994
- 235
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Experimental study of phase-shifting mask defect detection using phase-shifting interferometry [2197-22]Xu, Y. / Cohen, D. K. / O'Connor, J. M. / Liu, K.-C. / SPIE et al. | 1994
- 235
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Experimental study of phase-shifting mask defect detection using phase-shifting interferometryXu, Yiping / Cohen, Donald K. / O'Connor, John M. / Liu, Kuo-Ching / Cohen, Martin G. et al. | 1994
- 243
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Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technologyHam, Young-Mog / Kim, YoungSik / Hur, Ikboum / Park, Ki-Yeop / Kim, Hung-Eil / Ahn, Dong-Jun / Choi, Soo-Han et al. | 1994
- 243
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Fundamental analysis on fabrication of 256-MB DRAM using phase-shift mask technology [2197-23]Ham, Y.-M. / Kim, Y.-S. / Hur, I.-B. / Park, K.-Y. / SPIE et al. | 1994
- 253
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Comparison of phase-shift mask types for submicrometer contact hole definitionCui, Zheng / Martin, Brian / Prewett, Philip D. / Johnson, Steve / Herman, Philip et al. | 1994
- 253
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Comparison of phase-shift mask types for submicrometer contact hole definition [2197-24]Cui, Z. / Martin, B. / Prewett, P. D. / Johnson, S. / SPIE et al. | 1994
- 265
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Exposure of a halftone mask by conventional and off-axis illuminationOh, Hye-Keun / Goo, Jung-Woung / Yim, Sug-Soon / Yoon, Tak-Hyun / Park, Seung-Wook / Nam, Byoung Sub / Kang, Hoyoung / Kim, Cheol-Hong / Han, Woo-Sung et al. | 1994
- 265
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Exposure of a halftone mask by conventional and off-axis illumination [2197-26]Oh, H.-K. / Goo, J.-W. / Yim, S.-S. / Yoon, T.-H. / SPIE et al. | 1994
- 278
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Automated optical proximity correction: a rules-based approachOtto, Oberdan W. / Garofalo, Joseph G. / Low, K. K. / Yuan, Chi-Min / Henderson, Richard C. / Pierrat, Christophe / Kostelak, Robert L. / Vaidya, Sheila / Vasudev, P. K. et al. | 1994
- 278
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Automated optical proximity correction: a rules-based approach [2197-27]Otto, O. W. / Garofalo, J. G. / Low, K. K. / Yuan, C.-M. / SPIE et al. | 1994
- 294
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Fast proximity correction with zone samplingStirniman, John P. / Rieger, Michael L. et al. | 1994
- 294
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Fast proximity correction with zone sampling [2197-28]Stirniman, J. P. / Rieger, M. L. / SPIE et al. | 1994
- 302
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Automated determination of CAD layout failures through focus: experiment and simulationSpence, Chris A. / Nistler, John L. / Barouch, Eytan / Hollerbach, Uwe / Orszag, Steven A. et al. | 1994
- 302
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Automated determination of CAD layout failures through focus: experiment and simulation [2197-29]Spence, C. A. / Nistler, J. L. / Barouch, E. / Hollerbach, U. / SPIE et al. | 1994
- 314
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Phase-shifting masks: automated design and mask requirementsPati, Yagyensh C. / Wang, Yao-Ting / Liang, Jen-Wei / Kailath, Thomas et al. | 1994
- 314
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Phase-shifting masks: automated design and mask requirements [2197-30]Pati, Y. C. / Wang, Y.-T. / Liang, J.-W. / Kailath, T. / SPIE et al. | 1994
- 328
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Comparative study on optical proximity effect correction with various types of dummy patterns and its application to DRAM devices [2197-31]Sohn, C.-J. / Han, W.-S. / Kang, H.-Y. / Koh, Y.-B. / SPIE et al. | 1994
- 328
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Comparative study on optical proximity effect correction with various types of dummy patterns and its application to DRAM devicesSohn, Chang-Jin / Han, Woo-Sung / Kang, Hoyoung / Koh, Young-Bum / Lee, Moon-Yong et al. | 1994
- 337
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Investigation of proximity effects for a rim phase-shifting mask printed with annular illumination [2197-32]Newmark, D. M. / Tomacruz, E. / Vaidya, S. / Neureuther, A. R. / SPIE et al. | 1994
- 337
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Investigation of proximity effects for a rim phase-shifting mask printed with annular illuminationNewmark, David M. / Tomacruz, Eric / Vaidya, Sheila / Neureuther, Andrew R. et al. | 1994
- 348
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Large-area phase-shift mask design [2197-33]Cobb, N. B. / Zakhor, A. / SPIE et al. | 1994
- 348
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Large-area phase-shift mask designCobb, Nicolas B. / Zakhor, Avideh et al. | 1994
- 361
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Correcting for proximity effect widens process latitude [2197-34]Henderson, R. C. / Otto, O. W. / SPIE et al. | 1994
- 361
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Correcting for proximity effect widens process latitudeHenderson, Richard C. / Otto, Oberdan W. et al. | 1994
- 371
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Using behavior modeling for proximity correctionRieger, Michael L. / Stirniman, John P. et al. | 1994
- 371
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Using behavior modeling for proximity correction [2197-35]Rieger, M. L. / Stirniman, J. P. / SPIE et al. | 1994
- 377
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Systematic design of phase-shifting masksWang, Yao-Ting / Pati, Yagyensh C. / Liang, Jen-Wei / Kailath, Thomas et al. | 1994
- 377
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Systematic design of phase-shifting masks [2197-36]Wang, Y.-T. / Pati, Y. C. / Liang, J.-W. / Kailath, T. / SPIE et al. | 1994
- 390
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Comparison of I-line and deep-UV technologies for 0.35-um lithographyOrvek, Kevin J. / Ferrari, Joseph J. / Dass, Sasha K. / Corliss, Daniel A. / Buchanan, James R. / Piasecki, MaryAnn et al. | 1994
- 390
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Comparison of I-line and deep-UV technologies for 0.35-m lithography [2197-37]Orvek, K. J. / Ferrari, J. J. / Dass, S. K. / Corliss, D. A. / SPIE et al. | 1994
- 402
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Aerial image analysis of quarter-micrometer patterns on a 0.5-NA excimer stepperBoettiger, Ulrich C. / Fischer, Thomas / Grassmann, Andreas / Moritz, Holger et al. | 1994
- 402
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Aerial image analysis of quarter-micrometer patterns on a 0.5-NA excimer stepper [2197-38]Boettiger, U. / Fischer, T. / Grassmann, A. / Moritz, H. / SPIE et al. | 1994
- 412
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Practical 0.35-um i-line lithographyLuehrmann, Paul F. / Wittekoek, Stefan / Hansen, Steven G. et al. | 1994
- 412
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Practical 0.35-m i-line lithography [2197-39]Luehrmann, P. F. / Wittekoek, S. / Hansen, S. G. / SPIE et al. | 1994
- 421
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Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and (sigma) in conjunction with advanced PSM technologyKatz, Barton A. / Rogoff, Richard / Foster, James / Rericha, William T. / Rolfson, J. Brett / Holscher, Richard D. / Sager, Craig B. / Reynolds, Patrick et al. | 1994
- 421
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Lithographic performance at sub-300-nm design rules using a high-NA I-line stepper with optimized NA and in conjunction with advanced PSM technology [2197-40]Katz, B. A. / Rogoff, R. / Foster, J. / Rericha, W. T. / SPIE et al. | 1994
- 429
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Optimizing numerical aperture and partial coherence to reduce proximity effect in deep-UV lithographyCirelli, Raymond A. / Raab, Eric L. / Kostelak, Robert L. / Vaidya, Sheila et al. | 1994
- 429
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Optimizing numerical aperture and partial coherence to reduce proximity effect in deep-UV lithography [2197-41]Cirelli, R. A. / Raab, E. L. / Kostelak, R. L. / Vaidya, S. / SPIE et al. | 1994
- 442
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Aerial image of 3D phase-shifted reticle: 3D fast aerial image modelBarouch, Eytan / Hollerbach, Uwe / Orszag, Steven A. et al. | 1994
- 442
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Aerial image of 3D phase-shifted reticle: 3D fast aerial image model [2197-42]Barouch, E. / Hollerbach, U. / Orszag, S. A. / SPIE et al. | 1994
- 455
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Some image modeling issues for I-line, 5 x phase-shifting masks [2197-43]Wojcik, G. L. / Mould, J. / Ferguson, R. A. / Martino, R. M. / SPIE et al. | 1994
- 455
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Some image modeling issues for I-line, 5X phase-shifting masksWojcik, Gregory L. / Mould, John / Ferguson, Richard A. / Martino, Ronald M. / Low, K. K. et al. | 1994
- 466
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Experimental verification of high-numerical-aperture effects in photoresistFlagello, Donis G. / Milster, Tomas D. et al. | 1994
- 466
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Experimental verification of high-numerical-aperture effects in photoresist [2197-44]Flagello, D. G. / Milster, T. D. / SPIE et al. | 1994
- 478
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Sample-3D benchmarks including high-NA and thin-film effectsHelmsen, John J. / Yeung, Michael S. / Lee, Derek / Neureuther, Andrew R. et al. | 1994
- 478
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Sample-3D benchmarks including high-NA and thin-film effects [2197-45]Helmsen, J. J. / Yeung, M. S. / Lee, D. / Neureuther, A. R. / SPIE et al. | 1994
- 489
-
Evaluation of new attenuating phase-shifting mask techniques [2197-46]Lucas, K. D. / Strojwas, A. J. / Low, K. K. / SPIE et al. | 1994
- 489
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Evaluation of new attenuating phase-shifting mask techniquesLucas, Kevin D. / Strojwas, Andrzej J. / Low, K. K. et al. | 1994
- 501
-
Enhanced lumped parameter model for photolithography [2197-47]Mack, C. A. / SPIE et al. | 1994
- 501
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Enhanced lumped parameter model for photolithographyMack, Chris A. et al. | 1994
- 511
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Programming of phase-shift mask simulation software and some important aspects [2197-48]Que, L. / Sun, G. / Feng, B. / SPIE et al. | 1994
- 511
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Programming of phase-shift mask simulation software and some important aspectsQue, Long / Sun, Guoliang / Boru, Feng et al. | 1994
- 521
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Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulation [2197-49]Wong, A. K. / Neureuther, A. R. / SPIE et al. | 1994
- 521
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Polarization and edge effects in photolithographic masks using three-dimensional rigorous simulationWong, Alfred K. K. / Neureuther, Andrew R. et al. | 1994
- 530
-
New mask evaluation tool: the microlithography simulation microscope aerial image measurement system [2197-50]Budd, R. A. / Dove, D. B. / Staples, J. L. / Nasse, H. / SPIE et al. | 1994
- 530
-
New mask evaluation tool: the microlithography simulation microscope aerial image measurement systemBudd, Russell A. / Dove, Derek B. / Staples, John L. / Nasse, H. / Ulrich, Wilhelm et al. | 1994
- 541
-
Quantitative stepper metrology using the focus monitor test mask [2197-51]Brunner, T. A. / Martin, A. L. / Martino, R. M. / Ausschnitt, C. P. / SPIE et al. | 1994
- 541
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Quantitative stepper metrology using the focus monitor test maskBrunner, Timothy A. / Martin, Alexander L. / Martino, Ronald M. / Ausschnitt, Christopher P. / Newman, Thomas H. / Hibbs, Michael S. et al. | 1994
- 550
-
Analyzing deep-UV lens aberrations using aerial image and latent image metrologies [2197-52]Raab, E. L. / Pierrat, C. / Fields, C. H. / Kostelak, R. L. / SPIE et al. | 1994
- 550
-
Analyzing deep-UV lens aberrations using aerial image and latent image metrologiesRaab, Eric L. / Pierrat, Christophe / Fields, Charles H. / Kostelak, Robert L. / Oldham, William G. / Vaidya, Sheila et al. | 1994
- 566
-
Scattered light in photolithographic lenses [2197-53]Kirk, J. P. / SPIE et al. | 1994
- 566
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Scattered light in photolithographic lensesKirk, Joseph P. et al. | 1994
- 573
-
Application of the aerial image measurement system (AIMS)TMto the analysis of binary mask imaging and resolution enhancement techniquesMartino, Ronald M. / Ferguson, Richard A. / Budd, Russell A. / Staples, John L. / Liebmann, Lars W. / Molless, Antoinette F. / Dove, Derek B. / Weed, J. Tracy et al. | 1994
- 573
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Application of the aerial image measurement system (AIMS[TM]) to the analysis of binary mask imaging and resolution enhancement techniques [2197-54]Martino, R. M. / Ferguson, R. A. / Budd, R. A. / Staples, J. L. / SPIE et al. | 1994
- 585
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Aerial image measurements on a commercial stepperFields, Charles H. / Partlo, William N. / Oldham, William G. et al. | 1994
- 585
-
Aerial image measurements on a commercial stepper [2197-55]Fields, C. H. / Partlo, W. N. / Oldham, W. G. / SPIE et al. | 1994
- 598
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Application of subresolution phase-shift mask with G-line stepper for sub-half-micrometer gate GaAs circuitsShih, Yih-Cheng / Garofalo, Joseph G. et al. | 1994
- 598
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Application of subresolution phase-shift mask with G-line stepper for sub-half-micrometer gate GaAs circuits [2197-56]Shih, Y.-C. / Garofalo, J. G. / SPIE et al. | 1994
- 612
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Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designsLiebmann, Lars W. / Newman, Thomas H. / Ferguson, Richard A. / Martino, Ronald M. / Molless, Antoinette F. / Neisser, Mark O. / Weed, J. Tracy et al. | 1994
- 612
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Comprehensive evaluation of major phase-shift mask technologies for isolated gate structures in logic designs [2197-57]Liebmann, L. W. / Newman, T. G. / Ferguson, R. A. / Martino, R. M. / SPIE et al. | 1994
- 624
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I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticlesKrisa, William L. / Garza, Cesar M. / Yen, Anthony / Shu, Jing S. et al. | 1994
- 624
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I-line photoresist evaluations for contact hole performance with attenuated phase-shift reticles [2197-59]Krisa, W. L. / Garza, C. M. / Yen, A. / Shu, J. S. / SPIE et al. | 1994
- 636
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Process optimization for 0.35-m i-line lithography [2197-60]Garza, C. M. / Krisa, W. L. / Yen, A. / Shu, J. S. / SPIE et al. | 1994
- 636
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Process optimization for 0.35-um i-line lithographyGarza, Cesar M. / Krisa, William L. / Yen, Anthony / Shu, Jing S. et al. | 1994
- 648
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Analysis of microlithography in an open-architecture TCAD system [2197-62]Axelrad, V. / Boksha, V. V. / Granik, Y. / Milic, O. / SPIE et al. | 1994
- 648
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Analysis of microlithography in an open-architecture TCAD systemAxelrad, Valery / Boksha, Victor V. / Granik, Yuri / Milic, Ognjen / Rey, Juan C. / Ward, D. / Tochitsky, Eduard I. et al. | 1994
- 660
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Comparison of deep-UV reflection control methods for interconnect layers [2197-63]Ferrari, J. J. / Dass, S. K. / SPIE et al. | 1994
- 660
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Comparison of deep-UV reflection control methods for interconnect layersFerrari, Joseph J. / Dass, Sasha K. et al. | 1994
- 669
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Determining metal interconnect imaging capabilityBrown, Stuart E. / Goodwin, Greg A. / Ostrout, Wayne H. et al. | 1994
- 669
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Determining metal interconnect imaging capability [2197-64]Brown, S. L. / Goodwin, G. A. / Ostrout, W. H. / SPIE et al. | 1994
- 682
-
Metal layer resist process optimization by design of experiment [2197-96]Shiau, G.-Y. / Lee, D. H.-T. / Lin, H.-K. / SPIE et al. | 1994
- 682
-
Metal layer resist process optimization by design of experimentShiau, Gwo-Yuh / Lee, Daniel H. / Lin, Hwang-Kuen et al. | 1994
- 692
-
0.5-um deep-UV photolithography manufacturingDunn, Diana D. / Norris, Katherine C. / Somerville, Linda K. et al. | 1994
- 692
-
0.5-m deep-UV photolithography manufacturing [2197-67]Dunn, D. D. / Norris, K. C. / Somerville, L. / SPIE et al. | 1994
- 704
-
Wide-field variable NA lens analysis for high-volume 0.5-m manufacturing [2197-65]Ackmann, P. W. / Brown, S. L. / Edwards, R. / SPIE et al. | 1994
- 704
-
Wide-field variable NA lens analysis for high-volume 0.5-um manufacturingAckmann, Paul W. / Brown, Stuart E. / Edwards, Richard D. et al. | 1994
- 722
-
SiOxNy:H, high-performance antireflective layer for current and future optical lithographyOgawa, Tohru / Nakano, Hiroyuki / Gocho, Tetsuo / Tsumori, Toshiro et al. | 1994
- 722
-
SiOxNy:H, high-performance antireflective layer for current and future optical lithography [2197-66]Ogawa, T. / Nakano, H. / Gocho, T. / Tsumori, T. / SPIE et al. | 1994
- 733
-
Optimized registration model for 2:1 stepper field matching [2197-68]Flack, W. W. / Flores, G. E. / Pellegrini, J. C. / Merrill, M. / SPIE et al. | 1994
- 733
-
Optimized registration model for 2:1 stepper field matchingFlack, Warren W. / Flores, Gary E. / Pellegrini, Joseph C. / Merrill, Mark A. et al. | 1994
- 753
-
Minimization of total overlay errors when matching nonconcentric exposure fieldsPreil, Moshe E. / Manchester, Terry M. / Minvielle, Anna Maria / Chung, Robert J. et al. | 1994
- 753
-
Minimization of total overlay errors when matching nonconcentric exposure fields [2197-69]Preil, M. E. / Manchester, T. M. / Minvielle, A. M. / Chung, R. J. / SPIE et al. | 1994
- 770
-
Substrate contamination effects in the processing of chemically amplified DUV photoresistsSturtevant, John L. / Holmes, Steven J. / Knight, Stephen E. / Poley, Denis / Rabidoux, Paul A. / Somerville, Linda K. / McDevitt, Thomas L. / Stamper, Anthony / Valentine, Ed / Conley, Will et al. | 1994
- 770
-
Substrate contamination effects in the processing of chemically amplified DUV photoresists [2197-71]Sturtevant, J. L. / Holmes, S. J. / Knight, S. E. / Poley, D. / SPIE et al. | 1994
- 781
-
Reticle specific compensations to meet production overlay requirements for 64 MB and beyond [2197-70]Rogoff, R. / Hong, S.-S. / Schramm, D. / Espin, G. / SPIE et al. | 1994
- 781
-
Reticle specific compensations to meet production overlay requirements for 64 MB and beyondRogoff, Richard / Hong, Syi-Sying / Schramm, Doug / Espin, Gregg D. et al. | 1994
- 791
-
Interpreting cost of ownership for mix-and-match lithography [2197-72]Levine, A. L. / Bergendahl, A. S. / SPIE et al. | 1994
- 791
-
Interpreting cost of ownership for mix-and-match lithographyLevine, Alan L. / Bergendahl, Albert S. et al. | 1994
- 804
-
Manufacturing engineering use of data management to analyze and control stepper performance in existing fabs and on stepper evaluations for new toolsAckmann, Paul W. / Brown, Stuart E. / Edwards, Richard D. / Oshelski, Staci et al. | 1994
- 804
-
Manufacturing engineering use of data management to analyze and control stepper performance in existing fabs and on stepper evaluations for new tools [2197-73]Ackmann, P. W. / Brown, S. L. / Edwards, R. / Oshelski, S. / SPIE et al. | 1994
- 815
-
Application of CVD antireflective-layer process for sub-half-micrometer devicesMito, Hideaki / Tani, Yoshiyuki / Okuda, Yoshimitsu / Todokoro, Yoshihiro / Tatsuta, Toshiaki / Sawai, Mikio / Tsujii, Osamu et al. | 1994
- 815
-
Application of CVD antireflective-layer process for subhalf-micrometer devices [2197-75]Mito, H. / Tani, Y. / Okuda, Y. / Todokoro, Y. / SPIE et al. | 1994
- 826
-
Near-field nanofabrication with pipette-guided ArF excimer laserRudman, Michael / Shchemelinin, Anatoly / Lieberman, Klony S. / Lewis, Aaron et al. | 1994
- 826
-
Near-field nanofabrication with pipette-guided ArF excimer laser [2197-77]Rudman, M. / Shchemelinin, A. / Lieberman, K. / Lewis, A. / SPIE et al. | 1994
- 835
-
New phase-shifting method for high-resolution microlithography [2197-78]Kido, M. / Szabo, G. / Cavallaro, J. R. / Wilson, W. L. / SPIE et al. | 1994
- 835
-
New phase-shifting method for high-resolution microlithographyKido, Motoi / Szabo, Gabor / Cavallaro, Joseph R. / Wilson, William L. / Tittel, Frank K. et al. | 1994
- 844
-
Innovative image formation: coherency controlled imaging [2197-79]Matsumoto, K. / Shiraishi, N. / Takeuchi, Y. / Hirukawa, S. / SPIE et al. | 1994
- 844
-
Innovative image formation: coherency controlled imagingMatsumoto, Koichi / Shiraishi, Naomasa / Takeuchi, Yuichiro / Hirukawa, Shigeru et al. | 1994
- 854
-
Quarter-micrometer lithography system with oblique illumination and pupil filterOrii, Seiji / Sekino, Tetsuya / Ohta, Masakatsu et al. | 1994
- 854
-
Quarter-micrometer lithography system with oblique illumination and pupil filter [2197-80]Orii, S. / Sekino, T. / Ohta, M. / SPIE et al. | 1994
- 869
-
Multiple-exposure interferometric lithographyZaidi, Saleem H. / Brueck, Steven R. J. et al. | 1994
- 869
-
Multiple-exposure interferometric lithography [2197-81]Zaidi, S. H. / Brueck, S. R. J. / SPIE et al. | 1994
- 876
-
Small-field projection imaging system for deep-UV developmentHollman, Richard F. / Elliott, David J. et al. | 1994
- 876
-
Small-field projection imaging system for deep-UV development [2197-82]Hollman, R. F. / Elliott, D. J. / SPIE et al. | 1994
- 882
-
Optimizing distortion for a large-field submicrometer lensHwang, Shiow-Hwei / Ruff, Bruce J. et al. | 1994
- 882
-
Optimizing distortion for a large-field submicrometer lens [2197-83]Hwang, S.-H. / Ruff, B. J. / SPIE et al. | 1994
- 894
-
1:1 catadioptric deep-UV optics with a full-circle available fieldZhang, Yudong et al. | 1994
- 894
-
1:1 catadioptric deep-UV optics with a full-circle available field [2197-84]Zhang, Y. / SPIE et al. | 1994
- 908
-
Recent advances of a KrF excimer laser on a plant's practical requirements [2197-85]Kobayashi, Y. / Ishihara, T. / Nakarai, H. / Itoh, N. / SPIE et al. | 1994
- 908
-
Recent advances of a KrF excimer laser on a plant's practical requirementsKobayashi, Yukio / Ishihara, Takanobu / Nakarai, Hiroaki / Ito, Noritoshi / Takahashi, Tomokazu / Wakabayashi, Osamu / Mizoguchi, Hakaru / Amada, Yoshiho / Fujimoto, Junichi / Kowaka, Masahiko et al. | 1994
- 920
-
High-repetition-rate lasers for advanced DUV exposure toolsRebhan, Ulrich / Paetzel, Rainer / Buecher, Hermann / Powell, Michael W. et al. | 1994
- 920
-
High-repetition-rate lasers for advanced DUV exposure tools [2197-86]Rebhan, U. / Paetzel, R. / Buecher, H. / Powell, M. W. / SPIE et al. | 1994
- 927
-
High-spectral-brightness operation of narrow-linewidth KrF laser for microlithography [2197-87]Novoselov, A. N. / Konstantinov, B. A. / Nikiforov, V. G. / Trinchuk, B. F. / SPIE et al. | 1994
- 927
-
High-spectral-brightness operation of narrow-linewidth KrF laser for microlithographyNovoselov, Alexander N. / Konstantinov, Boris A. / Nikiforov, Victor G. / Trinchuk, Boris F. et al. | 1994
- 932
-
Micrascan II overlay error analysisCronin, David J. / Gallatin, Gregg M. et al. | 1994
- 932
-
Micrascan II overlay error analysis [2197-88]Cronin, D. J. / Gallatin, G. M. / SPIE et al. | 1994
- 943
-
Deep-UV photolithography cluster performanceHarned, Noreen et al. | 1994
- 943
-
Deep-UV photolithography cluster performance [2197-90]Harned, N. / SPIE et al. | 1994
- 953
-
Simulations on step-and-scan optical lithographyBischoff, Joerg / Henke, Wolfgang / van der Werf, Jan / Dirksen, Peter et al. | 1994
- 953
-
Simulations on step-and-scan optical lithography [2197-91]Bischoff, J. / Henke, W. / Van der Werf, J. / Dirksen, P. / SPIE et al. | 1994
- 965
-
Progression of overlay performance on a 0.5-NA broadband DUV wafer exposure system [2197-92]Vigil, J. / Elder, G. B. / Cronin, D. J. / Draskiewicz, S. / SPIE et al. | 1994
- 965
-
Progression of overlay performance on a 0.5-NA broadband DUV wafer exposure systemVigil, Joseph C. / Elder, Gerald B. / Cronin, David J. / Drazkiewicz, Stan / Wiltshire, Timothy J. et al. | 1994
- 980
-
Focusing and leveling based on wafer surface profile detection with interferometry for optical lithographyWatanabe, Masahiro / Oshida, Yoshitada / Nakayama, Yasuhiko / Yoshida, Minoru / Funatsu, Ryuichi / Fujii, Akira / Ninomiya, Taku et al. | 1994
- 980
-
Focusing and leveling based on wafer surface profile detection with interferometry for optical lithography [2197-93]Watanabe, M. / Oshida, Y. / Nakayama, Y. / Yoshida, M. / SPIE et al. | 1994
- 990
-
Stepper stability improvement by a perfect self-calibration systemKuniyoshi, Shinji / Komoriya, Susumu / Sekiguchi, Koohei / Katoo, Takeshi et al. | 1994
- 990
-
Stepper stability improvement by a perfect self-calibration system [2197-94]Kuniyoshi, S. / Komoriya, S. / Sekiguchi, K. / Katoo, T. / SPIE et al. | 1994
- 997
-
Focusing and leveling system using position-sensitive detectors for the wafer steppers [2197-95]Kim, D. H. / Jang, W. I. / Choi, B. Y. / Lee, Y. I. / SPIE et al. | 1994
- 997
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Focusing and leveling system using position-sensitive detectors for the wafer steppersKim, Dohoon / Jang, Won-Ick / Choi, Boo-Yeon / Lee, Youngjik I. / Lee, Jong-Hyun / Yoo, Hyung Joun / Kang, S. W. / Kwon, Jin H. et al. | 1994