Fabrication of 0.25-m electrode width SAW filters using x-ray lithography with a laser plasma source [2723-46] (Englisch)
- Neue Suche nach: Bobkowski, R.
- Neue Suche nach: Li, Y.
- Neue Suche nach: Fedosejevs, R.
- Neue Suche nach: Broughton, J. N.
- Neue Suche nach: SPIE
- Neue Suche nach: Bobkowski, R.
- Neue Suche nach: Li, Y.
- Neue Suche nach: Fedosejevs, R.
- Neue Suche nach: Broughton, J. N.
- Neue Suche nach: Seeger, D. E.
- Neue Suche nach: SPIE
In:
Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing
2723
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393-401
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1996
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Fabrication of 0.25-m electrode width SAW filters using x-ray lithography with a laser plasma source [2723-46]
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Beteiligte:Bobkowski, R. ( Autor:in ) / Li, Y. ( Autor:in ) / Fedosejevs, R. ( Autor:in ) / Broughton, J. N. ( Autor:in ) / Seeger, D. E. / SPIE
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Kongress:Conference; 6th, Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing ; 1996 ; Santa Clara; CA
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Erschienen in:Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing , 2723 ; 393-401PROCEEDINGS- SPIE THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING , 2723 ; 393-401
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.1996
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Format / Umfang:9 pages
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2
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Patterning ULSI circuitsCarruthers, John R. et al. | 1996
- 2
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Patterning ULSI circuits [2723-01]Carruthers, J. R. / SPIE et al. | 1996
- 15
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University-industry relations: what do we do now? [2723-02]Armstrong, J. A. / SPIE et al. | 1996
- 15
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University-industry relations: what do we do now?Armstrong, John A. et al. | 1996
- 26
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Science and technology policy in the 104th Congress [2723-03]Lofgren, Z. / SPIE et al. | 1996
- 26
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Science and technology policy in the 104th CongressLofgren, Zoe et al. | 1996
- 34
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Optical system for high-throughput EUV lithography [2723-04]Katagiri, S. / Ito, M. / Yamanashi, H. / Seya, E. / SPIE et al. | 1996
- 34
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Optical system for high-throughput EUV lithographyKatagiri, Souichi / Ito, Masaaki / Yamanashi, Hiromasa / Seya, Eiichi / Terasawa, Tsuneo et al. | 1996
- 46
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Silicon oxide deposition using a gallium-focused ion beamKomano, Haruki / Nakamura, Hiroko / Kariya, Mitsuyo / Ogasawara, Munehiro et al. | 1996
- 46
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Silicon oxide deposition using a gallium-focused ion beam [2723-05]Komano, H. / Nakamura, H. / Kariya, M. / Ogasawara, M. / SPIE et al. | 1996
- 54
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Characterization of the alignment system on a laboratory extreme ltraviolet lithography toolNguyen, Khanh B. / Tichenor, Daniel A. / Berger, Kurt W. / Ray-Chaudhuri, Avijit K. / Haney, Steven J. / Nissen, Rodney P. / Perras, Yon E. / Arling, Richard W. / Stulen, Richard H. / Fetter, Linus A. et al. | 1996
- 54
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Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool [2723-06]Nguyen, K. B. / Tichenor, D. A. / Berger, K. W. / Ray-Chaudhuri, A. K. / SPIE et al. | 1996
- 63
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Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laserKim, Tae-Geun / Hwang, Sung Min / Kim, Seong-Il / Son, Chang-Sik / Kim, Eun K. / Min, Suk-Ki / Park, Jung-Ho / Park, Kyung Hyun et al. | 1996
- 63
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Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser [2723-07]Kim, T.-G. / Hwang, S.-M. / Kim, S.-I. / Son, C.-S. / SPIE et al. | 1996
- 68
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Conception of optimal designing of optical column for ion projection lithography [2723-08]Jatchmenev, S. N. / Chinenov, A. A. / SPIE et al. | 1996
- 68
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Conception of optimal designing of optical column for ion projection lithographyJatchmenev, Stanislav N. / Chinenov, Alexander A. et al. | 1996
- 82
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Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithographyGramss, Juergen / Eichhorn, Hans / Baetz, Uwe et al. | 1996
- 82
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Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography [2723-09]Gramss, J. / Eichhorn, H. / Baetz, U. / SPIE et al. | 1996
- 91
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Position measurement of high-energy e-beams for pattern placement improvementPerkins, F. Keith / McCarthy, Daniel / Marrian, Christie R. / Peckerar, Martin C. et al. | 1996
- 91
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Position measurement of high-energy e-beams for pattern placement improvement [2723-10]Perkins, F. K. / McCarthy, D. / Marrian, C. R. K. / Peckerar, M. C. / SPIE et al. | 1996
- 102
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New electron-beam mask-writing system for 0.25-m lithography [2723-11]Satoh, H. / Someda, Y. / Saitou, N. / Kawasaki, K. / SPIE et al. | 1996
- 102
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New electron-beam mask writing system for 0.25-um lithographySatoh, Hidetoshi / Someda, Yasuhiro / Saitou, Norio / Kawasaki, Katsuhiro / Itoh, Hiroyuki / Mizuno, Kazui et al. | 1996
- 112
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Development of two new positive DUV photoresists for use with direct-write e-beam lithographyMancini, David P. / Resnick, Douglas J. / Nordquist, Kevin J. / Dauksher, William J. / Thackeray, James W. / McCord, Mark A. et al. | 1996
- 112
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Development of two new positive DUV photoresists for use with direct-write e-beam lithography [2723-12]Mancini, D. P. / Resnick, D. J. / Nordquist, K. J. / Dauksher, W. J. / SPIE et al. | 1996
- 122
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CD uniformity of photomasks written with high-voltage variable-shaped e beam [2723-13]Nakayamada, N. / Hara, S. / Magoshi, T. / Sakurai, H. / SPIE et al. | 1996
- 122
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CD uniformity of photomasks written with high-voltage variable-shaped e beamNakayamada, Noriaki / Hara, Shigehiro / Magoshi, Toshiyuki / Sakurai, Hideaki / Abe, Takayuki / Higashikawa, Iwao et al. | 1996
- 134
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Pattern-density-dependent contrast in commonly used dose-equalization schemes [2723-14]Peckerar, M. C. / Marrian, C. R. K. / SPIE et al. | 1996
- 134
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Pattern-density-dependent contrast in commonly used dose-equalization schemesPeckerar, Martin C. / Marrian, Christie R. et al. | 1996
- 143
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Mark topography for alignment and registration in projection electron lithographyFarrow, Reginald C. / Mkrtchyan, Masis M. / Bolen, Kevin / Blakey, Myrtle I. / Biddick, Christopher J. / Fetter, Linus A. / Huggins, Harold A. / Tarascon-Auriol, Regine G. / Berger, Steven D. et al. | 1996
- 143
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Mark topography for alignment and registration in projection electron lithography [2723-15]Farrow, R. C. / Mkrtchyan, M. M. / Bolen, K. / Blakey, M. / SPIE et al. | 1996
- 150
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Hierarchical e-beam proximity correction in mask making [2723-16]Hofmann, U. / Kalus, C. K. / Rosenbusch, A. / Jonckheere, R. / SPIE et al. | 1996
- 150
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Hierarchical e-beam proximity correction in mask makingHofmann, Ulrich / Kalus, Christian K. / Rosenbusch, Anja / Jonckheere, Rik M. / Hourd, Andrew C. et al. | 1996
- 159
-
Simulation and modeling of electron-beam lithography for delineating 0.2-um line and space patternsHam, Young-Mog / Lee, Changbuhm / Suh, Taewon / Chun, KukJin / Lee, Jong-Duk et al. | 1996
- 159
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Simulation and modeling of electron-beam lithography for delineating 0.2m line and space patterns [2723-17]Ham, Y.-M. / Lee, C.-B. / Suh, T. W. / Chun, K. / SPIE et al. | 1996
- 170
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Fine-pitch control in EB lithography for semiconductor laser grating formation [2723-18]Hisa, Y. / Minami, H. / Shibata, K. M. / Takemoto, A. / SPIE et al. | 1996
- 170
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Fine-pitch control in EB lithography for semiconductor laser grating formationHisa, Yoshihiro / Minami, Hiroyuki / Shibata, Kimitaka / Takemoto, Akira / Sato, Kazuhiko / Nagahama, Kouki / Otsubo, Mutuyuki / Aiga, Masao et al. | 1996
- 180
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Mix-and-match lithography processes for 0.1-um MOS transistor device fabricationYew, Jen Y. / Chen, Lih J. / Nakamura, Kazumitsu / Chao, Tien S. / Lin, Horng-Chih et al. | 1996
- 180
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Mix-and-match lithography processes for 0.1-m MOS transistor device fabrication [2723-19]Yew, J.-Y. / Chen, L.-J. / Nakamura, K. / Chao, T.-S. / SPIE et al. | 1996
- 190
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X-ray mask fabrication advancements at the Microlithographic Mask Development CenterKimmel, Kurt R. / Hughes, Patrick J. et al. | 1996
- 190
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X-ray mask fabrication advancements at the Microlithographic Mask Development Center [2723-20]Kimmel, K. R. / Hughes, P. J. / SPIE et al. | 1996
- 198
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Development of x-ray mask in TaiwanSheu, Jeng Tzong / Su, Shyang et al. | 1996
- 198
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Development of x-ray mask in Taiwan [2723-21]Sheu, J. T. / Su, S. / SPIE et al. | 1996
- 204
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X-ray mask image-placement studies at the Microlithography Mask Development CenterPuisto, Denise M. / Lawliss, Mark / Faure, Thomas B. / Rocque, Janet M. / Kimmel, Kurt R. / Benoit, Douglas E. et al. | 1996
- 204
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X-ray mask image-placement studies at the Microlithography Mask Development Center [2723-22]Puisto, D. / Lawliss, M. / Faure, T. / Rocque, J. M. / SPIE et al. | 1996
- 211
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Novel x-ray mask inspection tool based on transmission x-ray conversion microscope [2723-23]Liang, S. T. / Cerrina, F. / Lucatorto, T. B. / SPIE et al. | 1996
- 211
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Novel x-ray mask inspection tool based on transmission x-ray conversion microscopeLiang, Ted / Cerrina, Franco / Lucatorto, Thomas B. et al. | 1996
- 222
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Application of SR lithography to 0.14-m device fabrication [2723-24]Sumitani, H. / Itoga, K. / Shimano, H. / Aya, S. / SPIE et al. | 1996
- 222
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Application of SR lithography to 0.14-um device fabricationSumitani, Hiroaki / Itoga, Kenji / Shimano, Hiroki / Aya, Sunao / Yabe, Hideki / Hifumi, Takashi / Watanabe, Hiroshi / Kise, Koji / Inoue, Masami / Marumoto, Kenji et al. | 1996
- 237
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X-ray exposure in the manufacture of sub-150-nm gate lines [2723-25]Lamberti, A. C. / Agnello, P. D. / Crabbe, E. F. / Della Guardia, R. / SPIE et al. | 1996
- 237
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X-ray exposure in the manufacture of sub-150-nm gate linesLamberti, Angela C. / Agnello, Paul D. / Crabbe, Emmanuel F. / DellaGuardia, Ronald / Oberschmidt, James M. / Subbana, Seshu / Wu, Steve et al. | 1996
- 249
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Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion [2723-26]Dentinger, P. M. / Taylor, J. W. / SPIE et al. | 1996
- 249
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Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesionDentinger, Paul M. / Taylor, James W. et al. | 1996
- 261
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New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profileMakarov, Oleg A. / Chen, Zheng / Krasnoperova, Azalia A. / Cerrina, Franco / Cherkashin, Vadim V. / Poleshchuk, Alexander G. / Koronkevich, Voldemar P. et al. | 1996
- 261
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New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile [2723-27]Makarov, O. A. / Chen, Z. G. / Krasnoperova, A. A. / Cerrina, F. / SPIE et al. | 1996
- 268
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Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer poresKulipanov, G. N. / Makarov, Oleg A. / Mezentseva, Lubov A. / Mishnev, S. I. / Nazmov, Vladimir / Pindyurin, Valery F. / Skrinsky, A. N. / Artamonova, L. D. / Cherkov, G. A. / Gashtold, V. N. et al. | 1996
- 268
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Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores [2723-28]Kulipanov, G. N. / Makarov, O. A. / Mezentseva, L. A. / Mishnev, S. I. / SPIE et al. | 1996
- 278
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Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography [2723-29]Zhang, L. / Panarella, E. / Bielawski, M. / Chen, H. / SPIE et al. | 1996
- 278
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Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithographyZhang, Liyan / Panarella, Emilio / Bielawski, Mariusz / Chen, Haibo et al. | 1996
- 288
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Alternative soft x-ray source for step-and-scan lithographyPiestrup, Melvin A. / Powell, Michael W. / Lombardo, Louis W. et al. | 1996
- 288
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Alternative soft x-ray source for step-and-scan lithography [2723-30]Piestrup, M. A. / Powell, M. W. / Lombardo, L. W. / SPIE et al. | 1996
- 299
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Characterization techniques for x-ray lithography sources [2723-48]Maldonado, J. R. / Celliers, P. M. / SPIE et al. | 1996
- 299
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Characterization techniques for x-ray lithography sourcesMaldonado, Juan R. / Celliers, Peter M. et al. | 1996
- 310
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Debrisless laser-produced x-ray source with a gas puff target [2723-31]Fiedorowicz, H. / Bartnik, A. / Kostecki, J. / Szczurek, M. / SPIE et al. | 1996
- 310
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Debrisless laser-produced x-ray source with a gas puff targetFiedorowicz, Henryk / Bartnik, Andrzej / Kostecki, Jerzy / Szczurek, Miroslaw et al. | 1996
- 317
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Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As~2S~3 [2723-33]Gladysheva, L. G. / Kaliteevskaia, N. A. / Seisyan, R. P. / Smirnov, D. V. / SPIE et al. | 1996
- 317
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Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3Rotkina, Lolita G. / Kaliteevskaia, N. A. / Seisyan, Ruben P. / Smirnov, D. V. / Babushkin, S. / Vasilevsky, M. A. et al. | 1996
- 321
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Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure [2723-34]Choi, S.-S. / Jeon, Y. J. / Kim, J.-S. / Chung, H. B. / SPIE et al. | 1996
- 321
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Damage characterization of SiN x-ray mask membrane caused by electron-beam exposureChoi, Sang-Soo / Jeon, Young Jin / Kim, Jong-Soo / Chung, Hai Bin / Lee, Sang-Yun / Lee, Jong-Hyun / Yoo, Hyung Joun et al. | 1996
- 332
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Geometry of x-ray point source proximity printing, part II: overlay effectsHollanda, Peter A. et al. | 1996
- 332
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Geometry of x-ray point-source proximity printing, Part II: overlay effects [2723-35]Hollanda, P. A. / SPIE et al. | 1996
- 339
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Experiment and simulation of e-beam direct writing over topographyJagdhold, Ulrich A. / Bauch, Lothar / Boettcher, Monika et al. | 1996
- 339
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Experiment and simulation of e-beam direct writing over topography [2723-36]Jagdhold, U. A. / Bauch, L. / Boettcher, M. / SPIE et al. | 1996
- 348
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Enhanced defect inspection method for x-ray masks [2723-40]Sekimoto, M. / Okada, I. / Saitoh, Y. / Matsuda, T. / SPIE et al. | 1996
- 348
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Enhanced defect inspection method for x-ray masksSekimoto, Misao / Okada, Ikuo / Saitoh, Yasunao / Matsuda, Tadahito et al. | 1996
- 360
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Thick PMMA layer formation as an x-ray imaging medium for micromachining [2723-42]Vladimirsky, O. / Calderon, G. / Vladimirsky, Y. / Manohara, H. / SPIE et al. | 1996
- 360
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Thick PMMA layer formation as an x-ray imaging medium for micromachiningVladimirsky, Olga / Calderon, Gina M. / Vladimirsky, Yuli / Manohara, Harish M. et al. | 1996
- 372
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Optimization of electron-beam lithography for super-low-noise HEMTs [2723-44]Choi, S.-S. / Lee, J.-H. / Yun, H. S. / Chung, H. B. / SPIE et al. | 1996
- 372
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Optimization of electron-beam lithography for super-low-noise HEMTsChoi, Sang-Soo / Lee, Jin-Hee / Yun, Hyung-Sup / Chung, Hai Bin / Lee, Sang-Yun / Yoo, Hyung Joun et al. | 1996
- 383
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Process latitude for 100-nm dimensions for e-beam lithography in SAL-601 [2723-45]Dobisz, E. A. / Marrian, C. R. K. / SPIE et al. | 1996
- 383
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Process latitude for 100-nm dimensions for e-beam lithography in SAL-601Dobisz, Elizabeth A. / Marrian, Christie R. et al. | 1996
- 393
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Fabrication of 0.25-m electrode width SAW filters using x-ray lithography with a laser plasma source [2723-46]Bobkowski, R. / Li, Y. / Fedosejevs, R. / Broughton, J. N. / SPIE et al. | 1996
- 393
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Fabrication of 0.25-um electrode width SAW filters using x-ray lithography with a laser plasma sourceBobkowski, Romuald / Li, Yunlei / Fedosejevs, Robert / Broughton, James N. et al. | 1996
- 402
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Nanolithography by scanning probe stimulated development of photoresistsBalk, Ludwig J. / Koschinski, Paul M. / Fiege, Gero B. M. / Reineke, Frank J. et al. | 1996
- 402
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Nanolithography by scanning probe stimulated development of photoresists [2723-47]Balk, L. J. / Koschinski, P. M. / Fiege, G. B. M. / Reineke, F. J. / SPIE et al. | 1996