S-THERMANAL: an efficient thermal simulation tool for microsystem elements and MCMs [2880-05] (Englisch)
- Neue Suche nach: Szekely, V.
- Neue Suche nach: Csendes, A.
- Neue Suche nach: Rencz, M.
- Neue Suche nach: SPIE
- Neue Suche nach: Szekely, V.
- Neue Suche nach: Csendes, A.
- Neue Suche nach: Rencz, M.
- Neue Suche nach: Postek, M. T.
- Neue Suche nach: Friedrich, C.
- Neue Suche nach: SPIE
In:
Microlithography and metrology in micromachining
2880
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64-77
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1996
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:S-THERMANAL: an efficient thermal simulation tool for microsystem elements and MCMs [2880-05]
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Beteiligte:Szekely, V. ( Autor:in ) / Csendes, A. ( Autor:in ) / Rencz, M. ( Autor:in ) / Postek, M. T. / Friedrich, C. / SPIE
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Kongress:Annual conference; 2nd, Microlithography and metrology in micromachining ; 1996 ; Austin; TX
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Erschienen in:Microlithography and metrology in micromachining , 2880 ; 64-77
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.1996
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Format / Umfang:14 pages
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2
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Application of micromachining technology to optical devices and systems [2880-33]Fujita, H. / SPIE et al. | 1996
- 2
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Application of micromachining technology to optical devices and systems (Same as Vols. 2881 and 2882, p. 2)Fujita, H. et al. | 1996
- 12
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Commercializing MEMS--too fast or too slow? (Same as Vols. 2881 and 2882, p. 12)Walsh, S. / Carr, W. N. / Mados, H. / Narang, D. S. et al. | 1996
- 12
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Commercializing MEMS-too fast or too slow? [2880-34]Walsh, S. / Carr, W. N. / Mados, H. / Narang, D. S. / SPIE et al. | 1996
- 26
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Review on the importance of measurement technique in micromachine technologyUmeda, Akira et al. | 1996
- 26
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Review on the importance of measurement technique in micromachine technology (Invited Paper) [2880-01]Umeda, A. / SPIE et al. | 1996
- 39
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Material property measurements of micromechanical polysilicon beamsGupta, Raj K. / Osterberg, Peter M. / Senturia, Stephen D. et al. | 1996
- 39
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Material property measurements of micromechanical polysilicon beams (Invited Paper) [2880-02]Gupta, R. K. / Osterberg, P. M. / Senturia, S. D. / SPIE et al. | 1996
- 46
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Analysis of fixed-fixed beam test structures [2880-03]Marshall, J. C. / Read, D. T. / Gaitan, M. / SPIE et al. | 1996
- 46
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Analysis of fixed-fixed beam test structuresMarshall, Janet C. / Read, David T. / Gaitan, Michael et al. | 1996
- 56
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Measurements of fracture strength and Young's modulus of surface-micromachined polysiliconRead, David T. / Marshall, Janet C. et al. | 1996
- 56
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Measurements of fracture strength and Young's modulus of surface-micromachined polysilicon [2880-04]Read, D. T. / Marshall, J. C. / SPIE et al. | 1996
- 64
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S-THERMANAL: an efficient thermal simulation tool for microsystem elements and MCMs [2880-05]Szekely, V. / Csendes, A. / Rencz, M. / SPIE et al. | 1996
- 64
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μS-THERMANAL: an efficient thermal simulation tool for microsystem elements and MCMsSzekely, Vladimir / Csendes, A. / Rencz, Marta et al. | 1996
- 78
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New test structures and techniques for measurement of mechanical properties of MEMS materialsSharpe, William N. / Yuan, Bin / Vaidyanathan, Ranji / Edwards, Richard L. et al. | 1996
- 78
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New test structures and techniques for measurement of mechanical properties of MEMS materials (Invited Paper) [2880-06]Sharpe, W. N. / Yuan, B. / Vaidyanathan, R. / Edwards, R. L. / SPIE et al. | 1996
- 92
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Investigation on the frequency response characteristics of an instrument for laser vibrometry and laser displacementmetryUmeda, Akira / Ueda, Kazunaga et al. | 1996
- 92
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Investigation on the frequency response characteristics of an instrument for laser vibrometry and laser displacementmetry [2880-07]Umeda, A. / Ueda, K. / SPIE et al. | 1996
- 99
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Microstructures designed for shock robustness [2880-08]Cunningham, S. / McIntyre, D. / Carper, J. / Jaramillo, P. / SPIE et al. | 1996
- 99
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Microstructures designed for shock robustnessCunningham, Shawn J. / McIntyre, David / Carper, Judd / Jaramillo, Paul / Tang, William C. et al. | 1996
- 108
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Mechanical characterization of shape memory micromaterialsKohl, Manfred / Skrobanek, K. D. / Goh, C. M. / Allen, David M. et al. | 1996
- 108
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Mechanical characterization of shape memory micromaterials [2880-09]Kohl, M. / Skrobanek, K. D. / Goh, C. M. / Allen, D. M. / SPIE et al. | 1996
- 119
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Davies bar as the reference for impact acceleration metrology [2880-10]Umeda, A. / Ueda, K. / SPIE et al. | 1996
- 119
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Davies bar as the reference for impact acceleration metrologyUmeda, Akira / Ueda, Kazunaga et al. | 1996
- 130
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Fabrication of composite x-ray masks by micromilling (Invited Paper) [2880-11]Coane, P. J. / Friedrich, C. / SPIE et al. | 1996
- 130
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Fabrication of composite x-ray masks by micromillingCoane, Philip J. / Friedrich, Craig R. et al. | 1996
- 142
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New certified length scale for microfabrication metrology [2880-12]Potzick, J. E. / SPIE et al. | 1996
- 142
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New certified length scale for microfabrication metrologyPotzick, James E. et al. | 1996
- 152
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Critical dimension metrology for MEMS processes using electrical techniquesAllen, Richard A. / Marshall, Janet C. et al. | 1996
- 152
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Critical dimension metrology for MEMS processes using electrical techniques [2880-13]Allen, R. A. / Marshall, J. C. / SPIE et al. | 1996
- 160
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Multiexposure capability development for deep x-ray lithography for MEMSKhan Malek, Chantal G. / Wood, Robert L. / Dudley, Bruce W. / Ling, Zhong G. / Saile, Volker et al. | 1996
- 160
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Multiexposure capability development for deep x-ray lithography for MEMS [2880-15]Khan Malek, C. / Wood, R. / Dudley, B. W. / Ling, Z. / SPIE et al. | 1996
- 171
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Beamline and exposure station for deep x-ray lithography at the advanced photon sourceLai, Barry P. / Mancini, Derrick C. / Yun, Wenbing / Gluskin, Efim S. et al. | 1996
- 171
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Beamline and exposure station for deep x-ray lithography at the advanced photon source [2880-16]Lai, B. P. / Mancini, D. C. / Yun, W.-B. / Gluskin, E. S. / SPIE et al. | 1996
- 177
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Cyanoacrylate bonding of thick resists for LIGARogers, James G. / Marques, Christophe / Kelly, Kevin W. / Sangishetty, Venkat / Khan Malek, Chantal G. et al. | 1996
- 177
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Cyanoacrylate bonding of thick resists for LIGA [2880-17]Rogers, J. G. / Marques, C. / Kelly, K. W. / Sangishetty, V. / SPIE et al. | 1996
- 183
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Temperature rise in thick PMMA resists during x-ray exposureManohara, Harish M. / Calderon, Gina M. / Klopf, J. Michael / Morris, Kevin J. / Vladimirsky, Olga / Vladimirsky, Yuli et al. | 1996
- 183
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Temperature rise in thick PMMA resists during x-ray exposure [2880-18]Manohara, H. M. / Calderon, G. / Klopf, J. / Morris, K. J. / SPIE et al. | 1996
- 191
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LIGA-based family of tips for scanning probe applicationsAkkaraju, Sandeep / Desta, Yohannes M. / Li, BenQiang / Murphy, Michael C. / Vladimirsky, Olga / Vladimirsky, Yuli et al. | 1996
- 191
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LIGA-based family of tips for scanning probe applications [2880-19]Akkaraju, S. / Desta, Y. M. / Li, B. Q. / Murphy, C. / SPIE et al. | 1996
- 200
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Dimensional variation and roughness of LIGA-fabricated microstructures [2880-20]Egert, C. M. / Wood, R. / Khan Malek, C. / SPIE et al. | 1996
- 200
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Dimensional variation and roughness of LIGA-fabricated microstructuresEgert, Charles M. / Wood, Robert L. / Khan Malek, Chantal G. et al. | 1996
- 210
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New array lens optical system for large-area micromachining lithography [2880-32]Wang, L. / Markle, D. A. / Ellis, R. J. / Jeong, H. J. / SPIE et al. | 1996
- 210
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New array lens optical system for large-area micromachining lithographyWang, Lawrence C. / Markle, David A. / Ellis, Raymond J. / Jeong, Hwan J. et al. | 1996
- 224
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Design, fabrication, and testing of polysilicon microheaters in silicon [2880-22]George, N. / Srivastava, A. / SPIE et al. | 1996
- 224
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Design, fabrication, and testing of polysilicon microheaters in siliconGeorge, Naveen / Srivastava, Ashok et al. | 1996
- 231
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Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithography [2880-23]Calderon, G. / Morris, K. J. / Vladimirsky, O. / Vladimirsky, Y. / SPIE et al. | 1996
- 231
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Multilevel 3D patterning of stacked PMMA sheets for x-ray microlithographyCalderon, Gina M. / Morris, Kevin J. / Vladimirsky, Olga / Vladimirsky, Yuli et al. | 1996
- 236
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Microsystem design framework based on tool adaptations and library developments [2880-24]Karam, J.-M. / Courtois, B. / Rencz, M. / Poppe, A. / SPIE et al. | 1996
- 236
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Microsystem design framework based on tool adaptations and library developmentsKaram, Jean Michel / Courtois, Bernard / Rencz, Marta / Poppe, Andras / Szekely, Vladimir et al. | 1996
- 248
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Fabrication of microstructures by ion beam micromachiningDavies, Sam T. / Hayton, D. A. / Tsuchiya, Kazuyoshi et al. | 1996
- 248
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Fabrication of microstructures by ion beam micromachining [2880-25]Davies, S. T. / Hayton, D. A. / Tsuchiya, K. / SPIE et al. | 1996
- 256
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Lateral force microscopy using cantilevers with integrated Wheatstone bridge piezoresistive deflection sensorGotszalk, Teodor / Rangelow, Ivo W. / Dumania, Piotr / Grabiec, Piotr B. et al. | 1996
- 256
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Lateral force microscopy using cantilevers with integrated Wheatstone bridge piezoresistive deflection sensor [2880-27]Gotszalk, T. / Rangelow, I. W. / Dumania, P. / Grabiec, P. B. / SPIE et al. | 1996
- 264
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Cantilever with integrated Wheatstone bridge piezoresistive deflection sensor: analysis of force interaction measurement sensitivity [2880-28]Gotszalk, T. / Rangelow, I. W. / Dumania, P. / Grabiec, P. B. / SPIE et al. | 1996
- 264
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Cantilever with integrated Wheatstone bridge piezoresistive deflection sensor: analysis of force interaction measurement sensitivityGotszalk, Teodor / Rangelow, Ivo W. / Dumania, Piotr / Grabiec, Piotr B. et al. | 1996
- 272
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Measurements of stress-strain diagrams of thin films by a developed tensile machine [2880-29]Ogawa, H. / Ishikawa, Y. / Kitahara, T. / Kaneko, S. / SPIE et al. | 1996
- 272
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Measurements of stress-strain diagrams of thin films by a developed tensile machineOgawa, Hirofumi / Ishikawa, Yuichi / Kitahara, Tokio / Kaneko, Shinji et al. | 1996
- 280
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Transient thermal analysis of micromachined silicon bridge [2880-30]Yuasa, H. / Ohya, S. / Karasawa, S. / Kodato, S. / SPIE et al. | 1996
- 280
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Transient thermal analysis of micromachined silicon bridgeYuasa, Hiroyasu / Ohya, Seishiro / Karasawa, Shiro / Kodato, Setsuo / Akimoto, Kenji et al. | 1996
- 288
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Fabrication of mm-wave undulator/linear accelerator cavities using deep x-ray lithography [2280-31]Song, J. J. / Kang, Y. W. / Kustom, R. L. / Lai, B. P. / SPIE et al. | 1996
- 288
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Fabrication of mm-wave undulator/linear accelerator cavities using deep x-ray lithographySong, Joshua J. / Kang, Y. W. / Kustom, Robert L. / Lai, Barry P. / Mancini, Derrick C. / Nassiri, A. / White, V. et al. | 1996