Inverse lithography technology at chip scale [6154-41] (Englisch)
- Neue Suche nach: Lin, B.
- Neue Suche nach: Shieh, M. F.
- Neue Suche nach: Sun, J.
- Neue Suche nach: Ho, J.
- Neue Suche nach: Wang, Y.
- Neue Suche nach: Wu, X.
- Neue Suche nach: Leitermann, W.
- Neue Suche nach: Lin, O.
- Neue Suche nach: Lin, J.
- Neue Suche nach: Liu, Y.
- Neue Suche nach: SPIE-- the International Society for Optical Engineering
- Neue Suche nach: Lin, B.
- Neue Suche nach: Shieh, M. F.
- Neue Suche nach: Sun, J.
- Neue Suche nach: Ho, J.
- Neue Suche nach: Wang, Y.
- Neue Suche nach: Wu, X.
- Neue Suche nach: Leitermann, W.
- Neue Suche nach: Lin, O.
- Neue Suche nach: Lin, J.
- Neue Suche nach: Liu, Y.
- Neue Suche nach: Flagello, Donis G.
- Neue Suche nach: SPIE-- the International Society for Optical Engineering
In:
Optical microlithography
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615414
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2006
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Inverse lithography technology at chip scale [6154-41]
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Beteiligte:Lin, B. ( Autor:in ) / Shieh, M. F. ( Autor:in ) / Sun, J. ( Autor:in ) / Ho, J. ( Autor:in ) / Wang, Y. ( Autor:in ) / Wu, X. ( Autor:in ) / Leitermann, W. ( Autor:in ) / Lin, O. ( Autor:in ) / Lin, J. ( Autor:in ) / Liu, Y. ( Autor:in )
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Kongress:Technical conference; 19th, Optical microlithography ; 2006 ; San Jose, CA
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Erschienen in:Optical microlithography ; 615414
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2006
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Format / Umfang:615414 pages
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
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Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 61540A
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Evanescent wave imaging in optical lithographySmith, Bruce W. / Fan, Yongfa / Zhou, Jianming / Lafferty, Neal / Estroff, Andrew et al. | 2006
- 61540B
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Enabling the 45nm node by hyper-NA polarized lithographyde Boeij, Wim / Swinkels, Geert / Le Masson, Nicolas / Koolen, Armand / van Greevenbroek, Henk / Klaassen, Michel / van de Kerkhof, Mark / van Ingen Schenau, Koen / de Winter, Laurens / Wehrens, Martijn et al. | 2006
- 61540C
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Effect of azimuthally polarized illumination imaging on device patterns beyond 45nm nodeOzawa, Ken / Thunnakart, Boontarika / Kaneguchi, Tokihisa / Mita, Isao / Someya, Atsushi / Nakashima, Toshiharu / Nishinaga, Hisashi / Mizuno, Yasushi / Matsuyama, Tomoyuki / Hamatani, Masato et al. | 2006
- 61540D
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Experimental verification of PSM polarimetry: monitoring polarization at 193nm high-NA with phase shift masksMcIntyre, Gregory / Neureuther, Andrew / Slonaker, Steve / Vellanki, Venu / Reynolds, Patrick et al. | 2006
- 61540E
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Polarization aberration analysis in optical lithography systemsKye, Jongwook / McIntyre, Gregory / Norihiro, Yamamoto / Levinson, Harry J. et al. | 2006
- 61540F
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High NA polarized light lithography for 0.29k1 processPark, Chanha / Lee, Jeonkyu / Yang, Kiho / Tseng, Shih-en / Min, Young-Hong / Chen, Alek C. / Yang, Hyunjo / Yim, Donggyu / Kim, Jinwoong et al. | 2006
- 61540G
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Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM maskErdmann, Andreas / Citarella, Giuseppe / Evanschitzky, Peter / Schermer, Hans / Philipsen, Vicky / De Bisschop, Peter et al. | 2006
- 61540H
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Global optimization of the illumination distribution to maximize integrated process windowRosenbluth, Alan E. / Seong, Nakgeuon et al. | 2006
- 61540I
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Dense OPC and verification for 45nmCobb, Nicolas / Dudau, Dragos et al. | 2006
- 61540J
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OPC and verification accuracy enhancement using the 2D wafer image for the low-k1 memory devicesBan, Yong-Chan / Lee, Dong-Yoon / Hong, Ji-Suk / Yoo, Moon-Hyun / Kong, Jeong-Taek et al. | 2006
- 61540K
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(Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA, immersion lithography systemsGordon, R. L. / Rimmer, M. P. et al. | 2006
- 61540L
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An integrated lithography concept with application on 45-nm ½ pitch flash memory devicesDusa, Mircea / Engelen, Andre / Finders, Jo et al. | 2006
- 61540M
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Alternating phase shift mask technology for 65nm logic applicationsChakravorty, Kishore K. / Henrichs, Sven / Qiu, Wei / Chavez, Joas L. / Liu, Yi-Ping / Ghadiali, Firoz / Yung, Karmen / Wilcox, Nathan / Silva, Mary / Ma, Jian et al. | 2006
- 61540N
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Across wafer focus mapping and its applications in advanced technology nodesZhang, Gary / DeMoor, Stephen / Jessen, Scott / He, Qizhi / Yan, Winston / Chevacharoenkul, Sopa / Vellanki, Venugopal / Reynolds, Patrick / Ganeshan, Joe / Hauschild, Jan et al. | 2006
- 61540O
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Characterizing a scanner illuminator for prediction of OPE effectsRenwick, Stephen P. / Nishinaga, Hisashi / Kita, Naonori et al. | 2006
- 61540P
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MEEF-based correction to achieve OPC convergence of low-k1 lithography with strong OAIChoi, Soo-Han / Je, A-Young / Hong, Ji-Suk / Yoo, Moon-Hyun / Kong, Jeong-Taek et al. | 2006
- 61540Q
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Basic studies of overlay performance on immersion lithography toolShiraishi, Ken-ichi / Fujiwara, Tomoharu / Tanizaki, Hirokazu / Ishii, Yuuki / Kono, Takuya / Nakagawa, Shinichiro / Higashiki, Tatsuhiko et al. | 2006
- 61540R
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Experimental characterization of the receding meniscus under conditions associated with immersion lithographyShedd, Timothy A. / Schuetter, Scott D. / Nellis, Gregory F. / Van Peski, Chris K. et al. | 2006
- 61540S
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A dive into clear water: immersion defect capabilitiesStreefkerk, B. / Mulkens, J. / Moerman, R. / Stavenga, M. / van der Hoeven, J. / Grouwstra, C. / Bruls, R. / Leenders, M. / Wang, S. / van Dommelen, Y. et al. | 2006
- 61540T
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Investigation of immersion related defects using pre- and post-wet experimentsBrandl, Stefan / Watso, Robert / Pierson, Bill / Holmes, Steve / Wei, Yayi / Petrillo, Karen / Cummings, Kevin / Goodwin, Frank et al. | 2006
- 61540U
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Immersion effects on lithography system performanceNagahara, Seiji / Pollentier, Ivan / Machida, Takahiro / O'Brien, Sean / Jacobs, Eric / Schaap, Charles / Leray, Philippe / Storms, Greet / Nafus, Kathleen / Laidler, David et al. | 2006
- 61540V
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Laser bandwidth and other sources of focus blur in lithographyBrunner, T. / Corliss, D. / Butt, S. / Wiltshire, T. / Ausschnitt, C. P. / Smith, M. et al. | 2006
- 61540X
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Aerial image based lens metrology for wafer steppersDirksen, Peter / Braat, Joseph J. M. / Janssen, Augustus J. E. M. / Leeuwestein, Ad / Matsuyama, Tomoyuki / Noda, Tomoya et al. | 2006
- 61540Y
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Practical approach to full-field wavefront aberration measurement using phase wheel targetsZavyalova, Lena V. / Smith, Bruce W. / Bourov, Anatoly / Zhang, Gary / Vellanki, Venugopal / Reynolds, Patrick / Flagello, Donis G. et al. | 2006
- 61540Z
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Effects of laser bandwidth on OPE in a modern lithography toolHuggins, Kevin / Tsuyoshi, Toki / Ong, Meng / Rafac, Robert / Treadway, Christopher / Choudhary, Devashish / Kudo, Takehito / Hirukawa, Shigeru / Renwick, Stephen P. / Farrar, Nigel R. et al. | 2006
- 61541A
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High index fluoride materials for 193nm immersion lithographyNawata, T. / Inui, Y. / Masada, I. / Nishijima, E. / Satoh, H. / Fukuda, T. et al. | 2006
- 61541C
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Mask defect printing mechanisms for future lithography generationsErdmann, Andreas / Graf, Thomas / Bubke, Karsten / Höllein, Ingo / Teuber, Silvio et al. | 2006
- 61541D
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High-transmission mask technology for 45nm node imagingConley, Will / Morgana, Nicoló / Kasprowicz, Bryan S. / Cangemi, Mike / Lassiter, Matt / Litt, Lloyd C. / Cangemi, Marc / Cottle, Rand / Wu, Wei / Cobb, Jonathan et al. | 2006
- 61541E
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Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA lithographyYoshizawa, Masaki / Philipsen, Vicky / Leunissen, Leonardus H. A. et al. | 2006
- 61541F
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193-nm immersion photomask image placement in exposure toolsCotte, Eric / Alles, Benjamin / Wandel, Timo / Antesberger, Gunter / Teuber, Silvio / Vorwerk, Manuel / Frangen, Andreas / Katzwinkel, Frank et al. | 2006
- 61541G
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EMF simulation with DDM to enable EAPSM masks in 45-nm manufacturingMartin, Patrick M. / Progler, C. J. / Cangemi, Michael / Adam, Kostas / Bailey, George / LaCour, Pat et al. | 2006
- 61541H
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Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodesAksenov, Yuri / Zandbergen, Peter / Yoshizawa, Masaki et al. | 2006
- 61541I
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Dynamic leaching procedure on an immersion interference printerGronheid, Roel / Tenaglia, Enrico / Ercken, Monique et al. | 2006
- 61541J
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Fast inverse lithography technologyAbrams, Daniel S. / Pang, Linyong et al. | 2006
- 61541K
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The improvement of DOF for sub-100nm process by focus scanKim, Jung-Chan / Yang, Hyun-Jo / Jeon, Jin-Hyuck / Park, Chan-Ha / Moon, James / Yim, Dong-gyu / Kim, Jin-Woong / Tseng, Shih-en / Rhe, Kyu-Kab / Min, Young-Hong et al. | 2006
- 61541L
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Finding the right way: DFM versus area efficiency for 65 nm gate layer lithographySarma, Chandra S. / Scheer, Steven / Herold, Klaus / Fonseca, Carlos / Thomas, Alan / Schroeder, Uwe P. et al. | 2006
- 61541M
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Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generationHung, Chi-Yuan / Zhang, Bin / Guo, Eric / Pang, Linyong / Liu, Yong / Wang, Kechang / Dai, Grace et al. | 2006
- 61541O
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Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illuminationChen, Ting / Van Den Broeke, Doug / Hsu, Stephen / Park, Sangbong / Berger, Gabriel / Coskun, Tamer / de Vocht, Joep / Corcoran, Noel / Chen, Fung / van der Heijden, Eddy et al. | 2006
- 61541P
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Calibrating OPC models using asymmetric structuresDepre, Laurent / Cork, Christopher / Yan, Qiliang et al. | 2006
- 61541Q
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Lithography process optimization using linear superposition of commonly available illumination modesCrouse, Michael M. / Yudhistira, Yasri / Lee, Min Ho / Matis, Hope et al. | 2006
- 61541R
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Mask topography effect on OPC at hyper-NA lithographyLee, Sook / Kim, In-Sung / Chun, Yong-Jin / Kim, Sang-Wook / Lee, Suk-Joo / Woo, Sang-Gyun / Cho, Han-Ku / Moon, Joo-Tae et al. | 2006
- 61541S
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In quest of predictive lithography simulationKalus, Christian K. / Buß, Hinderk M. / Brooker, Peter D. et al. | 2006
- 61541T
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Predictive focus exposure modeling (FEM) for full-chip lithographyChen, Luoqi / Cao, Yu / Liu, Hua-yu / Shao, Wenjin / Feng, Mu / Ye, Jun et al. | 2006
- 61541U
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Mass production level ArF immersion exposure toolOkumura, Masahiko / Ishikawa, Jun / Hamatani, Masato / Nei, Masahiro et al. | 2006
- 61541V
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Development status of a 193-nm immersion exposure toolChibana, Takahito / Nakano, Hitoshi / Hata, Hideo / Kodachi, Nobuhiro / Sano, Naoto / Arakawa, Mikio / Matsuoka, Yoichi / Kawasaki, Youji / Mori, Sunao / Chiba, Keiko et al. | 2006
- 61541W
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Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination systemJasper, Hans / Modderman, Theo / van de Kerkhof, Mark / Wagner, Christian / Mulkens, Jan / de Boeij, Wim / van Setten, Eelco / Kneer, Bernhard et al. | 2006
- 61541X
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Early learning on hyper-NA lithography using two-beam immersion interferenceHendrickx, Eric / Op de Beeck, Maaike / Gronheid, Roel / Versluijs, Janko / Van Look, Lieve / Ercken, Monique / Vandenberghe, Geert et al. | 2006
- 61541Y
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SLM lithography: printing down to k1=0.30 without previous OPC processingSandstrom, Tor / Ivonin, Igor et al. | 2006
- 61541Z
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Liquid immersion lithography at 193 nm using a high-NA achromatic interferometerCharley, Anne-Laure / Lagrange, Alexandre / Lartigue, Olivier / Bandelier, Philippe / Derouard, Marianne / Schiavone, Patrick et al. | 2006
- 61542A
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Application of super-diffraction lithography (SDL) for an actual device fabricationNakao, Shuji / Maejima, Shinroku / Kanai, Itaru / Nakae, Akihiro / Sakai, Junjiro / Narimatsu, Koichiro / Suko, Kazuyuki et al. | 2006
- 61542B
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DOF enhancement for contact holes by using Nikon's CDP option and its introduction into productionArmellin, Louis-Pierre / Dureuil, Virginie / Nuel, Laurent / Salvetat, Vincent / Meier, Winfried / Kraft, Andreas et al. | 2006
- 61542C
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Model-based placement and optimization of subresolution assist featuresBarnes, Levi D. / Painter, Benjamin D. / Melvin, Lawrence S. et al. | 2006
- 61542D
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The investigation of 193nm CPL 3D topology mask effect on wafer process performanceCheng, Yung Feng / Chou, Yueh Lin / Yang, Chuen Huei et al. | 2006
- 61542E
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Robust double exposure flow for memoryPark, J. W. / Shu, Sungsoo / Kim, Insung / Kang, Youngsuk et al. | 2006
- 61542F
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Multiple focal plane exposure in 248nm lithography to improve the process latitude of 110nm contactJung, Sunwook / Yang, Elvis / Yang, T. H. / Chen, K. C. / Ku, Joseph / Lu, Chih-Yuan et al. | 2006
- 61542G
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Contact-hole process window improved by assistant features with FLEX function on KrFChiang, Cheng Ku / Yeh, L. S. / Wu, Wen Bin / Shih, Chiang Lin / Lin, Jeng Ping et al. | 2006
- 61542H
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One method to monitor the PPD function of Nikon scanners and some reticle surface particle detection machinesYang, Wei-Han / Lin, Ying-Ku / Huang, C. C. et al. | 2006
- 61542I
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LIS design for optimum efficiencyRyzhikov, Lev / Vladimirsky, Yuli et al. | 2006
- 61542J
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Active spectral control of DUV light sources for OPE minimizationDunstan, Wayne J. / Jacques, Robert / Rafac, Robert J. / Rao, Rajasekhar / Trintchouk, Fedor et al. | 2006
- 61542K
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244-nm imaging interferometric lithography test bedSmolev, Svjatoslav / Biswas, A. / Frauenglass, A. / Brueck, Steven R. J. et al. | 2006
- 61542L
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Effects of beam pointing instability on two-beam interferometric lithographyFan, Yongfa / Bourov, Anatoly / Slocum, Michael / Smith, Bruce W. et al. | 2006
- 61542N
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High-throughput homogenizers for hyper-NA illumination systemsGanser, H. / Darscht, M. / Miklyaev, Y. / Hauschild, D. / Aschke, L. et al. | 2006
- 61542O
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GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithographyTanaka, Satoshi / Tsushima, Hiroaki / Nakaike, Takanori / Yamazaki, Taku / Saito, Takashi / Tomaru, Hitoshi / Kakizaki, Koji / Matsunaga, Takashi / Suzuki, Toru / Wakabayashi, Osamu et al. | 2006
- 61542P
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Structure and optical property of large size CaF2single crystals grown by the CZ methodMasada, I. / Nawata, T. / Inui, Y. / Date, T. / Mabuchi, T. / Nishijima, E. / Fukuda, T. et al. | 2006
- 61542Q
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Benchmark of numerical versus analytical proximity curve calculationsKöhle, Roderick / Bodendorf, Christof / Hoppe, Wolfgang et al. | 2006
- 61542R
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Evaluation of partial coherent imaging using the transfer function in immersion lithographyJung, Mi-Rim / Kwak, Eun-A / Oh, Hye-Keun / Shim, Seong-Bo / Choi, Na-Rak / Kim, Jai-Soon et al. | 2006
- 61542S
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Heterogeneous diffusion model for simulation of resist processLim, Chang Moon / Park, Jun Taek / Kim, Seo Min / Kim, Hyeong Soo / Moon, Seung Chan et al. | 2006
- 61542T
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Simulation of mask induced polarization effect on imaging in immersion lithographyKwak, Eun-A / Jung, Mi-Rim / Kim, Dai-Gyoung / Lee, Ji-Eun / Oh, Hye-Keun / Lee, Sook et al. | 2006
- 61542U
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Simulation of dense contact hole (κ1=0.35) arrays with 193 nm immersion lithographyRaub, Alex K. / Biswas, Abani M. / Borodovsky, Y. / Allen, G. / Brueck, S. R. J. et al. | 2006
- 61542V
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How to obtain accurate resist simulations in very low-k1 eraChiou, Tsann-Bim / Park, Chan-Ha / Choi, Jae-Seung / Min, Young-Hong / Hansen, Steve / Tseng, Shih-En / Chen, Alek C. / Yim, Donggyu et al. | 2006
- 61542W
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Intensive 2D SEM model calibration for 45nm and beyondBailey, George E. / Do, Thuy / Granik, Yuri / Kusnadi, Ir / Estroff, Andrew et al. | 2006
- 61542X
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Methods for benchmarking photolithography simulators: part IVGraves, Trey / Smith, Mark D. / Mack, Chris A. et al. | 2006
- 61542Y
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The capability of a 1.3-NA μstepper using 3D EMF mask simulationsConley, Will / Meute, Jeff / Webb, James / Goodman, Douglas / Maier, Robert et al. | 2006
- 61542Z
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Experimental measurement of photoresist modulation curvesBourov, Anatoly / Robertson, Stewart A. / Smith, Bruce W. / Slocum, Michael / Piscani, Emil C. et al. | 2006
- 61543A
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Line end optimization through optical proximity correction (OPC): a case studyChou, Dyiann / McAllister, Ken et al. | 2006
- 61543B
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Efficient OPC model generation and verification for focus variationPark, Yong-Hee / Ban, Yong-Chan / Hur, Duck-Hyung / Kim, Dong-Hyun / Hong, Ji-Suk / Yoo, Moon-Hyun / Kong, Jeong-Taek et al. | 2006
- 61543C
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Model-based OPC for node random size contact hole with SRAFHuang, C. W. / Chang, Y. Y. / Yeh, L. S. / Liao, H. Y. / Shih, C. L. / Lin, J. P. et al. | 2006
- 61543D
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Using reconfigurable OPC to improve quality and throughput of sub-100nm IC manufacturingMorse, Richard D. / LoPresti, Pat / Corbett, Kevin et al. | 2006
- 61543E
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Application of CM0 resist model to OPC and verificationGranik, Yuri / Cobb, Nick / Medvedev, Dmitry et al. | 2006
- 61543F
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Verifying high NA polarization OPC treatment on waferSchlief, Ralph E. / Hennig, Mario / Pforr, Rainer / Thiele, Jörg / Hoepfl, Max et al. | 2006
- 61543G
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Improvements in post-OPC data constraints for enhanced process correctionsBurns, Ryan L. / Cui, Yuping / Zhao, Zengqin / Stobert, Ian / LaCour, Pat / Yehia, Ayman / Madkour, Kareem / Gheith, Mohamed / Seoud, Ahmed et al. | 2006
- 61543H
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OPC and PSM design using inverse lithography: a nonlinear optimization approachPoonawala, Amyn / Milanfar, Peyman et al. | 2006
- 61543I
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Integration of the retical systematic CD errors into an OPC modeling and correctionHan, Geng / Mansfield, Scott / Krasnoperova, Azalia et al. | 2006
- 61543J
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Simulation based post OPC verification to enhance process window, critical failure analysis, and yieldKang, Jae-Hyun / Choi, Jae-Young / Yun, Kyung-Hee / Do, Munho / Lee, Yong-Suk / Kim, Keeho et al. | 2006
- 61543K
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Mask process variation induced OPC accuracy in sub-90nm technology nodePark, Se-Jin / Shim, Yeon-Ah / Kang, Jae-Hyun / Choi, Jae-Young / Yoon, Kyung-Hee / Lee, Yong-Suk / Kim, Keeho et al. | 2006
- 61543L
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Process window OPC for reduced process variability and enhanced yieldKrasnoperova, Azalia / Culp, James A. / Graur, Ioana / Mansfield, Scott / Al-Imam, Mohamed / Maaty, Hesham et al. | 2006
- 61543M
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Layout 'hot spots' for advancing optical technologiesHolwill, Juliet / McIntyre, Gregory / Poppe, Wojtek / Neureuther, Andrew R. et al. | 2006
- 61543N
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Building a computational model for process and proximity compensationPerçin, Gökhan / Huang, Hsu-Ting / Zach, Franz X. / Sezginer, Apo / Mokhberi, Ali et al. | 2006
- 61543O
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Enhancing DRAM printing process window by using inverse lithography technology (ILT)Chu, Chih-Wei / Tsao, Becky / Chiou, Karl / Lee, Snow / Huang, Jerry / Liu, Yong / Lin, Timothy / Moore, Andrew / Pang, Linyong et al. | 2006
- 61543P
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A systematic study of the dip in the CD through-pitch curve for low-k1 processesZhu, Jun / Wu, Peng / Jiang, Yuntao / Wu, Qiang et al. | 2006
- 61543Q
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Dual antireflection layers for ARC/hard-mask applicationsHuang, Victor / Wu, T.S. / Yang, Mars / Lin, Francis / Yang, Elvis / Yang, T.H. / Chen, K.C. / Ku, Joseph / Lu, C.Y. et al. | 2006
- 61543R
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Application of aberration optimization for specific pattern using Nikon's TAO methodMeier, Winfried / Weirauch, Gabriele / Hoepfl, Max / Jahnke, Andreas et al. | 2006
- 61543S
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Efficient optimization of lithographic process conditions using a distributed, combined global/local search approachFühner, Tim / Popp, Stephan / Dürr, Christoph / Erdmann, Andreas et al. | 2006
- 61543T
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Optimization of contact hole lithography for 65-nm node logic LSISetta, Yuji / Futatsuya, Hiroki / Sagisaka, Atsushi / Chijimatsu, Tatsuo / Minami, Takayoshi / Sugimoto, Fumitoshi / Ishikawa, Seiichi / Asai, Satoru et al. | 2006
- 61543U
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Pupil and illuminator optimization in partially coherent imaging systemsIvonin, Igor / Sandstrom, Tor et al. | 2006
- 61543V
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Illumination conditions matching for critical layers manufacturing in a production contextArmellin, Louis-Pierre / Torsy, Andreas / Hernan, Ken / Kerrien, Gurwan / Guidet, Johanna / Riopel, Yan / Salvetat, Vincent et al. | 2006
- 61543W
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Inverting pupil illumination from resist-based measurementsPerçin, Gokhan / Sezginer, Apo / Zach, Franz X. et al. | 2006
- 61543X
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A systematic study of process windows and MEF for line end shortening under various photo conditions for more effective and robust OPC correctionWu, Qiang / Zhu, Jun / Wu, Peng / Jiang, Yuntao et al. | 2006
- 61543Y
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Lithography budget analysis at the process module levelBrodsky, Colin J. / Chu, William et al. | 2006
- 61543Z
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Minimization of sidelobes in rectangular contact/via hole structuresColes, Mary / Somervell, Mark et al. | 2006
- 61544A
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The feasibility study of KrF HT-PSM in ArF lithography processLim, Yeon Hwa / Kim, Hong Ik / Choi, Jae Sung / Lee, Jeong Gun et al. | 2006
- 61544B
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Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD errorShim, Yeon-Ah / Park, Se-Jin / Kim, Ju-Hyun / Kim, Jea-Hee / Kim, Kee-Ho et al. | 2006
- 61544C
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Influence of mask manufacturing process on printing behavior of angled line structuresTeuber, Silvio / Dürr, Arndt C. / Herguth, Holger / Kunkel, Gerhard / Wandel, Timo / Zell, Thomas et al. | 2006
- 61544D
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Process window OPC verification: dry versus immersion lithography for the 65nm nodeBorjon, Amandine / Belledent, Jerome / Trouiller, Yorick / Lucas, Kevin / Couderc, Christophe / Sundermann, Frank / Urbani, Jean-Christophe / Rody, Yves / Gardin, Christian / Foussadier, Frank et al. | 2006
- 61544E
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CFD analysis of the receding meniscus in immersion lithographyEl-Morsi, Mohamed S. / Schuetter, Scott D. / Nellis, Gregory F. / Van Peski, Chris K. et al. | 2006
- 61544F
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Mask topography effect with polarization at hyper NAYamamoto, Norihiro / Kye, Jongwook / Levinson, Harry J. et al. | 2006
- 61544G
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Determination of complex index of immersion liquids at 193 nmStehle, Jean-Louis / Piel, Jean-Philippe / Campillo-Carreto, Jose et al. | 2006
- 61544H
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Sub-40nm pattern fabrication in 157nm interferometric immersion lithographyHagiwara, Takuya / Tsuji, Shou / Fujii, Kiyoshi / Moriya, Masato / Wakabayashi, Osamu / Sumitani, Akira / Saito, Yusuke / Maeda, Kazuhiko et al. | 2006
- 61544I
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Full-field exposure tools for ArF immersion lithographyLee, Jeung-woo / Otoguro, Akihiko / Itani, Toshiro / Fujii, Kiyoshi / Shiraishi, Ken-ichi / Fujiwara, Tomoharu / Ishii, Yuki et al. | 2006
- 61544J
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Analysis and improvement of defectivity in immersion lithographyNakano, Katsushi / Owa, Soichi / Malik, Irfan / Yamamoto, Tetsuya / Nag, Somnath et al. | 2006
- 61544K
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Verification of optical proximity effect in immersion lithographySuganaga, Toshifumi / Maejima, Shinroku / Hanawa, Tetsuro / Ishibashi, Takeo / Nakao, Shuji / Shirai, Seiichiro / Narimatsu, Koichiro / Suko, Kazuyuki / Shiraishi, Kenichi / Ishii, Yuki et al. | 2006
- 61544L
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Wafer management between coat/developer track and immersion lithography toolFujiwara, Tomoharu / Shiraishi, Kenichi / Tanizaki, Hirokazu / Ishii, Yuuki / Kyoda, Hideharu / Yamamoto, Taro / Ishida, Seiki et al. | 2006
- 61544M
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Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithographyZhou, Jianming / Fan, Yongfa / Smith, Bruce W. et al. | 2006
- 61544N
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Comparison of immersion lithography from projection and interferometric exposure toolsRobertson, Stewart A. / Leonard, Joanne M. / Smith, Bruce W. / Bourov, Anatoly et al. | 2006
- 61544O
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Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrastLagrange, Alex / Charley, Anne Laure / Lartigue, Olivier / Derouard, Marianne et al. | 2006
- 61544P
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Drag-a-drop: a characterization tool for immersion lithographyBassett, Derek W. / Taylor, J. Chris / Conley, Will / Willson, C. Grant / Bonnecaze, Roger T. et al. | 2006
- 61544Q
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Novel high refractive index fluids for 193nm immersion lithographySantillan, Julius / Otoguro, Akihiko / Itani, Toshiro / Fujii, Kiyoshi / Kagayama, Akifumi / Nakano, Takashi / Nakayama, Norio / Tamatani, Hiroaki / Fukuda, Shin et al. | 2006
- 61544R
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Development of cleaning process for immersion lithographyChang, Ching Yu / Yu, D.C. / Lin, John C. / Lin, Burn J. et al. | 2006
- 615401
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From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the roadmap enablers for the next decadeCapodieci, Luigi et al. | 2006
- 615401
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From optical proximity correction to lithography-driven physical design (1996-2006): 10 years of resolution enhancement technology and the roadmap enablers for the next decade (Invited Paper) [6154-01]Capodieci, L. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615402
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The optics of photomasks: from shadowy past to scattered future (Invited Paper) [6154-02]Progler, C. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615402
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The optics of photomasks: from shadowy past to scattered futureProgler, Christopher J. et al. | 2006
- 615403
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The lithographic lens: its history and evolution (Invited Paper) [6154-03]Matsuyama, T. / Ohmura, Y. / Williamson, D. M. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615403
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The lithographic lens: its history and evolutionMatsuyama, Tomoyuki / Ohmura, Yasuhiro / Williamson, David M. et al. | 2006
- 615405
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Characterization of imaging performance for immersion lithography at NA=0.93 [6154-05]Gil, D. / Tirapu-Azpiroz, J. / Deschner, R. / Brunner, T. / Fonseca, C. / Fullam, J. / Corliss, D. / Ausschnitt, C. P. / Vanoppen, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615405
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Characterization of imaging performance for immersion lithography at NA=0.93Gil, Dario / Tirapu-Azpiroz, Jaione / Deschner, Ryan / Brunner, Timothy / Fonseca, Carlos / Fullam, Jennifer / Corliss, Dan / Auschnitt, K. / Vanoppen, Peter et al. | 2006
- 615406
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The next phase for immersion lithographySewell, Harry / Mulkens, Jan / McCafferty, Diane / Markoya, Louis / Streefkerk, Bob / Graeupner, Paul et al. | 2006
- 615406
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The next phase for immersion lithography [6154-06]Sewell, H. / Mulkens, J. / McCafferty, D. / Markoya, L. / Streefkerk, B. / Graeupner, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615407
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Immersion lithography robustness for the C065 node [6154-07]Warrick, S. / Morton, R. / Mauri, A. / Chapon, J.-D. / Belledent, J. / Conley, W. / Barr, A. / Lucas, K. / Monget, C. / Plantier, V. et al. | 2006
- 615407
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Immersion lithography robustness for the C065 nodeWarrick, Scott / Morton, Rob / Mauri, Andrea / Chapon, Jean-Damien / Belledent, Jerome / Conley, Will / Barr, Alex / Lucas, Kevin / Monget, Cedric / Plantier, Valerie et al. | 2006
- 615408
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Current status and future prospect of immersion lithography [6154-08]Owa, S. / Nagasaka, H. / Nakano, K. / Ohmura, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615408
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Current status and future prospect of immersion lithographyOwa, Soichi / Nagasaka, Hiroyuki / Nakano, Katsushi / Ohmura, Yasuhiro et al. | 2006
- 615409
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Immersion specific defect mechanisms: findings and recommendations for their controlKocsis, Michael / Van Den Heuvel, Dieter / Gronheid, Roel / Maenhoudt, Mireille / Vangoidsenhoven, Dizana / Wells, Greg / Stepanenko, Nickolay / Benndorf, Michael / Kim, Hyun Woo / Kishimura, Shinji et al. | 2006
- 615409
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Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]Kocsis, M. / Van Den Heuvel, D. / Gronheid, R. / Maenhoudt, M. / Vangoidsenhoven, D. / Wells, G. / Stepanenko, N. / Benndorf, M. / Kim, H. W. / Kishimura, S. et al. | 2006
- 615410
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Positive and negative tone double patterning lithography for 50nm flash memoryLim, Chang-Moon / Kim, Seo-Min / Hwang, Young-Sun / Choi, Jae-Seung / Ban, Keun-Do / Cho, Sung-Yoon / Jung, Jin-Ki / Kang, Eung-Kil / Lim, Hee-Youl / Kim, Hyeong-Soo et al. | 2006
- 615410
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Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]Lim, C.-M. / Kim, S.-M. / Hwang, Y.-S. / Choi, J.-S. / Ban, K.-D. / Cho, S.-Y. / Jung, J.-K. / Kang, E.-K. / Lim, H.-Y. / Kim, H.-S. et al. | 2006
- 615411
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High transmission mask technology for 45nm node imaging [6154-38]Conley, W. / Morgana, N. / Kasprowicz, B. S. / Cangemi, M. / Lassiter, M. / Litt, L. C. / Cottle, R. / Wu, W. / Cobb, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615412
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Experimental evaluation of bull's-eye illumination for assist-free random contact printing at sub-65nm nodeFinders, Jo / Engelen, Andre / Vandenberghe, Geert / Bekaert, Joost / Chen, Tim et al. | 2006
- 615412
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Experimental evaluation of bull's-eye illumination for assist-free random contact printing at sub-65nm node [6154-39]Finders, J. / Engelen, A. / Vandenberghe, G. / Bekaert, J. / Chen, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615413
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Optical properties and process impacts of high transmission EAPSM [6154-40]Ham, Y. M. / Morgana, N. / Sixt, P. / Cangemi, M. / Kasprowicz, B. / Progler, C. / Martin, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615413
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Optical properties and process impacts of high transmission EAPSMHam, Young Mog / Morgana, Nicolo / Sixt, Pierre / Cangemi, Mike / Kasprowicz, Bryan / Progler, Chris / Martin, Pat et al. | 2006
- 615414
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Inverse lithography technology at chip scale [6154-41]Lin, B. / Shieh, M. F. / Sun, J. / Ho, J. / Wang, Y. / Wu, X. / Leitermann, W. / Lin, O. / Lin, J. / Liu, Y. et al. | 2006
- 615414
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Inverse lithography technology at chip scaleLin, Benjamin / Shieh, Ming Feng / Sun, Jie-wei / Ho, Jonathan / Wang, Yan / Wu, Xin / Leitermann, Wolfgang / Lin, Orson / Lin, Jason / Liu, Yong et al. | 2006
- 615415
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Second generation fluids for 193nm immersion lithography [6154-42]French, R. H. / Qiu, W. / Yang, M. K. / Wheland, R. C. / Lemon, M. F. / Shoe, A. L. / Adelman, D. J. / Crawford, M. K. / Tran, H. V. / Feldman, J. et al. | 2006
- 615415
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Second generation fluids for 193nm immersion lithographyFrench, Roger H. / Qiu, Weiming / Yang, Min K. / Wheland, Robert C. / Lemon, Michael F. / Shoe, Aaron L. / Adelman, Doug J. / Crawford, Michael K. / Tran, Hoang V. / Feldman, Jerald et al. | 2006
- 615416
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Studies of consequences of photo-acid generator leaching in 193-nm immersion lithography [6154-43]Liberman, V. / Switkes, M. / Rothschild, M. / Palmacci, S. T. / Grenville, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615416
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Studies of consequences of photo-acid generator leaching in 193nm immersion lithographyLiberman, V. / Switkes, M. / Rothschild, M. / Palmacci, S. T. / Grenville, A. et al. | 2006
- 615417
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Watermark defect formation and removal for immersion lithographyChang, Ching-Yu / Yu, Da-Ching / Lin, John C. H. / Lin, Burn J. et al. | 2006
- 615417
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Watermark defect formation and removal for immersion lithography [6154-44]Chang, C.-Y. / Yu, D.-C. / Lin, J. C. H. / Lin, B. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615418
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High-index optical materials for 193-nm immersion lithography [6154-45]Burnett, J. H. / Kaplan, S. G. / Shirley, E. L. / Horowitz, D. / Clauss, W. / Grenville, A. / Van Peski, C. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615418
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High-index optical materials for 193nm immersion lithographyBurnett, John H. / Kaplan, Simon G. / Shirley, Eric L. / Horowitz, Deane / Clauss, Wilfried / Grenville, Andrew / Van Peski, Chris et al. | 2006
- 615420
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Catadioptric lens design: the breakthrough to hyper-NA optics [6154-75]Kneer, B. / Graupner, P. / Garreis, R. / Klasges, R. / Feldmann, H. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615420
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Catadioptric lens design: the breakthrough to hyper-NA opticsKneer, Bernhard / Gräupner, Paul / Garreis, Reiner / Kläsges, Ralph / Feldmann, Heiko et al. | 2006
- 615421
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A hyper-NA projection lens for ArF immersion exposure toolIkezawa, Hironori / Ohmura, Yasuhiro / Matsuyama, Tomoyuki / Uehara, Yusaku / Ishiyama, Toshiro et al. | 2006
- 615421
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A hyper-NA projection lens for ArF immersion exposure tool [6154-73]Ikezawa, H. / Ohmura, Y. / Matsuyama, T. / Uehara, Y. / Ishiyama, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615422
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What determines the ultimate resolution? the critical relationship between exposure tools and photoresists [6154-74]Honda, T. / Kishikawa, Y. / Iwasaki, Y. / Ohkubo, A. / Kawashima, M. / Yoshii, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615422
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What determines the ultimate resolution? The critical relationship between exposure tools and photoresistsHonda, Tokuyuki / Kishikawa, Yasuhiro / Iwasaki, Yuichi / Ohkubo, Akinori / Kawashima, Miyoko / Yoshii, Minoru et al. | 2006
- 615423
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XLA-300: the fourth-generation ArF MOPA light source for immersion lithography [6154-76]Trintchouk, F. / Ishihara, T. / Gillespie, W. / Ness, R. / Bergstedt, R. / Wittak, C. / Perkins, R. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615423
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XLA-300: the fourth-generation ArF MOPA light source for immersion lithographyTrintchouk, Fedor / Ishihara, Toshihiko / Gillespie, Walter / Ness, Richard / Bergstedt, Robert / Wittak, Christian / Perkins, Richard et al. | 2006
- 615424
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A new on-machine measurement system to measure wavefront aberrations of projection optics with hyper-NA [6154-77]Ohsaki, Y. / Mori, T. / Koga, S. / Ando, M. / Yamamoto, K. / Tezuka, T. / Shiode, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615424
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A new on-machine measurement system to measure wavefront aberrations of projection optics with hyper-NAOhsaki, Y. / Mori, T. / Koga, S. / Ando, M. / Yamamoto, K. / Tezuka, T. / Shiode, Y. et al. | 2006
- 615425
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High power injection lock 6 kHz 60 W laser for ArF dry/wet lithographyMizoguchi, Hakaru / Inoue, T. / Fujimoto, J. / Suzuki, T. / Matsunaga, T. / Sakanishi, S. / Kaminishi, M. / Watanabe, Y. / Nakaike, T. / Shinbori, M. et al. | 2006
- 615425
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High power injection lock 6kHz 60W laser for ArF dry/wet lithography [6154-78]Mizoguchi, H. / Inoue, T. / Fujimoto, J. / Suzuki, T. / Matsunaga, T. / Sakanishi, S. / Kaminishi, M. / Watanabe, Y. / Nakaike, T. / Shinbori, M. et al. | 2006
- 615428
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Performance study of chromeless phase lithography mask for the 65nm node and beyond [6154-81]Kojima, Y. / Ohshima, T. / Chiba, K. / Konishi, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615428
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Performance study of chromeless phase lithography mask for the 65nm node and beyondKojima, Yosuke / Ohshima, Takashi / Chiba, Kazuaki / Konishi, Toshio et al. | 2006
- 615429
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Optimization of chromeless phase mask by comparing scattering bars with zebra patternsKang, Hye-Young / Lee, Ji-Eun / Kwak, Eun-A / Kim, Eun-Jin / Park, Seung-Wook / Kim, Sung-Hyuck / Shin, Dong-Soo / Jeong, HeeJun / Oh, Hye-Keun et al. | 2006
- 615429
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Optimization of chromeless phase mask by comparing scattering bars with zebra patterns [6154-82]Kang, H.-Y. / Lee, J.-E. / Kwak, E.-A. / Kim, E.-J. / Park, S.-W. / Kim, S.-H. / Shin, D.-S. / Jeong, H. / Oh, H.-K. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615430
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Phase-shift focus monitoring techniquesMcQuillan, Matthew / Roberts, Bill et al. | 2006
- 615430
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Phase shift focus monitoring techniques [6154-114]McQuillan, M. / Roberts, B. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615431
-
Study of polarization aberration measurement using SPIN methodShiode, Yoshihiro / Ebiahara, Takeaki et al. | 2006
- 615431
-
Study of polarization aberration measurement using SPIN method [6154-115]Shiode, Y. / Ebiahara, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615432
-
Effect of lens aberrations on OPC model accuracy for low k1 lithography process [6154-116]Ahn, J.-K. / Jeong, C.-Y. / Park, J.-L. / Choi, J.-S. / Lee, J.-G. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615432
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Effect of lens aberrations on OPC model accuracy for low k1 lithography processAhn, Jun-Kyu / Jeong, Chang-Young / Park, Jeong-Lyeol / Choi, Jae-Sung / Lee, Jeong-Gun et al. | 2006
- 615433
-
Fractal model applied wavefront aberration for the expression of local flareNakashima, Toshiharu / Ogata, Taro et al. | 2006
- 615433
-
Fractal model applied wavefront aberration for the expression of local flare [6154-117]Nakashima, T. / Ogata, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615434
-
Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90 nm technology node imaging with off-axis illuminations [6154-118]Loi, S. / Iessi, U. / Chung, R. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615434
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Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90nm technology node imaging with off-axis illuminationsLoi, Sara / Iessi, Umberto / Chung, Robert et al. | 2006
- 615435
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Flare effect of different shape of illumination apertures in 193-nm optical lithography system [6154-119]Yun, Y.-J. / Moon, J.-H. / Jeon, H.-L. / Kim, J.-H. / Kim, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615435
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Flare effect of different shape of illumination apertures in 193-nm optical lithography systemYun, Young-Je / Moon, Ju-Hyung / Jeon, Haeng-Leem / Kim, Jea-Hee / Kim, Keeho et al. | 2006
- 615436
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Intelligent model-based OPC [6154-121]Huang, W. C. / Lai, C. M. / Luo, B. / Tsai, C. K. / Chih, M. H. / Lai, C. W. / Kuo, C. C. / Liu, R. G. / Lin, H. T. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615436
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Intelligent model-based OPCHuang, W.C. / Lai, C.M. / Luo, B. / Tsai, C.K. / Chih, M.H. / Lai, C.W. / Kuo, C.C. / Liu, R.G. / Lin, H.T. et al. | 2006
- 615437
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Maximizing test pattern coverage for OPC model build [6154-123]Khoh, A. / Quek, S.-F. / Foong, Y.-M. / Cheng, J. / Choi, B.-I. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615437
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Maximizing test pattern coverage for OPC model buildKhoh, Andrew / Quek, Shyue-Fong / Foong, Yee-Mei / Cheng, Jacky / Choi, Byoung-Il et al. | 2006
- 615438
-
A novel approach for full chip SRAF printability check [6154-124]Hung, C.-Y. / Zhang, L. / Liu, Q. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615438
-
A novel approach for full-chip SRAF printability checkHung, Chi-Yuan / Zhang, Liguo / Liu, Qingwei et al. | 2006
- 615439
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A methodology to take LER effect into OPC modeling algorithm [6154-125]Hung, C.-Y. / Liu, Q. / Deng, Z. / Zhang, L. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615439
-
A methodology to take LER effect into OPC modeling algorithmHung, Chi-Yuan / Liu, Qingwei / Deng, Zexi / Zhang, Liguo et al. | 2006
- 615440
-
Systematic optimization of the thin-film stack by minimizing CD sensitivityYu, Shinn-Sheng / Lin, Burn J. / Yen, Anthony / Ke, Chih-Ming et al. | 2006
- 615440
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Systematic optimization of the thin-film stack by minimizing CD sensitivity [6154-154]Yu, S.-S. / Lin, B. J. / Yen, A. / Ke, C.-M. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615441
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Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM applicationKim, Hyoung-ryeun / Ahn, Yeong-Bae / Kim, JongKuk / Kim, SeokKyun / Park, DongHeok / Kim, Young-Sik et al. | 2006
- 615441
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Implementation of contact hole patterning performance with KrF resist flow process for 60nm node DRAM application [6154-155]Kim, H. / Ahn, Y.-B. / Kim, J. / Kim, S. / Park, D. / Kim, Y.-S. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615442
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Advances in imaging tool adjustment optimization methodologies and capabilities, including impact upon imaging performance budget componentsSlonaker, Steve D. / Phillips, Mark C. / Treadway, Chris / Darby, Greg / Johnson, Kurt / Moore, Bob et al. | 2006
- 615442
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Advances in imaging tool adjustment optimization methodologies and capabilities including impact upon imaging performance budget components [6154-158]Slonaker, S. D. / Phillips, M. C. / Treadway, C. / Darby, G. / Johnson, K. / Moore, B. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615443
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Measurement, separation, and amelioration of transverse scanning synchronization errorYamaguchi, Yuji / Khurana, Ranjan / Smith, Adlai H. / Subramony, Venky / Wean, Calvin Chen Chii / Bendik, Joseph J. et al. | 2006
- 615443
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Measurement, separation, and amelioration of transverse scanning synchronization error [6154-185]Yamaguchi, Y. / Khurana, R. / Smith, A. H. / Subramony, V. / Wean, C. C. C. / Bendik, J. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615444
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Mask substrate birefringence requirements for hyper-NA lithography [6154-159]van de Kerkhof, M. / de Boeij, W. / Demarteau, M. / Geh, B. / Leunissen, L. H. A. / Martin, P. / Cangemi, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615444
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Mask substrate birefringence requirements for hyper-NA lithographyvan de Kerkhof, Mark / de Boeij, Wim / Demarteau, Marcel / Geh, Bernd / Leunissen, Leonardus H. A. / Martin, Patrick / Cangemi, Mike et al. | 2006
- 615446
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Printability of quartz defects in a production Cr-less mask process [6154-161]Hughes, G. / MacDonald, S. / Riddick, J. / Nhiev, A. / Hickethier, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615446
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Printability of quartz defects in a production Cr-less mask processHughes, Gregory / MacDonald, Susan / Riddick, John / Nhiev, Anthony / Hickethier, Jason et al. | 2006
- 615447
-
Alternated phase-shift mask for 45nm node contact hole patterningCantu, Pietro / Capetti, Gianfranco / Catarisano, Chiara / D'Angelo, Fabrizio / Vaccaro, Alessandro et al. | 2006
- 615447
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Alternated phase shift mask for 45nm node contact holes patterning [6154-162]Cantu, P. / Capetti, G. / Catarisano, C. / D Angelo, F. / Vaccaro, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615448
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Alternating PSM balancing characterization: a comparative study using AIMS and wafer print data [6154-163]Sczyrba, M. / Kohle, R. / Bubke, K. / Hennig, M. / Pforr, R. / Neubauer, R. / SPIE-- the International Society for Optical Engineering et al. | 2006
- 615448
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Alternating PSM balancing characterization: a comparative study using AIMS and wafer print dataSczyrba, Martin / Köhle, Roderick / Bubke, Karsten / Hennig, Mario / Pforr, Rainer / Neubauer, Ralf et al. | 2006
- 615449
-
Applicability of alternating phase shifting masks using polarized lightBubke, Karsten / Sczyrba, Martin / Pierrat, Christophe et al. | 2006
- 615449
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Applicability of alternating phase shifting masks using polarized light [6154-164]Bubke, K. / Sczyrba, M. / Pierrat, C. / SPIE-- the International Society for Optical Engineering et al. | 2006
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High NA polarized light lithography for 0.29k1 process [6154-15]Park, C. / Lee, J. / Yang, K. / Tseng, S. / Min, Y.-H. / Chen, A. C. / Yang, H. / Yim, D. / Kim, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
-
Dense OPC and verification for 45nm [6154-18]Cobb, N. / Dudau, D. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Global optimization of the illumination distribution to maximize integrated process window [6154-17]Rosenbluth, A. E. / Seong, N. / SPIE-- the International Society for Optical Engineering et al. | 2006
-
EMF simulation with DDM to enable EAPSM masks in 45nm manufacturing [6154-53]Martin, P. M. / Progler, C. J. / Cangemi, M. / Adam, K. / Bailey, G. / LaCour, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Mask topography effect on OPC at hyper NA lithography [6154-64]Lee, S. / Kim, I.-S. / Chun, Y.-J. / Kim, S.-W. / Lee, S.-J. / Woo, S.-G. / Cho, H.-K. / Moon, J.-T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system [6154-69]Jasper, H. / Modderman, T. / van de Kerkhof, M. / Wagner, C. / Mulkens, J. / de Boeij, W. / van Setten, E. / Kneer, B. / SPIE-- the International Society for Optical Engineering et al. | 2006
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OPC and PSM design using inverse lithography: a nonlinear optimization approach [6154-135]Poonawala, A. / Milanfar, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Integration of the reticle systematic CD errors into an OPC modeling and correction [6154-136]Han, G. / Mansfield, S. / Krasnoperova, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
-
A systematic study of the dip in the CD through-pitch curve for low k1 processes [6154-143]Zhu, J. / Wu, P. / Jiang, Y. / Wu, Q. / SPIE-- the International Society for Optical Engineering et al. | 2006
-
Pupil and illuminator optimization in partially coherent imaging systems [6154-148]Ivonin, I. / Sandstrom, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Immersion effects on lithography system performance [6154-30]Nagahara, S. / Pollentier, I. / Machida, T. / O Brien, S. / Jacobs, E. / Schaap, C. / Leray, P. / Storms, G. / Nafus, K. / Laidler, D. et al. | 2006
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Effects of laser bandwidth on OPE in a modern lithography tool [6154-36]Huggins, K. / Tsuyoshi, T. / Ong, M. / Rafac, R. / Treadway, C. / Choudhary, D. / Kudo, T. / Hirukawa, S. / Renwick, S. P. / Farrar, N. R. et al. | 2006
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Fast inverse lithography technology [6154-55]Abrams, D. S. / Pang, L. / SPIE-- the International Society for Optical Engineering et al. | 2006
-
LIS design for optimum efficiency [6154-92]Ryzhikov, L. / Vladimirsky, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Active spectral control of DUV light sources for OPE minimization [6154-94]Dunstan, W. J. / Jacques, R. / Rafac, R. J. / Rao, R. / Trintchouk, F. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Intensive 2D SEM model calibration for 45nm and beyond [6154-109]Bailey, G. E. / Do, T. / Granik, Y. / Kusnadi, I. / Estroff, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Efficient OPC model generation and verification for focus variation [6154-128]Park, Y.-H. / Ban, Y.-C. / Hur, D.-H. / Kim, D.-H. / Hong, J.-S. / Yoo, M.-H. / Kong, J.-T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Building a computational model for process and proximity compensation [6154-141]Percin, G. / Huang, H.-T. / Zach, F. X. / Sezginer, A. / Mokhberi, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Optimization of contact hole lithography for 65-nm node logic LSI [6154-147]Setta, Y. / Futatsuya, H. / Sagisaka, A. / Chijimatsu, T. / Minami, T. / Sugimoto, F. / Ishikawa, S. / Asai, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Lithography budget analysis at the process module level [6154-152]Brodsky, C. J. / Chu, W. / SPIE-- the International Society for Optical Engineering et al. | 2006
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The feasibility study of KrF HT-PSM in ArF lithography process [6154-165]Lim, Y. H. / Kim, H. I. / Choi, J. S. / Lee, J. G. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Sub-40 nm pattern fabrication in 157 nm interferometric immersion lithography [6154-173]Hagiwara, T. / Tsuji, S. / Fujii, K. / Moriya, M. / Wakabayashi, O. / Sumitani, A. / Saito, Y. / Maeda, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Assembly of a 193-nm interferometer for immersion lithography: vibration effects on image contrast [6154-181]Lagrange, A. / Charley, A. L. / Lartigue, O. / Derouard, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Experimental verification of PSM polarimetry: monitoring polarization at 193-nm high-NA with phase-shift masks [6154-13]McIntyre, G. / Neureuther, A. / Slonaker, S. / Vellanki, V. / Reynolds, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Practical approach to full-field wavefront aberration measurement using phase wheel targets [6154-35]Zavyalova, L. V. / Smith, B. W. / Bourov, A. / Zhang, G. / Vellanki, V. / Reynolds, P. / Flagello, D. G. / SPIE-- the International Society for Optical Engineering et al. | 2006
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The investigation of 193nm CPL 3D topology mask effect on wafer process performance [6154-87]Cheng, Y. F. / Chou, Y. L. / Yang, C. H. / SPIE-- the International Society for Optical Engineering et al. | 2006
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High-throughput homogenizers for hyper-NA illumination systems [6154-98]Ganser, H. / Darscht, M. / Miklyaev, Y. / Hauschild, D. / Aschke, L. / SPIE-- the International Society for Optical Engineering et al. | 2006
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CFD analysis of the receding meniscus in immersion lithography [6154-170]El-Morsi, M. S. / Schuetter, S. D. / Nellis, G. F. / Van Peski, C. K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Determination of complex index of immersion liquids at 193nm [6154-172]Stehle, J.-L. / Piel, J.-P. / Campillo-Carreto, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Three-dimensional imaging of 30-nm nanospheres using immersion interferometric lithography [6154-178]Zhou, J. / Fan, Y. / Smith, B. W. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Development of cleaning process for immersion lithography [6154-184]Chang, C. Y. / Yu, D. C. / Lin, J. C. H. / Lin, B. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Mask defect printing mechanisms for future lithography generations [6154-49]Erdmann, A. / Graf, T. / Bubke, K. / Hollein, I. / Teuber, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Calibrating OPC models using asymmetric structures [6154-61]Depre, L. / Cork, C. / Yan, Q. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Mass production level ArF immersion exposure tool [6154-67]Okumura, M. / Ishikawa, J. / Hamatani, M. / Nei, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Liquid immersion lithography at 193 nm using a high-NA achromatic interferometer (Best Student Paper Award) [6154-72]Charley, A.-L. / Lagrange, A. / Lartigue, O. / Bandelier, P. / Derouard, M. / Schiavone, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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SLM lithography: printing down to k~1=0.30 without previous OPC processing [6154-71]Sandstrom, T. / Ivonin, I. / SPIE-- the International Society for Optical Engineering et al. | 2006
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244-nm imaging interferometric lithography test bed [6154-95]Smolev, S. / Biswas, A. / Frauenglass, A. / Brueck, S. R. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Structure and optical property of large-size CaF~2 single crystals grown by the CZ method [6154-100]Masada, I. / Nawata, T. / Inui, Y. / Date, T. / Mabuchi, T. / Nishijima, E. / Fukuda, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Simulation of dense contact hole (k~1=0.35) arrays with 193-nm immersion lithography [6154-106]Raub, A. K. / Biswas, A. M. / Borodovsky, Y. / Allen, G. / Brueck, S. R. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Application of CM0 resist model to OPC and verification [6154-132]Granik, Y. / Cobb, N. / Medvedev, D. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Enhancing DRAM printing process window by using inverse lithography technology (ILT) [6154-142]Chu, C.-W. / Tsao, B. / Chiou, K. / Lee, S. / Huang, J. / Liu, Y. / Lin, T. / Moore, A. / Pang, L. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Minimization of sidelobes in rectangular contact/via hole structures [6154-153]Coles, M. / Somervell, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD error [6154-167]Shim, Y.-A. / Park, S.-J. / Kim, J.-H. / Kim, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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A dive into clear water: immersion defect capabilities [6154-28]Streefkerk, B. / Mulkens, J. / Moerman, R. / Stavenga, M. / van der Hoeven, J. / Grouwstra, C. / Bruls, R. / Leenders, M. / Wang, S. / van Dommelen, Y. et al. | 2006
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Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA lithography [6154-51]Yoshizawa, M. / Philipsen, V. / Leunissen, L. H. A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Benchmark of numerical versus analytical proximity curve calculations [6154-102]Kohle, R. / Bodendorf, C. / Hoppe, W. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Simulation based post OPC verification to enhance process window critical failure analysis and yield [6154-137]Kang, J.-H. / Choi, J.-Y. / Yun, K.-H. / Do, M. / Lee, Y.-S. / Kim, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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(Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems [6154-20]Gordon, R. L. / Rimmer, M. P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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An integrated lithography concept with application on 45-nm 1/2 pitch flash memory devices (Invited Paper) [6154-21]Dusa, M. / Engelen, A. / Finders, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Experimental characterization of the receding meniscus under conditions associated with immersion lithography [6154-27]Shedd, T. A. / Schuetter, S. D. / Nellis, G. F. / Van Peski, C. K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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High-index fluoride materials for 193 nm immersion lithography [6154-47]Nawata, T. / Inui, Y. / Masada, I. / Nishijima, E. / Satoh, H. / Fukuda, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Lithography process optimization using linear superposition of commonly available illumination modes [6154-63]Crouse, M. M. / Yudhistira, Y. / Lee, M. H. / Matis, H. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Application of super-diffraction lithography (SDL) for an actual device fabrication [6154-84]Nakao, S. / Maejima, S. / Kanai, I. / Nakae, A. / Sakai, J. / Narimatsu, K. / Suko, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Model-based placement and optimization of subresolution assist features [6154-86]Barnes, L. D. / Painter, B. D. / Melvin, L. S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Robust double exposure flow for memory [6154-88]Park, J. W. / Shu, S. / Kim, I. / Kang, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Line end optimization through optical proximity correction (OPC): a case study [6154-126]Chou, D. / McAllister, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Dual anti-reflection layers for ARC/hard-mask applications [6154-144]Huang, V. / Wu, T. S. / Yang, M. / Lin, F. / Yang, E. / Yang, T. H. / Chen, K. C. / Ku, J. / Lu, C. Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Illumination conditions matching for critical layers manufacturing in a production context [6154-149]Armellin, L.-P. / Torsy, A. / Hernan, K. / Kerrien, G. / Guidet, J. / Riopel, Y. / Salvetat, V. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Inverting pupil illumination from resist-based measurements [6154-150]Percin, G. / Sezginer, A. / Zach, F. X. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Effect of azimuthally polarized illumination imaging on device patterns beyond 45-nm node [6154-12]Ozawa, K. / Thunnakart, B. / Kaneguchi, T. / Mita, I. / Someya, A. / Nakashima, T. / Nishinaga, H. / Mizuno, Y. / Matsuyama, T. / Hamatani, M. et al. | 2006
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Alt-phase shift mask technology for 65nm logic applications [6154-22]Chakravorty, K. K. / Henrichs, S. / Qiu, W. / Chavez, J. L. / Liu, Y.-P. / Ghadiali, F. / Yung, K. / Wilcox, N. / Silva, M. / Ma, J. et al. | 2006
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MEEF-based correction to achieve OPC convergence of low-k1 lithography with strong OAI [6154-25]Choi, S.-H. / Je, A.-Y. / Hong, J.-S. / Yoo, M.-H. / Kong, J.-T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Investigation of immersion related defects using pre- and post-wet experiments [6154-29]Brandl, S. / Watso, R. / Pierson, B. / Holmes, S. / Wei, Y. / Petrillo, K. / Cummings, K. / Goodwin, F. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation [6154-58]Hung, C.-Y. / Zhang, B. / Guo, E. / Pang, L. / Liu, Y. / Wang, K. / Dai, G. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Effects of beam pointing instability on two-beam interferometric lithography [6154-96]Fan, Y. / Bourov, A. / Slocum, M. / Smith, B. W. / SPIE-- the International Society for Optical Engineering et al. | 2006
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GT40A: durable 45-W ArF injection-lock laser light source for dry/immersion lithography [6154-99]Tanaka, S. / Tsushima, H. / Nakaike, T. / Yamazaki, T. / Saito, T. / Tomaru, H. / Kakizaki, K. / Matsunaga, T. / Suzuki, T. / Wakabayashi, O. et al. | 2006
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How to obtain accurate resist simulations in very low-k1 era? [6154-107]Chiou, T.-B. / Park, C.-H. / Choi, J.-S. / Min, Y.-H. / Hansen, S. / Tseng, S.-E. / Chen, A. C. / Yim, D. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Mask process variation induced OPC accuracy in sub-90 nm technology node [6154-138]Park, S.-J. / Shim, Y.-A. / Kang, J.-H. / Choi, J.-Y. / Yoon, K.-H. / Lee, Y.-S. / Kim, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]Borjon, A. / Belledent, J. / Trouiller, Y. / Lucas, K. / Couderc, C. / Sundermann, F. / Urbani, J.-C. / Rody, Y. / Gardin, C. / Foussadier, F. et al. | 2006
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Mask topography effect with polarization at hyper NA [6154-171]Yamamoto, N. / Kye, J. / Levinson, H. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Comparison of immersion lithography from projection and interferometric exposure tools [6154-179]Robertson, S. A. / Leonard, J. M. / Smith, B. W. / Bourov, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Novel high refractive index fluids for 193-nm immersion lithography [6154-183]Santillan, J. / Otoguro, A. / Itani, T. / Fujii, K. / Kagayama, A. / Nakano, T. / Nakayama, N. / Tamatani, H. / Fukuda, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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193-nm immersion photomask image placement in exposure tools [6154-52]Cotte, E. / Alles, B. / Wandel, T. / Antesberger, G. / Teuber, S. / Vorwerk, M. / Frangen, A. / Katzwinkel, F. / SPIE-- the International Society for Optical Engineering et al. | 2006
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In quest of predictive lithography simulation [6154-65]Kalus, C. K. / Buss, H. M. / Brooker, P. D. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103]Jung, M.-R. / Kwak, E.-A. / Oh, H.-K. / Shim, S.-B. / Choi, N.-R. / Kim, J.-S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Improvements in post-OPC data constraints for enhanced process corrections [6154-134]Burns, R. L. / Cui, Y. / Zhao, Z. / Stobert, I. / LaCour, P. / Yehia, A. / Madkour, K. / Gheith, M. / Seoud, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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A systematic study of process windows and MEF for line end shortening under various photo conditions for more effective and robust OPC correction [6154-151]Wu, Q. / Zhu, J. / Wu, P. / Jiang, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Evanescent wave imaging in optical lithography [6154-10]Smith, B. W. / Fan, Y. / Zhou, J. / Lafferty, N. / Estroff, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Basic studies of overlay performance on immersion lithography tool [6154-26]Shiraishi, K. / Fujiwara, T. / Tanizaki, H. / Ishii, Y. / Kono, T. / Nakagawa, S. / Higashiki, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Aerial image based lens metrology for wafer steppers [6154-34]Dirksen, P. / Braat, J. J. M. / Janssen, A. J. E. M. / Leeuwestein, A. / Matsuyama, T. / Noda, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Laser bandwidth and other sources of focus blur in lithography [6154-31]Brunner, T. / Corliss, D. / Butt, S. / Wiltshire, T. / Ausschnitt, C. P. / Smith, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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High transmission mask technology for 45nm node imaging [6154-50]Conley, W. / Morgana, N. / Kasprowicz, B. S. / Cangemi, M. / Lassiter, M. / Litt, L. C. / Cottle, R. / Wu, W. / Cobb, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Dynamic leaching procedure on an immersion interference printer [6154-186]Gronheid, R. / Tenaglia, E. / Ercken, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]Hendrickx, E. / de Beeck, M. O. / Gronheid, R. / Versluijs, J. / Van Look, L. / Ercken, M. / Vandenberghe, G. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Heterogeneous diffusion model for simulation of resist process [6154-104]Lim, C. M. / Park, J. T. / Kim, S. M. / Kim, H. S. / Moon, S. C. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Methods for benchmarking photolithography simulators: part IV [6154-110]Graves, T. / Smith, M. D. / Mack, C. A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Layout `hot spots' for advancing optical technologies [6154-140]Holwill, J. / McIntyre, G. / Poppe, W. / Neureuther, A. R. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Verification of optical proximity effect in immersion lithography [6154-176]Suganaga, T. / Maejima, S. / Hanawa, T. / Ishibashi, T. / Nakao, S. / Shirai, S. / Narimatsu, K. / Suko, K. / Shiraishi, K. / Ishii, Y. et al. | 2006
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Across wafer focus mapping and its applications in advanced technology nodes [6154-23]Zhang, G. / DeMoor, S. / Jessen, S. / He, Q. / Yan, W. / Chevacharoenkul, S. / Vellanki, V. / Reynolds, P. / Ganeshan, J. / Hauschild, J. et al. | 2006
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Characterizing a scanner illuminator for prediction of OPE effects [6154-24]Renwick, S. P. / Nishinaga, H. / Kita, N. / SPIE-- the International Society for Optical Engineering et al. | 2006
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The improvement of DOF for sub-100nm process by focus scan [6154-56]Kim, J.-C. / Yang, H.-J. / Jeon, J.-H. / Park, C.-H. / Moon, J. / Yim, D. / Kim, J.-W. / Tseng, S. / Rhe, K.-K. / Min, Y.-H. et al. | 2006
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Predictive focus exposure modeling (FEM) for full-chip lithography [6154-66]Chen, L. / Cao, Y. / Liu, H. / Shao, W. / Feng, M. / Ye, J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]Kwak, E.-A. / Jung, M.-R. / Kim, D.-G. / Lee, J.-E. / Oh, H.-K. / Lee, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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The capability of a 1.3-NA mustepper using 3D EMF mask simulations [6154-111]Conley, W. / Meute, J. / Webb, J. / Goodman, D. / Maier, R. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Model-based OPC for node random size contact hole with SRAF [6154-129]Huang, C. W. / Chang, Y. Y. / Yeh, L. S. / Liao, H. Y. / Shih, C. L. / Lin, J. P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Using reconfigurable OPC to improve quality and throughput of sub-100nm IC manufacturing [6154-131]Morse, R. D. / LoPresti, P. / Corbett, K. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Efficient optimization of lithographic process conditions using a distributed combined global/local search approach [6154-146]Fuhner, T. / Popp, S. / Durr, C. / Erdmann, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Influence of mask manufacturing process on printing behavior of angled line structures [6154-168]Teuber, S. / Durr, A. C. / Herguth, H. / Kunkel, G. / Wandel, T. / Zell, T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Enabling the 45nm node by hyper-NA polarized lithography [6154-11]de Boeij, W. / Swinkels, G. / Le Masson, N. / Koolen, A. / van Greevenbroek, H. / Klaassen, M. / van de Kerkhof, M. / van Ingen Schenau, K. / de Winter, L. / Wehrens, M. et al. | 2006
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Polarization aberration analysis in optical lithography systems [6154-14]Kye, J. / McIntyre, G. / Norihiro, Y. / Levinson, H. J. / SPIE-- the International Society for Optical Engineering et al. | 2006
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OPC and verification accuracy enhancement using the 2D wafer image for the low k1 memory devices [6154-19]Ban, Y.-C. / Lee, D.-Y. / Hong, J.-S. / Yoo, M.-H. / Kong, J.-T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Compensation of high-NA mask topography effects by using object modified Kirchhoff model for 65 and 45nm nodes [6154-54]Aksenov, Y. / Zandbergen, P. / Yoshizawa, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60]Chen, T. / Van Den Broeke, D. / Hsu, S. / Park, S. / Berger, G. / Coskun, T. / de Vocht, J. / Corcoran, N. / Chen, F. / van der Heijden, E. et al. | 2006
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Multiple focal plane exposure in 248nm lithography to improve the process latitude of 110nm contact [6154-89]Jung, S. / Yang, E. / Yang, T. H. / Chen, K. C. / Ku, J. / Lu, C.-Y. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Contact-hole process window improved by assistant features with FLEX function on KrF [6154-90]Chiang, C. K. / Yeh, L. S. / Wu, W. B. / Shih, C. L. / Lin, J. P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Analysis and improvement of defectivity in immersion lithography [6154-175]Nakano, K. / Owa, S. / Malik, I. / Yamamoto, T. / Nag, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Wafer management between coat/developer track and immersion lithography tool [6154-177]Fujiwara, T. / Shiraishi, K. / Tanizaki, H. / Ishii, Y. / Kyoda, H. / Yamamoto, T. / Ishida, S. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Drag-a-drop: a characterization tool for immersion lithography [6154-182]Bassett, D. W. / Taylor, J. C. / Conley, W. / Willson, C. G. / Bonnecaze, R. T. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Validity of the Hopkins approximation in simulations of hyper NA (NA>1) line-space structures for an attenuated PSM mask [6154-16]Erdmann, A. / Citarella, G. / Evanschitzky, P. / Schermer, H. / Philipsen, V. / De Bisschop, P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Finding the right way: DFM vs. area efficiency for 65nm gate layer lithography [6154-57]Sarma, C. S. / Scheer, S. / Herold, K. / Fonseca, C. / Thomas, A. / Schroeder, U. P. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Development status of a 193-nm immersion exposure tool [6154-68]Chibana, T. / Nakano, H. / Hata, H. / Kodachi, N. / Sano, N. / Arakawa, M. / Matsuoka, Y. / Kawasaki, Y. / Mori, S. / Chiba, K. et al. | 2006
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DOF enhancement for contact holes by using Nikon's CDP option and its introduction into production [6154-85]Armellin, L.-P. / Dureuil, V. / Nuel, L. / Salvetat, V. / Meier, W. / Kraft, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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One method to monitor the PPD function of Nikon scanners and some reticle surface particle detection machines [6154-91]Yang, W.-H. / Lin, Y.-K. / Huang, C. C. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Experimental measurement of photoresist modulation curves [6154-113]Bourov, A. / Robertson, S. A. / Smith, B. W. / Slocum, M. / Piscani, E. C. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Verifying high NA polarization OPC treatment on wafer [6154-133]Schlief, R. E. / Hennig, M. / Pforr, R. / Thiele, J. / Hoepfl, M. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Process window OPC for reduced process variability and enhanced yield [6154-139]Krasnoperova, A. / Culp, J. A. / Graur, I. / Mansfield, S. / Al-Imam, M. / Maaty, H. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Application of aberration optimization for specific pattern using Nikon's TAO method [6154-145]Meier, W. / Weirauch, G. / Hoepfl, M. / Jahnke, A. / SPIE-- the International Society for Optical Engineering et al. | 2006
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Full-field exposure tools for ArF immersion lithography [6154-174]Lee, J. / Otoguro, A. / Itani, T. / Fujii, K. / Shiraishi, K. / Fujiwara, T. / Ishii, Y. / SPIE-- the International Society for Optical Engineering et al. | 2006