An OPC approach to improve logic gate features corner fidelity (Englisch)

In: Optical Microlithography XXXII   ;  109610S-109610S-9 

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109610A
Improved wafer alignment model algorithm for better on-product overlay
Jeong, Ik-Hyun / Kim, Hyun-Sok / Kong, Yeong-Oh / Song, Ji-Hyun / Ju, Jae-Wuk / Kim, Young-Sik / Lambregts, Cees / Yu, Miao / Rahman, Rizvi / Karssemeijer, Leendertjan et al. | 2019
109610B
Efficient search of layout hotspot patterns for matching SEM images using multilevel pixelation
Tseng, Sean Shang-En / Chang, Wei-Chun / Jiang, Iris Hui-Ru / Zhu, Jun / Shiely, James P. | 2019
109610D
Analytical solutions for the deformation of a photoresist film
Granik, Yuri | 2019
109610F
Compact modeling of negative tone development resist with photo decomposable quencher
Chen, Ao / Koh, Kar Kit / Foong, Yee Mei / Morgenfeld, Bradley / Chen, Jun / Lee, Sandra / Chen, Xi / Omar, Hesham / Feng, Mu / Wang, ChangAn et al. | 2019
109610G
Improved validation and optimization of physics-based NTD compact modeling flows
Latinwo, Folarin / Yang, Delian / Wu, Cheng-En (Rich) / Brooker, Peter / Chen, Yulu / Song, Hua / Lucas, Kevin | 2019
109610H
Thin film characterization for advanced patterning
Zhu, Zhimin / Ye, Xianggui / Simmons, Sean / Frank, Catherine / Limmer, Tim / Lamb, James | 2019
109610I
A study on stepper's performance enhancements
Mori, Ken-Ichiro / Shigenobu, Atsushi / Motojima, Junichi / Suda, Hiromi | 2019
109610K
Holistic feedforward control for the 5 nm logic node and beyond
Megens, Henry / Brinkhof, Ralph / Aarts, Igor / Kok, Haico / Karssemeijer, Leendertjan / ten Haaf, Gijs / Lee, Shawn / Slotboom, Daan / de Ruiter, Chris / Lyulina, Irina et al. | 2019
109610M
Automatic parameter setting for lens aberration control during product lot exposure
Kanakutsu, Yutaka / Koizumi, Yukio / Ikezawa, Hironori / Eto, Shigeru / Ikeda, Junji / Takeuchi, Takenori / Matsuyama, Tomoyuki / Stan, Edward / Hiltunen, Ronald | 2019
109610N
Metrology and deep learning integrated solution to drive OPC model accuracy improvement
Yuan, Wei / Lu, Yifei / Zhao, Yuhang / Chen, Shoumian / Li, Ming / Hu, Hongmei / Yao, Shuxin / Liu, Zhunhua / Li, Qiaoqiao / Tian, Yu et al. | 2019
109610O
Optimal feature vector design for computational lithography
Shi, Xuelong / Zhao, YuHang / Cheng, Shoumian / Li, Ming / Yuan, Wei / Yao, Leon / Zhao, Wenhao / Xiao, Yanjun / Kang, Xiaohui / Li, Angmar | 2019
109610P
SRAF rule extraction and insertion based on inverse lithography technology
Su, Xiaojing / Gao, Pengzheng / Wei, Yayi / Shi, Weijie | 2019
109610R
Localized source and mask optimization with narrow-band level-set method
Shen, Yijiang | 2019
109610S
An OPC approach to improve logic gate features corner fidelity
Lin, Ping-Hung / Chao, Tzu-Chi / Yeh, Shin-Shing / Mai, Yung-Ching / Lin, Lawrence / Lai, Nelson | 2019
109610T
A programmable UVLED array with a collimated optics as transform lens as light field adjustable source
Huang, Jiun-Woei | 2019
109610V
Modeling of dynamic image performance for lithographic projection lens
Yang, Zhiyong / Shi, Yating / Jiang, Hao / Liu, Shiyuan | 2019
109610X
Extremely long life excimer laser chamber technology for multi-patterning lithography
Tsushima, Hiroaki / Fujimaki, Yousuke / Kiyota, Yasuaki / Tanaka, Makoto / Itou, Takashi / Asayama, Takeshi / Kurosu, Akihiko / Tanaka, Satoshi / Ohta, Takeshi / Bushida, Satoru et al. | 2019
109610Z
Robust alignment mark design for DRAM using a holistic computational approach
Li, Danying / Zhang, Stella / Chen, Chia-Huang / Zhang, Youping / Huang, Alex / Xu, David / Wang, Yufeng / Shi, Zhen / Wang, Shi-lu / Tsao, Sheng-Tsung et al. | 2019
1096101
Front Matter: Volume 10961
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1096105
Automatic correction of lithography hotspots with a deep generative model
Sim, Woojoo / Lee, Kibok / Yang, Dingdong / Jeong, Jaeseung / Hong, Ji-Suk / Lee, Sooryong / Lee, Honglak | 2019
1096106
Predictable etch model using machine learning
Kim, Youngchang / Jung, Sunwook / Kwak, DooHwan / Liubich, Vlad / Fenger, Germain | 2019
1096107
Investigation on MBOPC convergence improvement with location-dependent correction factors aided by machine learning
Chien, Sheng-Wei / Cai, Jia-Syun / Lee, Chien-Lin / Tsai, Kuen-Yu / Shiely, James / St. John, Matt | 2019
1096109
Pairing wafer leveling metrology from a lithographic apparatus with deep learning to enable cost effective dense wafer alignment metrology
Schmitt-Weaver, Emil / Bhattacharyya, Kaustuve | 2019
1096110
Improvement of spectrum measurement accuracy by high resolution spectrometer for DUV laser
Hattori, Masakazu / Hu, Sophia / Kudo, Takehito / Oga, Toshihiri / Mizoguchi, Hakaru | 2019