Resist shrinkage during development: rigorous simulations and first compact model for OPC (Englisch)
- Neue Suche nach: Granik, Yuri
- Neue Suche nach: Khaira, Daman
- Neue Suche nach: Granik, Yuri
- Neue Suche nach: Khaira, Daman
In:
Optical Microlithography XXXIII
;
113270G-113270G-7
;
2020
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ISBN:
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ISSN:
- Aufsatz (Konferenz) / Print
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Titel:Resist shrinkage during development: rigorous simulations and first compact model for OPC
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Beteiligte:Granik, Yuri ( Autor:in ) / Khaira, Daman ( Autor:in )
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Kongress:Optical Microlithography XXXIII
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Erschienen in:Optical Microlithography XXXIII ; 113270G-113270G-7Proceedings of SPIE, the International Society for Optical Engineering ; 11327 ; 113270G-113270G-7
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsdatum:01.01.2020
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Format / Umfang:113270G-113270G-7
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ISBN:
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ISSN:
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Medientyp:Aufsatz (Konferenz)
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Format:Print
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Sprache:Englisch
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Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Inhaltsverzeichnis Konferenzband
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