Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layer (Englisch)
- Neue Suche nach: Kuhl, M.
- Neue Suche nach: O'Halloran, G. M.
- Neue Suche nach: Gennissen, P. T. J.
- Neue Suche nach: French, P. J.
- Neue Suche nach: Kuhl, M.
- Neue Suche nach: O'Halloran, G. M.
- Neue Suche nach: Gennissen, P. T. J.
- Neue Suche nach: French, P. J.
In:
JOURNAL OF MICROMECHANICS AND MICROENGINEERING
;
8
, 4
;
317-322
;
1998
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Formation of porous silicon using an ammonium fluoride based electrolyte for application as a sacrificial layer
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Beteiligte:Kuhl, M. ( Autor:in ) / O'Halloran, G. M. ( Autor:in ) / Gennissen, P. T. J. ( Autor:in ) / French, P. J. ( Autor:in )
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Erschienen in:JOURNAL OF MICROMECHANICS AND MICROENGINEERING ; 8, 4 ; 317-322
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Verlag:
- Neue Suche nach: IOP PUBLISHING LTD
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Erscheinungsdatum:01.01.1998
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Format / Umfang:6 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 620
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 620 -
Datenquelle:
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