Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indices (Englisch)
- Neue Suche nach: Boher, P.
- Neue Suche nach: Piel, J. P.
- Neue Suche nach: Sacepe, B.
- Neue Suche nach: Boher, P.
- Neue Suche nach: Piel, J. P.
- Neue Suche nach: Sacepe, B.
In:
THIN SOLID FILMS
;
455-456
;
581-585
;
2004
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indices
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Beteiligte:
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Erschienen in:THIN SOLID FILMS ; 455-456 ; 581-585
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2004
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Format / Umfang:5 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 530.4275
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 530.4275 -
Datenquelle:
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Inhaltsverzeichnis – Band 455-456
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- 1
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Preface| 2004
- 3
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Expanding horizons: new developments in ellipsometry and polarimetryAspnes, D.E. et al. | 2003
- 14
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Multichannel Mueller matrix ellipsometer based on the dual rotating compensator principleChen, Chi / An, Ilsin / Ferreira, G.M. / Podraza, N.J. / Zapien, J.A. / Collins, R.W. et al. | 2003
- 24
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Spectroscopic ellipsometry using the grating division-of-amplitude photopolarimeter (G-DOAP)Krishnan, S. / Hampton, Scott / Azzam, R.M.A. et al. | 2003
- 33
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Comparison of the capabilities of rotating-analyzer and rotating-compensator ellipsometers by measurements on a single systemMori, T. / Aspnes, D.E. et al. | 2003
- 39
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Generalized magneto-optical ellipsometry in ferromagnetic metalsNeuber, G. / Rauer, R. / Kunze, J. / Backstrom, J. / Rübhausen, M. et al. | 2003
- 43
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Mueller matrix spectroscopic ellipsometry: formulation and applicationLaskarakis, A. / Logothetidis, S. / Pavlopoulou, E. / Gioti, M. et al. | 2003
- 50
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Optical anisotropy relevant to rotating-compensator polarimeters: application to the monoplate retarderAsar, M. / Aspnes, D.E. et al. | 2003
- 54
-
Prism spectroscopic ellipsometerAzzam, R.M.A. / Sudradjat, F.F. / Nazim Uddin, M. et al. | 2003
- 61
-
Accurate calibration and optimized measurement: use of an achromatic compensator in rotating polarizer spectroscopic ellipsometryBroch, L. / En Naciri, A. / Johann, L. et al. | 2003
- 66
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Precision in ellipsometrically determined sample parameters: simulation and experimentJohs, Blaine / Herzinger, Craig M. et al. | 2003
- 72
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Precision auto-alignment for incident angle of an ellipsometer using specimen stagePark, Sunglim / Gweon, DaeGab / Kim, Young Dong et al. | 2003
- 78
-
In situ calibration technique for photoelastic modulator in ellipsometryWang, M.W. / Tsai, F.H. / Chao, Y.F. et al. | 2003
- 84
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New design of a spectroscopic ellipsometer by using a spectrometer with multiple gratings and a two-dimensional CCD array detectorYou, Hai-Yang / Jia, Jian-Hu / Chen, Jian-Ke / Han, Tao / Ni, Wei-Ming / Wang, Song-You / Li, Jin / Zhang, Rong-Jun / Yang, Yue-Mei / Chen, Liang-Yao et al. | 2003
- 90
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Photo-interferometric spectroscopic ellipsometryMartinez-Antón, J.C. / Esteban, O. et al. | 2003
- 95
-
Evaluation of ellipsometric measurements using complex strategiesPolgár, O. / Fried, M. / Lohner, T. / Bársony, I. et al. | 2003
- 101
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Error function for interpretations of ellipsometric measurementsPolovinkin, V.G. et al. | 2003
- 106
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Application of spectral and temporal weighted error functions for data analysis in real-time spectroscopic ellipsometryZapien, J.A. / Ferlauto, A.S. / Collins, R.W. et al. | 2003
- 112
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General methods for optimized design and calibration of Mueller polarimetersDe Martino, A. / Garcia-Caurel, E. / Laude, B. / Drévillon, B. et al. | 2003
- 120
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Spectroscopic Mueller polarimeter based on liquid crystal devicesGarcia-Caurel, E. / De Martino, A. / Drévillon, B. et al. | 2003
- 124
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Optical properties of anisotropic materials: an experimental approachAlonso, M.I. / Garriga, M. et al. | 2003
- 132
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Calibration and data reduction for a UV-extended rotating-compensator multichannel ellipsometerAn, Ilsin / Zapien, J.A. / Chen, Chi / Ferlauto, A.S. / Lawrence, A.S. / Collins, R.W. et al. | 2003
- 138
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Development and test of a new grating-polarimeter and its application in ellipsometric measurementsMasetti, E. / Krasilnikova, A. et al. | 2004
- 143
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Far-infrared ellipsometry using a synchrotron light source—the dielectric response of the cuprate high Tc superconductorsBernhard, C. / Humlı́cek, J. / Keimer, B. et al. | 2004
- 150
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Infrared spectroscopic ellipsometry applied to the characterization of ultra shallow junction on silicon and SOIDefranoux, C. / Emeraud, T. / Bourtault, S. / Venturini, J. / Boher, P. / Hernandez, M. / Laviron, C. / Noguchi, T. et al. | 2004
- 157
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Optical purity evaluation of the noble metal by the ellipsometric methodZhou, Peng / Wang, Song-You / Li, Jing / Zhang, Rong-Jun / You, Hai-Yang / Shen, Zhuo-Chen / Chen, Liang-Yao et al. | 2003
- 161
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Infrared dielectric functions and crystal orientation of a-plane ZnO thin films on r-plane sapphire determined by generalized ellipsometryBundesmann, C. / Ashkenov, N. / Schubert, M. / Rahm, A. / Wenckstern, H.v. / Kaidashev, E.M. / Lorenz, M. / Grundmann, M. et al. | 2003
- 167
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FTIR phase-modulated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nanoparticlesCanillas, A. / Pinyol, A. / Sancho-Parramon, J. / Ferré-Borrull, J. / Bertran, E. et al. | 2003
- 172
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Infrared study of YBa2Cu3O7/La0.67Ca0.33MnO3 superlatticesDubroka, A. / Cristiani, G. / Habermeier, H.-U. / Humlı́ček, J. et al. | 2004
- 177
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Diffraction effects in infrared ellipsometry of conducting samplesHumlı́ček, J. / Bernhard, C. et al. | 2004
- 183
-
Infrared ellipsometry of SiC/Si heterostructures with Ge modified interfacesZgheib, Ch. / Förster, Ch. / Weih, P. / Cimalla, V. / Kazan, M. / Masri, P. / Ambacher, O. / Pezoldt, J. et al. | 2003
- 187
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Optical properties of silicon carbide polytypes below and around bandgapKildemo, M. et al. | 2003
- 196
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Simultaneous determination of bulk isotropic and surface-induced anisotropic complex dielectric functions of semiconductors from high speed Mueller matrix ellipsometryChen, Chi / An, Ilsin / Collins, R.W. et al. | 2004
- 201
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Optical characterization of aluminum-doped zinc oxide films by advanced dispersion theoriesPflug, Andreas / Sittinger, Volker / Ruske, Florian / Szyszka, Bernd / Dittmar, Georg et al. | 2004
- 207
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Fine art painting characterization by spectroscopic ellipsometry: preliminary measurements on varnish layersChristofides, C. / Castellon, B. / Othonos, A. / Polikreti, K. / de Deyne, C. et al. | 2004
- 213
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Optical properties study of MgB2Chvostová, D. / Železný, V. / Pajasová, L. / Tarasenko, A. / Plecenı́k, A. / Kúš, P. / Satrapinský, L. et al. | 2004
- 217
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Optical constants and interband transitions of Ge1−xSnx alloys (x<0.2) grown on Si by UHV-CVDCook, Candi S. / Zollner, Stefan / Bauer, Matthew R. / Aella, Pavan / Kouvetakis, John / Menendez, Jose et al. | 2003
- 222
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Parametric modeling of the dielectric functions of Cd1−xMgxTe alloy filmsIhn, Y.S. / Kim, T.J. / Ghong, T.H. / Kim, Y.D. / Aspnes, D.E. / Kossut, J. et al. | 2004
- 228
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Optical properties of ZnSe and Zn0.87Mn0.13Se epilayers determined by spectroscopic ellipsometryKvietkova, J. / Daniel, B. / Hetterich, M. / Schubert, M. / Spemann, D. et al. | 2003
- 231
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Hydrogen implantation in InGaNAs studied by spectroscopic ellipsometryLeibiger, G. / Gottschalch, V. / Razek, N. / Schindler, A. / Schubert, M. et al. | 2003
- 235
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Infrared to vacuum ultraviolet optical properties of 3C, 4H and 6H silicon carbide measured by spectroscopic ellipsometryLindquist, O.P.A. / Schubert, M. / Arwin, H. / Järrendahl, K. et al. | 2004
- 239
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Ion implantation-caused damage in SiC measured by spectroscopic ellipsometryPetrik, P. / Shaaban, E.R. / Lohner, T. / Battistig, G. / Fried, M. / Garcia Lopez, J. / Morilla, Y. / Polgár, O. / Gyulai, J. et al. | 2004
- 244
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Phase-modulated spectroscopic ellipsometry and polarized transmission intensity studies of wide-gap biaxial CaGa2S4Shim, Yonggu / Mamedov, Nazim / Yamamoto, Nobuyuki et al. | 2004
- 248
-
Optical properties of bulk c-ZrO2, c-MgO and a-As2S3 determined by variable angle spectroscopic ellipsometrySynowicki, R.A. / Tiwald, Thomas E. et al. | 2004
- 256
-
IR ellipsometry and photoluminescence investigations of Zn1−xBexSe and Zn1−x−yBexMnySe mixed crystalsWronkowska, A.A. / Bejtka, K. / Arwin, H. / Wronkowski, A. / Firszt, F. / Łęgowski, S. / Męczyńska, H. / Marasek, A. et al. | 2003
- 261
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Gate oxide metrology and silicon piezoopticsZollner, Stefan / Liu, Ran / Volinsky, A.A. / White, Ted / Nguyen, Bich-Yen / Cook, C.S. et al. | 2003
- 266
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Structure analysis of organic films by mid-infrared ellipsometryHinrichs, K. / Röseler, A. / Gensch, M. / Korte, E.H. et al. | 2004
- 272
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Infrared spectroscopic ellipsometry study of molecular orientation induced anisotropy in polymer substratesBungay, Corey / Tiwald, Thomas E. et al. | 2003
- 278
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Temperature dependence of ellipsometric spectra of poly(methyl-phenylsilane)Bonaventurová Zrzavecká, O. / Nebojsa, A. / Navrátil, K. / Nešpůrek, S. / Humlı́ček, J. et al. | 2004
- 283
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IR–FUV ellipsometry studies on the optical, electronic and vibrational properties of polymeric membranesGioti, M. / Laskarakis, A. / Logothetidis, S. et al. | 2003
- 288
-
Envelope analysis in spectroscopic ellipsometry of thin films. Application to a weakly-absorbing polymer filmMartinez-Antón, J.C. / Gómez-Pedrero, J.A. / Álvarez-Herrero, A. et al. | 2004
- 292
-
Swelling of a thin B+ implanted polyimide layer—a dynamic spectroscopic ellipsometry studyEichhorn, K.-J. / Sahre, K. / Günther, M. / Suchaneck, G. / Gerlach, G. et al. | 2003
- 295
-
Infrared ellipsometry characterization of conducting thin organic filmsSchubert, M. / Bundesmann, C. / Jakopic, G. / Maresch, H. / Arwin, H. / Persson, N.-C. / Zhang, F. / Inganäs, O. et al. | 2003
- 301
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Relationships among surface processing at the nanometer scale, nanostructure and optical properties of thin oxide filmsLosurdo, Maria et al. | 2003
- 313
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Correlations between the microstructure of Ag-Si3N4 multilayers and their optical propertiesGirardeau, T. / Camelio, S. / Babonneau, D. / Toudert, J. / Barranco, A. et al. | 2004
- 318
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Characterization of interfacial layer of ultrathin Zr silicate on Si(100) using spectroscopic ellipsometry and HRTEMAhn, H. / Chen, H.-W. / Landheer, D. / Wu, X. / Chou, L.J. / Chao, T.-S. et al. | 2004
- 323
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Ellipsometric characterisation of heterogeneous 2D layersWormeester, Herbert / Stefan Kooij, E. / Mewe, Agnes / Rekveld, Sander / Poelsema, Bene et al. | 2004
- 335
-
Dielectric function of Si nanocrystals embedded in SiO2Gallas, B. / Kao, Chih-Cheng / Defranoux, C. / Fisson, S. / Vuye, G. / Rivory, J. et al. | 2003
- 339
-
Spectroscopic ellipsometry of carbon nanotube formation in SiC surface decompositionMatsumoto, K. / Maeda, H. / Kawaguchi, Y. / Takahashi, K. / Aoyama, M. / Yamaguchi, T. / Postava, K. et al. | 2003
- 344
-
Depth distribution of disorder and cavities in high dose helium implanted silicon characterized by spectroscopic ellipsometryPetrik, P. / Cayrel, F. / Fried, M. / Polgár, O. / Lohner, T. / Vincent, L. / Alquier, D. / Gyulai, J. et al. | 2004
- 349
-
The simultaneous determination of n, k, and t from polarimetric dataFlock, K. et al. | 2004
- 356
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Water adsorption in porous TiO2–SiO2 sol–gel films analyzed by spectroscopic ellipsometryAlvarez-Herrero, A. / Ramos, G. / del Monte, F. / Bernabeu, E. / Levy, D. et al. | 2004
- 361
-
Determination of refractive index of printed and unprinted paper using spectroscopic ellipsometryBakker, J.W.P. / Bryntse, G. / Arwin, H. et al. | 2004
- 366
-
Description of the porosity of inhomogeneous porous low-k films using solvent adsorption studied by spectroscopic ellipsometry in the visible rangeBourgeois, A. / Brunet Bruneau, A. / Jousseaume, V. / Rochat, N. / Fisson, S. / Demarets, B. / Rivory, J. et al. | 2003
- 370
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Visible and infrared ellipsometry applied to the study of metal-containing diamond-like carbon coatingsCorbella, C. / Pascual, E. / Canillas, A. / Bertran, E. / Andújar, J.L. et al. | 2003
- 376
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Application of in-situ ellipsometry to the fabrication of multi-layer optical coatings with sub-nanometre accuracyDligatch, Svetlana / Netterfield, Roger P. / Martin, Barry et al. | 2004
- 380
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Complete wetting transition at the fluid–vapour interface of Ga–Bi studied by spectroscopic ellipsometryDogel, S. / Nattland, D. / Freyland, W. et al. | 2003
- 384
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Spectroscopic ellipsometry characterization of ZnO–In2O3 systemsEl Rhaleb, H. / En Naciri, A. / Dounia, R. / Johann, L. / Hakam, A. / Addou, M. et al. | 2004
- 388
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Analytical model for the optical functions of amorphous semiconductors and its applications for thin film solar cellsFerlauto, A.S. / Ferreira, G.M. / Pearce, J.M. / Wronski, C.R. / Collins, R.W. / Deng, X. / Ganguly, G. et al. | 2003
- 393
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Optical properties of diamond-like carbon films containing SiOx studied by the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel / Ohlı́dal, Ivan / Buršı́ková, Vilma / Zajı́čková, Lenka et al. | 2003
- 399
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Complete characterization of rough polymorphous silicon films by atomic force microscopy and the combined method of spectroscopic ellipsometry and spectroscopic reflectometryFranta, Daniel / Ohlı́dal, Ivan / Klapetek, Petr / Roca i Cabarrocas, Pere et al. | 2003
- 404
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Dose-dependence of ion implantation-caused damage in silicon measured by ellipsometry and backscattering spectrometryFried, M. / Petrik, P. / Lohner, T. / Khánh, N.Q. / Polgár, O. / Gyulai, J. et al. | 2004
- 410
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Characterisation of porous silicon composite material by spectroscopic ellipsometryGaillet, M. / Guendouz, M. / Ben Salah, M. / Le Jeune, B. / Le Brun, G. et al. | 2004
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Spectroellipsometric characterization of sol–gel TiO2–CuO thin coatingsGartner, M. / Scurtu, R. / Ghita, A. / Zaharescu, M. / Modreanu, M. / Trapalis, C. / Kokkoris, M. / Kordas, G. et al. | 2004
- 422
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Ex situ spectroscopic ellipsometry investigations of chemical vapor deposited nanocomposite carbon thin filmsGupta, S. / Weiner, B.R. / Morell, G. et al. | 2003
- 429
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Optical and magnetooptical properties of bismuth and gallium substituted iron garnet filmsHansteen, Fredrik / Egil Helseth, Lars / Johansen, Tom H. / Hunderi, Ola / Kirilyuk, Andrei / Rasing, Theo et al. | 2003
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Contributions to the static dielectric constant of low-k xerogel films derived from ellipsometry and IR spectroscopyHimcinschi, C. / Friedrich, M. / Frühauf, S. / Schulz, S.E. / Gessner, T. / Zahn, D.R.T. et al. | 2003
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Study of structure and optical properties of silver oxide films by ellipsometry, XRD and XPS methodsGao, Xiao-Yong / Wang, Song-You / Li, Jing / Zheng, Yu-Xiang / Zhang, Rong-Jun / Zhou, Peng / Yang, Yue-Mei / Chen, Liang-Yao et al. | 2003
- 443
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Dielectric function of thin metal films by combined in situ transmission ellipsometry and intensity measurementsPribil, G.K. / Johs, B. / Ianno, N.J. et al. | 2003
- 450
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Mn1−xFex alloy films studied by optical and magneto-optical spectroscopiesKim, J.B. / Park, S.Y. / Lee, Y.P. / Kudryavtsev, Y.V. / Gontarz, R. / Szymański, B. et al. | 2004
- 453
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Effect of ion irradiation on the optical properties and room temperature oxidation of copper surfacePoperenko, L.V. / Ramadan Shaaban, Essam / Khánh, N.Q. / Stashchuk, V.S. / Vinnichenko, M.V. / Yurgelevich, I.V. / Nosach, D.V. / Lohner, T. et al. | 2004
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Spectroscopic ellipsometry characterization of interface reactivity in GaAs-based superlatticesLosurdo, M. / Giuva, D. / Giangregorio, M.M. / Bruno, G. / Brown, A.S. et al. | 2003
- 462
-
The finite difference time domain method as a numerical tool for studying the polarization optical response of rough surfacesLehner, B. / Hingerl, K. et al. | 2004
- 468
-
Ellipsometric and XPS analysis of the interface between silver and SiO2, TiO2 and SiNx thin filmsMasetti, E. / Bulir, J. / Gagliardi, S. / Janicki, V. / Krasilnikova, A. / Di Santo, G. / Coluzza, C. et al. | 2003
- 473
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Spectroscopic ellipsometry of TaNx and VN filmsMistrik, J. / Takahashi, K. / Antos, R. / Aoyama, M. / Yamaguchi, T. / Anma, Y. / Fukuda, Y. / Takeyama, M.B. / Noya, A. / Jiang, Z.-T. et al. | 2003
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Spectroscopic ellipsometry of pulsed laser irradiated c-Ge surfacesMistrik, J. / Antos, R. / Murakami, K. / Aoyama, M. / Yamaguchi, T. / Anma, Y. / Fukuda, Y. / Medvid’, A. / Michko, A. et al. | 2003
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Spectroscopic ellipsometry analysis for investigation of the modification of thin film p-a-Si1−xCx:H after ultraviolet treatment in an Argon ambientMyong, Seung Yeop / Kim, Sang Soo / Lim, Koeng Su et al. | 2004
- 486
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- 491
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- 495
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- 500
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UV–VUV spectroscopic ellipsometry of ternary MgxZn1−xO (0≤x≤0.53) thin filmsSchmidt-Grund, R. / Schubert, M. / Rheinländer, B. / Fritsch, D. / Schmidt, H. / Kaidashev, E.M. / Lorenz, M. / Herzinger, C.M. / Grundmann, M. et al. | 2003
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Spectroellipsometric study of the sol–gel nanocrystalline ITO multilayer filmsStoica, T.F. / Gartner, M. / Losurdo, M. / Teodorescu, V. / Blanchin, M. / Stoica, T. / Zaharescu, M. et al. | 2003
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Photopolarimetric investigations of liquid crystals–electrochromic oxides interfaceStrangi, G. / Versace, C. / Scaramuzza, N. / Cazzanelli, E. / Bruno, V. / Vena, C. / D'Elia, S. / Bartolino, R. et al. | 2003
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Spectroscopic ellipsometry (SE) and grazing X-ray reflectometry (GXR) analyses on tungsten carbide films for diffusion barrier in copper metallization schemesSun, Lianchao / Fouere, Jean-Claude / Sammet, Timo / Hatzistergos, Michael / Efstathiadis, Harry et al. | 2004
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Spectroscopic ellipsometry investigation of amorphous carbon films with different sp3 content: relation with protein adsorptionVinnichenko, M. / Gago, R. / Huang, N. / Leng, Y.X. / Sun, H. / Kreissig, U. / Kulish, M.P. / Maitz, M.F. et al. | 2003
- 535
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The ideal vehicle for optical model development: porous silicon multilayersVolk, J. / Fried, M. / Tóth, A.L. / Bársony, I. et al. | 2004
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Spectroscopic ellipsometry study of focused ion beam induced GaAs surface modificationBasnar, B. / Lugstein, A. / Bertagnolli, E. / Gornik, E. et al. | 2004
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Ellipsometric analysis of gamma radiation effects on standard optical coatings used in aerospace applicationsFernández-Rodrı́guez, M. / Ramos, G. / del Monte, F. / Levy, D. / Alvarado, C.G. / Núñez, A. / Álvarez-Herrero, A. et al. | 2004
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Determination of the anisotropic dielectric function for metal free phthalocyanine thin filmsGordan, O.D. / Friedrich, M. / Zahn, D.R.T. et al. | 2003
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Investigation of optical anisotropy of Langmuir–Blodgett films of long-chain acetylenic acidsBadmaeva, I.A. / Nenasheva, L.A. / Polovinkin, V.G. / Repinsky, S.M. / Sveshnikova, L.L. et al. | 2003
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Far-infrared magnetooptic generalized ellipsometry: determination of free-charge-carrier parameters in semiconductor thin film structuresSchubert, Mathias / Hofmann, Tino / Herzinger, Craig M. et al. | 2003
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Analysis of the optical properties and structure of sculptured thin films from spectroscopic Mueller matrix ellipsometryPodraza, N.J. / Chen, Chi / An, Ilsin / Ferreira, G.M. / Rovira, P.I. / Messier, R. / Collins, R.W. et al. | 2003
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Anisotropic optical functions of pentaerythrytol, an uniaxial organic crystalSassella, A. / Wagner, Th. / Herzinger, C. / Su, Genbo / He, Youping / Chen, Chenjia et al. | 2003
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Generalized ellipsometry for the characterization of anisotropic materials: influence of the sample adjustment on the extracted optical indicesBoher, P. / Piel, J.P. / Sacépé, B. et al. | 2004
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VASE and IR spectroscopy: excellent tools to study biaxial organic molecular thin films: DiMe-PTCDI on S-passivated GaAs(100)Friedrich, M. / Himcinschi, C. / Salvan, G. / Anghel, M. / Paraian, A. / Wagner, Th. / Kampen, T.U. / Zahn, D.R.T. et al. | 2003
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Mueller-matrix characterization of liquid crystalsHilfiker, J.N. / Herzinger, C.M. / Wagner, T. / Marino, Antigone / Delgais, Guiseppe / Abbate, Giancarlo et al. | 2004
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Generalized spectroscopic ellipsometry and Mueller-matrix study of twisted nematic and super twisted nematic liquid crystalsHilfiker, J.N. / Johs, B. / Herzinger, C.M. / Elman, J.F. / Montbach, E. / Bryant, D. / Bos, P.J. et al. | 2004
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Far-infrared dielectric function and phonon modes of spontaneously ordered (AlxGa1−x)0.52In0.48PHofmann, Tino / Schubert, Mathias / Gottschalch, Volker et al. | 2003
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Concentration and size dependence of optical properties of Ag:Bi2O3 composite films by using the co-sputtering methodZhou, Peng / You, Hai-Yang / Jia, Jian-Hu / Li, Jing / Han, Tao / Wang, Song-You / Zhang, Rong-Jun / Zheng, Yu-Xiang / Chen, Liang-Yao et al. | 2003
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Ellipsometry on uniaxial ZnO and Zn1−xMgxO thin films grown on (0001) sapphire substrateKang, T.D. / Lee, Hosun / Park, Won-Il / Yi, Gyu-Chul et al. | 2003
- 615
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Magneto-optical ellipsometry of systems containing thick layersPostava, K. / Životský, O. / Pištora, J. / Yamaguchi, T. et al. | 2003
- 619
-
Generalized ellipsometry for orthorhombic, absorbing materials: dielectric functions, phonon modes and band-to-band transitions of Sb2S3Schubert, M. / Hofmann, T. / Herzinger, C.M. / Dollase, W. et al. | 2003
- 624
-
Mueller matrix ellipsometry study of uniaxial deuterated potassium dihydrogen phosphate (DKDP)Synowicki, R.A. / Hilfiker, James N. / Whitman, Pamela K. et al. | 2004
- 628
-
Coherent and incoherent interference modelling and measurement of anisotropic multilayer stacks using conventional ellipsometryTouir, H. / Stchakovsky, M. / Ossikovski, R. / Warenghem, M. et al. | 2003
- 632
-
General virtual interface algorithm for in situ spectroscopic ellipsometric data analysisJohs, Blaine et al. | 2003
- 639
-
Integrated rotating-compensator polarimeter for real-time measurements and analysis of organometallic chemical vapor depositionFlock, K. / Kim, S.-J. / Asar, M. / Kim, I.K. / Aspnes, D.E. et al. | 2004
- 645
-
Control of etch depth in patterned semiconductor substrates using real time spectroscopic ellipsometryCho, S.-J. / Snyder, P.G. / Ianno, N.J. / Herzinger, C.M. / Johs, B. et al. | 2004
- 650
-
Spectroellipsometric evaluation of colour and oxidation resistance of TiMgN coatingsBanakh, O. / Balzer, M. / Fenker, M. / Blatter, A. et al. | 2003
- 656
-
An in situ study of mesostructured CTAB-silica film formation using infrared ellipsometry: evolution of water contentBrunet-Bruneau, A. / Bourgeois, A. / Cagnol, F. / Grosso, D. / Sanchez, C. / Rivory, J. et al. | 2003
- 661
-
In-situ spectroscopic ellipsometry investigation and control of GaN growth mode in metal-organic vapor phase epitaxy at low pressures of 20 TorrCao, B. / Xu, K. / Ishitani, Y. / Yoshikawa, A. et al. | 2004
- 665
-
Evaluation of compositional depth profiles in mixed-phase (amorphous+crystalline) silicon films from real time spectroscopic ellipsometryFerlauto, A.S. / Ferreira, G.M. / Koval, R.J. / Pearce, J.M. / Wronski, C.R. / Collins, R.W. / Al-Jassim, M.M. / Jones, K.M. et al. | 2003
- 670
-
Real-time studies of amorphous and microcrystalline Si:H growth by spectroscopic ellipsometry and infrared spectroscopyFujiwara, Hiroyuki / Kondo, Michio / Matsuda, Akihisa et al. | 2003
- 675
-
Observation of the cascaded phase transformation of Ge–Sb–Te alloy at elevated temperature by using nanosecond time resolved ellipsometryKim, Sang Jun / Park, Young D. / An, Sung Hyuck / Kim, Sang Youl et al. | 2004
- 679
-
In-situ studies of the growth of amorphous and nanocrystalline silicon using real time spectroscopic ellipsometryLevi, D.H. / Nelson, B.P. / Iwanizcko, E. / Teplin, C.W. et al. | 2003
- 684
-
In-situ growth monitoring by spectroscopy ellipsometry of MOCVD cubic-GaN(001)Montaigne Ramil, A. / Schmidegg, K. / Bonanni, A. / Sitter, H. / Stifter, D. / Shunfeng, Li / As, D.J. / Lischka, K. et al. | 2004
- 688
-
In situ ellipsometry for control of Hg1−xCdxTe nanolayer structures and inhomogeneous layers during MBE growthShvets, V.A. / Rykhlitski, S.V. / Spesivtsev, E.V. / Aulchenko, N.A. / Mikhailov, N.N. / Dvoretsky, S.A. / Sidorov, Yu.G. / Smirnov, R.N. et al. | 2003
- 695
-
In situ spectroscopic ellipsometry of hydrogen-argon plasma cleaned silicon surfacesFörster, Ch. / Schnabel, F. / Weih, P. / Stauden, Th. / Ambacher, O. / Pezoldt, J. et al. | 2003
- 700
-
Time-resolved microellipsometry for rapid thermal processes monitoringSpesivtsev, E.V. / Rykhlitsky, S.V. / Shvets, V.A. / Chikichev, S.I. / Mardezhov, A.S. / Nazarov, N.I. / Volodin, V.A. et al. | 2003
- 705
-
Realtime layer-by-layer analysis for multilayer fabrication monitoring by an automatic null ellipsometerTsuru, T. / Tsutou, T. / Yamamoto, M. et al. | 2004
- 710
-
In situ measurements of chemical sensor film dynamics by spectroscopic ellipsometry. Three case studiesZudans, Imants / Heineman, William R. / Seliskar, Carl J. et al. | 2004
- 716
-
Protein monolayers monitored by internal reflection ellipsometryPoksinski, M. / Arwin, H. et al. | 2004
- 722
-
Application of FTIR ellipsometry to detect and classify microorganismsGarcia-Caurel, Enric / Nguyen, Jacqueline / Schwartz, Laurent / Drévillon, Bernard et al. | 2004
- 726
-
Protein adsorption in porous silicon gradients monitored by spatially-resolved spectroscopic ellipsometryKarlsson, L.M. / Schubert, M. / Ashkenov, N. / Arwin, H. et al. | 2004
- 731
-
Spectroscopic ellipsometry on biological materials – investigation of hydration dynamics and structural propertiesSchulz, B. / Chan, D. / Bäckström, J. / Rübhausen, M. et al. | 2004
- 735
-
In situ ellipsometric and electrochemical monitoring of the oxidation of a Pb–Ca–Sn alloy used in the lead acid batteriesStein, N. / Bourguignon, G. / Raboin, L. / Broch, L. / Johann, L. / Rocca, E. et al. | 2003
- 742
-
Use of in-situ spectroscopic ellipsometry to study aluminium/oxide surface modifications in chloride and sulfuric solutionsVan Gils, S. / Melendres, C.A. / Terryn, H. / Stijns, E. et al. | 2004
- 747
-
CO2 sorption of a ceramic separation membraneWormeester, Herbert / Benes, Nieck E. / Spijksma, Gerald I. / Verweij, Henk / Poelsema, Bene et al. | 2004
- 752
-
Reflection anisotropy spectroscopy of molecular assembly at metal surfacesMartin, D.S. / Weightman, P. et al. | 2003
- 759
-
Atomic-layer resolved monitoring of thermal oxidation of Si(001) by reflectance difference oscillation techniqueYasuda, Tetsuji / Nishizawa, Masayasu / Kumagai, Naoto / Yamasaki, Satoshi / Oheda, Hitoshi / Yamabe, Kikuo et al. | 2003
- 764
-
Calculation of surface optical properties: from qualitative understanding to quantitative predictionsSchmidt, W.G. / Seino, K. / Hahn, P.H. / Bechstedt, F. / Lu, W. / Wang, S. / Bernholc, J. et al. | 2003
- 772
-
Industrial applications of spectroscopic ellipsometryTompkins, Harland G. et al. | 2004
- 779
-
Biplate artifacts in rotating-compensator ellipsometersEbert, K. / Aspnes, D.E. et al. | 2004
- 784
-
Ellipsometric monitoring of molecular evolution in freely suspended films of M12/10 ferroelectric liquid crystalBortchagovsky, E.G. / Deineka, A. / Glogarová, M. / Hamplová, V. / Jastrabı́k, L. / Kašpar, M. et al. | 2004
- 790
-
Performance analysis of ellipsometer systemsAsinovski, Leo et al. | 2003
- 794
-
Spectroscopic ellipsometry for in-line monitoring of silicon nitridesCook, Candi S. / Daly, Terry / Liu, Ran / Canonico, Michael / Xie, Q. / Gregory, R.B. / Zollner, Stefan et al. | 2003
- 798
-
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronicsBoher, P / Evrard, P / Condat, O / Dos Reis, C / Defranoux, C / Piel, J.Ph / Stehle, J.L / Bellandi, E et al. | 2004
- 804
-
Application of the genetic algorithms in spectroscopic ellipsometryKudla, Andrzej et al. | 2003
- 809
-
A new multiple wavelength ellipsometric imager: design, limitations and applicationsBoher, P. / Thomas, O. / Piel, J.P. / Stehle, J.L. et al. | 2004
- 819
-
Oxidation behaviour of thin silver films deposited on plastic web characterized by spectroscopic ellipsometry (SE)Sahm, H / Charton, C / Thielsch, R et al. | 2003
- 824
-
A memory application of light reflection from anisotropic micro-structured thin filmsTazawa, M. / Xu, G. / Jin, P. / Arwin, H. et al. | 2003
- 828
-
Spectroscopic ellipsometry and reflectometry from gratings (Scatterometry) for critical dimension measurement and in situ, real-time process monitoringHuang, Hsu-Ting / Terry Jr, Fred L. et al. | 2004
- 837
-
Author Index| 2004
- 840
-
Subject Index| 2004
- iii
-
Editorial Board| 2004