Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10^−^7 Torr base pressures (Englisch)
- Neue Suche nach: García-Valenzuela, J. A.
- Neue Suche nach: Cabrera-German, D.
- Neue Suche nach: Cota-Leal, M.
- Neue Suche nach: Suárez-Campos, G.
- Neue Suche nach: Martínez-Gil, M.
- Neue Suche nach: Romo-García, F.
- Neue Suche nach: Baez-Gaxiola, M. R.
- Neue Suche nach: Sotelo-Lerma, M.
- Neue Suche nach: Andreu, J.
- Neue Suche nach: Bertomeu, J.
- Neue Suche nach: García-Valenzuela, J. A.
- Neue Suche nach: Cabrera-German, D.
- Neue Suche nach: Cota-Leal, M.
- Neue Suche nach: Suárez-Campos, G.
- Neue Suche nach: Martínez-Gil, M.
- Neue Suche nach: Romo-García, F.
- Neue Suche nach: Baez-Gaxiola, M. R.
- Neue Suche nach: Sotelo-Lerma, M.
- Neue Suche nach: Andreu, J.
- Neue Suche nach: Bertomeu, J.
In:
Revista Mexicana de física
;
64
, 6
;
566-576
;
2018
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Modulation of argon pressure as an option to control transmittance and resistivity of ZnO:Al films deposited by DC magnetron sputtering: on the dark yellow films at 10^−^7 Torr base pressures
-
Beteiligte:García-Valenzuela, J. A. ( Autor:in ) / Cabrera-German, D. ( Autor:in ) / Cota-Leal, M. ( Autor:in ) / Suárez-Campos, G. ( Autor:in ) / Martínez-Gil, M. ( Autor:in ) / Romo-García, F. ( Autor:in ) / Baez-Gaxiola, M. R. ( Autor:in ) / Sotelo-Lerma, M. ( Autor:in ) / Andreu, J. ( Autor:in ) / Bertomeu, J. ( Autor:in )
-
Erschienen in:Revista Mexicana de física ; 64, 6 ; 566-576
-
Verlag:
- Neue Suche nach: SOCIEDAD MEXICANA DE FISICA
-
Erscheinungsdatum:01.01.2018
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Format / Umfang:11 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
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Sprache:Englisch
- Neue Suche nach: 530
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 530 -
Datenquelle:
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