Advances in resist technology : March 12-13, 1984, Santa Clara, California (Englisch)
- Neue Suche nach: Willson, Grant
1984
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ISBN:
- Konferenzband / Print
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Titel:Advances in resist technology : March 12-13, 1984, Santa Clara, California
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Beteiligte:
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Kongress:Advances in Resist Technology ; 1 ; 1984 ; Santa Clara, Calif.
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Erschienen in:
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsort:Bellingham, Wash.
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Erscheinungsdatum:1984
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Format / Umfang:VI, 195 S
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ISBN:
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Medientyp:Konferenzband
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 686.2/325
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 686.2/325 -
Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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A High Sensitivity Two Layer Resist Process For Use In High Resolution Optical LithographyWatts, M. P. et al. | 1984
- 11
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Image Formation In The Sublayer Of A Multilayer Resist StructureMeyerhofer, D. / White, L. K. et al. | 1984
- 16
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Polysilane Bilayer uv LithographyHofer, Donald C. / Miller, Robert D. / Willson, C.Grant et al. | 1984
- 24
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An Improved Deep Ultra Violet (DUV) Multilayer Resist Process For High Resolution LithographyTing, C. H. / Liauw, K. L. et al. | 1984
- 30
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Some Aspects Of Anti-Reflective Coating For Optical LithographyLin, Yi-Ching / Marriott, Vic / Orvek, Kevin / Fuller, Gene et al. | 1984
- 38
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Deep UV Positive Resists For Two-Level Photoresist ProcessesReichmanis, E. / Smolinsky, G. et al. | 1984
- 46
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Optical Performance And Process Characterizations Of Several High Contrast Metal-Ion-Free Developer ProcessesPetersen, John S. / Kozlowski, Alan E. et al. | 1984
- 57
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Effect of Developer Composition on Photoresist PerformanceHinsberg, William D. / Gutierrez, Monica L. et al. | 1984
- 65
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Resolution Enhancement Of Positive Photoresist Through Optimization Of Thermal ProcessingMarriott, Vic / Lin, Yi -Ching / Fuller, Gene et al. | 1984
- 72
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Thermolysis Of Positive PhotoresistsJohnson, Donald W. et al. | 1984
- 80
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Three Dimensional Microfabrication On Thick Film Photoresist MandrelsSalmre, William et al. | 1984
- 86
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A New Negative/High Resolution Photoresist WX-305Toukhy, Medhat A. / Marcotte, Stephen F. et al. | 1984
- 94
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Application Of Contrast-Enhanced Lithography To 1:1 Projection PrintingGriffing, B. F. / West, P. R. / Balch, E. W. et al. | 1984
- 102
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Two-Dimensional Modeling Of Contrast-Enhanced LithographyGriffing, B. F. / Lorensen, W. E. et al. | 1984
- 108
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Contrast Enhanced UV Lithography With PolysilanesHofer, Donald C. / Miller, Robert D. / Willson, C.Grant / Neureuther, Andrew R. et al. | 1984
- 117
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Negative Photoresists For Deep-UV LithographyYang, Jer-Ming / Chiong, Kaolin / Yan, Hoh-Jiear / Chow, Ming-Fea et al. | 1984
- 127
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High Resolution Polymer Pattern Fabrications With Low Energy Proton BeamsHiraoka, H. et al. | 1984
- 135
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Novel, Negative-Working Electron-Beam ResistTan, Z. C. / Daly, R. C. / Georgia, S. S. et al. | 1984
- 144
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Electron Beam Lithographic Evaluation And Chain Scissioning Yields Of Itaconate ResistsNamaste, Y. M. / Obendorf, S. K. / Anderson, C. C. / Rodriguez, F. et al. | 1984
- 151
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The Use Of Photoresists As Negative Electron ResistsBerker, T. D. et al. | 1984
- 159
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A New High Temperature Positive Photoresist HX-256Toukhy, Medhat A. / Jech, Joe et al. | 1984
- 169
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High Contrast Photoresist For Use With Wafer SteppersGrunwald, John J. / Turner, Edwin J. / Sawoska, David A. / D'Ottavio, Eugene D. / Spencer, Allen C. et al. | 1984
- 179
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Trilayer Resist Processing Using Spin-On Glass Intermediate LayersGupta, Satish K. / Audain, Carver G. et al. | 1984
- 189
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Image Reversal Techniques With Standard Positive PhotoresistLong, Mary L. / Newman, Jeff et al. | 1984