Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California (Englisch)

1996

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  • Titel:
    Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March, 1996, Santa Clara, California
  • Sonstige Beteiligte:
  • Kongress:
    Conference; 1996; Santa Clara, Calif.
  • Erschienen in:
  • Verlag:
    SPIE
  • Erscheinungsort:
    Berlin, Bellingham, Wash.
  • Erscheinungsjahr:
    1996
  • Format / Umfang:
    vii, 412 p
  • Anmerkungen:
    28 cm
    ill
    Includes bibliographic references and index
  • ISBN:
  • Medientyp:
    Konferenzband
  • Format:
    Print
  • Sprache:
    Englisch
  • Klassifikation:
    DDC:    621.3815/31
  • Datenquelle:
  • Exportieren:

Inhaltsverzeichnis Konferenzband

Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.

2
Patterning ULSI circuits [2723-01]
Carruthers, J. R. / SPIE | 1996
2
Patterning ULSI circuits
Carruthers, John R. | 1996
15
University-industry relations: what do we do now?
Armstrong, John A. | 1996
15
University-industry relations: what do we do now? [2723-02]
Armstrong, J. A. / SPIE | 1996
26
Science and technology policy in the 104th Congress
Lofgren, Zoe | 1996
26
Science and technology policy in the 104th Congress [2723-03]
Lofgren, Z. / SPIE | 1996
34
Optical system for high-throughput EUV lithography
Katagiri, Souichi / Ito, Masaaki / Yamanashi, Hiromasa / Seya, Eiichi / Terasawa, Tsuneo | 1996
34
Optical system for high-throughput EUV lithography [2723-04]
Katagiri, S. / Ito, M. / Yamanashi, H. / Seya, E. / SPIE | 1996
46
Silicon oxide deposition using a gallium-focused ion beam
Komano, Haruki / Nakamura, Hiroko / Kariya, Mitsuyo / Ogasawara, Munehiro | 1996
46
Silicon oxide deposition using a gallium-focused ion beam [2723-05]
Komano, H. / Nakamura, H. / Kariya, M. / Ogasawara, M. / SPIE | 1996
54
Characterization of the alignment system on a laboratory extreme ltraviolet lithography tool
Nguyen, Khanh B. / Tichenor, Daniel A. / Berger, Kurt W. / Ray-Chaudhuri, Avijit K. / Haney, Steven J. / Nissen, Rodney P. / Perras, Yon E. / Arling, Richard W. / Stulen, Richard H. / Fetter, Linus A. et al. | 1996
54
Characterization of the alignment system on a laboratory extreme ultraviolet lithography tool [2723-06]
Nguyen, K. B. / Tichenor, D. A. / Berger, K. W. / Ray-Chaudhuri, A. K. / SPIE | 1996
63
Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser [2723-07]
Kim, T.-G. / Hwang, S.-M. / Kim, S.-I. / Son, C.-S. / SPIE | 1996
63
Formation of submicrometer current-blocking layer for high-power GaAs/AlGaAs quantum wire array laser
Kim, Tae-Geun / Hwang, Sung Min / Kim, Seong-Il / Son, Chang-Sik / Kim, Eun K. / Min, Suk-Ki / Park, Jung-Ho / Park, Kyung Hyun | 1996
68
Conception of optimal designing of optical column for ion projection lithography
Jatchmenev, Stanislav N. / Chinenov, Alexander A. | 1996
68
Conception of optimal designing of optical column for ion projection lithography [2723-08]
Jatchmenev, S. N. / Chinenov, A. A. / SPIE | 1996
82
Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography [2723-09]
Gramss, J. / Eichhorn, H. / Baetz, U. / SPIE | 1996
82
Fast layout data processing and repetitive structure exposure for high-throughput e-beam lithography
Gramss, Juergen / Eichhorn, Hans / Baetz, Uwe | 1996
91
Position measurement of high-energy e-beams for pattern placement improvement [2723-10]
Perkins, F. K. / McCarthy, D. / Marrian, C. R. K. / Peckerar, M. C. / SPIE | 1996
91
Position measurement of high-energy e-beams for pattern placement improvement
Perkins, F. Keith / McCarthy, Daniel / Marrian, Christie R. / Peckerar, Martin C. | 1996
102
New electron-beam mask-writing system for 0.25-�m lithography [2723-11]
Satoh, H. / Someda, Y. / Saitou, N. / Kawasaki, K. / SPIE | 1996
102
New electron-beam mask writing system for 0.25-um lithography
Satoh, Hidetoshi / Someda, Yasuhiro / Saitou, Norio / Kawasaki, Katsuhiro / Itoh, Hiroyuki / Mizuno, Kazui | 1996
112
Development of two new positive DUV photoresists for use with direct-write e-beam lithography
Mancini, David P. / Resnick, Douglas J. / Nordquist, Kevin J. / Dauksher, William J. / Thackeray, James W. / McCord, Mark A. | 1996
112
Development of two new positive DUV photoresists for use with direct-write e-beam lithography [2723-12]
Mancini, D. P. / Resnick, D. J. / Nordquist, K. J. / Dauksher, W. J. / SPIE | 1996
122
CD uniformity of photomasks written with high-voltage variable-shaped e beam [2723-13]
Nakayamada, N. / Hara, S. / Magoshi, T. / Sakurai, H. / SPIE | 1996
122
CD uniformity of photomasks written with high-voltage variable-shaped e beam
Nakayamada, Noriaki / Hara, Shigehiro / Magoshi, Toshiyuki / Sakurai, Hideaki / Abe, Takayuki / Higashikawa, Iwao | 1996
134
Pattern-density-dependent contrast in commonly used dose-equalization schemes [2723-14]
Peckerar, M. C. / Marrian, C. R. K. / SPIE | 1996
134
Pattern-density-dependent contrast in commonly used dose-equalization schemes
Peckerar, Martin C. / Marrian, Christie R. | 1996
143
Mark topography for alignment and registration in projection electron lithography
Farrow, Reginald C. / Mkrtchyan, Masis M. / Bolen, Kevin / Blakey, Myrtle I. / Biddick, Christopher J. / Fetter, Linus A. / Huggins, Harold A. / Tarascon-Auriol, Regine G. / Berger, Steven D. | 1996
143
Mark topography for alignment and registration in projection electron lithography [2723-15]
Farrow, R. C. / Mkrtchyan, M. M. / Bolen, K. / Blakey, M. / SPIE | 1996
150
Hierarchical e-beam proximity correction in mask making
Hofmann, Ulrich / Kalus, Christian K. / Rosenbusch, Anja / Jonckheere, Rik M. / Hourd, Andrew C. | 1996
150
Hierarchical e-beam proximity correction in mask making [2723-16]
Hofmann, U. / Kalus, C. K. / Rosenbusch, A. / Jonckheere, R. / SPIE | 1996
159
Simulation and modeling of electron-beam lithography for delineating 0.2-um line and space patterns
Ham, Young-Mog / Lee, Changbuhm / Suh, Taewon / Chun, KukJin / Lee, Jong-Duk | 1996
159
Simulation and modeling of electron-beam lithography for delineating 0.2�m line and space patterns [2723-17]
Ham, Y.-M. / Lee, C.-B. / Suh, T. W. / Chun, K. / SPIE | 1996
170
Fine-pitch control in EB lithography for semiconductor laser grating formation [2723-18]
Hisa, Y. / Minami, H. / Shibata, K. M. / Takemoto, A. / SPIE | 1996
170
Fine-pitch control in EB lithography for semiconductor laser grating formation
Hisa, Yoshihiro / Minami, Hiroyuki / Shibata, Kimitaka / Takemoto, Akira / Sato, Kazuhiko / Nagahama, Kouki / Otsubo, Mutuyuki / Aiga, Masao | 1996
180
Mix-and-match lithography processes for 0.1-um MOS transistor device fabrication
Yew, Jen Y. / Chen, Lih J. / Nakamura, Kazumitsu / Chao, Tien S. / Lin, Horng-Chih | 1996
180
Mix-and-match lithography processes for 0.1-�m MOS transistor device fabrication [2723-19]
Yew, J.-Y. / Chen, L.-J. / Nakamura, K. / Chao, T.-S. / SPIE | 1996
190
X-ray mask fabrication advancements at the Microlithographic Mask Development Center
Kimmel, Kurt R. / Hughes, Patrick J. | 1996
190
X-ray mask fabrication advancements at the Microlithographic Mask Development Center [2723-20]
Kimmel, K. R. / Hughes, P. J. / SPIE | 1996
198
Development of x-ray mask in Taiwan [2723-21]
Sheu, J. T. / Su, S. / SPIE | 1996
198
Development of x-ray mask in Taiwan
Sheu, Jeng Tzong / Su, Shyang | 1996
204
X-ray mask image-placement studies at the Microlithography Mask Development Center
Puisto, Denise M. / Lawliss, Mark / Faure, Thomas B. / Rocque, Janet M. / Kimmel, Kurt R. / Benoit, Douglas E. | 1996
204
X-ray mask image-placement studies at the Microlithography Mask Development Center [2723-22]
Puisto, D. / Lawliss, M. / Faure, T. / Rocque, J. M. / SPIE | 1996
211
Novel x-ray mask inspection tool based on transmission x-ray conversion microscope [2723-23]
Liang, S. T. / Cerrina, F. / Lucatorto, T. B. / SPIE | 1996
211
Novel x-ray mask inspection tool based on transmission x-ray conversion microscope
Liang, Ted / Cerrina, Franco / Lucatorto, Thomas B. | 1996
222
Application of SR lithography to 0.14-um device fabrication
Sumitani, Hiroaki / Itoga, Kenji / Shimano, Hiroki / Aya, Sunao / Yabe, Hideki / Hifumi, Takashi / Watanabe, Hiroshi / Kise, Koji / Inoue, Masami / Marumoto, Kenji et al. | 1996
222
Application of SR lithography to 0.14-�m device fabrication [2723-24]
Sumitani, H. / Itoga, K. / Shimano, H. / Aya, S. / SPIE | 1996
237
X-ray exposure in the manufacture of sub-150-nm gate lines
Lamberti, Angela C. / Agnello, Paul D. / Crabbe, Emmanuel F. / DellaGuardia, Ronald / Oberschmidt, James M. / Subbana, Seshu / Wu, Steve | 1996
237
X-ray exposure in the manufacture of sub-150-nm gate lines [2723-25]
Lamberti, A. C. / Agnello, P. D. / Crabbe, E. F. / Della Guardia, R. / SPIE | 1996
249
Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion
Dentinger, Paul M. / Taylor, James W. | 1996
249
Importance of chemistry at the resist-wafer interface for mechanical and lithographic adhesion [2723-26]
Dentinger, P. M. / Taylor, J. W. / SPIE | 1996
261
New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile
Makarov, Oleg A. / Chen, Zheng / Krasnoperova, Azalia A. / Cerrina, Franco / Cherkashin, Vadim V. / Poleshchuk, Alexander G. / Koronkevich, Voldemar P. | 1996
261
New application for x-ray lithography: fabrication of blazed diffractive optical elements with a deep-phase profile [2723-27]
Makarov, O. A. / Chen, Z. G. / Krasnoperova, A. A. / Cerrina, F. / SPIE | 1996
268
Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores
Kulipanov, G. N. / Makarov, Oleg A. / Mezentseva, Lubov A. / Mishnev, S. I. / Nazmov, Vladimir / Pindyurin, Valery F. / Skrinsky, A. N. / Artamonova, L. D. / Cherkov, G. A. / Gashtold, V. N. et al. | 1996
268
Application of deep x-ray lithography for fabrication of polymer regular membranes with submicrometer pores [2723-28]
Kulipanov, G. N. / Makarov, O. A. / Mezentseva, L. A. / Mishnev, S. I. / SPIE | 1996
278
Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography
Zhang, Liyan / Panarella, Emilio / Bielawski, Mariusz / Chen, Haibo | 1996
278
Spherical pinch (soft x ray/EUV) and vacuum spark (soft x ray) for microlithography [2723-29]
Zhang, L. / Panarella, E. / Bielawski, M. / Chen, H. / SPIE | 1996
288
Alternative soft x-ray source for step-and-scan lithography [2723-30]
Piestrup, M. A. / Powell, M. W. / Lombardo, L. W. / SPIE | 1996
288
Alternative soft x-ray source for step-and-scan lithography
Piestrup, Melvin A. / Powell, Michael W. / Lombardo, Louis W. | 1996
299
Characterization techniques for x-ray lithography sources
Maldonado, Juan R. / Celliers, Peter M. | 1996
299
Characterization techniques for x-ray lithography sources [2723-48]
Maldonado, J. R. / Celliers, P. M. / SPIE | 1996
310
Debrisless laser-produced x-ray source with a gas puff target
Fiedorowicz, Henryk / Bartnik, Andrzej / Kostecki, Jerzy / Szczurek, Miroslaw | 1996
310
Debrisless laser-produced x-ray source with a gas puff target [2723-31]
Fiedorowicz, H. / Bartnik, A. / Kostecki, J. / Szczurek, M. / SPIE | 1996
317
Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As2S3
Rotkina, Lolita G. / Kaliteevskaia, N. A. / Seisyan, Ruben P. / Smirnov, D. V. / Babushkin, S. / Vasilevsky, M. A. | 1996
317
Submicrometer resolution of contact printing by pulsed excimer laser radiation in thin films As~2S~3 [2723-33]
Gladysheva, L. G. / Kaliteevskaia, N. A. / Seisyan, R. P. / Smirnov, D. V. / SPIE | 1996
321
Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure
Choi, Sang-Soo / Jeon, Young Jin / Kim, Jong-Soo / Chung, Hai Bin / Lee, Sang-Yun / Lee, Jong-Hyun / Yoo, Hyung Joun | 1996
321
Damage characterization of SiN x-ray mask membrane caused by electron-beam exposure [2723-34]
Choi, S.-S. / Jeon, Y. J. / Kim, J.-S. / Chung, H. B. / SPIE | 1996
332
Geometry of x-ray point source proximity printing, part II: overlay effects
Hollanda, Peter A. | 1996
332
Geometry of x-ray point-source proximity printing, Part II: overlay effects [2723-35]
Hollanda, P. A. / SPIE | 1996
339
Experiment and simulation of e-beam direct writing over topography [2723-36]
Jagdhold, U. A. / Bauch, L. / Boettcher, M. / SPIE | 1996
339
Experiment and simulation of e-beam direct writing over topography
Jagdhold, Ulrich A. / Bauch, Lothar / Boettcher, Monika | 1996
348
Enhanced defect inspection method for x-ray masks [2723-40]
Sekimoto, M. / Okada, I. / Saitoh, Y. / Matsuda, T. / SPIE | 1996
348
Enhanced defect inspection method for x-ray masks
Sekimoto, Misao / Okada, Ikuo / Saitoh, Yasunao / Matsuda, Tadahito | 1996
360
Thick PMMA layer formation as an x-ray imaging medium for micromachining [2723-42]
Vladimirsky, O. / Calderon, G. / Vladimirsky, Y. / Manohara, H. / SPIE | 1996
360
Thick PMMA layer formation as an x-ray imaging medium for micromachining
Vladimirsky, Olga / Calderon, Gina M. / Vladimirsky, Yuli / Manohara, Harish M. | 1996
372
Optimization of electron-beam lithography for super-low-noise HEMTs
Choi, Sang-Soo / Lee, Jin-Hee / Yun, Hyung-Sup / Chung, Hai Bin / Lee, Sang-Yun / Yoo, Hyung Joun | 1996
372
Optimization of electron-beam lithography for super-low-noise HEMTs [2723-44]
Choi, S.-S. / Lee, J.-H. / Yun, H. S. / Chung, H. B. / SPIE | 1996
383
Process latitude for 100-nm dimensions for e-beam lithography in SAL-601
Dobisz, Elizabeth A. / Marrian, Christie R. | 1996
383
Process latitude for 100-nm dimensions for e-beam lithography in SAL-601 [2723-45]
Dobisz, E. A. / Marrian, C. R. K. / SPIE | 1996
393
Fabrication of 0.25-�m electrode width SAW filters using x-ray lithography with a laser plasma source [2723-46]
Bobkowski, R. / Li, Y. / Fedosejevs, R. / Broughton, J. N. / SPIE | 1996
393
Fabrication of 0.25-um electrode width SAW filters using x-ray lithography with a laser plasma source
Bobkowski, Romuald / Li, Yunlei / Fedosejevs, Robert / Broughton, James N. | 1996
402
Nanolithography by scanning probe stimulated development of photoresists
Balk, Ludwig J. / Koschinski, Paul M. / Fiege, Gero B. M. / Reineke, Frank J. | 1996
402
Nanolithography by scanning probe stimulated development of photoresists [2723-47]
Balk, L. J. / Koschinski, P. M. / Fiege, G. B. M. / Reineke, F. J. / SPIE | 1996