Electron-beam, x-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983 Santa Clara, California (Englisch)
- Neue Suche nach: Blais, Phillip D.
1983
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ISBN:
- Konferenzband / Print
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Titel:Electron-beam, x-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983 Santa Clara, California
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Beteiligte:
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Kongress:Electron-Beam, X-Ray, and Ion-Beam Techniques for Submicron Lithographies ; 2 ; 1983 ; Santa Clara, Calif.
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Erschienen in:
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Verlag:
- Neue Suche nach: SPIE
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Erscheinungsort:Bellingham, Wash.
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Erscheinungsdatum:1983
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Format / Umfang:VIII, 242 S
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Anmerkungen:Ill., graph. Darst
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ISBN:
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Medientyp:Konferenzband
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 621.3815/2
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 621.3815/2 -
Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 2
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Exposure Characteristics Of Electron Beam Resists For Synchrotron X-Ray LithographyKimura, Takeshi / Mochiji, Kozo / Tsumita, Norikazu / Obayashi, Hidehito / Mikuni, Akira et al. | 1983
- 8
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Multilayer Resist Systems Using Polysiloxanes As Etch MasksParaszczak, J. / Shaw, J. / Hatzakis, M. / Babich, E. / Arthur, E. et al. | 1983
- 20
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Solid State Electron Beam ChemistryPacansky, J. et al. | 1983
- 27
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Electron Beam Exposure Of GeSexPolasko, K. J. / Pease, R. F. W. et al. | 1983
- 34
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Options And Oportunities With Inorganic Photoresist SystemsLis, S. A. / Lavine, J. M. .. / Goldberg, G. M. .. / Masters, J. I. et al. | 1983
- 41
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Submicron Optical Lithography Using Inorganic ResistsLavine, J. M. / Lis, S. A. / Masters, J. I. et al. | 1983
- 50
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Electron Beam Systems At IBM Status ReportWeber, Edward V. et al. | 1983
- 56
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Waferwriter: A Process-Compatible Electron Beam Direct Write SystemLivesay, W. R. / Greeneich, J. S. / Wolfe, J. E. / Felker, R. J. et al. | 1983
- 62
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Accurate Mark Position Detection In High Voltage Electron Beam LithographyKato, Y. / Takigawa, T. / Yoshimi, M. / Kawabuchi, K. / Kirita, K. et al. | 1983
- 70
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Submicron Lithography Radiation Damage In Silicon And Gallium Arsenide ICsPhillips, D. H. et al. | 1983
- 78
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Theoretical Model For Photoelectron Transport In X-Ray Lithography SystemsGarth, J. C. et al. | 1983
- 87
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Submicron X-Ray Replication Technology For Early ApplicationFencil, C. R. / Hughes, G. P. et al. | 1983
- 93
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Status Of X-Ray Lithography At H-PNeukermans, A. P. et al. | 1983
- 99
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X-Ray Lithography Exposures Using Synchrotron RadiationSilverman, Jerome P. / Haelbich, Rolf P. / Grobman, Warren D. / Warlaumont, John M. et al. | 1983
- 106
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A Lithography System For X-Ray Process DevelopmentNovak, W. T. et al. | 1983
- 114
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X-Ray Lithography On Beam Line III-IV (3°) At SSRLTatchyn, R. / Lindau, I. / Su, Y. G. / Gutcheck, R. / Muray, J. / Csonka, P. L. et al. | 1983
- 120
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Liquid Metal Ion Sources For Lithography Some Recent AdvancesPrewett, P. D. / McMillan, D. J. / Jefferies, D. K. / Mair, G. L. R. et al. | 1983
- 129
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Scanning Ion Beam Lithography For Sub-Micron Structure FabricationCleaver, J. R. A. / Heard, P. J. / Ahmed, H. et al. | 1983
- 137
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Ion-Optical System For Maskless Ion Implantation With 100 nm ResolutionAnazawa, N. / Aihara, R. / Ban, E. / Okunuki, M. et al. | 1983
- 143
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A Focused Ion Beam System For The Generation Of Submicron PatternsDoherty, J. A. / Steyer, M. F. et al. | 1983
- 159
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Maskless Fabrication Using Focused Ion BeamsGamo, Kenji / Namba, Susumu et al. | 1983
- 167
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Applications Of Focused Ion BeamsWagner, Alfred et al. | 1983
- 177
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Status Of The Production Use Of Ion Implantation For IC Manufacture And Requirements For Competitive Application Of Focused Ion BeamsCurrent, Michael I. / Wagner, Alfred et al. | 1983
- 192
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Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist SchemeBuiguez, F / Parrens, P. / Picard, B. et al. | 1983
- 198
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Registration And Distortion Compensating Techniques For A Large Field X-Ray Exposure SystemFay, B. et al. | 1983
- 205
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Influence Of Various Electro-Attractive Substituents On The Performances Of Acrylic Type Positive Resists In Microlithography.Serre, B. / Schue, F. / Eranian, A. / Datamanti, E. / Dubois, J. c. / Montginoul, C. / Giral, L. et al. | 1983
- 213
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Optic And X-Ray Lithographies In 1990'sLazzari, J. P. / Parrens, P. et al. | 1983
- 221
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X-Ray Lithography Using Synchrotron Radiation And Ion-Beam Shadow PrintingHeuberger, A. / Betz, H. et al. | 1983
- 233
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Prospects For The 1:1 Electron Image ProjectorWard, R. / Franklin, A. R. / Gould, P. / Plummer, M. J. / Lewin, I. H. et al. | 1983