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Proceedings of the 12th European Congress on Electron Microscopy : held in Brno, Czech Republic, from 9th to 14th July 2000 / ed. by Luděk Frank and Fedor Čiampor ; Vol. 3: Instrumentation and methodology (Englisch)
- Neue Suche nach: European Congress on Electron Microscopy
- Weitere Informationen zu European Congress on Electron Microscopy:
- http://d-nb.info/gnd/10013601-1
- Neue Suche nach: Tománek, Pavel
- Neue Suche nach: Frank, Luděk
- Neue Suche nach: Čiampor, Fedor
- Neue Suche nach: European Congress on Electron Microscopy
- Weitere Informationen zu European Congress on Electron Microscopy:
- http://d-nb.info/gnd/10013601-1
2000
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ISBN:
- Konferenzband / Print
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Titel:Proceedings of the 12th European Congress on Electron Microscopy : held in Brno, Czech Republic, from 9th to 14th July 2000 / ed. by Luděk Frank and Fedor Čiampor ; Vol. 3: Instrumentation and methodology
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Beteiligte:
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Kongress:European Congress on Electron Microscopy; 2000
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Verlag:
- Neue Suche nach: Czechoslovak Society for Electron Microscopy
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Erscheinungsort:Brno
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Erscheinungsdatum:2000
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Format / Umfang:XXVI, 544 S
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Anmerkungen:Ill., graph. Darst
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ISBN:
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Medientyp:Konferenzband
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 33.18 / 30.03
- Weitere Informationen zu Basisklassifikation
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Schlagwörter:
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Klassifikation:
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
- 1437
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SEM resolution improvement at low voltage with gun monochromatorBarth, J. E. / Nykerk, M. D. / Mook, H. W. / Kruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1439
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Construction and characterisation of a TEM specimen holder for in situ application of magnetic in-plane fieldsUhlig, T. / Heumann, M. / Schneider, M. / Hoffmann, H. / Zweck, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1441
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On the enhancement factors for electron field emittersEdgcombe, C. / Valdre, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1443
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Investigation of an EuS-coated cooled field emitter for application in state on the art electron microscopesWittel, H. / Schafer, A. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1445
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Test specimens for SEMMatejka, F. / Ryzi, Z. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1447
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Field emission SEM with a newly developed FEGUN and a conical strongly excited objective lensKazumori, H. / Yamada, A. / Mita, M. / Nokuo, T. / Saito, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1451
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On actual questions in filtering and inelastic interactionsJouffrey, B. / Schattschneider, P. / Hebert, C. / Nelhiebel, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1455
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Performance of detector elements for electron microscopesSchauer, P. / Autrata, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1459
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Design of a monochromator for electron sourcesKahl, F. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1461
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First development step and test of the SESAM/SATEMKujawa, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1463
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Software for the analysis and design of imaging energy filters with homogeneous and inhomogeneous bending magnetsMunro, E. / Rouse, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1465
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Performance data of a new 2048 x 2048 pixel slow-scan CCD camera for TEMHiller, S. A. / Kabius, B. / Probst, W. / Troster, H. / Trendelenburg, M. / Crucifix, C. / Trondle, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1467
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Geometric distortion correction for imaging plates using reflected light signal improves gain normalization and DQEBele, P. / Ochs, R. / Schroder, R. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1469
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Cryodetectors for high resolution X-Ray spectroscopyHohne, J. / Buhler, M. / Hertrich, T. / Hess, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1471
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Scanning electron microscopy of semiconductor multilayers using a converter of backscattered electrons into secondary electronsAscarelli, P. / Capelli, E. / Corticelli, F. / Franchi, S. / Merli, P. G. / Migliori, A. / Morandi, V. / Rossi, C. / Salvatori, S. / Valdre, A. et al. | 2000
- 1473
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Simulation of electron trajectories in the 3D field of two coupled hemispherical electrostatic deflectorsHuber, A. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1475
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New possibilities of SEBIV mode in SEMDegel, B. / Kienle, M. / Plies, E. / Rau, E. I. / Zhu, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1477
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Detection of the angular distribution of the signal electrons in VLESEMHoracek, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1479
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Direct electron exposed silicon detectors in EELSOrsholm, C. / Scillag, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1481
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Auger microscopy with a parallel acquisition spectrometerJacka, M. / Kale, A. / Tyndall, M. / Prutton, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1483
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Elemental mapping using omega filter and imaging plateShindo, D. / Ikematsu, Y. / Lee, C.-W. / Murakami, Y. / Sugiyama, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1485
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New frame-transfer wide-angle slow-scan CCD camera allows recording of distortion-free images for digital montagesHiller, S. A. / Probst, W. / Seybold, V. / Zellmann, E. / Kabius, B. / Trondle, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1487
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Combined TEM and CL of self-assembled CdSe quantum dotsPreis, H. / Muller, P. / Fuchs, K. / Kaiser, S. / Gebhardt, W. / Zweck, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1491
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Recent achievements in multi-keV X-ray microscopySusini, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1495
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Amplitude and phase contrast soft X-ray cryo-microscopy of biological samplesSchneider, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1499
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New aspects of coherent hard X-ray imagingCloetens, P. / Ludwig, W. / Guigay, J. P. / Schlenker, M. / Baruchel, J. / Van Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1503
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Synchrotron radiation scanning photoemission microscopy: advances and applicationsBarinov, A. / Casalis, L. / Gregoratti, L. / Gunther, S. / Marsi, M. / Kiskinova, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1507
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Quantitative, chemical state mapping of wood composites via scanning X-ray microscopyBuckley, C. / Phanopoulos, C. / Khaleque, N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1509
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Applications of high resolution microcalorimeter type X-Ray spectrometers in material analysisHohne, J. / Buhler, M. / Hertrich, T. / Hess, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1511
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One plasma focus device as possible soft X-ray source for microscopyAntanasijevic, R. / Joksimovic, D. / Vukovic, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1515
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Environmental scanning electron Microscopy - taking SEM into the futureDonald, A. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1519
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Imaging of electronic structure: achievements, competition and challengesHowie, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1523
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Biomedical EM under change: recent developments and trendsMaunsbach, A. B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1527
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EMS in the European frameworkCarrascosa, J. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I1
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On the development of electron microscopes in BrnoDelong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I7
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Electron microscopy at the milleniuHawkes, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I13
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Prospects of quantitative high resolution electron microscopyVan Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I19
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High-performance electron microscopes of the futureRose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I25
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Structural, magnetic and chemical surface electron microscopy with slow electronsBauer, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I33
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Membrane protein structure and dynamics observed at high resolution by electron and atomic force crystallographyEngel, A. / Heymann, B. J. / Muller, D. J. / Stahlberg, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I35
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Nanoscale Analysis by Energy Filtering TEMMayer, J. / Plitzko, J. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I43
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New experiments in charged particle interferometry and quantum statisticsHasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I47
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Off-axis electron holography - the way to useLichte, H. / Lehmann, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I49
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Electrons as waves - and what will come next?Tyc, T. / Lenc, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I51
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An electron antibunching experimentKiesel, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I53
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Time-resolved observation in transmission electron microscopy using electron correlation measurementOsakabe, N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I55
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Partial coherence and HREM image simulationMuller, H. / Schorsch, P. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I57
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Assessment of the experimental constraints for phase contrast EM and complex object reconstructionMajorovits, E. / Nagayama, K. / Schroder, R. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I59
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Correction of the Fresnel diffraction caused by the biprism filament in phase-shifting electron holographyYamamoto, K. / Tanji, T. / Hirayama, T. / Hibino, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I61
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Complex electron microscopyNagayama, K. / Danev, R. / Okawara, H. / Murata, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I63
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Off-axis electron holography of focused ion beam milled transistorsDunin-Borkowski, R. E. / Newcomb, S. B. / Doyle, D. / Deignan, A. / McCartney, M. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I65
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Miniaturized biprism interferometer for wide separation of the coherent beamsProchel, H. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I67
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Holographic studies of thin manganite filmsLehmann, M. / Walter, T. / Dorr, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I69
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Inelastic electron holographyLichte, H. / Freitag, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I71
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Comparison of accuracy of electron holography and EELS on thickness measurement of amorphous SiO~2Lee, C.-W. / Ikematsu, Y. / Shindo, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I73
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Two-dimensional mapping of electrostatic potential in a SiC MESFET using electron holographyTwitchett, A. C. / Lloyd, S. J. / Lehmann, M. / Midgley, P. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I77
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Recent trends in electron opticsMunro, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I81
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SMART electron opticsPreikszas, D. / Hartel, P. / Spehr, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I85
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Design and manufacturing of magnetic electron optical systems with midsection symmetrySpehr, R. / Hartel, P. / Muller, H. / Preikszas, D. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I87
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Computations of Wien filter properties and aberrationsLencova, B. / Vlcek, I. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I89
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High resolution imaging near zero CsChang, L. Y. / Chen, F. R. / Kai, J. J. / Kirkland, A. I. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I91
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Electron holography in the diffraction planeZhou, F. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I93
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An active vibration damping systemBeierlein, R. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I95
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Quadrupole projector system with variable magnification for energy filtering transmission electron microscopesGerheim, V. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I97
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Outline of a variable-axis lens with arbitrary shift of the axis in one directionSchmid, P. / Janzen, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I99
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Electron ray-tracing for numerical determination of aberrationsMynar, M. / Vasina, R. / Kolarik, R. / Lencova, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I101
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New CAD program for the design in electron opticsLencova, B. / Zlamal, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I103
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Perturbation methods in charged particle opticsRadlicka, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I107
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Advances in atomic structure determination using the focal-series reconstruction techniqueThust, A. / Jia, C. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I111
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Progress in structure analysis of crystal defects by quantitative HRTEMSchweinfest, R. / Ernst, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I115
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Image formation using incoherent scattering in a CTEMAnstis, G. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I117
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Extension of HRTEM resolution using Gerchberg-Saxton algorithm: application to grain boundary and interfaceChen, F.-R. / Kai, J. J. / Chang, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I119
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Effect of the objective lens on the measurement of rapidly varying displacement fields from HRTEM imagesHytch, M. / Plamann, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I121
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The effect of strain on chemically sensitive imaging with the (002) reflection in sphalerite type crystalsRosenauer, A. / Van Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I123
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Parallel realization of the simulated annealing algorithm and its applications to quantitative electron microscopyLi, S.-Y. / Wu, M.-Y. / Zhu, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I125
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Quantitative measurement of intensity profiles of equal thickness fringes of Si and MgO crystals and estimation of crystal potentialNishio, K. / Isshiki, T. / Okunishi, E. / Oikawa, T. / Kawasaki, M. / Endoh, H. / Shiojiri, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I127
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A Fourier space approach for calculating the electron optical phase shift of superconducting fluxonsBeleggia, M. / Pozzi, G. / Tonomura, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I129
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Design aspects for an optimum DF STEM probeVan Aert, S. / Dekker, A. J. d. / Van Dyck, D. / van den Bos, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I131
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A quantitative evaluation of different STEM imaging modesDekker, A. J. d. / Van Aert, S. / Van Dyck, D. / van den Bos, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I133
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Accurate measurements of atomic displacements in La~0~.~9Sr~0~.~1MnO~3 thin films grown on a SrTiO~3 substrateGeuens, P. / Lebedev, O. I. / Van Dyck, D. / Van Tendeloo, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I135
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Direct object data retrieval: an inversion of electron diffractionScheerschmidt, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I137
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Influence of experimental parameters on the accuracy of lattice-distortion measurements directly from high-resolution micrographsDu, K. / Jin-Phillipp, N. Y. / Phillipp, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I139
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EELS thickness-measurement without spectrum acquisitionTanaka, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I141
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Contrast modulations in HRTEM images caused by crystal tiltWaitz, T. / Karnthaler, H. P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I145
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Towards sub-Angstrom point resolution by correction of spherical aberrationHaider, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I149
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Advances in Cs-corrected STEMKrivanek, O. L. / Dellby, N. / Lupini, A. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I151
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Correction of chromatic and spherical aberration using a Wien filterSteffen, T. / Tiemeijer, P. C. / Krijn, M. P. C. M. / Mentink, S. A. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I153
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Performance of the mirror corrector for an ultrahigh-resolution spectromicroscopeHartel, P. / Preikszas, D. / Spehr, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I155
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An electrostatic achromatHenstra, A. / Krijn, M. P. C. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I157
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Electrostatic correction of the chromatic and spherical aberration of charged particle lensesWeissbaecker, C. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I159
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Super resolution imaging of complex metal oxidesKirkland, A. I. / Sloan, J. / Meyer, R. / Dunin-Borkowski, R. E. / Hutchison, J. L. / Saxton, W. O. / Sayagues, M. J. / Tilley, R. J. D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I161
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Validity of spherical aberration free focus conditionEndoh, H. / Hashimoto, H. / Kumao, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I163
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The Triebenberg laboratory - designed for highest resolution electron microscopy and holographyLichte, H. / Schulze, D. / Lehmann, M. / Just, H. / Erabi, T. / Furst, P. / Gobel, J. / Hasenpusch, A. / Dietz, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I165
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A new method for the determination of the wave aberration functionMeyer, R. R. / Kirkland, A. I. / Saxton, W. O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I169
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Aspects of aberration correction in LVSEMZach, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I173
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Scanning low and very low energy electron microscopyMullerova, I. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I177
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New aspects in LEEM and spectroscopic emission microscopy instrumentationLilienkamp, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I181
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X-ray photoemission and low energy electron microscopeKolarik, V. / Vasina, R. / Mynar, M. / Bejdak, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I183
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Low voltage electron microscope II. - ApplicationsCoufalova, E. / Delong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I185
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Low energy electron scattering - Monte Carlo simulationFitting, H. J. / Kuhr, J. C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I187
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In-depth imaging in S.E.MLehuede, P. / Appriou-Marciano, J. / Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I189
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Double scintillation detector with a conical retarding lens for SEMSlowko, W. / Drzazga, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I191
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Quantitative topographic contrast in LV SEMSlowko, W. / Hejna, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I193
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Energy filtering scanning transmission electron microscopy at low voltage with a `simulated' spherical deflection analyzerKramer, K. H. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I195
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Low voltage electron microscope III. - Present and future possibilitiesStepan, P. / Delong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I197
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Low voltage electron microscope I. - DesignDelong, A. / Hladil, K. / Kolarik, V. / Pavelka, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I199
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Dimension measurement in a cathode lens equipped low-energy SEMHutar, O. / Oral, M. / Mullerova, I. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I201
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Application of low-energy backscattered electron detection in the inspection of semiconductor devices technologyHutar, O. / Oral, M. / Mullerova, I. / Romanovsky, V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I203
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Signal detection near the critical energy of non-charging illumination in a low-energy SEM equipped with a cathode lensKanova, J. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I207
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Charging mechanisms in S.E.M.: from the secondary yield to the contrast of images?Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I211
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Scanning electron microscopy at low vacuum in specimen chamberAutrata, R. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I217
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Possibilities of evaluation of the influence of conditions in the specimen chamber on the quality of imaging in environmental SEMMichlek, M. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I219
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ESEM as a routine tool for failure analysis in industryvan der Wal, D. / Baken, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I221
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ESEM and TEM investigations on experimentally corroded synthetic zirconolite crystals and their replacing secondary phasesMalmstrom, J. / Reusser, E. / Guggenheim, R. / Duggelin, M. / Mathys, D. / Giere, R. / Lumpkin, G. R. / Blackford, M. G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I223
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Structure degradation of austenitic stainless steels as effect of corrosion fatiguePalka, K. / Surowska, B. / Weronski, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I225
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Absorbed electron imaging of non-conductive samples in low-vacuum SEMHellum, B. / Reme, P. / Hansen, L. U. / Johnsen, P. O. / Hjelen, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I227
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SEM analysis of corrosion degradation on tinplate substratesZumelzu, E. / Vera, A. / Cabezas, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I229
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Charging effects in S.E.M.: role of the working distanceGrillon, F. / Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I231
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Studies of biological specimens by environmental scanning electron microscopyAutrata, R. / Horky, D. / Ilkovics, L. / Prochazka, V. / Skricka, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I233
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Microstructural and compositional changes at high temperature oxidation of stainless steel in steam environmentKhalid, F. A. / Hussain, N. / Qureshi, A. H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I235
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Conditions of study of electrode masses structures in environmental scanning electron microscopeDrnovsky, R. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I237
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An anomalous contrast effect in scanning electron microscopy of insulators: the pseudo-mirror effectBelhaj, M. / Jbara, O. / Odof, S. / Msellak, K. / Cazaux, J. / Rau, E. I. / Andrianov, M. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I239
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Spectral distribution of backscattered electrons of charged insulatorsJbara, O. / Belhaj, M. / Odof, S. / Rau, E. I. / Andrianov, M. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I241
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Combined scintillation and ionisation detectors for environmental scanning electron microscopesRomanovsky, V. / Autrata, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I243
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Imaging of semiconductor structures in environmental SEMRomanovsky, V. / Hutar, O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I245
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Effect of the electron beam accelerating voltage and of specimen coating on the image in the microscope operating at higher pressuresAutrata, R. / Jirak, J. / Spinka, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I249
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Near field optical microscopy: theory and applicationsTomanek, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I255
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Spectroscopy on semiconductor surfaces using photoassisted scanning tunneling microscopy and Kelvin probe force microscopyLux-Steiner, M. C. / Sommerhalter, C. / Matthes, T. W. / Boneberg, J. / Leiderer, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I259
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Electrochemical applications of SPMJanda, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I263
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An in situ STM for applications in catalysisAires, F. J. C. S. / Deranlot, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I265
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Direct imaging of AFM force interactions using TEMErts, D. / Olin, H. / Olsson, L. / Ryen, L. / Tholen, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I267
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Force microscopy experiments in ultrahigh vacuumMeyer, E. / Guggisberg, M. / Bennewitz, R. / Loppacher, C. / Barwich, V. / Pfeiffer, O. / Schar, S. / Baratoff, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I269
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AFM in the study of primary neurons isolated from rabbit olfactory mucosaMenevse, A. / Sahin, F. I. / Ergun, M. A. / Tan, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I271
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Electron transport in point contacts studied by TEM-STMErts, D. / Lohmus, A. / Lohmus, R. / Olin, H. / Olsson, E. / Ryen, L. / Tholen, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I275
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X-ray microanalysis at low kVWendt, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I279
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Standardless microanalysisWernisch, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I283
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Automated analysis of submicron particles in SEM?Poelt, P. / Schmied, M. / Brunner, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I285
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Correction of peak overlap in EDX-maps by digital image processingvon Bradke, M. / Ruckdaeschel, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I287
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Standards for analysis of submicron particles by SEM / EDXSSchmied, M. / Poelt, P. / Dahl, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I289
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Combined autoradiography and electron microscopy analysis for granulometric measurements of actinide oxide aerosolsLe Naour, H. / Fritsch, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I291
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Quantitative electron microprobe analyses of subsurface micro-inclusions in diamondsGutkin, V. / Izraeli, E. / Navon, O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I293
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The use of energy dispersive X-ray microanalysis (EDX) in pollution impact studiesGregory, M. A. / McClurg, T. P. / Connell, A. D. / Moodley, V. E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I295
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Characterisation of industrial TiO~2 pigments with low voltage FE-SEM/EDX and FE-TEM/STEM/EDX methodsTapper, U. / Kauppinen, E. I. / Jalava, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I299
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Understanding EELS and its applications to metallic alloys and semiconductorsHumphreys, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I303
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Energy filtering transmission electron microscopy: fundamentals and applicationsKohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I307
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Analysis of the atomic scale oxygen vacancy ordering by EELS and Z- contrast imagingIto, Y. / Stemmer, S. / Klie, R. F. / Browning, N. D. / Mazanec, T. J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I309
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Extended image-series analysis in the energy-filtered TEMThomas, P. J. / Midgley, P. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I311
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Composition and chemical shift analysis of a multilayer using spatially-resolved EELSKimoto, K. / Matsui, Y. / Aoyama, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I313
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Electron channeling and monopole transitions in ELNESSchattschneider, P. / Hebert, C. / Jouffrey, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I315
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Monochromator for high brightness electron gunsMook, H. W. / Batson, P. E. / Kruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I317
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Application of EFTEM for cross-sectional on-product characterization of semiconductor devicesEngelmann, H. J. / Blum, W. / Saage, H. / Worch, M. / Zschech, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I319
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Extraction of three-body distribution in amorphous silicon by wavelet analysis of EXELFSMuto, S. / Yu, K. M. / Walukiewicz, W. / Jin, H.-C. / Abelson, J. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I321
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Wavelet analysis of extended energy-loss fine structureMuto, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I323
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Energy-filtering techniques for thick samplesKabius, B. / Seybold, V. / Hiller, S. / Rilk, A. / Zellmann, E. / Probst, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I325
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EFTEM analysis of the interaction of Co with a fluorinated organic dielectricHens, S. / Van Landuyt, J. / Bender, H. / Lanckmans, F. / Maex, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I327
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Quantitative evaluation of short-range order diffuse scattering in Cu~7~2~.~5Pd~2~7~.~5 alloy by energy filter and imaging plateIkematsu, Y. / Shindo, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I329
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Cryo-EFTEM elemental mapping of particles in frozen solutionsBovin, J.-O. / Balmes, O. / Karlsson, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I331
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Electron energy-loss near-edge structures of silicon and silicon carbidePark, M. Y. / Kruger, P. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I333
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Effect of the excited state lifetime on the near edge structure in EELS or XANES experimentsHebert, C. / Kostner, M. / Schattschneider, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I335
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EELS study of phase transformation in Cu-Al-Ni alloyHanada, T. / Kitao, R. / Nakata, Y. / Hirotsu, Y. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I337
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Stability performance of an energy filtering TEMBenner, G. / Zellmann, E. / Harscher, A. / Harle, R. / Kabius, B. / Seybold, V. / Probst, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I339
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Factor analysis of TEM-EEL spectra on nanoscale Fe/Al/Fe layersThomas, J. / Bauer, H.-D. / Baunack, S. / Wetzig, K. / Mensch, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I341
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Beam brightness and STEM-EELS performanceBarth, J. E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I343
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Factors affecting the performance of EELS energy-filtersKothleitner, G. / Brink, H. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I345
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Energy-filtered imaging of Fe and Ni nanoparticles in a field emission gun transmission electron microscopeSayagues, M. J. / Rojas, T. C. / Dunin-Borkowski, R. E. / Hutchison, J. L. / Fernandez, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I347
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Direct atomic scale characterization of interfaces and doping layers in field-effect transistorsTopuria, T. / James, E. / Browning, N. / Ma, Z. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I351
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Photoemission electron microscopy with high chemical and magnetic sensitivitySchonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I355
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Auger analysis of sharp topographies: quantification at high spatial resolutionEl Gomati, M. M. / Gelthorpe, A. / Dell, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I359
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Quantitative secondary electron emissiometryTomashpolsky, Y. Y. / Sadovskaya, N. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I361
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Contrast studies on organic monolayers in FESEM and their correlation with SFM dataBittermann, A. G. / Reichelt, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I363
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Magneto-optical linear dichroism in threshold photoemission electron microscopy of a polycrystalline Fe-filmMarx, G. K. L. / Elmers, H.-J. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I365
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Structural and chemical surface analysis with the double-reflection emission electron microscope DREEMGrzelakowski, K. / Settemeyer, J. / Escher, M. / Merkel, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I367
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Secondary electron field emission microscopy - SEFEMFitting, H.-J. / Hingst, T. / Schreiber, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I369
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Possibilities of measurement of magnetic field distributions by photoemission electron microscopyNepijko, S. A. / Sedov, N. N. / Marx, G. K. L. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I371
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Domain imaging and determination of magnetic moments in Co-films using XMCD-PEEMMarx, G. K. L. / Klais, M. J. / Haibach, P. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I375
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Towards more quantitative results from three dimensional electron microscopy of macromoleculesCarazo, J. M. / Jimenez-Lozano, N. / Sorzano, C. O. S. / Chagoyen, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I379
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ProcessDiffraction: a computer program to process electron diffraction patterns from polycrystalline or amorphous samplesLabar, J. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I381
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Detection of particles in elemental maps using 2D-histogramsMuller, I. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I383
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Bimodal stereo-based surface reconstruction in SEMJan, J. / Janova, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I385
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EMS simulations for STEM and applicationsMobus, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I387
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On the optimum energy for backscattered electron imaging of topographic details in scanning electron microscopyMerli, P. G. / Morandi, V. / Rosa, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I389
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Genetic algorithms as applied to surface morphology reconstruction in the scanning electron microscopeLi, X. / Kodama, T. / Uchikawa, Y. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I391
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Influence of the imaginary part of the atomic scattering factor on diffractograms of thin amorphous foilsKnippelmeyer, R. / Thesing, A. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I393
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Backscattered electron stereophotogrammetry based on the BSE-microtomography in the SEMRau, E. I. / Sennov, R. A. / Sokolov, V. N. / Yurkovets, D. I. / Melnik, V. N. / Boyde, A. / Howell, P. G. T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I395
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Aliasing correction of undersampled crystal imagesKoeck, P. J. B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I397
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Monte Carlo calculation on 3D distribution of maximum penetration depths of backscattered electrons in the SEMHoffmeister, H. / Reimer, L. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I399
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Image analysis of illuvial soil horizonsKyzlassov, I. / Shoba, S. A. / Sokolov, V. N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I401
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Application of 2D-FFT for analysis of vanadium carbonitrides precipitatesKruk, A. / Osuch, W. / Ciura, F. / Michta, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I403
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An implementation of the coherence function multislice methodSchorsch, P. / Muller, H. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I407
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Microscope automation: does the computer replace the operator?Volkl, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I411
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WebXpertEze: intelligent instruments via the InternetCaldwell, N. H. M. / Breton, B. C. / Holburn, D. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I413
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Computer-controlled transmission electron microscopyvan der Krift, T. P. / Ziese, U. / Janssen, A. H. / van Maurik, W. A. M. / Koster, A. J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I417
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COM technology based modular software for scientific instrumentation controlVasina, J. / Vasina, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I419
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Computer controlled high-throughput integration system: FasTEMFukushima, K. / O Donnell, R. M. / Fujiwara, K. / Kai, H. / Okunishi, E. / Kawasaki, M. / Kersker, M. / Naruse, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I423
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Modern electron optics in SEM and inspectionPlies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I427
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Advances in TEM instrumentationKruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I431
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A high resolution add-on lens for scanning electron microscopesKhursheed, A. / Karuppiah, N. / Koh, S. H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I433
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Advances in high-throughput multiple electron-beam lithographyMankos, M. / Chang, T. H. P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I435
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Investigations of an electrostatic duo-hexapole-stigmatorBartle, J. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000