A comparative study of three-terminal Hanle signals in CoFe/SiO2/n+-Si and Cu/SiO2/n+-Si tunnel junctions (Englisch)
- Neue Suche nach: Lee, Jeong-Hyeon
- Neue Suche nach: He, Shumin
- Neue Suche nach: Grünberg, Peter
- Neue Suche nach: Jin, Mi-Jin
- Neue Suche nach: Yoo, Jung-Woo
- Neue Suche nach: Cho, B. K.
- Neue Suche nach: Lee, Jeong-Hyeon
- Neue Suche nach: He, Shumin
- Neue Suche nach: Grünberg, Peter
- Neue Suche nach: Jin, Mi-Jin
- Neue Suche nach: Yoo, Jung-Woo
- Neue Suche nach: Cho, B. K.
In:
Applied Physics Letters
;
108
, 3
;
5
;
2016
- Aufsatz (Zeitschrift) / Elektronische Ressource
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Titel:A comparative study of three-terminal Hanle signals in CoFe/SiO2/n+-Si and Cu/SiO2/n+-Si tunnel junctions
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Beteiligte:Lee, Jeong-Hyeon ( Autor:in ) / He, Shumin ( Autor:in ) / Grünberg, Peter ( Autor:in ) / Jin, Mi-Jin ( Autor:in ) / Yoo, Jung-Woo ( Autor:in ) / Cho, B. K. ( Autor:in )
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Erschienen in:Applied Physics Letters ; 108, 3 ; 5
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Verlag:
- Neue Suche nach: AIP Publishing LLC
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Erscheinungsdatum:18.01.2016
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Format / Umfang:5 pages
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ISSN:
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DOI:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis – Band 108, Ausgabe 3
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