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1–10 von 29.647 Ergebnissen
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Lithography and OPC friendly triple patterning decomposition method for VIA [10147-55]
British Library Conference Proceedings | 2017 -
450mm lithography status for high volume manufacturing [10147-11]
British Library Conference Proceedings | 2017 -
Si-photonics waveguides manufacturability using advanced RET solutions [10147-36]
British Library Conference Proceedings | 2017 -
Optimal structure sampling for etch model calibration [10147-17]
British Library Conference Proceedings | 2017 -
FinFET-induced anisotropy in printing of implantation shapes [10147-40]
British Library Conference Proceedings | 2017 -
Process margin improvement through finger-print removal based on scanner leveling data [10147-8]
British Library Conference Proceedings | 2017 -
Application of optical similarity in OPC model calibration [10147-62]
British Library Conference Proceedings | 2017 -
Layout independent leveling (LIL) on NXT:1980Di immersion scanners for enhanced productivity [10147-45]
British Library Conference Proceedings | 2017 -
Reducing the impact of etch-induced pattern shift on overlay by using lithography and etch tool corrections [10147-16]
British Library Conference Proceedings | 2017 -
Fast prediction of process variation band through machine learning models
British Library Conference Proceedings | 2021|