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FINFET with source/drain structure and method of fabrication thereof
Freier ZugriffEuropäisches Patentamt | 2019| -
Input/output (I/O) devices with greater source/drain proximity than non-I/O devices
Freier ZugriffEuropäisches Patentamt | 2018| -
SEMICONDUCTOR STRUCTURE AND METHOD OF MANUFACTURING THE SAME
Freier ZugriffEuropäisches Patentamt | 2018| -
Method for manufacturing semiconductor structure with multi spacers
Freier ZugriffEuropäisches Patentamt | 2018| -
METHOD FOR MANUFACTURING SEMICONDUCTOR STRUCTURE WITH MULTI SPACERS
Freier ZugriffEuropäisches Patentamt | 2018| -
FINFET WITH SOURCE/DRAIN STRUCTURE AND METHOD OF FABRICATION THEREOF
Freier ZugriffEuropäisches Patentamt | 2018| -
Semiconductor structure and method of manufacturing the same
Freier ZugriffEuropäisches Patentamt | 2018| -
FinFET devices having different source/drain proximities for input/output devices and non-input/output devices and the method of fabrication thereof
Freier ZugriffEuropäisches Patentamt | 2017| -
METHOD OF TUNING SOURCE/DRAIN PROXIMITY FOR INPUT/OUTPUT DEVICE RELIABILITY ENHANCEMENT
Freier ZugriffEuropäisches Patentamt | 2017| -
SEMICONDUCTOR STRUCTURE WITH MULTI SPACER AND METHOD FOR FORMING THE SAME
Freier ZugriffEuropäisches Patentamt | 2017| -
METHOD OF TUNING SOURCE/DRAIN PROXIMITY FOR INPUT/OUTPUT DEVICE RELIABILITY ENHANCEMENT
Freier ZugriffEuropäisches Patentamt | 2017| -
FINFET WITH SOURCE/DRAIN STRUCTURE AND METHOD OF FABRICATION THEREOF
Freier ZugriffEuropäisches Patentamt | 2017| -
FinFETs with wrap-around silicide and method forming the same
Freier ZugriffEuropäisches Patentamt | 2021| -
System and method for widening fin widths for small pitch FinFET devices
Freier ZugriffEuropäisches Patentamt | 2021| -
FINFETs with wrap-around silicide and method forming the same
Freier ZugriffEuropäisches Patentamt | 2019|