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Verwendete Synonyme:

  • industrielle technik
  • ingenieurwesen
  • ingenieurwissenschaft
  • ingenieurwissenschaften
  • technik
  • technikwissenschaften
  • technique
  • technische wissenschaften

Verwendete Synonyme:

  • fur

Verwendete Synonyme:

  • angewandte optik
  • optische technik
  • technische optik

Verwendete Synonyme:

  • gesellschaft
  1.  

    Multi-patterning overlay control

    Ausschnitt, C.P. / Dasari, P. | Tema Archiv | 2008
  2.  

    32 nm 1:1 line and space patterning by resist reflow process

    Park, Joon-Min / Jeong, Heejun / An, Ilsin et al. | Tema Archiv | 2008
  3.  

    Luminescent oxide nanoparticles with enhanced optical properties

    Mialon, G. / Moreau, M. / Casanova, D. et al. | Tema Archiv | 2008
  4.  

    Simulating thermal NDT of bonded structures by FEM

    Guo, Xingwang / Fang, Qie | Tema Archiv | 2008
  5.  

    Optical properties of Yb-doped laser fibers in dependence on codopants and preparation conditions

    Unger, S. / Schwuchow, A. / Jetschke, S. et al. | Tema Archiv | 2008
  6.  

    CD control: whose turn is it?

    Kostler, W. / Rossiger, M. / Wege, S. et al. | Tema Archiv | 2004
  7.  

    3-dimensional scanning of grinded optical surfaces based on optical coherence tomography

    Hellmuth, T. / Borret, R. / Khrennikov, K. | Tema Archiv | 2007
  8.  

    Tellurite glass fiber fabrication and drawing furnace analysis

    Wang, Xunsi / Nie, Qiuhua / Xu, Tiefeng et al. | Tema Archiv | 2007
  9.  

    Development status of a 157nm full field scanner

    Nakano, H. / Hata, H. / Nogawa, H. et al. | Tema Archiv | 2003
  10.  

    High-power excimer lasers for 157 nm lithography

    Spratte, S. / Voss, F. / Bragin, I. et al. | Tema Archiv | 2003
  11.  

    Outlier rejection with mixture models in alignment

    Nakajima, S. / Kanaya, Y. / Li, Mengling et al. | Tema Archiv | 2003
  12.  

    Electrospun tin oxide nanofibers

    Leon, N. / Figueroa, G. / Wang, Yu et al. | Tema Archiv | 2005
  13.  

    Magnetism and magneto-optics of Co nanoparticles embedded in dielectric and metallic matrices

    Clavero, C. / Cebollada, A. / Armelles, G. et al. | Tema Archiv | 2005
  14.  

    Challenge for effective OCV control in 90 nm logic gate using ArF lithography

    Kang, Hyun-Jae / Lee, Sung-Woo / Lee, Doo-Youl et al. | Tema Archiv | 2003
  15.  

    Strategies for predictive control of chrome stress-induced registration errors

    Wei, A.C. / Hughes, G.P. / Chalekian, A.J. et al. | Tema Archiv | 2003
  16.  

    New concerns with the design of filters for the protection of lithography optics

    Dallas, A.J. / Ding, William / Hoang, Brian et al. | Tema Archiv | 2003
  17.  

    Rates and mechanisms of optic contamination in the EUV Engineering Test Stand

    Grunow, P.A. / Klebanoff, L.E. / Graham, S. jun. et al. | Tema Archiv | 2003
  18.  

    ArF issues of 90 nm node DRAM device integration

    Goo, Doo-Hoon / Kim, Byeong-Soo / Park, Joon-Soo et al. | Tema Archiv | 2003

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