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Viewing Angle and Imaging Polarization Analysis of Liquid Crystal Displays and Their Components
British Library Online Contents | 2014| -
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics
Online Contents | 2004|Contributors: Evrard, P. -
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics
Online Contents | 2004|Contributors: Evrard, P. -
Automated metrology system including VUV spectroscopic ellipsometry and X-ray reflectometry for 300 mm silicon microelectronics
Online Contents | 2004|Contributors: Evrard, P. -
A new multiple wavelength ellipsometric imager: design, limitations and applications
Online Contents | 2004| -
VUV spectroscopic ellipsometry applied to the characterization of high-k dielectrics
Online Contents | 2004|Contributors: Heinrich, P. -
A new multiple wavelength ellipsometric imager: design, limitations and applications
Online Contents | 2004| -
Low-k dielectrics: a non-destructive characterization by infrared spectroscopic ellipsometry
Online Contents | 2003| -
10 - 5 Flicker Measurement Method to Adjust the Common Electrode Voltage of LCDs
British Library Conference Proceedings | 2007| -
DOSSIER - Les mesures optiques dans l'industrie - L'optique trouve de plus en plus d'applications dans les mesures industrielles. Son potentiel important résulte de spécificités telles que l'insensibilité aux parasites électromagnétiques, la possibilité de mesurer sans contact et à distance... des caractéristiques qui permettent notamment la mise en place de solutions dans les secteurs de l'électricité et l'électronique - Profilométrie optique appliquée à la caractérisation des surfaces en microélectronique et en technologie des écrans plats
Online Contents | 2002|Contributors: Piel, J.-P. -
SOPRA SE300: a new tool for high accuracy characterization of multilayer structures
Online Contents | 1999| -
A transmission electron microscopy study of low‐temperature reaction at the Co‐Si interface
National licenceAmerican Institute of Physics | 1990|
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