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  1.  

    Advances in Nanomanufacturing Technology

    Nalamasu, O. / American Chemical Society | British Library Conference Proceedings | 2012
  2.  

    APPLIED PHYSICS: Testing the Limits for Resists

    Reichmanis, E. / Nalamasu, O. | British Library Online Contents | 2002
  3.  

    Testing the limits for resists

    Reichmanis, E. / Nalamasu, O. | CEABA® | 2002
  4.  

    SCIENCE'S COMPASS - PERSPECTIVES - APPLIED PHYSICS: Testing the Limits for Resists

    Reichmanis, E. / Nalamasu, O. | Online Contents | 2002
  5.  

    Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever (3 pages)

    Ganesan, P. G. / Wang, X. / Nalamasu, O. | British Library Online Contents | 2006
  6.  

    Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever

    National licence
    Ganesan, P. G. / Wang, X. / Nalamasu, O. | American Institute of Physics | 2006
  7.  

    Synthesis of Silica-Gold Nanocomposites and Their Porous Nanoparticles by an In-Situ Approach

    Kumar, A. / Pushparaj, V.L. / Murugesan, S. et al. | Online Contents | 2006
  8.  

    Lithography for sub<30 nm design rules: materials challenges

    Nalamasu, O. / Ramanath, G. / Toh-Ming Lu, | IEEE | 2004
  9.  

    Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators

    Houlihan, F. M. / Nalamasu, O. / Reichmanis, E. | British Library Online Contents | 2003
  10.  

    Writing an arbitrary non-periodic pattern using interference lithography

    Pau, S. / Watson, G.P. / Nalamasu, O. | Online Contents | 2001
  11.  

    Polymers for Microlithographic Applications: New Directions and Challenges

    Reichmanis, E. / Nalamasu, O. / Houlihan, F. M. | British Library Online Contents | 2001
  12.  

    Writing an arbitary non-periodic pattern using interference lithography

    Pau, S. / Watson, G. P. / Nalamasu, O. | British Library Online Contents | 2001
  13.  

    Nanospring Pressure Sensors Grown by Glancing Angle Deposition

    Kesapragada, S.V. / Victor, P. / Nalamasu, O. et al. | Online Contents | 2006
  14.  

    Organic Materials Challenges for 193 nm Imaging

    Reichmanis, E. / Nalamasu, O. / Houlihan, F. M. | British Library Online Contents | 1999
  15.  

    A Perspective on Lithographic Materials: Past, Present and Future Challenges

    Reichmanis, E. / Nalamasu, O. / Houlihan, F. M. | British Library Online Contents | 1999
  16.  

    DAPI Method: A Novel Assay to Evaluate the In vitro Impact of Nanomaterials on Mammalian Cells

    Raja, P.M.V. / Connolley, J. / Ajayan, P.M. et al. | British Library Conference Proceedings | 2007
  17.  

    The Use of Photoadditives in 248 nm and 193 nm Chemically Amplified Resists: A Retrospective of Work Done at Bell Laboratories

    Houlihan, F. M. / Nalamasu, O. / Reichmanis, E. | British Library Online Contents | 1999

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