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Resist Technology - 193 nm single layer resist strategies, concepts, and recent results
Online Contents | 1998| -
A unified approach to resist materials design for the advanced lithographic technologies
Online Contents | 1995| -
Revolutionary and evolutionary resist design concepts for 193 nm lithography
Online Contents | 1997| -
Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever
National licenceAmerican Institute of Physics | 2006| -
Method for sensing the self-assembly of polyelectrolyte monolayers using scanning probe microscope cantilever (3 pages)
British Library Online Contents | 2006| -
Retrospective of work at Bell Laboratories on the effect of fluorine substitution on the properties of photoacid generators
British Library Online Contents | 2003| -
Writing an arbitary non-periodic pattern using interference lithography
British Library Online Contents | 2001| -
Submicrometer Dimple Array Based Interference Color Field Displays and Sensors
American Chemical Society | 2007| -
Chemical amplification mechanisms for microlithography
National licenceAmerican Chemical Society | 1991| -
Simulation analysis of a chemically amplified positive resist for KrF lithography
Tema Archive | 1994| -
The Use of Photoadditives in 248 nm and 193 nm Chemically Amplified Resists: A Retrospective of Work Done at Bell Laboratories
British Library Online Contents | 1999| -
Polymers for Microlithographic Applications: New Directions and Challenges
British Library Online Contents | 2001|