Recent Developments in Nuclear Methods in Support of Semiconductor Characterization (English)

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5
Copper Behavior in Bulk Silicon and Associated Characterization Techniques
Heiser, T. / Belayachi, A. / Schunck, J.-P. / Electrochemical Society | 2003
21
Quantification Issues of Trace Metal Contaminants on Silicon Wafers by Means of TOF-SIMS and ICP-MS
Rostam-Khani, P. / Vullings, P. / Noij, G. / Claassen, W. / Electrochemical Society | 2003
31
Determination of the Aluminum-Induced Oxide Charge by AC Surface Photovoltage Measurements in N-Type Silicon
Shimizu, H. / Ikeda, M. / Shin, R. / Electrochemical Society | 2003
37
Characterization of Heavy Metal Contamination by Capacitance-Frequency Method
Hara, K. / Takahashi, M. / Yoshida, H. / Kishino, S. / Electrochemical Society | 2003
42
In-line Copper Contamination Monitoring Using Non-Contact Q-V-SPV Techniques
Bohringer, M. / Hauber, J. / Passefort, S. / Eason, K. / Electrochemical Society | 2003
50
Recent Developments in Nuclear Methods in Support of Semiconductor Characterization
Brijs, B. / Bender, H. / Huyghebaert, C. / Janssens, T. / Vandervorst, W. / Nakajima, K. / Kimura, K. / Bergmaier, A. / Dollinger, G. / van den Berg, J. A. et al. | 2003
63
Determination of Oxygen in Semiconductor Silicon by Gas Fusion Analysis GFA - Historical and Future Trends
Pahlke, S. / Electrochemical Society | 2003
75
High Sensitivity Measurement of Nitrogen in Czochralski Silicon
Porrini, M. / Pretto, M. G. / Scala, R. / Voronkov, V. V. / Electrochemical Society | 2003
83
Spark Source Mass Spectrometric Analysis of Low Carbon Contents in Crystalline Silicon
Wiedemann, B. / Meyer, J. D. / Alt, H. C. / Riemann, H. / Electrochemical Society | 2003
88
Hydrogen Contamination and Defect Generation in p-type Silicon and Silicon-Germanium Schottky Barrier Test Structures
Volpi, F. / Peaker, A. R. / Berbezier, I. / Ronda, A. / Electrochemical Society | 2003
96
Analysis of Oxygen Thermal Donor Formation in n-type Cz-Silicon
Rafi, J. M. / Simoen, E. / Claeys, C. / Ulyashin, A. / Job, R. / Fahrner, W. / Versluys, J. / Clauws, P. / Lozano, M. / Campabadal, F. et al. | 2003
106
The Application of Synchrotron Radiation to Semiconductor Materials Characterization
Barrett, R. / Electrochemical Society | 2003
120
Ultra-trace Analysis of Light Elements and Speciation of Minute Organic Contaminants on Silicon Wafer Surfaces by means of TXRF in Combination with NEXAFS
Beckhoff, B. / Fliegauf, R. / Ulm, G. / Weser, J. / Pepponi, G. / Streli, C. / Wobrauschek, P. / Ehmann, T. / Fabry, L. / Mantler, C. et al. | 2003
129
TXRF Characterization of Inhomogneous Solids: Influence of Surface Morphology
Alov, N. / Oskolok, K. / Wittershagen, A. / Kolbesen, B. O. / Electrochemical Society | 2003
136
Characterization of Trace Organic Contamination on Silicon Surfaces in Semiconductor Manufacturing
Saga, K. / Hattori, T. / Electrochemical Society | 2003
150
Characterization of Advanced Semiconductor Materials by Thermal Desorption Mass Spectrometry with Atmospheric, Pressure Ionization
Carbonell, L. / Vereecke, G. / Van Elshocht, S. / Caymax, M. / Van Hove, M. / Maex, K. / Mertens, P. / Electrochemical Society | 2003
160
Analysis of Trace VOCs` in Clean Room Air with PDMS/Carboxen SPME Fibers
Tuduri, L. / Teetaert, V. / Desauziers, V. / Coffre, E. / Dupont, P. / Camenzind, M. / Electrochemical Society | 2003
170
Cleaning Chemistry with Complexing Agents (CAs): Direct Concentration Measurement of CAs with HPLC
Metzger, S. / Kolbesen, B. O. / Electrochemical Society | 2003
177
Complexing Agents (CAs) for Semiconductor Cleaning Chemistries: Characterization of CA Lifetimes by UV/VIS-Spectroscopy
Doll, O. / Kolbesen, B. O. / Electrochemical Society | 2003
189
Stress Management in IC Manufacturing: mu-Raman Spectroscopy Revisited
Kwakman, L. F. T. / Delille, D. / Mermoux, M. / Crisci, A. / Lucazeau, G. / Electrochemical Society | 2003
207
Characterization and Metrology of Novel Materials Involved in Advanced CMOS Processes
Wyon, C. / Electrochemical Society | 2003
223
Physical Characterization of Thin HfO~2 Layers by the Combined Analysis with Complementary Techniques
Bender, H. / Conard, T. / Richard, O. / Brijs, B. / Petry, J. / Vandervorst, W. / Defranoux, C. / Boher, P. / Rochat, N. / Wyon, C. et al. | 2003
233
Analytical Characterization of Process Parameter Influence on the Initial Growth and Crystallinity of Atomic Layer Deposition HfO~2 Thin Films
Blin, D. / Rochat, N. / Rolland, G. / Holliger, P. / Martin, F. / Damlencourt, J.-F. / Lardin, T. / Besson, P. / Haukka, S. / Semeria, M.-N. et al. | 2003
243
Application of X-Ray Fluorescence Spectrometry in Characterization of High-k Ultra-Thin Films
Zhao, C. / Brijs, B. / Dortu, F. / DeGendt, S. / Caymax, M. / Heyns, M. / Besling, W. / Maes, J. W. / Electrochemical Society | 2003
252
Characterization of Nano-Laminate Structure Using Grazing Incidence XRD and ATR-FTIR
Zhao, C. / DeGendt, S. / Caymax, M. / Heyns, M. / Consier, V. / Maes, J. W. / Roebben, G. / Van Der Biest, O. / Electrochemical Society | 2003
260
High-Resolution Analysis of the HfO~2-SiO~2 Interface by Soft X-Ray Photoelectron Spectroscopy
Renault, O. / Samour, D. / Damlencourt, J.-F. / Papon, A.-M. / Martin, F. / Marthon, S. / Blin, D. / Barrett, N. T. / Electrochemical Society | 2003
267
Ag Electrodeposition on n-InP Followed in Situ by Photoluminescence
Gerard, I. / Mathieu, C. / Tran-Van, P. / Etcheberry, A. / Electrochemical Society | 2003
276
Characterization by Electrochemistry and Chemical Surface Analysis of an Oxide Film on n-InP
Quach, N. C. / Gerard, I. / Simon, N. / Etcheberry, A. / Electrochemical Society | 2003
285
Charging Effects on Ferroelectric SBT Thin Films Imaged by Non-Contact Electrostatic Force Microscopy
Junghans, N. / Kolbesen, B. O. / Electrochemical Society | 2003
293
Two Dimensional Carrier Profiling Using Scanning Capacitance Microscopy
Duhayon, N. / Clarysse, T. / Alvarez, D. / Eyben, P. / Fouchier, M. / Vandervorst, W. / Hellemans, L. / Electrochemical Society | 2003
305
Spectroscopic Ellipsometry in the VUV Range Applied to the Characterization of Atomic Layer Deposited HfO~2, Al~2O~3 and HfAIO~x Thin Layers for High k Dielectrics
Boher, P. / Defranoux, C. / Bourtauld, S. / Piel, J. P. / Bender, H. / Electrochemical Society | 2003
316
Optical Characterisation of High-? Materials Deposited by ALCVD
Bellandi, E. / Crivelli, B. / Elbaz, A. / Alessandri, M. / Boher, P. / Defranoux, C. / Electrochemical Society | 2003
322
Macroscopic and Microscopic Photoluminescence Mapping System Applicable to 300 mm Wafers
Li, Z. / Tajima, M. / Shimidzu, R. / Electrochemical Society | 2003
329
In-Line and Non-Destructive Analysis of Epitaxial Si~1~-~x~-~yGe~xC~y by Spectroscopic Ellipsometry and Comparison with Other Established Techniques
Loo, R. / Meunier-Beillard, P. / Delhougne, R. / Koumoto, T. / Geenen, L. / Brijs, B. / Vandervorst, W. / Electrochemical Society | 2003
339
Study by Spectroellipsometry of the InP Surface Evolution by Cerium Acidic Solution
Canava, B. / Vigneron, J. / Etcheberry, A. / Stchakovsky, M. / Gaston, J. P. / Electrochemical Society | 2003
346
Characterisation of Bulk and Surface Properties in Semiconductors Using Non-Contacting Techniques
Castaldini, A. / Cavalcoli, D. / Cavallini, A. / Rossi, M. / Electrochemical Society | 2003
357
Focused Ion Beam Analysis of Cu/Low-k Metallization Structures
Bender, H. / Electrochemical Society | 2003
373
Characterization and Mechanism of Device Failure due to Hollow Via Formation
Hatcher, C. / Lappan, R. / Prasad, J. / Engle, M. / Electrochemical Society | 2003
378
ZrO~2 as Dielectric Material for Device Characterization with Scanning Capacitance Microscopy
Brezna, W. / Harasek, S. / Enichlmair, H. / Bertagnolli, E. / Gornik, E. / Smoliner, J. / Electrochemical Society | 2003
386
Potential and Pitfalls of the Diode Characterization Technique for ULSI Device Analysis
Poyai, A. / Simoen, E. / Claeys, C. / Electrochemical Society | 2003
396
In-Situ Electrochemical Sensor for Early Detection of Plating Problems in Copper Metallization Process
Jaworski, A. / Wikiel, K. / Electrochemical Society | 2003
409
Semiconductor Metrology Requirements over the Next 15 Years
Diebold, A. C. / Electrochemical Society | 2003
420
Noise Diagnostics of Advanced Silicon Substrates and Deep Submicron Process Modules
Simoen, E. / Mercha, A. / Claeys, C. / Electrochemical Society | 2003
440
High Resolution X-Ray Reflectometry: Theory, Practice, Accuracy and Precision
Matyi, R. J. / Electrochemical Society | 2003
455
Watching Chips Work: Optical Imaging of Hot Carriers in ICs
Tsang, J. C. / Electrochemical Society | 2003
467
Measurement of Local Strain in Semiconductor Materials by Using Synchrotron X-Ray Microbeam
Matsui, J. / Tsusaka, Y. / Kagoshima, Y. / Yokoyama, K. / Electrochemical Society | 2003
479
Direct Observation of Substitutional and Interstitial Iron Atoms in Silicon by High-Temperature and In-Beam Mossbauer Spectroscopy
Yoshida, Y. / Electrochemical Society | 2003
493
Quantitative Evaluation of Iron at the Silicon Surface after Wet Cleaning Treatments
Caputo, D. / Bacciaglia, P. / Carpanese, C. / Polignano, M. L. / Lazzeri, P. / Bersani, M. / Vanzetti, L. / Pianetta, P. / Moro, L. / Electrochemical Society | 2003
505
Influence of Cobalt Contamination in the Measurement of Diffusion Length of p-type CZ Silicon Wafers
Pic, N. / Polignano, M. L. / Caputo, D. / Salva, G. / Sardo, M. / Danel, A. / Electrochemical Society | 2003
516
Nitrogen Concentration Measurement of CZ Silicon
Inoue, N. / Fujiyama, N. / Yagi, H. / Electrochemical Society | 2003
527
Extraction of the Capacitance of Ultrathin High-kappa Gate Dielectrics
Kar, S. / Electrochemical Society | 2003
540
Optical Surface Analysis of Transparent Substrates for Manufacturing Applications
Bechtler, L. / Velidandla, V. / Lane, G. / Electrochemical Society | 2003
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