Characteristics of Al doped zinc oxide (ZAO) thin films deposited by RF magnetron sputtering (English)
- New search for: Kobayakawa, S.
- New search for: Tanaka, Y.
- New search for: Ide-Ektessabi, A.
- New search for: Kobayakawa, S.
- New search for: Tanaka, Y.
- New search for: Ide-Ektessabi, A.
- New search for: Boerma, Dirk O.
- New search for: Climent-Font, Aurelio
- New search for: Respaldiza, Miguel Angel
In:
Ion beam analysis; IBA2005
1/2
;
536-539
;
2006
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ISSN:
- Conference paper / Print
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Title:Characteristics of Al doped zinc oxide (ZAO) thin films deposited by RF magnetron sputtering
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Contributors:Kobayakawa, S. ( author ) / Tanaka, Y. ( author ) / Ide-Ektessabi, A. ( author ) / Boerma, Dirk O. / Climent-Font, Aurelio / Respaldiza, Miguel Angel
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Conference:International conference; 17th, Ion beam analysis; IBA2005 ; 2005 ; Sevilla, Spain
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Published in:Ion beam analysis; IBA2005 , 1/2 ; 536-539NUCLEAR INSTRUMENTS AND METHODS IN PHYSICS RESEARCH SECTION B ; 249, 1/2 ; 536-539
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Publisher:
- New search for: Elsevier
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Publication date:2006-01-01
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Size:4 pages
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ISSN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
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