Diagnostics and Poly-Si Gate Process Development at New Microwave Coupled Plasma Source Etching System (English)
- New search for: Hoffman, P. J.
- New search for: Heinrich, F.
- New search for: Renner, S.
- New search for: Deutschmann, L.
- New search for: Electrochemical Society
- New search for: Hoffman, P. J.
- New search for: Heinrich, F.
- New search for: Renner, S.
- New search for: Deutschmann, L.
- New search for: Electrochemical Society
In:
Spring Meeting
1
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222-223
;
1995
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ISBN:
- Conference paper / Print
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Title:Diagnostics and Poly-Si Gate Process Development at New Microwave Coupled Plasma Source Etching System
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Contributors:Hoffman, P. J. ( author ) / Heinrich, F. ( author ) / Renner, S. ( author ) / Deutschmann, L. ( author ) / Electrochemical Society
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Conference:187th Meeting, Spring Meeting ; 1995 ; Reno; NV
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Published in:Spring Meeting , 1 ; 222-223
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Publisher:
- New search for: The Society
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Publication date:1995-01-01
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Size:2 pages
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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New High Voltage Cathode Materials for Rechargeable Lithium BatteriesFey, G. T. K. / Wu, C. S. / Yang, S. M. / Dahn, J. R. / Electrochemical Society et al. | 1995
- 4
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Electrochemical Determination of the Diffusion Coefficient of Hydrogen Through a LaNi~4~.~2~5Al~0~.~7~5 Electrode in Alkaline SolutionZheng, G. / Popov, B. N. / White, R. E. / Electrochemical Society et al. | 1995
- 6
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Effect of Cell Temperature on the Electrochemical Performance of Metal Hydride ElectrodesZhang, W. / Kumar, M. P. S. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 8
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A General Discharge Model for the Nickel/Metal Hydride Battery SystemPaxton, B. / Newman, J. / Electrochemical Society et al. | 1995
- 9
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Synthesis and Electrochemical Studies of Spinel Phase LiMn~2O~4 and LiM~Mn~2~-~O~4 (M=Co, Ni) Prepared by the Pechini ProcessLiu, W. / Davis, P. / Chaput, F. / Dunn, B. / Electrochemical Society et al. | 1995
- 11
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Testing of a Refuelable Zinc-Air Bus BatteryCooper, J. F. / Fleming, D. / Koopman, R. / Hargrove, D. / Electrochemical Society et al. | 1995
- 13
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The Zero Emission Vehicle as Symbol - Evidence Suggesting an Organizational and Political Function of the California Air Resources Board's Electric Vehicle RegulationPaxton, B. / Electrochemical Society et al. | 1995
- 15
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Conductivity in the Poly(ethylene oxide) Mixed Salt Complexes PEO~x[LiN(S~2CF~3)~2]~y [LiSO~3C~8F~1~7]~xNafshun, R. / Lerner, M. / Electrochemical Society et al. | 1995
- 19
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Electrochemical Impedance Spectroscopic Study in Proton Exchange Membrane Fuel CellsLee, S.-M. / Hirano, S. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 21
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Water Profile Determination across a Polymer Electrolyte during the Operation of a Hydrogen/Oxygen Proton Exchange Membrane Fuel CellMosdale, R. / Gebel, G. / Pineri, M. / Electrochemical Society et al. | 1995
- 23
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Effect of Platinum Concentration on Proton Exchange Membrane Fuel Cell PerformanceMosdale, R. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 25
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Specific Surface Area Measurement of Lithium Anode in Lithium Secondary BatteriesSaito, K. / Arakawa, M. / Tobishima, S. / Yamaki, J. / Electrochemical Society et al. | 1995
- 27
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Lithium Anode Studies in a Tetrafluoroborate Molten Salt ElectrolyteFuller, J. / Osteryoung, R. A. / Carlin, R. T. / Electrochemical Society et al. | 1995
- 28
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Corrosion Current Maps of AB~5 Electrode SurfacesZhang, W. / Kumar, M. P. S. / Srinivasan, S. / Mukerjee, S. / Electrochemical Society et al. | 1995
- 30
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Electrochemical Deposition of Bi~2Te~3 Thin Films for Thermoelectric Device ApplicationsRyan, M. A. / Williams, R. M. / Electrochemical Society et al. | 1995
- 31
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A Simplified Two-Dimensional Model of Lead-Acid Cell DischargeSemenko, M. G. / Semenenko, V. I. / Electrochemical Society et al. | 1995
- 33
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Electrochemical Applications of Carbonaceous MaterialsKinoshita, K. / Chu, X. / Electrochemical Society et al. | 1995
- 34
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Carbon Filaments for Electrochemical ApplicationsChung, D. D. L. / Shui, X. / Frysz, C. A. / Electrochemical Society et al. | 1995
- 35
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Electrochemical and Physico-chemical Characterization of Randomly Oriented Graphite ElectrodesLavoie, M.-A. / Regisseur, F. / Belanger, D. / Champagne, G. Y. / Electrochemical Society et al. | 1995
- 37
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Improving the Electrochemical Performance of Carbons by Surface TreatmentsChung, D. D. L. / Shui, X. / Frysz, C. A. / Electrochemical Society et al. | 1995
- 38
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Oxygen Reduction on Carbonaceous Materials in Alkaline ElectrolyteChu, X. / Markovic, N. / Kinoshita, K. / Ross, P. / Electrochemical Society et al. | 1995
- 40
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Review of Processes for the Production of Mixtures of Caustic Soda and Hydrogen Peroxide via the Reduction of OxygenFoller, P. C. / Electrochemical Society et al. | 1995
- 42
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Bromine/Bromide Ion Redox Reaction on Carbon Electrodes with a High Surface AreaShindo, K. / Hirai, T. / Electrochemical Society et al. | 1995
- 44
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Superior Corrosion Resistance of Diamond Thin Film Electrodes in Acidic Fluoride MediaSwain, G. M. / Alesham, S. / Chambers, F. / Granger, M. / Electrochemical Society et al. | 1995
- 45
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Synthesis and Characterization of New Carbon Electrodes for Secondary Lithium BatteriesSandi, G. / Winans, R. E. / Carrado, K. A. / Electrochemical Society et al. | 1995
- 46
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Characterization of Lithium Intercalation-Deintercalation in Disordered Carbon Materials as Anodes for Lithium Ion CellsSatoh, A. / Takami, N. / Hara, M. / Ohsaki, T. / Electrochemical Society et al. | 1995
- 48
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Electrochemical Intercalation of Lithium in Different Origin of Carbon Materials Use as Negative Electrode for Lithium-Ion Type BatteriesZaghib, K. / Tatsumi, K. / Imamura, T. / Sawada, Y. / Electrochemical Society et al. | 1995
- 50
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Rate Effect on Lithium-Ion Graphite Electrode PerformanceTran, T. S. / Feikert, J. H. / Kinoshita, K. / Electrochemical Society et al. | 1995
- 52
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The Influence of Structural Parameters on Lithium Storage Capacity of Mesocarbon Microbeads at Several Current DensitiesTatsumi, K. / Imamura, T. / Zaghib, K. / Iwashita, N. / Electrochemical Society et al. | 1995
- 53
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Periodic Behavior in the Iron/Sulfuric Acid SystemRush, B. / Newman, J. / Electrochemical Society et al. | 1995
- 55
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Characterization of Corrosion Phenomena Using the Electrochemical Noise Resistance and the Pitting IndexKelly, R. G. / Yuan, J. / Hudson, J. L. / Inman, M. E. / Electrochemical Society et al. | 1995
- 56
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Nonlinear Potential and Current Oscillations on Irradiated and Unirradiated Type 304SS in Chloride SolutionSikora, J. / Sikora, E. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 57
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Aperiodic Oscillatory Behavior of Fe-Ni Alloys in Concentrated Chloride SolutionsChen, L. / Shen, D. H. / Nobe, B. K. / Nobe, K. / Electrochemical Society et al. | 1995
- 58
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An In Situ Small Angle Neutron Scattering Investigation of Ag~0~.~7Au~0~.~3 DealloyingCorcoran, S. G. / Wiesler, D. / Barker, J. / Sieradzki, K. / Electrochemical Society et al. | 1995
- 59
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Microstructure and De-Alloying Kinetics of Zinc-Nickel Alloy ElectrodepositsNakamaru, H. / Newman, R. C. / Electrochemical Society et al. | 1995
- 60
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X-Ray Studies of Iron Dissolution Through Passive Films on Fe-Cr AlloysDavenport, A. J. / Simmonds, M. P. / Ryan, M. P. / Newman, R. C. / Electrochemical Society et al. | 1995
- 61
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Effect of Grain Boundary Orientation on the Sensitization of Austenitic Stainless SteelDevine, T. M. / Kavner, A. / Electrochemical Society et al. | 1995
- 62
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Propagation Behavior of Crevice Corrosion under Metal-Glass Crevice for High Purity 18Cr-14Ni Steel in 3% NaCl SolutionShinohara, T. / Chen, P. / Tsujikawa, S. / Electrochemical Society et al. | 1995
- 64
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A Metastable Pit Growth Front on Heat-Tinted Stainless SteelPistorius, P. C. / Electrochemical Society et al. | 1995
- 66
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Corrosion in Supercritical Aqueous Systems and the Density of SolventKriksunov, L. B. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 68
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Influence of a Corrosive Environment on the Fatigue Behavior of 2024 Aluminum Alloy Investigated by In Situ Atomic Force MicroscopyKowal, K. / Deluccia, J. J. / Josefowicz, J. Y. / Laird, C. / Electrochemical Society et al. | 1995
- 70
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Influence of Alloying Elements on the Corrosion of Aluminum in Alkaline SolutionKoroleva, E. V. / Thompson, G. E. / Hollrigl, G. / Bloeck, M. / Electrochemical Society et al. | 1995
- 72
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Tunnel Shapes in DC Etching of AluminumGoad, D. / Electrochemical Society et al. | 1995
- 73
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Tunneling Corrosion of Aluminum: The Intelligent PitNewman, R. C. / Electrochemical Society et al. | 1995
- 74
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Synchrotron X-Ray Scattering Techniques for In Situ Studies of Corrosion-Passivation Phenomena in MetalsMelendres, C. A. / Electrochemical Society et al. | 1995
- 76
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Surface Enhanced Raman Spectroelectrochemical Studies of the Corrosion Films on Iron in Aqueous Carbonate SolutionsSimpson, L. J. / Melendres, C. A. / Electrochemical Society et al. | 1995
- 78
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Transient Behavior of Passive Film on TungstenSikora, E. / Macdonald, D. D. / Sikora, J. / Electrochemical Society et al. | 1995
- 80
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Metal Oxide Film Formation/Reduction: A QCMB and Impedance InvestigationBirss, V. I. / Chan, M. / Phan, T. / Vanysek, P. / Electrochemical Society et al. | 1995
- 81
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On the Kinetics for Passive Film Growth: Comparison of the Modified High Field Model and the Point Defect ModelZhang, L. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 83
-
Breakdown and Reformation of Surface Films on Ti in Halide SolutionsChen, L. / Williamson, J. J. / Nobe, K. / Electrochemical Society et al. | 1995
- 84
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Controlled Hydrodynamic Electrochemical Studies in High-Temperature Aqueous SystemsBertuch, A. F. / Lvov, S. N. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 85
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Modeling the Electronic Structure of the Passive Film on Tungsten from Capacitance MeasurementsSikora, E. / Sikora, J. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 86
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About the Role of the Chemical Composition and the Structure of Surface Layers - Products Interaction of Metal with an Aggressive Media - in Electrochemical Corrosion of Carbon SteelEnikeev, E. K. / Panov, M. K. / Feoktistov, A. K. / Krasheninnikova, I. M. / Electrochemical Society et al. | 1995
- 88
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The Influence of Surface States on the Electrochemical Behavior of Passive ZincIsmail, K. M. / Macdonald, D. D. / Electrochemical Society et al. | 1995
- 90
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The Transpassive Behavior of the Anodic Film of Fe-Cr Alloys in Acidic Aqueous MediaBrookes, H. C. / Tonkinson, C. / Electrochemical Society et al. | 1995
- 91
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Initiation of Corrosion Pits at Inclusions on Stainless SteelAlkire, R. C. / Ke, R. / Electrochemical Society et al. | 1995
- 93
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Hydride Formation In Occluded Cells on a Magnesium Anode SurfaceNazarov, A. P. / Yurasova, T. A. / Electrochemical Society et al. | 1995
- 94
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STM Investigation of BTA on Cu(111) and (110) SurfacesPickering, H. W. / Cho, K. H. / Kishimoto, J. / Hashizume, T. / Electrochemical Society et al. | 1995
- 95
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SERS Study of Carbon Steel in CO~2-Saturated Brine with Comments on the Action of InhibitorsOblonsky, L. J. / Devine, T. M. / Chesnut, G. R. / Electrochemical Society et al. | 1995
- 96
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Resistance Corrosion of Zinc with Lead Chloride and Polyethylene GlycolZhang, S. T. / Huang, Z. Q. / Li, M. J. / Electrochemical Society et al. | 1995
- 98
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Reaction of Scandia with NaVO~3-V~2O~5 MeltsJones, R. L. / Reidy, R. F. / Electrochemical Society et al. | 1995
- 99
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Pitting of Rapidly Solidified Neodymium-Iron-Boron (Nd-Fe-B) Permanent MagnetsAttanasio, S. A. / Latanision, R. M. / Electrochemical Society et al. | 1995
- 101
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Effect of Cold Work and Recrystallization Processes on Oxidation of Chromium SteelZimina, T. / Racoch, A. / Sirotkina, A. / Oshe, E. / Electrochemical Society et al. | 1995
- 103
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Electrochemical Measurements of Polymer Coatings under PressureMacQueen, R. C. / Miron, R. R. / Granata, R. D. / Electrochemical Society et al. | 1995
- 105
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Study of Cathodic Behavior of Iron Using Potential Pulse TechniqueChebotareva, N. / Mikhailovsky, U. / Electrochemical Society et al. | 1995
- 106
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Cathodic Reactions and Interactions Between Iron and Hydrogen in the Presence of Oxygen-Containing OxidantsMaksaeva, L. B. / Marshakov, A. I. / Mikhailovski, Y. N. / Electrochemical Society et al. | 1995
- 107
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Effect of Organosilanes on Anticorrosion Properties and Cathodic Delamination Stability of Polymeric CoatingsPetrunin, M. A. / Nazarov, A. P. / Electrochemical Society et al. | 1995
- 108
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Evaluation of Nonchromate Inhibiting Pigments for Steel and Aluminum AlloysKendig, M. / Cunningham, M. / Jeanjaquet, S. / Electrochemical Society et al. | 1995
- 110
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The Application of Selected Nuclear-Based Methods for the Understanding of Hexavalent Chromium Protection in Aluminum CorrosionWieckowski, A. / Electrochemical Society et al. | 1995
- 111
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^2^7Al NMR Study of Porous Anodized AluminumDavenport, A. J. / Grey, C. P. / French, G. / Electrochemical Society et al. | 1995
- 112
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Corrosion Protection of Aluminum-Matrix Composites by AnodizationChung, D. D. L. / Hou, J. / Electrochemical Society et al. | 1995
- 113
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A Review of Mechanisms of Chromate Treatment of Aluminum and Modeling of Related Interfacial Chemical ProcessesIsaacs, H. S. / Feldberg, S. / Davenport, A. J. / Aldykiewicz, A. J. / Electrochemical Society et al. | 1995
- 114
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Nonchromate Transition Metal Conversion Coatings for Aluminum AlloysBailin, L. J. / Electrochemical Society et al. | 1995
- 115
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The Purpose of Hydrotalcite Coated Aluminum to Sealing with Transition Metal Salt SolutionsBuchheit, P. G. / Martinez, M. A. / Electrochemical Society et al. | 1995
- 117
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Corrosion Protection of High-Copper Aluminum Alloys Using Chromate-Free ProcessesMansfeld, F. / Wang, Y. / Electrochemical Society et al. | 1995
- 119
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Performance of Chromate Conversion Coating Alternatives over Aluminum Substrates in Nonaerospace ApplicationsAult, J. P. / Cramer, K. / Evans, M. / Electrochemical Society et al. | 1995
- 121
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Critical Issues in Chromate ReplacementMacdonald, D. D. / Electrochemical Society et al. | 1995
- 124
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A Multistep Supervisory Controller for Photolithographic OperationsSpanos, C. J. / Ma, S.-Y. / Electrochemical Society et al. | 1995
- 126
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Nonlinear Run-to-Run Control for Rapid Thermal Processing with Unmeasured Variable EstimationZafiriou, E. / Chiou, H.-W. / Adomaitis, R. A. / Electrochemical Society et al. | 1995
- 128
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Artificial Neural Network Model-Based Run-to-Run Process ControllerWang, X. A. / Mahajan, R. L. / Electrochemical Society et al. | 1995
- 130
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Demonstration of a Process-Independent Run-to-Run ControllerTelfeyan, R. / Moyne, J. / Hurwitz, A. / Taylor, J. / Electrochemical Society et al. | 1995
- 132
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Modeling of Plasma Etch Dynamics Using Linear and Nonlinear ModelsBushman, S. / Karjala, T. W. / Himmelblau, D. M. / Trachtenberg, I. / Electrochemical Society et al. | 1995
- 133
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Modeling of Transport Phenomena and Detailed Chemistry in Tungsten Chemical Vapor DepositionKleijn, C. R. / Kuylaars, K. J. / Van der Akker, H. E. A. / Electrochemical Society et al. | 1995
- 134
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Development of RTP-Control with Monte Carlo SimulationKersch, A. / Electrochemical Society et al. | 1995
- 136
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Process Models for Process Control in Semiconductor ProcessingMeyyappan, M. / Govindan, T. R. / Buggeln, R. / DeJong, F. / Electrochemical Society et al. | 1995
- 138
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A Reduced Fluid-Dynamical Discharge Model for Applications in Technology-Oriented CADBrinkmann, R. P. / Furst, R. / Werner, C. / Hierlemann, M. / Electrochemical Society et al. | 1995
- 140
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CVD TiN Process Modeling for Contact/Via BarriersParanjpe, A. / IslamRaja, M. / Electrochemical Society et al. | 1995
- 142
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Thermophoretic Force on Particles in Low Pressure Processing ReactorsChio, S. J. / Rader, D. J. / Geller, A. S. / Electrochemical Society et al. | 1995
- 144
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Charging of Microfeatures by Radio Frequency SheathsDalvie, M. / Vahedi, V. / Hamaguchi, S. / Electrochemical Society et al. | 1995
- 145
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Grain Oriented Thin Film Microstructure SimulationFriedrich, L. / Robbie, K. / Dew, S. / Brett, M. / Electrochemical Society et al. | 1995
- 147
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One Approach to Combining Equipment Scale and Feature Scale ModelsGobbert, M. / Cale, T. / Ringhofer, C. / Electrochemical Society et al. | 1995
- 150
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A Method to Determine the Infrared Optical Constants and Thickness of a Thin Film from a Single Reflectance SpectrumMorrison, P. W. / Electrochemical Society et al. | 1995
- 151
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Normal Incidence Reflectance: A Robust Tool for In Situ Real-Time Measurement of Growth Rates and Optical Constants of CVD-Grown Semiconductor Thin FilmsBreiland, W. C. / Brannan, T. M. / Chui, H. C. / Hammons, B. E. / Electrochemical Society et al. | 1995
- 154
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A Neural Network Model of a Contact Plasma Etch ProcessRietman, E. A. / Electrochemical Society et al. | 1995
- 155
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Real-Time Optical Diagnostics for 0.25 m Gate Etching Process Control: Optical Emission, Full Wafer Interferometry, and UV-Visible EllipsometryLee, J. T. C. / Maynard, H. L. / Blayo, N. / Ibbatson, D. E. / Electrochemical Society et al. | 1995
- 157
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Application of Raman Spectroscopy for SC-1 Processing Bath Concentration ControlPelletier, M. J. / Carpio, R. / Davis, K. L. / Electrochemical Society et al. | 1995
- 159
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The Dependence of Bulk Defects on the Axial Temperature Gradient of Silicon Crystals during Czochralski GrowthAmmon, W. V. / Dornberger, E. / Oelkrug, H. / Weidner, H. / Electrochemical Society et al. | 1995
- 163
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Phenomenological Modeling for Real-Time Feedback Control of RTEChandhok, M. / Hanish, P. D. / Grizzle, J. W. / Electrochemical Society et al. | 1995
- 166
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Integrated Process Monitoring, Control, and Diagnostics of Semiconductor Manufacturing Wet Etch/Clean Spray ToolsAllen, M. / Luca, S. / Lee, P. / Seaton, J. / Electrochemical Society et al. | 1995
- 168
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Sensor Development and Process Control for Chemical-Mechanical Planarization of Multilevel Interconnect DevicesHu, A. / Dun, H.-P. / Renteln, P. / Sachs, E. / Electrochemical Society et al. | 1995
- 171
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Sensor Information from a Lam 9600 Metal Etch ProcessBarna, G. G. / Buck, D. W. / Butler, S. W. / Splichal, M. / Electrochemical Society et al. | 1995
- 173
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Characteristics of ICP in Ar and Cl~2 Plasmas and Application to Cu EtchingSeo, S.-H. / Kim, J.-H. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 174
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Determination of F Radical Atom Distribution by Plasma Parameter Normalization in Electron Cyclotron Resonance SF~6 PlasmaKim, Y.-J. / Lee, P.-W. / Chang, C. S. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 176
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Investigation of Plasma Etch Chemistry Using ICP SpectroscopyMautz, K. E. / Electrochemical Society et al. | 1995
- 177
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On In Situ Etch Rate Extraction from Interferometric SignalsWong, K. S. / Boning, D. S. / Electrochemical Society et al. | 1995
- 179
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Molecular Beam Mass Spectrometry of the Thermal Decomposition of TetraethoxysilaneWierda, C. A. / Zachariah, M. R. / Burgess, D. R. F. / Electrochemical Society et al. | 1995
- 180
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Real-Time Equipment, Process and Wafer State Sensing of PolySi RTCVD from SiH~4 Using Mass SpectrometryTedder, L. L. / Rubloff, G. W. / Electrochemical Society et al. | 1995
- 181
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Mechanistic Investigations of Titanium Nitride CVDAllendorf, M. D. / Larson, R. S. / Melius, C. F. / Outka, D. A. / Electrochemical Society et al. | 1995
- 182
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Spatiotemporal Structure of ICP Reactor in Two-Dimensional ModelKamimura, K. / Makabe, T. / Nakagami, S. / Nakano, N. / Electrochemical Society et al. | 1995
- 184
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Simulation of Low Pressure Plasma Reactors on a Massively Parallel Supercomputer Using the Direct Simulation Monte Carlo (DSMC) MethodBartel, T. / Johannes, J. E. / Lymberopoulos, D. P. / Wise, R. S. / Electrochemical Society et al. | 1995
- 186
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Modeling of Neutral Effects in a High Density Etching PlasmaBukowski, J. D. / Stewart, R. A. / Vitelle, P. / Graves, D. B. / Electrochemical Society et al. | 1995
- 187
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Simulations of Real-Time Two-Coil Control of an Inductively Coupled Plasma Source for Etching ApplicationsVentzek, P. L. G. / Yamada, N. / Kitamori, K. / Sakai, Y. / Electrochemical Society et al. | 1995
- 189
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Modeling and Simulation of Two-Dimensional Reactive Plasma Flow in Inductively Coupled ReactorsEconomou, D. J. / Lymberopoulos, D. P. / Electrochemical Society et al. | 1995
- 191
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Modeling of a Two-Dimensional RF DischargeWilcoxson, M. / Manousiouthakis, V. / Electrochemical Society et al. | 1995
- 193
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SiO~2 Deposition on the Wafer in a High Density Plasma Deposition ReactorSelitser, S. / Fry, H. W. / Electrochemical Society et al. | 1995
- 196
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Modeling of BPSG Chemical Downstream Etch Process in the Batch Reactor: Taper Contact Etch ProcessMocala, K. J. / Electrochemical Society et al. | 1995
- 198
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Model-Based Control of Rapid Thermal ProcessesEdgar, T. F. / Electrochemical Society et al. | 1995
- 199
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Improving RIE Process Robustness via Real-Time Feedback ControlGrizzle, J. W. / Elta, M. E. / Freudenberg, J. S. / Khargonekar, P. P. / Electrochemical Society et al. | 1995
- 201
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Application of Sampling Quadruple Mass Spectrometry to Multivariable Process ControlGreve, D. W. / Cheng, X. / Knight, T. J. / Krogh, B. H. / Electrochemical Society et al. | 1995
- 203
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Ellipsometry-Based Control of III-V MBE GrowthCelii, F. / Kao, Y.-C. / Katz, A. / Moise, T. / Electrochemical Society et al. | 1995
- 205
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Model Based Training of a Neural Network End-Point Detector for Plasma Etch ApplicationsMundt, R. / Electrochemical Society et al. | 1995
- 206
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Finding Plasma Etching Endpoint by Monitoring RF Power Systems with an Artificial Neural NetworkMaynard, H. / Rietman, E. / Lee, J. T. C. / Ibbotson, D. / Electrochemical Society et al. | 1995
- 208
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Real Time Intrusive Optical Emission Spectroscopy for Process ControlLee, P.-W. / Kim, Y.-J. / Seo, S.-H. / Kim, J.-H. / Electrochemical Society et al. | 1995
- 210
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Characterization of Plasma Surface Charging Using a Real-Time On-Wafer ProbeMa, S. / McVittie, J. P. / Electrochemical Society et al. | 1995
- 211
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Improved Within-Wafer Uniformity Through the Use of Maximum-Likelihood Estimation of the Mean and Covariance SurfacesDavis, J. C. / Hughes-Oliver, J. / Gyurcsik, R. S. / Lu, J. C. / Electrochemical Society et al. | 1995
- 213
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Failure Analysis of 4-Kilo-Bit Polycrystalline-Silicon Gate Complementary Metal Oxide Semiconductor Field Effect Transistor Static Random Access Memory (TC5514AP) Silicon Die Chips Through the Observation of Digitally Expressed Fail Bit Pattern on a Cathode Ray TubeSaito, Y. / Electrochemical Society et al. | 1995
- 214
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(BFH^+) Contamination of Phosphorus Ion ImplantsHeden, C. / Ho, K. / Pong, R. / Weisenberger, W. / Electrochemical Society et al. | 1995
- 216
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Multivariate Classification of BPSG Thin Films Using Mahalanobis DistancesZhang, S. / Franke, J. E. / Niemczyk, T. M. / Haaland, D. M. / Electrochemical Society et al. | 1995
- 218
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Effect of Hydroxylamine Chemistry on Polymer Removal for Submicron Via ResistanceNguyen, T. T. / Kirk, S. J. / Electrochemical Society et al. | 1995
- 220
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Growth Kinetics of Silicon-Oxynitrides Formed by Furnace Oxidation of Si in N~2O AmbientBhat, M. / Jia, H. H. / Kwong, D. L. / Electrochemical Society et al. | 1995
- 222
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Diagnostics and Poly-Si Gate Process Development at New Microwave Coupled Plasma Source Etching SystemHoffman, P. J. / Heinrich, F. / Renner, S. / Deutschmann, L. / Electrochemical Society et al. | 1995
- 224
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Production of High Density Plasma on the Substrate in a Helicon Source and Application to the Deposition of SiFO Film with Low Dielectric ConstantKim, J.-H. / Seo, S.-H. / Chang, H.-Y. / Electrochemical Society et al. | 1995
- 226
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Application of Laser Irradiation for Control of Cd~xHg~1~-~xTe Semiconductor ParametersGnatyuk, V. A. / Borshch, V. V. / Kopishinska, O. P. / Tarasevich, A. A. / Electrochemical Society et al. | 1995
- 230
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Low Electric Field Time-Dependent Dielectric Breakdown for BEOL Capacitor ApplicationsNguyen, D. B. / Wachnik, R. A. / Rathore, H. S. / Kane, T. / Electrochemical Society et al. | 1995
- 234
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Optimization of Thin Oxide ProcessTai, S.-S. / Electrochemical Society et al. | 1995
- 236
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Accelerated Testing for Stress Voiding in Multilayered MetallizationSullivan, T. / Bouldin, D. / Yao, D. / Electrochemical Society et al. | 1995
- 237
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Stress-Voiding and Electromigration Reliability of Interconnects in ULSI-CircuitsKorhonen, M. A. / Li, C.-Y. / Electrochemical Society et al. | 1995
- 238
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Microstructural Implications for Thermally Induced Effects and Electromigration in Thin Film InterconnectsRajan, K. / Electrochemical Society et al. | 1995
- 240
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Corrosion Characteristics of Blanket, Stacked, and Patterned Al-Cu Thin Films Used for Submicron MetallizationCarpio, R. / Chan, T. / Von Meurs, R. / Electrochemical Society et al. | 1995
- 242
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Thermal Stress Characteristics and Void Formation in Al(Cu) InterconnectsHo, P. S. / Yeo, I.-S. / Jawarani, D. / Anderson, S. G. / Electrochemical Society et al. | 1995
- 243
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The Design of a Test Chip for a Sematech Program to Standardize Electromigration TestingSmall, M. / Harward, M. / Zhao, B. / Electrochemical Society et al. | 1995
- 245
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The Importance of the Threshold Current For Electromigration Design RulesBaerg, B. / Electrochemical Society et al. | 1995
- 247
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Roles of WSi and TiN on Via Electromigration Resistance in Aluminum-Based InterconnectionsYamaha, T. / Naito, M. / Hotta, T. / Electrochemical Society et al. | 1995
- 249
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Electromigration Performance in Al Layered Interconnects Using Ti and/or TiN LayersHashimoto, K. / Kageyama, M. / Touchi, K. / Onoda, H. / Electrochemical Society et al. | 1995
- 251
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The Effect of Test Structure and Stress Condition on Electromigration FailureKawasaki, H. / Lee, C. / Pintchovski, F. / Electrochemical Society et al. | 1995
- 253
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Behavior of Silver Coated Particles under Elevated Temperatures and Humid ConditionsDjokic, S. S. / Lepard, R. H. / Dubois, M. L. / Currie, J. C. / Electrochemical Society et al. | 1995
- 254
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Electromigration under AC Current StressHu, C. / Cheung, N. / Tao, J. / Electrochemical Society et al. | 1995
- 255
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Electromigration Drift Velocity in Al and Cu InterconnectionsHu, C.-K. / Lee, K. Y. / Lee, K. L. / Cabral, C. / Electrochemical Society et al. | 1995
- 257
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Cu Atom Redistribution and Electromigration Resistance of AlCu Lines after Aging TreatmentNogami, T. / Nemoto, T. / Electrochemical Society et al. | 1995
- 259
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Improvement in Electromigration of AlSiCu Reflowed on Recessed W-PlugKakuhara, Y. / Yamada, Y. / Kikkawa, T. / Huo, D. T.-C. / Electrochemical Society et al. | 1995
- 261
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Spectral Emissivity of Liquid SiTakasuka, E. / Tokizaki, E. / Terashima, K. / Kimura, S. / Electrochemical Society et al. | 1995
- 263
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Scalar Transport Due to the Turbulent Effect in the Czochralski Silicon MeltChung, S.-I. / Izunome, K. / Togawa, S. / Kawanishi, S. / Electrochemical Society et al. | 1995
- 267
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Photoluminescence D-Lines Spectra in Heat-Treated Czochralski Silicon CrystalCho, K. H. / Lee, J. Y. / Jeon, H. I. / Suh, E.-K. / Electrochemical Society et al. | 1995
- 269
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Competitive Analysis of 200 mm Epitaxial Silicon WafersHuff, H. R. / Goodall, R. K. / Bhat, V. / Electrochemical Society et al. | 1995
- 271
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Application of Chemical Mechanical Planarization for Mesa Isolation in Silicon on InsulatorAli, I. / Joyner, K. / Roy, S. / Shinn, G. / Electrochemical Society et al. | 1995
- 275
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The Effect of Preannealing on Anodic Aluminum Oxide Formed on Al Thin FilmsChang, P.-H. / Chiu, R.-L. / Tung, C.-H. / Electrochemical Society et al. | 1995
- 277
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Agglomeration of TiSi~2 after Densification Process and Its Effects on Barrier QualityHarel, O. / Electrochemical Society et al. | 1995
- 278
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Plasma Enhanced Chemical Vapor Deposition of Molybdenum, Molybdenum Carbide, and Oxide in Thin FilmsChen, B. / Selman, J. R. / Electrochemical Society et al. | 1995
- 280
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The Deposition of Noble Metals from Buffered Oxide Etchants onto Silicon Surfaces - A Morphological StudyYoneshige, K. K. / Parks, H. G. / Helms, C. R. / Halepete, S. / Electrochemical Society et al. | 1995
- 282
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The Effects of Ion Beam Mixing on Titanium Silicide Formation in Submicron CMOS DevicesChonko, M. A. / Sitaram, A. R. / Honcik, C. / Somero, B. M. / Electrochemical Society et al. | 1995
- 284
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Reduction of Surface Residues Seen after Metal Etch ProcessingMautz, K. E. / Electrochemical Society et al. | 1995
- 285
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Thermodynamics and Kinetics of Hydrogen Evolution in Hydrogenated Amorphous Silicon FilmsChung, D. D. L. / Sridhar, N. / Anderson, W. A. / Coleman, J. / Electrochemical Society et al. | 1995
- 286
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Polycrystalline Silicon Films of High Photoresponse, Obtained by Vacuum Annealing of Aluminum Capped Hydrogenated Amorphous Silicon FilmsChung, D. D. L. / Sridhar, N. / Anderson, W. A. / Coleman, J. / Electrochemical Society et al. | 1995
- 287
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Development of a Manufacturable MERIE Polysilicon Etch ProcessAlzaben, T. / Mautz, K. E. / Electrochemical Society et al. | 1995
- 289
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The Ultimate Gate Oxide ThinnessKar, S. / Electrochemical Society et al. | 1995
- 291
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BPSG Stability Layer for High Dopant BPSG FilmsFry, H. W. / Fernandes, N. I. / Electrochemical Society et al. | 1995
- 293
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Characterization of Oxygen-Enriched TEOS FilmsDeCrosta, D. A. / Hackenberg, J. J. / Linn, J. H. / Electrochemical Society et al. | 1995
- 294
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Extending SOG Based Planarization to Sub-Half Micron TechnologyBothra, S. / Weling, M. / Electrochemical Society et al. | 1995
- 296
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An Application of Virtual Wafer Modeling to an Advanced 0.45 m CMOS TechnologyGardner, M. / Kadoch, D. / Electrochemical Society et al. | 1995
- 297
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Role of Rapid Isothermal Processing as a Low Temperature Processing Technique in Silicon Integrated Circuits ManufacturingSingh, R. / Sharangapani, R. / Gong, C. / Alamgir, S. / Electrochemical Society et al. | 1995
- 298
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A Statistical Analysis of High Tc SuperconductorsChow, C. C. / Electrochemical Society et al. | 1995
- 300
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Phase Diagram Calculations of Nonequilibrium Stationary States for CVD Diamond GrowthWang, J.-T. / Zheng, P.-J. / Electrochemical Society et al. | 1995
- 301
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Variational Transition State Theory Rate Constants for Methyl Radical Recombination with Diamond SurfacesHarrington, J. / Jeffries, J. B. / Smith, G. P. / Electrochemical Society et al. | 1995
- 302
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Molecular Dynamics Simulations of Ultrathin Amorphous Carbon FilmsPhilpott, M. R. / Glosli, J. N. / Belak, J. / Electrochemical Society et al. | 1995
- 303
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Models of Transport, Gas-Phase, and Surface Chemistry in Diamond Chemical Vapor DepositionColtrin, M. E. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 304
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A Reverse Monte Carlo Modeling Study of Diamond-Like CarbonRigden, J. S. / Newport, R. J. / Electrochemical Society et al. | 1995
- 305
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Local Density Functional Modeling of Diamond Growth and GraphitizationHeggie, M. I. / Latham, C. D. / Jones, R. / Briddon, P. / Electrochemical Society et al. | 1995
- 306
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Studies of Heteroepitaxial Nucleation and Growth of Diamond on SiliconJiang, X. / Paul, M. / Klages, C.-P. / Jia, C. L. / Electrochemical Society et al. | 1995
- 307
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Crystallization of Diamond by the Chemical Transport ReactionSpitsyn, B. V. / Electrochemical Society et al. | 1995
- 308
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Mechanisms for the Bias-Enhanced Nucleation of DiamondMcGinnis, S. P. / Kelly, M. A. / Hagstrom, S. B. / Electrochemical Society et al. | 1995
- 309
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From Crystals of Naphthalene to Crystals of Diamond: Kinetics and MechanismVoronov, O. A. / Rakhmanina, A. V. / Electrochemical Society et al. | 1995
- 310
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The Role of Carbonaceous Precursors during Diamond NucleationSheldon, B. W. / Boekenhauer, R. E. / Nijhawan, S. / Electrochemical Society et al. | 1995
- 311
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Chemical Vapor Deposition of Diamond: Effect of Process Variables on Growth Rate and QualityAngus, J. C. / Cassidy, W. D. / Kovach, C. S. / Roozbehani, G. / Electrochemical Society et al. | 1995
- 312
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Local Monitoring of Diamond Nucleation DensityObraztsov, A. N. / Timoshenko, V. Y. / Electrochemical Society et al. | 1995
- 313
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Nucleation and Initial Growth Stages of Diamond in CVD: A Theoretical ApproachLiu, H. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 314
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Homoepitaxial Growth of Diamond Thin Films on the Misoriented (001) SubstratesLee, N. / Badzian, A. / Electrochemical Society et al. | 1995
- 315
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Titanium as a Potential Heteroepitaxial Substrate for DiamondMcClure, M. T. / Wolter, S. D. / Glass, J. T. / Stoner, B. R. / Electrochemical Society et al. | 1995
- 318
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Effect of the Silicon Substrate Orientation and Pretreatment on the Nucleation and Adhesion of CVD Diamond FilmsBorges, C. F. M. / Schelz, S. / Martinu, L. / Moisan, M. / Electrochemical Society et al. | 1995
- 320
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Process Parameter Dependence of the Morphology of Diamond Films on Graphite FibersShah, S. I. / Waite, M. M. / Electrochemical Society et al. | 1995
- 321
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The Initial Stages of Diamond Growth on Si(100) Studied by Conventional and Cross-Sectional Micro-Raman SpectroscopyWerninghaus, T. / Laufer, S. / Hinneberg, H.-J. / Zahn, D. R. T. / Electrochemical Society et al. | 1995
- 322
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Morphological Control of Homoepitaxial Diamond: Its Correlation to Texture in Polycrystalline Diamond FilmsYee, A. L. / Ong, H. / Chang, R. P. H. / Electrochemical Society et al. | 1995
- 323
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Deposition of Diamond-Like Carbon Cubic Boron Nitride and Bias-Enhanced Nucleation of Diamond as a Subplantation ProcessRobertson, J. / Electrochemical Society et al. | 1995
- 324
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Laser-Based Synthesis of Diamond at Low TemperaturesSubramaniam, V. V. / Rebello, J. H. D. / Electrochemical Society et al. | 1995
- 325
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Optimization Techniques in DC Arcjet Diamond Chemical Vapor DepositionWeimer, W. A. / Reeve, S. W. / Dandy, D. S. / Electrochemical Society et al. | 1995
- 327
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Diamond Deposition from Acetylene-Oxygen FlamesSchermer, J. J. / Giling, L. J. / Electrochemical Society et al. | 1995
- 329
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Effects of Flame Speed and Stoichiometry on Low Pressure Combustion Diamond GrowthKim, J. / Cappelli, M. A. / Electrochemical Society et al. | 1995
- 330
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Alternative Fuels for Combustion Synthesis of DiamondShin, H. S. / Goodwin, D. G. / Electrochemical Society et al. | 1995
- 332
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Effect of Oxygen on High Temperature Deposition of Diamond by Microwave PlasmaChein, T. / Tzeng, Y. / Electrochemical Society et al. | 1995
- 333
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Deposition of Diamond from Plasma Jet Including Dichlorobenzene as Carbon SourceKotaki, T. / Horii, N. / Isono, H. / Matsumoto, O. / Electrochemical Society et al. | 1995
- 334
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Impurity Effects in the Cyclic Deposition of Diamond FilmsHoward, W. / Spear, K. / Frenklach, M. / Electrochemical Society et al. | 1995
- 335
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Diamond Deposition Using a Planar Radio Frequency Inductively Coupled PlasmaBozeman, S. P. / Tucker, D. A. / Stoner, B. R. / Hooke, W. M. / Electrochemical Society et al. | 1995
- 337
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Preparation of Diamond Films by CVD Including the Use of Halogens and InterhalogensShamir, J. / Electrochemical Society et al. | 1995
- 338
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CVD Diamond Deposition on Ce-TZP CeramicsCorat, E. J. / Do Carmo, M. / Nono, A. / Trava-Airoldi, V. J. / Electrochemical Society et al. | 1995
- 339
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The Role of Microwave Power in the Plasma-Chemical Vapor Deposition of DiamondFox, C. A. / McMaster, M. C. / Hsu, W. L. / Kelly, M. A. / Electrochemical Society et al. | 1995
- 340
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Diamond Shaping and Polishing by Chemical ReactionsJin, S. / Zhu, W. / Tiefel, T. H. / Electrochemical Society et al. | 1995
- 342
-
Electrochemical Formation and Surface Modification of Freestanding Homoepitaxial Diamond FilmsPehrsson, P. / Marchywka, M. / Butler, J. E. / Electrochemical Society et al. | 1995
- 343
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CVD Diamond Films Etching in ECR DischargeSuetin, N. V. / Gulyaev, K. S. / Kovalev, A. S. / Rakhimov, A. T. / Electrochemical Society et al. | 1995
- 344
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Cubic Boron Nitride and Carbon Nitride Films: Recent DevelopmentsRichter, F. / Electrochemical Society et al. | 1995
- 346
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Advances in Understanding How Cubic BN Films Form by Ion-Assisted DepositionMirkarimi, P. B. / Medlin, D. L. / McCarty, K. F. / Barbour, J. C. / Electrochemical Society et al. | 1995
- 348
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Mass Separated Ion Beam Deposition: A Unique Technique to Grow DLC, c-BN, and CN FilmsRonning, C. / Hofsass, H. / Electrochemical Society et al. | 1995
- 349
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Growth and Nucleation Mechanisms of c-BN Films Deposited with Inductively Coupled Plasma CVDKuhr, M. / Reinke, S. / Kulisch, W. / Electrochemical Society et al. | 1995
- 350
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Amorphous C-N and SiC-N Films: Properties and ApplicationsOng, H. / Yee, A. L. / Xiong, F. / Chang, R. P. H. / Electrochemical Society et al. | 1995
- 351
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Intrinsic Strain and Flexural Strength of CVD DiamondKlein, C. A. / Hallock, R. B. / Miller, R. P. / Electrochemical Society et al. | 1995
- 353
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Hypervelocity Impact Tests on Polycrystalline Diamond Deposited over Silicon SubstratesRamesham, R. / Hill, D. / Best, S. / Rose, M. F. / Electrochemical Society et al. | 1995
- 355
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Carbon-Graphite-Like Friction Behavior of Polycrystalline Diamond Sliding Against Itself in VacuumGardos, M. N. / Ravi, K. V. / Electrochemical Society et al. | 1995
- 356
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Mechanical Characterization of Diamond-Coated MetalsDrory, M. D. / Electrochemical Society et al. | 1995
- 357
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Aspects of Characterization of Diamond Coatings on Cutting ToolsBhat, D. G. / Malshe, A. P. / Sung, C. / Electrochemical Society et al. | 1995
- 358
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Growth and Characterization of Microwave Plasma CVD Diamond Using CO+H~2, CH~4+H~2+O~2, CO+N~2, and CORamesham, R. / Rose, M. F. / Askew, R. F. / Electrochemical Society et al. | 1995
- 360
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Cutting of Diamond Coated Molybdenum by Wire Electric Discharge MachineRamesham, R. / Askev, R. F. / Rose, M. F. / Sirois, D. L. / Electrochemical Society et al. | 1995
- 362
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Transformation of Monoatomic Step on (100) Diamond SurfacesSkokov, S. / Weiner, B. / Frenklach, M. / Electrochemical Society et al. | 1995
- 363
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The Radiation Damage Inflicted on CVD Diamond by Doses of up to 6 X 10^1^4 High Energy Neutrons cm^-^2Mainwood, A. / Allers, L. / Hassard, J. F. / Howard, A. S. / Electrochemical Society et al. | 1995
- 364
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HFCVD of Diamond at Low Substrate and Low Filament TemperaturesLi, Z. / Clausing, R. E. / Shaw, R. W. / Feigerle, C. / Electrochemical Society et al. | 1995
- 366
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Photo-Hall Effect and Photoconductivity of Polycrystalline Undoped CVD-DiamondErmakov, M. G. / Vedeneev, A. S. / Ermakova, O. N. / Sokolina, G. A. / Electrochemical Society et al. | 1995
- 367
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Controllable Electronic Properties of Diamond-Like Atomic-Scale Composite (DLASC) Films and DLASC/Si InterfaceDorfman, B. / Polyakov, V. / Rukovishnikov, A. / Abraizov, M. / Electrochemical Society et al. | 1995
- 368
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The Formation of Cubic Boron Nitride and Silicon Carbide Layers on SiliconFriedrich, M. / Hahn, J. / Laufer, S. / Richter, F. / Electrochemical Society et al. | 1995
- 369
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The Effect of RF Power on the Growth of c-BN Films on Nickel SubstratesChen, G. / Guo, Y. / Li, G. / Song, Z. / Electrochemical Society et al. | 1995
- 372
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Chemistry and the Electronic Properties of Low-Index Diamond SurfacesPehrsson, P. / Potochnik, S. J. / Butler, J. E. / Electrochemical Society et al. | 1995
- 375
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Depth-Resolved Residual Stress Measurements in Homoepitaxial Diamond Films Grown by Chemical Vapor DepositionAger, J. W. / Plano, M. A. / Moyer, D. / Electrochemical Society et al. | 1995
- 377
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A Study of Diffusion Lengths on Diamond and Gallium Nitride MaterialsCropper, A. D. / Moore, D. J. / Scott, C. J. / Binari, S. / Electrochemical Society et al. | 1995
- 378
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Raman Spectroscopy of Annealed Amorphous Hydrogenated and Fluorinated Carbon FilmsMuller, U. / Hauert, R. / Oral, B. / Tobler, M. / Electrochemical Society et al. | 1995
- 379
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Diamond for High Temperature Pressure SensorDavidson, J. L. / Wur, D. / Kang, W. P. / Beetz, C. / Electrochemical Society et al. | 1995
- 380
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Silicon-Based Contacts on Homoepitaxial Diamond FilmsVespan, A. / Ebert, W. / Borst, T. H. / Pitter, M. / Electrochemical Society et al. | 1995
- 382
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Relationship Between Raman Spectra and [H] and [CH~3] for Diamond FilmsPrawer, S. / Harris, S. J. / Electrochemical Society et al. | 1995
- 383
-
Effect of Additives and hBN Structure on the cBN Growth at HP/HTDinca, G. / Georgeoni, P. / Baluta, G. / Calu, G. / Electrochemical Society et al. | 1995
- 384
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Structure of Highly Oriented Polycrystalline Diamond Films Grown on Si(001)Tachibana, T. / Hayashi, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 386
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Effects of Surface Treatments on the Current-Voltage Characteristics of Metal/Intrinsic Diamond/Semiconducting Diamond DiodesMiyata, K. / Nishimura, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 388
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The Physical Properties of c-BN Films Obtained in RF-Plasma with Additional Ion StimulationGerasimovich, S. S. / Sleptsov, V. V. / Teryoshin, S. A. / Electrochemical Society et al. | 1995
- 389
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Time-of-Flight Experiments for DLC FilmsStrzelecki, W. / Staryga, E. / Mycielski, W. / Electrochemical Society et al. | 1995
- 390
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Low-Temperature Synthesis of Cubic Boron Nitride and Diamond Under High Pressure C~2B~1~0H~1~2 and CN~5H~3 as SpeciesVoronov, O. A. / Kashevarova, L. S. / Electrochemical Society et al. | 1995
- 392
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In Situ Surface Roughness Measurements during PECVD Diamond Film GrowthZuiker, C. D. / Gruen, D. M. / Krauss, A. R. / Electrochemical Society et al. | 1995
- 393
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Optical Diagnostics for Temperature Measurement in a Diamond CVD ReactorJeffries, J. B. / Brinkman, E. A. / Electrochemical Society et al. | 1995
- 394
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In Situ X-Ray Investigation of DLC Film Properties during Growth and Etching ProcessesBaranov, A. M. / Sleptsov, V. V. / Teryoshin, S. A. / Mikhailov, I. F. / Electrochemical Society et al. | 1995
- 395
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Forced Diffusion of Boron and Lithium in DiamondPopovici, G. / Sung, T. / Prelas, M. A. / Khasawinah, S. / Electrochemical Society et al. | 1995
- 396
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Etching of Diamond Wafers with Electron-Cyclotron-Resonance PlasmasChakraborty, R. N. / Reinhard, D. K. / Goldman, P. D. / Electrochemical Society et al. | 1995
- 398
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Surface and Bulk Effects in Ion Assisted Cubic Boron Nitride (c-BN) GrowthReinke, S. / Kuhr, M. / Kulisch, W. / Electrochemical Society et al. | 1995
- 400
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Deposition and Stress Measurements of HFCVD Diamond Coating on Tool InsertsTaher, M. / Schultz, J. / Malshe, A. P. / Nasrazadani, S. / Electrochemical Society et al. | 1995
- 401
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Large Area Diamond Film Deposition for Multichip ModulesBrown, W. D. / Beera, R. / Haque, S. / Naseem, H. A. / Electrochemical Society et al. | 1995
- 402
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Decomposition of Diborane and Ammonia on Ni(100) SurfacesGreve, D. W. / Desrosiers, R. M. / Gellman, A. J. / McFadden, C. F. / Electrochemical Society et al. | 1995
- 404
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X-Ray Diffraction ImagingBlack, D. / Burdette, H. / Linares, R. / Doering, P. / Electrochemical Society et al. | 1995
- 405
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Shallow Angle X-Ray Diffraction from In Situ Diamond Thin FilmsRigden, J. S. / Newport, R. J. / Electrochemical Society et al. | 1995
- 406
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Two-Dimensional Model of HFCVD ReactorSuetin, N. V. / Mankelevich, Y. A. / Rakhimov, A. T. / Vagin, V. P. / Electrochemical Society et al. | 1995
- 408
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Cubic Lattice Parameter of Nitrogen Doped DiamondVoronov, O. A. / Rakhamanina, A. V. / Khlybov, E. P. / Electrochemical Society et al. | 1995
- 409
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Study of Diamond Peculiarities and Production of the Monocrystal InstrumentTimofeev, V. E. / Popov, I. Y. / Zasimova, N. S. / Saparin, G. V. / Electrochemical Society et al. | 1995
- 410
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Properties of Hydrogenated Tetrahedral Amorphous CarbonWeiler, M. / Robertson, J. / Sattel, S. / Jung, K. / Electrochemical Society et al. | 1995
- 411
-
Field Induced Transformation of DLC Films Deposited by DC Plasma TechniqueYalamanchi, R. S. / Thutupalli, G. K. M. / Sankara Reddy, K. S. / Satyam, M. / Electrochemical Society et al. | 1995
- 412
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Equilibrium Constants of Naphthalene Decomposition ReactionsYakovlev, E. N. / Voronov, O. A. / Electrochemical Society et al. | 1995
- 413
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Influence of Substrate Temperature on Diamond Synthesis in a Supersonic Hydrogen ArcjetLoh, M. H. / Cappelli, M. A. / Electrochemical Society et al. | 1995
- 414
-
Measurement Techniques and Results for the Thermal Conductivity of CVD DiamondGraebner, J. E. / Electrochemical Society et al. | 1995
- 416
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Measurement of Electrical Properties of Undoped Diamond Films Between Room Temperature and 1000CVandersande, J. W. / Zoltan, L. D. / Electrochemical Society et al. | 1995
- 419
-
Measurement of the Change in Diamond's Refractive Index with Temperature and of the Etching Rate of Diamond by the KrF (248 nm) Excimer LaserHauge, R. H. / Patterson, M. J. / Margrave, J. L. / Ball, Z. / Electrochemical Society et al. | 1995
- 420
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Process of Epitaxial Joining to Fabricate Large-Area Diamond Single CrystalMalta, D. P. / Posthill, J. B. / Hudson, G. C. / Thomas, R. E. / Electrochemical Society et al. | 1995
- 421
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Recent Observations of Microcavities in CVD Diamond: Their Effects on MCM ProcessingMalshe, A. P. / Glezen, J. G. / Naseem, H. A. / Brown, W. D. / Electrochemical Society et al. | 1995
- 422
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Negative Electron Affinity DiamondPate, B. B. / Bandis, C. / Haggerty, D. / Electrochemical Society et al. | 1995
- 423
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Electron Field Emission Characteristics of CVD DiamondZhu, W. / Kochanski, G. P. / Jin, S. / Seibles, L. / Electrochemical Society et al. | 1995
- 425
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CVD Diamond: A Unique Dielectric, Semiconductor, and Thermal Conductor for Electronic ApplicationsDavidson, J. L. / Brown, W. D. / Dismukes, J. P. / Electrochemical Society et al. | 1995
- 427
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Silicon-Diamond Interface Band StructureObraztsov, A. N. / Guseva, M. B. / Petrukhin, A. G. / Petrov, A. V. / Electrochemical Society et al. | 1995
- 428
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Photoconductive Spectroscopy of CVD DiamondAllers, L. / Collins, A. T. / Electrochemical Society et al. | 1995
- 429
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Strategies for CVD Diamond Cost ReductionSinger, A. T. / Goodwin, D. G. / Electrochemical Society et al. | 1995
- 430
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Microwave Deposition Reactors for Commercial CVD Diamond ApplicationsSevillano, E. / Casey, J. A. / Gat, R. / Jin, S. / Electrochemical Society et al. | 1995
- 431
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Device Simulations of Diamond FETs with MES, p^+ip^+ and "-Doped" Structures in Comparison with SiC MESFETNishimura, K. / Miyata, K. / Kobashi, K. / Electrochemical Society et al. | 1995
- 433
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Thin Film Diamond Diode Chemical Gas SensorGurbuz, Y. / Kang, W. P. / Davidson, J. L. / Wu, D. / Electrochemical Society et al. | 1995
- 435
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High Power Electron Beam Activated Diamond SwitchesLin, S.-H. / Sverdrup, L. H. / Electrochemical Society et al. | 1995
- 437
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Diamond-Like Carbon Films for High Temperature Electronic ApplicationsKosel, P. B. / Wu, D. / Kosel, O. P. / Carr, S. F. / Electrochemical Society et al. | 1995
- 438
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The Use of Diamond and Diamond-Like Carbon Coatings for Corrosion ProtectionNatishan, P. M. / McCafferty, E. / Glesener, J. / Morrish, A. A. / Electrochemical Society et al. | 1995
- 440
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Process Modeling and Process Control Needs for Process Synthesis for ULSI DevicesHosack, H. H. / Electrochemical Society et al. | 1995
- 442
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Influence of Fluorine Implant on the Transient Enhanced Diffusion of Boron: Determination of Process Modeling ParametersVuong, H.-H. / Gossmann, H.-J. / Rafferty, C. S. / Luftman, H. S. / Electrochemical Society et al. | 1995
- 444
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Modeling of Low Thermal Budget Redistribution of Arsenic in Silicon: Dynamic ClusteringMathiot, D. / Scheiblin, P. / Electrochemical Society et al. | 1995
- 446
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Computationally Efficient Model for Dopant Precipitating KineticsClejan, I. / Dunham, S. T. / Electrochemical Society et al. | 1995
- 448
-
A Two-Dimensional Model for Strain from Dislocation Loops in Ion-Implanted SiliconChaudhry, S. / Thompson, R. H. / Jones, K. S. / Law, M. E. / Electrochemical Society et al. | 1995
- 450
-
Modeling of Notching Caused by Aspect Ratio Dependant Charging during HDP EtchingMcVittie, J. / Hane, M. / Kinosita, T. / Electrochemical Society et al. | 1995
- 452
-
Issues and Challenges in MOSFET Scaling below 0.6 Microns for ULSI TechnologyTasch, A. F. / Electrochemical Society et al. | 1995
- 454
-
A 47 GHz f~ SiHBT with an Emitter of c-Si/Very Thin a-SiCx Double LayerKondo, M. / Shiba, T. / Tamaki, Y. / Nakamura, T. / Electrochemical Society et al. | 1995
- 456
-
A 0.25 m MOSFET Technology Using In Situ Rapid Thermal Gate DielectricsZhang, K. / Osburn, C. M. / Hames, G. / Parker, C. / Electrochemical Society et al. | 1995
- 462
-
Geometry Dependence of Void Formation in Deep Submicron Poly-Buffered LOCOS Isolation Structures: Experimental Evidence of the Stress-Relaxation ModelSmeys, P. / Griffin, P. B. / Saraswat, K. C. / Electrochemical Society et al. | 1995
- 464
-
TEOS/Ozone APCVD Thin SiO~2 for Sub 0.5 m LDD Spacer ApplicationsMoinpour, M. / Lu, W.-J. / Sadjadi, R. / Li, J. / Electrochemical Society et al. | 1995
- 466
-
Materials Challenges for ULSIKimerling, L. C. / Electrochemical Society et al. | 1995
- 467
-
Self-Limited Fractional Atomic-Layer Etching of SiMatsuura, T. / Suzue, K. / Murota, J. / Sawada, Y. / Electrochemical Society et al. | 1995
- 469
-
H-Passivation of Si(100) Surfaces: Correlation with Ion Beam Characterization (Elastic Recoil and Nuclear Resonance) and Atomic Force MicroscopyAtluri, V. / Herbots, N. / Whaley, S. / Bhagvat, S. / Electrochemical Society et al. | 1995
- 471
-
Effects of the Chlorine Concentration in the Anneal Ambient on the Contamination and Surface Microroughness in SIMOXAnc, M. J. / Krull, W. A. / Alles, M. A. / Electrochemical Society et al. | 1995
- 476
-
Applications of Carrier Lifetime and Diffusion Length MeasurementsBullis, W. M. / Huff, H. R. / Electrochemical Society et al. | 1995
- 477
-
Influence of Vacuum Annealing on Native Si Point DefectsGossmann, H.-J. / Mogi, T. K. / Stolk, P. A. / Eaglesham, D. J. / Electrochemical Society et al. | 1995
- 479
-
The Effect of Temperature on Electron Capture Cross Sections and Densities in X-Ray Irradiated Gate Field Effect TransistorsKim, H. S. / Reisman, A. / Williams, C. K. / Brush, H. / Electrochemical Society et al. | 1995
- 481
-
Analysis of Silicon Damage and Surface Contamination Caused by Oxide EtchingReinhart, K. / Busch, E. / Kelso, S. / Electrochemical Society et al. | 1995
- 483
-
TDS Study on the Corrosion Suppression Mechanism after Aluminum Etching by O~2+H~2O Downstream AshingKojiri, H. / Nakamura, M. / Electrochemical Society et al. | 1995
- 485
-
Silicon Oxidation Inhibition after NF~3/Ar RIE in the Presence of PhotoresistTsuchiaki, M. / Ohiwa, T. / Takato, H. / Watanabe, T. / Electrochemical Society et al. | 1995
- 487
-
Conditioning of Silicon Surface after RIE Using O~2 and NF~3 Remote PlasmaHwang, D. / Ruzyllo, J. / Grant, R. / Mount, D. / Electrochemical Society et al. | 1995
- 488
-
Reduction of Charge-Up Damage in Magnetron RIEYoshida, Y. / Electrochemical Society et al. | 1995
- 490
-
Plasma Etch of Titanium and Titanium OxideKuo, Y. / Electrochemical Society et al. | 1995
- 492
-
Investigation of Undesirable Film Deposition in Contacts during Contact EtchWeling, M. / Gabriel, C. / Electrochemical Society et al. | 1995
- 494
-
Low Dielectric Dow Cyclotene 3022 (BCB) Etch for Multilevel Interconnection IntegrationLii, Y. T. / Wetzel, J. / Electrochemical Society et al. | 1995
- 498
-
Selective Remote Plasma Etching of Si~3N~4 Over SiO~2 at Elevated TemperatureStaffa, J. / Luther, B. / Ruzyllo, J. / Grant, R. / Electrochemical Society et al. | 1995
- 499
-
Process Integration of Chemical Mechanical PolishingPerry, K. A. / Electrochemical Society et al. | 1995
- 500
-
A One-Step Shallow Trench Global Planarization Process Using Chemical Mechanical PolishingBoyd, J. M. / Ellul, J. P. / Electrochemical Society et al. | 1995
- 502
-
Optimization of a Chemical Mechanical Polishing Process for Dielectric PlanarizationWeling, M. / Drill, C. / Electrochemical Society et al. | 1995
- 504
-
Prevention of Charging Damage to Gate Oxide during Intermetal Oxide Deposition by HDP CVDBothra, S. / Gabriel, C. / Electrochemical Society et al. | 1995
- 506
-
Improved Gap-Filling Capability of Fluorine-Doped PECVD Silicon Oxide Thin FilmMizuno, S. / Verma, A. / Lee, P. / Nguyen, B. / Electrochemical Society et al. | 1995
- 508
-
Gap Fill and Film Reflow Capability of Subatmospheric Chemical Vapor Deposition (SACVD) Borophosphosilicate GlassRobles, S. / Russel, K. / Galiano, M. / Siva, V. / Electrochemical Society et al. | 1995
- 510
-
Integration of BPSG in a 0.25 m DRAM ProcessGambino, J. / Jaso, M. / Aochi, H. / Tsunashima, Y. / Electrochemical Society et al. | 1995
- 512
-
GCMS and FTIR Studies of By-Product Inhibited Growth and the Rate-Limiting Step in TEOS-Based SiO~2CVDBartram, M. E. / Moffat, H. K. / Electrochemical Society et al. | 1995
- 514
-
Dielectric Constant and Stability of Fluorine Doped PECVD Silicon Oxide Thin FilmsMizuno, S. / Verma, A. / Tran, H. / Lee, P. / Electrochemical Society et al. | 1995
- 518
-
Copper Adsorption at a Silicon Surface from HF SolutionTurner, J. E. / Miyazaki, K. / Fukazawa, Y. / Muraoka, H. / Electrochemical Society et al. | 1995
- 520
-
A Point-of-Use Purification Method of HF Chemicals for VLSI ManufacturingYamamoto, K. / Shimono, T. / Okada, T. / Kawazawa, Y. / Electrochemical Society et al. | 1995
- 522
-
Comparison of Automated Testing Methods for Plasma Charging Induced DamageAbdel-Ati, W. L. N. / Ma, S. / Yang, T.-C. / McVittie, J. P. / Electrochemical Society et al. | 1995
- 524
-
Analysis of Within-Run Process Variations Using Automated Wafer-Position Tracking in WorkstreamLing, Z.-M. / Pak, J. / Beckage, P. / Lin, Y.-T. / Electrochemical Society et al. | 1995
- 526
-
Thin Gate Dielectrics for ULSI: RTO or Furnace?Green, M. L. / Electrochemical Society et al. | 1995
- 527
-
The Effect of Carbon in Silicon on Oxidation Kinetics and Silicon Dioxide IntegrityRidley, R. / Brozek, T. / Ruzyllo, J. / Electrochemical Society et al. | 1995
- 530
-
Gate Oxide Integrity in DRAM Devices: D-defect Effects in CZ SiPark, J.-G. / Rozgonyi, G. A. / Lee, C.-S. / Choi, S.-P. / Electrochemical Society et al. | 1995
- 532
-
Formation of High Quality Thin Stacked Oxynitride Gate Dielectrics by In Situ Rapid Thermal MultiprocessingBhat, M. / Cho, T. H. / Yan, J. / Han, L. K. / Electrochemical Society et al. | 1995
- 534
-
High Quality Oxynitride Gate Dielectrics Prepared by Reoxidation of NH~3-Nitrided SiO~2 in N~2O AmbientHan, L. K. / Kim, J. / Yoon, G. W. / Bhat, M. / Electrochemical Society et al. | 1995
- 535
-
Process Dependence of MOSFET Performance and Reliability with N~2O-Based Furnace-Grown Gate OxidesHan, L. K. / Wang, H. H. / Kim, J. / Yoon, G. W. / Electrochemical Society et al. | 1995
- 536
-
Resistivity Reduction of Thin Polycrystalline Silicon Films Crystallized from In Situ Phosphorus-Doped Amorphous Silicon Deposited Using Silane or DisilaneOguro, S. / Shishiguchi, S. / Arai, K. / Electrochemical Society et al. | 1995
- 538
-
Super Self-Aligned Ultrashallow Junction Formation/Selective Si~1~-~xGe~x CVD in Deep-Submicron MOSFETs FabricationGoto, K. / Murota, J. / Honma, F. / Matsuura, T. / Electrochemical Society et al. | 1995
- 540
-
Formation of Deep Submicrometer Cobalt Silicided Poly Gate Using Bilayer ProcessesWang, Q. F. / Lauwers, A. / Deweerdt, B. / Veerbeeck, R. / Electrochemical Society et al. | 1995
- 544
-
Rapid, Routine, Nondestructive Screening of III-V Substrate Wafers Using X-Ray TopographyBassignana, I. C. / Macquistan, D. A. / Young, M. C. / Electrochemical Society et al. | 1995
- 546
-
Study of Residual Strains and Dislocation Density in Semiconducting Crystal Wafers by Means of Bragg Angle MappingFerrari, C. / Electrochemical Society et al. | 1995
- 547
-
X-Ray Diffraction Imaging of ZnSeBlack, D. / Burdette, H. / Cantwell, G. / Electrochemical Society et al. | 1995
- 548
-
Nano-Scale Imaging of Compositional, Defect and Dopant Distributions in Semiconductor Laser HeterostructuresHull, R. / Electrochemical Society et al. | 1995
- 550
-
Nano and Micro Characterization of III-V-Compound Material by Dedicated Scanning MicroscopyBalk, L. J. / Electrochemical Society et al. | 1995
- 551
-
Low Temperature Near Field Optical Spectroscopy Device StructuresHarris, T. D. / Electrochemical Society et al. | 1995
- 552
-
Applications of Atomic Force Microscopy for Compared Semiconductor MaterialsLuftman, H. S. / Electrochemical Society et al. | 1995
- 553
-
GaAs Integrated Circuit Process Characterization and Nondestructive Process Monitoring by Atomic Force MicroscopyBaca, A. G. / Howard, A. J. / Shul, R. J. / Zolper, J. C. / Electrochemical Society et al. | 1995
- 554
-
Cathodoluminescence Imaging and Spectroscopy of Low-Dimensional StructuresGustafsson, A. / Samuelson, L. / Kapon, E. / Bonard, J.-M. / Electrochemical Society et al. | 1995
- 556
-
Substrate and Epilayer Homogeneity: Their Role in Compound Semiconductor Device ProductionMoore, C. / Hennessy, J. / Electrochemical Society et al. | 1995
- 557
-
Use of Photoluminescence, Mesa Width, and Chip Test Mapping to Determine the Effect of Mesa Width on Laser PerformanceLevkoff, J. / Palin, M. G. / Grim-Bogdan, K. A. / Electrochemical Society et al. | 1995
- 559
-
Nondestructive Characterization of n-AlGaAs/GaAs Heterojunction Structures Using PhotoellipsometryWong, C. C. / Saitoh, T. / Xiong, Y.-M. / Electrochemical Society et al. | 1995
- 561
-
Photoellipsometry Analysis of Doped GaAsKobayashi, K. / Wong, C. C. / Saitoh, T. / Xiong, Y.-M. / Electrochemical Society et al. | 1995
- 563
-
The Economics of SOI Material ChoicesCraven, R. A. / Downey, W. P. / Electrochemical Society et al. | 1995
- 564
-
SIMOX Technology and Applications to Wafer BondingAuberton-Herve, A. J. / Barge, T. / Aspar, B. / Electrochemical Society et al. | 1995
- 566
-
High Volume Manufacturability of SOI Bonded WafersEaster, W. G. / Goodwin, C. A. / Hsieh, C. M. / Shanaman, R. H. / Electrochemical Society et al. | 1995
- 568
-
Recent Advances in Thinning of Bonded SOI Wafers by Plasma Assisted Chemical EtchingMumola, P. B. / Gardopee, G. J. / Electrochemical Society et al. | 1995
- 569
-
SOI for Next Generation High Performance MicroprocessorsShahidi, G. G. / Electrochemical Society et al. | 1995
- 570
-
High Performance Bipolar SOI TechnologyIkeda, T. / Watanabe, K. / Yamaguchi, H. / Nishizawa, H. / Electrochemical Society et al. | 1995
- 571
-
A Fully Oxide Isolated Bipolar Transistor Integrated Circuit ProcessGoody, S. B. / Saul, P. H. / Electrochemical Society et al. | 1995
- 573
-
High Voltage SOI TechnologyNakagawa, A. / Funaki, H. / Omura, I. / Electrochemical Society et al. | 1995
- 575
-
A Comparison of Bipolar Devices on Bonded and Trenched Wafers with Junction and Trench Isolated Bulk WafersDeCourcey, M. / Alderman, J. C. / Blackstone, S. / Gamble, H. / Electrochemical Society et al. | 1995
- 577
-
High-Resolution Flat-Panel Displays Using Silicon-on-Insulator Materials TechnologyDolny, G. / Ipri, A. C. / Hsuch, F.-L. / Stewart, R. G. / Electrochemical Society et al. | 1995
- 579
-
Epitaxial Layer Transfer by Bond and Etchback of Porous SiYonehara, T. / Sakaguchi, K. / Sato, N. / Electrochemical Society et al. | 1995
- 581
-
Bonded SOI with Buried Silicide LayersWilson, R. / Quinn, C. / McDonnell, B. / Blackstone, S. / Electrochemical Society et al. | 1995
- 583
-
High Temperature Metallic Joints Produced at Low Process Temperature for Stress ReductionLee, C. C. / Chen, Y.-C. / Matijasevic, G. / Electrochemical Society et al. | 1995
- 584
-
Characterization of Thin SOI LayersBengtsson, S. / Electrochemical Society et al. | 1995
- 586
-
Strain Sources in Bond and Etchback Silicon-on-InsulatorEgloff, R. / Letavic, T. / Merchant, S. / Greenberg, B. / Electrochemical Society et al. | 1995
- 587
-
Investigation of the Electrical Properties of Bonded Silicon-on-Insulator WafersBailey, P. T. / Jin, G. / Armstrong, B. M. / Gamble, H. S. / Electrochemical Society et al. | 1995
- 589
-
Characterization of the Crystalline Quality of Silicon Layer in Bonded SOI Silicon MaterialWijaranakula, W. / Gupta, D. C. / Electrochemical Society et al. | 1995
- 590
-
Microstructure of Bonded SOI FilmsNayar, V. / Keir, A. M. / Abe, T. / Electrochemical Society et al. | 1995
- 592
-
Mechanical Thinning for SOIBlackstone, S. / Hahn, P. / Electrochemical Society et al. | 1995
- 593
-
Oxygen Precipitate Distribution in Bonded SOI WafersOkonogi, K. / Kikuchi, H. / Arai, K. / Electrochemical Society et al. | 1995
- 595
-
Chemical Free Wafer Bonding of Silicon to Glass and SapphireFarrens, S. / Smith, J. / Electrochemical Society et al. | 1995
- 596
-
Reduction of Flow Pattern Defect Density in the Wafer Bonding ProcessAbe, T. / Electrochemical Society et al. | 1995
- 597
-
Process Design of Low Temperature Wafer BondingTong, Q.-Y. / Gosele, U. / Electrochemical Society et al. | 1995
- 599
-
Probing the Interface of Bonded Silicon Wafers with Infrared SpectroscopyChabal, Y. J. / Feijoo, D. / Christman, S. B. / Goodwin, C. A. / Electrochemical Society et al. | 1995
- 600
-
Boron Present in the Interface of Bonded SOI Wafers and Its Protection MethodMitani, K. / Katayama, M. / Nakazawa, K. / Electrochemical Society et al. | 1995
- 601
-
Mechanical Considerations for Direct Wafer BondingBower, R. W. / Sundararaman, R. / Chan, W. / Watt, V. H. C. / Electrochemical Society et al. | 1995
- 602
-
Effects of Different Prebonding Cleaning Procedures on the Buried Oxide in Bond and Etchback Silicon on Insulator MaterialsEricsson, P. / Bengtsson, S. / Electrochemical Society et al. | 1995
- 604
-
The Influence of Surface Micro-Roughness on BondabilityBergh, M. / Bengtsson, S. / Andersson, M. O. / Electrochemical Society et al. | 1995
- 606
-
Monolithically Integrated Detector Arrays by Wafer BondingKing, E. E. / Holland, S. / Wang, J. J. / Beuville, E. / Electrochemical Society et al. | 1995
- 608
-
Silicon Wafer Bonding Via Designed MonolayersSteinkirchner, J. / Martini, T. / Gosele, U. / Electrochemical Society et al. | 1995
- 610
-
What Determines the Bonding Speed in Silicon Wafer Bonding?Martini, T. / Schmidt, E. / Mack, S. / Stenzel, H. / Electrochemical Society et al. | 1995
- 612
-
Thermally Induced Bend Change of Anodically Bonded Silicon and Pyrex WafersHarz, M. / Bruckner, W. / Electrochemical Society et al. | 1995
- 614
-
Thick Wafer BondingTong, Q.-Y. / Gosele, U. / Electrochemical Society et al. | 1995
- 616
-
Modification of Silicon Surfaces with H~2SO~4:H~2O~2:HF for Wafer Bonding ApplicationsLjungberg, K. / Jansson, U. / Bengtsson, S. / Soderbarg, A. / Electrochemical Society et al. | 1995
- 618
-
Technical Challenges of Precision Production Wafer Bonding in Controlled EnvironmentsReyerse, C. C. A. / Electrochemical Society et al. | 1995
- 619
-
A van der Waals Force Model of Bonded SubstratesFarrens, S. / Dekker, J. / Electrochemical Society et al. | 1995
- 621
-
An AFM Study on the Roughness of Silicon Wafers Correlated with Direct Wafer BondingRoberds, B. / Farrens, S. / Electrochemical Society et al. | 1995
- 623
-
Buried Metallic Layers with Silicon Direct BondingGoh, W. L. / Campbell, D. L. / Armstrong, B. M. / Gamble, H. S. / Electrochemical Society et al. | 1995
- 625
-
Misorientation-Induced Defects at Bonded Si-Si Wafer Interfaces: Structural and Electrical InvestigationsLaporte, A. / Sarrabayrouse, G. / Benamara, M. / Claverie, A. / Electrochemical Society et al. | 1995
- 627
-
A Thin SOI Process Using a Bonding and Etchback Method Without Epitaxial GrowthUnno, H. / Imai, K. / Electrochemical Society et al. | 1995
- 629
-
Characterization of PN Junction Leakage Current in Bonded SOI WafersHasegawa, H. / Murakami, Y. / Kawai, Y. / Morita, E. / Electrochemical Society et al. | 1995
- 631
-
SOI Wafers for Crystalline SiC and GaN GrowthGuarin, F. / Iyer, S. S. / Yang, Z. / Wang, W. / Electrochemical Society et al. | 1995
- 633
-
Direct Bonding of LPCVD Silicon Oxide Thin Films Deposited from N~2O and SiH~4Watt, V. H. C. / Bower, R. / Sundararaman, R. / Chan, W. / Electrochemical Society et al. | 1995
- 634
-
Precision Pressure Sensors with Anodically Bonded Backing PlatesHorning, R. / Glenn, M. / Yeh, T. / Electrochemical Society et al. | 1995
- 635
-
Analysis of Process-Induced Stresses in Lateral Trench Isolation Structures for High Voltage Devices in Bonded SOI WafersBaumgart, H. / Letavic, T. J. / De Wolf, I. / Maes, H. E. / Electrochemical Society et al. | 1995
- 637
-
Low Temperature Adhesion Bonding MethodsBooth, D. / Hunt, C. E. / Brown, W. E. / Stover, R. J. / Electrochemical Society et al. | 1995
- 638
-
A Commodity Analogue Process Based on Bonded WaferMcStay, K. / Smoot, F. / Hariton, D. / Egan, K. / Electrochemical Society et al. | 1995
- 639
-
"Lord Raleigh's Ghost" or a Short History of Wafer BondingGosele, U. / Electrochemical Society et al. | 1995
- 640
-
Bonding of Structured WafersBaumann, H. / Mack, S. / Munzel, H. / Electrochemical Society et al. | 1995
- 642
-
Sacrificial Wafer Bonding: An Addition to the Micromachining TechniquesSpiering, V. L. / Berenschot, J. W. / Elwenspoek, M. / Fluitman, J. M. J. / Electrochemical Society et al. | 1995
- 644
-
The Application of Silicon Wafer Bonding to Micromachined DevicesSchmidt, M. A. / Electrochemical Society et al. | 1995
- 645
-
Fabrication of a High-Sensitivity Pressure Sensor with Nitride Membranes and Single Crystal Piezoresistors Using Wafer Bond and EtchbackDesmond, C. / Mlcak, R. / Franz, D. / Electrochemical Society et al. | 1995
- 647
-
Selective Au-Si Eutectic Bonding for Si-Based MEMS ApplicationsLee, A. P. / Lehew, S. / Yu, C. / Ciarlo, D. R. / Electrochemical Society et al. | 1995
- 649
-
An Investigation of Corner Rounding to Strengthen Silicon Micromachining Pressure Sensor for Fusion Bonded WafersChan, W. / Sooriakumar, K. / Bartholomew, K. / Savage, T. S. / Electrochemical Society et al. | 1995
- 651
-
Direct Bonding of InP to Different Materials for Optical DevicesWada, H. / Kamijoh, T. / Electrochemical Society et al. | 1995
- 653
-
Bonding of InP to GaAs Substrate by Wafer Fusing and Its Applications to Long Wavelength DetectorsTan, I.-H. / Murtaza, S. S. / Bowers, J. E. / Hu, E. L. / Electrochemical Society et al. | 1995
- 655
-
Direct Wafer Bonding Technique of Ferroelectric Single CrystalsTomita, Y. / Sugimoto, M. / Eda, K. / Electrochemical Society et al. | 1995
- 657
-
Application of Direct Bonding to the Fabrication of Si/ZnS Composite Infrared WindowsFeng, T. / Tong, Q.-Y. / Askinazi, J. / Gosele, U. M. / Electrochemical Society et al. | 1995
- 659
-
Anodic Wafer BondingObermeier, E. / Electrochemical Society et al. | 1995
- 661
-
Characterization of the Direct Bonding of Silicon Wafers after Treatment in Dilute HF SolutionsOkada, C. / Kawai, Y. / Morita, E. / Saitou, Y. / Electrochemical Society et al. | 1995
- 665
-
Interface Strength Characterization of Bonded WafersPetzold, M. / Busch, M. / Abe, T. / Reiche, M. / Electrochemical Society et al. | 1995
- 667
-
Surface Morphology and Electroluminescence of Porous Silicon Layer Prepared on P-Type Silicon with Electrochemical Etching in HF Aqueous SolutionsShigyou, K. / Seo, M. / Azumi, K. / Takahashi, H. / Electrochemical Society et al. | 1995
- 669
-
Photoluminescence Studies of Thermally Impurity Diffused Porous Silicon LayersSundaram, K. B. / Ali, S. A. / Peale, R. E. / McClintic, W. A. / Electrochemical Society et al. | 1995
- 671
-
Luminescence from Silicon Nanostructures Fabricated by Conventional Lithographic and Reactive Ion Etching TechniquesNassiopoulos, A. G. / Grigoropoulos, S. / Gogolides, E. / Papadimitriou, D. / Electrochemical Society et al. | 1995
- 673
-
Porous Gallium Phosphide Photoelectrodes with Near-Unity Quantum Yield for Light Absorbed in the Indirect Optical TransitionErne, B. H. / Vanmaekelbergh, D. / Kelly, J. J. / Electrochemical Society et al. | 1995
- 674
-
Optoelectrochemistry and Nanocrystalline Semiconductor ElectrodesFitzmaurice, D. / Enright, B. / Electrochemical Society et al. | 1995
- 675
-
Charge Transport Nanoporous-Nanocrystalline TiO~2 Film ElectrodesLindquist, S.-E. / Electrochemical Society et al. | 1995
- 676
-
Photoinduced Charge Transfer Reactions at Nanocrystalline TiO~2 FilmsAugustynski, J. / Carroy, A. / Wahl, A. / Electrochemical Society et al. | 1995
- 678
-
Photoresponse and Stability of Pyrolytically Prepared n-TiO~2 SemiconductorKhan, S. U. M. / Akikusa, J. / Electrochemical Society et al. | 1995
- 680
-
Investigation of Nanocrystalline TiO/Ti Electrodes by Means of Impedance SpectroscopyKedzierzawski, P. / Dolata, M. / Augustynski, J. / Electrochemical Society et al. | 1995
- 682
-
Surface Modification of Nanocrystalline TiO~2 Electrodes: Applications in Electrochromic Devices and PhotoelectrocatalysisHagfeldt, A. / Walder, L. / Graetzel, M. / Electrochemical Society et al. | 1995
- 683
-
Electron Injection Rates in Sensitized Nanostructured TiO~2 Photovoltaic CellsHeimer, T. / Meyer, G. J. / Electrochemical Society et al. | 1995
- 684
-
A Novel Dye Sensitized TiO~2 Photovoltaic Cell Using Polymer Gel ElectrolyteCao, F. / Searson, P. C. / Electrochemical Society et al. | 1995
- 686
-
Intensity Modulated Photocurrent Spectroscopy on Nanostructured TiO~2 Solar CellsOskam, G. / Cao, F. / Searson, P. C. / Electrochemical Society et al. | 1995
- 687
-
Efficient Ruthenium Diimine Modified Nanocrystalline TiO~2 PhotoanodesMeyer, G. J. / Heimer, T. / Electrochemical Society et al. | 1995
- 688
-
Nanocrystalline SnO~2 Films Modified with Thiazine and Oxazine Dye AggregatesKamat, P. V. / Liu, D. / Electrochemical Society et al. | 1995
- 689
-
Relative Roles of Surface Area and Crystallite Size in Photocatalytic Ability of TiO~2Kelly, S. / Tomkiewicz, M. / Shen, W. M. / Electrochemical Society et al. | 1995
- 690
-
Li Insertion into Spin Coated V~2O~5 Xerogel Thin FilmsReynard, M. / Le, D. B. / Passerini, S. / Smyrl, W. H. / Electrochemical Society et al. | 1995
- 691
-
Charge Injection into Small Semiconductor ParticlesMeisel, D. / Lawless, D. / Luangdilok, C. / Cook, A. R. / Electrochemical Society et al. | 1995
- 693
-
Overlayer Formation in the n-CdSe/[Fe(CN)~6]^4^-^/^3^- Photoelectrochemical SystemDe Tacconi, N. R. / Rajeshwar, K. / Myung, N. / Electrochemical Society et al. | 1995
- 695
-
High Efficiency Photo-Hole Injection from Cyanine Dyes into CoSCNi: Prospective p-Type Material for a Dye-Sensitized p-n HeterojunctionO'Regan, B. / Schwartz, D. T. / Electrochemical Society et al. | 1995
- 696
-
Preparation of Nanocomposites by Latex-Colloid InteractionOriakhi, C. / Lerner, M. / Electrochemical Society et al. | 1995
- 698
-
Nanocomposition of PPV and Poly(p-phenoxyphenylene Sulfide)Oriakhi, C. / Lerner, M. / Electrochemical Society et al. | 1995
- 700
-
Electrodeposition of Cu-Ni MultilayersMoffat, T. P. / Electrochemical Society et al. | 1995
- 701
-
Processing and Properties of Electrodeposited Cu-Co Multilayered NanowiresNagodawithana, K. / Searson, P. C. / Liu, K. / Chien, C. L. / Electrochemical Society et al. | 1995
- 703
-
Processing and Mechanical Behavior of Electrodeposited Ni-Al~2O~3 Nanocomposite Thin FilmsCammarata, R. R. / Oberle, R. R. / Scanlon, M. R. / Searson, P. C. / Electrochemical Society et al. | 1995
- 704
-
Electrochemical Fabrication of Metal and Semiconductor NanowiresMoskovits, M. / Al Mawlawi, D. / Douketis, C. / Bigioni, T. / Electrochemical Society et al. | 1995
- 706
-
Transport Applications of SOFCsYamazaki, Y. / Yamada, K. / Mizusaki, J. / Yokokawa, H. / Electrochemical Society et al. | 1995
- 707
-
Oxygen Reduction at the Interface LaMnO~3/YSZ Prepared by Vapor Phase ProcessesTakehara, Z. / Ioroi, T. / Uchimoto, Y. / Ogumi, Z. / Electrochemical Society et al. | 1995
- 709
-
In Situ Oxidation of Nickel and Cobalt in Molten Li + K and Na + K Carbonate EutecticTomczyk, P. / Sato, H. / Yamada, K. / Nishimi, T. / Electrochemical Society et al. | 1995
- 711
-
Influence of CO~2 on Oxygen Reduction in Molten Li + Na Carbonate EutecticTomczyk, P. / Electrochemical Society et al. | 1995
- 713
-
The Fundamentals of Fuel Cell ModelingStandaert, F. / Hemmes, K. / Woudstra, N. / Electrochemical Society et al. | 1995
- 714
-
Microelectrode Investigation of the Oxygen Permeation in Different Proton Exchange MembranesBuchi, F. N. / Wakizoe, M. / Srinivasan, S. / Electrochemical Society et al. | 1995
- 716
-
Solid-State NMR Characterization of H~3PO~4-Doped Polybenzimidazole Polymer Electrolyte Fuel Cell MembranesWasmus, S. / Savinell, R. F. / Moaddel, H. / Litt, M. H. / Electrochemical Society et al. | 1995
- 719
-
Membrane Development for PEFC at PSIRota, M. / Brack, H. P. / Buchi, F. N. / Scherer, G. G. / Electrochemical Society et al. | 1995
- 720
-
Effect of Ethylene Carbonate on the Electrochemical Properties of Lithium Salt-Poly(Ethylene Oxide) Polymer ElectrolyteDo, J.-S. / Chang, C.-P. / Lee, T.-J. / Electrochemical Society et al. | 1995
- 722
-
Direct Electro-Oxidation of Dimethoxymethane, Trimethoxymethane, and Trioxane and Their Application in Fuel CellsNarayanan, S. R. / Vamos, E. / Surampudi, S. / Frank, H. / Electrochemical Society et al. | 1995
- 724
-
New Results on the Electrocatalytic Oxidation of Small Organic Molecules on Dispersed Platinum-Modified ElectrodesLeger, J.-M. / Napporn, T. / Laborde, H. / Lamy, C. / Electrochemical Society et al. | 1995
- 725
-
Electro-oxidation of H~2, CO, and H~2/CO Mixtures on Well-Characterized Pt-Ru and Pt-Sn Rotating Disk Electrodes at 62CGasteiger, H. A. / Markovic, N. M. / Ross, P. N. / Electrochemical Society et al. | 1995
- 727
-
CO and Methanol Oxidation on Smooth and High Area Pt, Pt-Ru, Pt-Sn ElectrodesMorimoto, Y. / Yeager, E. B. / Electrochemical Society et al. | 1995
- 729
-
Ligand or Bifunctional Effect? Ru as a Promotor for the Electro-oxidation of Small Organic Molecules over PtFrelink, T. / Cox, A. P. / Visscher, W. / Van Veen, J. A. R. / Electrochemical Society et al. | 1995
- 731
-
Macrocyclic Redox Promoters for Direct Methanol Fuel Cells. Part ISarangapani, S. / Electrochemical Society et al. | 1995
- 733
-
Macrocyclic Redox Promoters for Direct Methanol Fuel Cells. Part IISarangapani, S. / Morriseau, B. / Electrochemical Society et al. | 1995
- 735
-
Direct Methanol Fuel Cells with Polymeric Membrane ElectrolytesWilson, M. / Bett, J. A. S. / Ren, X. / Uribe, F. / Electrochemical Society et al. | 1995
- 736
-
DMFC Stack Test ResultsMaricle, D. L. / Murach, B. L. / Electrochemical Society et al. | 1995
- 738
-
Comparison of Electrolyte Materials for Use in Direct Methanol Oxidation Fuel CellsKosek, J. A. / Cropley, C. C. / Wilson, G. / LaConti, A. B. / Electrochemical Society et al. | 1995
- 740
-
Methanol Oxidation on High Surface Area Pt-Ru CatalystsWilson, M. / Uribe, F. / Gottesfeld, S. / Bett, J. / Electrochemical Society et al. | 1995
- 742
-
In Situ X-Ray Absorption Spectroscopy of Methanol Oxidation on Carbon-Supported Pt/Ru ClustersSwider, K. E. / Pandya, K. I. / Kowalak, A. D. / Hagans, P. L. / Electrochemical Society et al. | 1995
- 743
-
XAS Studies of Modified Pt Electrocatalysts for Methanol OxidationMcBreen, J. / Mukerjee, S. / Electrochemical Society et al. | 1995
- 744
-
Pt/Ru Alloys, Electrocatalytic Activity, and X-Ray Absorption Spectroscopic Structure StudiesO'Grady, W. E. / Swider, K. E. / Pandya, K. I. / Kowalak, A. D. / Electrochemical Society et al. | 1995
- 748
-
Multipurpose Electrochemical Mass Spectrometry: A Powerful Method for the Study of Fuel Cell ReactionsWasmus, S. / Savinell, R. F. / Electrochemical Society et al. | 1995
- 750
-
Physicochemical Investigations of CO and Ch~3OH Oxidations on Various Platinum Ruthenium ElectrodesKabbabi, A. / Durand, R. / Faure, R. / Leger, J. M. / Electrochemical Society et al. | 1995
- 753
-
Oxidation of Methanol on Platinum Without Interference by Chemisorbed COWieckowski, A. / Chrzanowski, W. / Herrero, E. / Electrochemical Society et al. | 1995
- 755
-
Quartz Crystal Microbalance Studies of Methanol Oxidation at PlatinumCheek, G. T. / O'Grady, W. E. / Electrochemical Society et al. | 1995
- 756
-
The Importance of Surface Heterogeneity in Electrocatalytic SystemsBurke, L. D. / Electrochemical Society et al. | 1995
- 758
-
Microwave Subsystems Developed Through the Consortium for Superconducting ElectronicsRalston, R. W. / Electrochemical Society et al. | 1995
- 760
-
High Temperature Superconducting Microwave Filters and AntennasNagai, Y. / Suzuki, N. / Electrochemical Society et al. | 1995
- 762
-
HTS Coils for Magnetic-Resonance InstrumentsWithers, R. S. / Kotsubo, V. / Brey, W. / Wong, W.-H. / Electrochemical Society et al. | 1995
- 764
-
Tuneable Microwave Resonators Based on Sputtered Tl-Ba-Ca-Cu-O and Ba-Sr-Ti-O Thin FilmsHermann, A. M. / Naziripour, A. / Mueller, C. / Electrochemical Society et al. | 1995
- 765
-
Recent Progress in Low-T~c Circuit Fabrication Technology and Future ProspectsBhushan, M. / Electrochemical Society et al. | 1995
- 766
-
SQUIDs for MagnetometryKetchen, M. B. / Kirtley, J. R. / Electrochemical Society et al. | 1995
- 768
-
New Ultrafast Superconductor Digital ElectronicsLikharev, K. K. / Electrochemical Society et al. | 1995
- 769
-
Space Qualified Hybrid Superconductor/Semiconductor Planar Oscillator CircuitMiranda, F. A. / Chorey, C. M. / Bhasin, K. B. / Electrochemical Society et al. | 1995
- 771
-
The High Temperature Superconductivity Space Experiment: A Status ReportNisenoff, M. / Gubser, G. U. / Wolf, S. A. / Ritter, R. C. / Electrochemical Society et al. | 1995
- 772
-
System for Measurements of the Current-Phase Relation in Superconducting Weak LinksUchaikin, S. / Electrochemical Society et al. | 1995
- 773
-
High-T~c Superconductors in Joint Microwave, Radiowave, and DC Magnetic FieldsCherpak, N. T. / Izhyk, E. V. / Kirichenko, A. Y. / Velichko, A. V. / Electrochemical Society et al. | 1995
- 774
-
Fabrication of Bulk Hg-1201 Superconductor Using a Simple Method under Atmospheric PressureFung, P. C. W. / Chow, J. C. L. / Du, Z. L. / Electrochemical Society et al. | 1995
- 775
-
The Effects of Low-Energy Blanket Ion Milling on the Properties of YBCO Superconducting FilmsScott, S. S. / Ang, S. S. / Brown, W. D. / Electrochemical Society et al. | 1995
- 776
-
Ion Beam Assisted Sputter Deposition of CeO~2 Buffer Layers for Superconducting Multichip Module (MCM) ApplicationsFlorence, G. / Ang, S. / Brown, W. D. / Electrochemical Society et al. | 1995
- 777
-
Epitaxial Growth of YBCO Films on Sr(Al~0~.~5Ta~0~.~5)O~3 Buffered MgO SubstratesChen, K. Y. / Afonso, S. / Wang, R. C. / Tang, Y. Q. / Electrochemical Society et al. | 1995
- 780
-
Anomalous Hall Effect in an YBa~2Cu~3O~7/PrBa~2Cu~3O~7 Multilayer in the Mixed StateQiu, X. G. / Moshcalkov, V. V. / Bruynseraede, Y. / Jakob, G. / Electrochemical Society et al. | 1995
- 782
-
Evidence of Weak Superconductivity in Carbon Arc FilmsLebedev, S. G. / Topalov, S. V. / Electrochemical Society et al. | 1995
- 784
-
New Registration Principle at the Low-Power Electromagnetic Waves by Superconducting Film in Nonequilibrium StateChurilov, G. E. / Agafonov, A. B. / Dikin, D. A. / Dmitriev, V. M. / Electrochemical Society et al. | 1995
- 785
-
Measurement of the Lifetime of the Josephson Transition in the Metastable State by Use of Ultrasonic AmplificationUrushadze, G. I. / Electrochemical Society et al. | 1995
- 786
-
Dissipation Behavior and Critical Currents under the Strong Electrostatic Field in the BiPbSrCaCuO Thin FilmGomeniuk, Y. V. / Lysenko, V. S. / Lozovski, V. Z. / Tyagulski, I. P. / Electrochemical Society et al. | 1995
- 787
-
Properties of the Superconducting Yttrium Ceramics with Different Amounts of TinGumbatov, S. G. / Pashaev, K. M. / Panakh-zade, S. A. / Electrochemical Society et al. | 1995
- 788
-
Growth and Characterization of Bi-Sr-Ca-Cu-O WhiskersThamizhavel, A. / Jayavel, R. / Murugakoothan, P. / Subramanian, C. / Electrochemical Society et al. | 1995
- 789
-
ARPA Program on CryoelectronicsPatten, F. W. / Electrochemical Society et al. | 1995
- 790
-
Status and Trends in the Cryogenic Operation of SiGe Bipolar TechnologyCressler, J. D. / Electrochemical Society et al. | 1995
- 792
-
Low-Temperature Simulation of SiGe HBTs Using SCORPIORichey, D. M. / Cressler, J. D. / Jaeger, R. C. / Electrochemical Society et al. | 1995
- 794
-
Operation of SiGe BiCMOS Technology at Cryogenic TemperaturesBradford, G. D. / Cressler, J. D. / Harame, D. L. / Electrochemical Society et al. | 1995
- 796
-
On Temperature Dependence of Bandgap Narrowing in Heavily Doped p-Type Si~1~-~xGe~x Strained LayersSokolic, S. / Amon, S. / Electrochemical Society et al. | 1995
- 798
-
Temperature Dependence of Early Voltage and Current Gain-Early Voltage Product in SiGe HBTsJoseph, A. J. / Cressler, J. D. / Richey, D. M. / Harame, D. L. / Electrochemical Society et al. | 1995
- 800
-
The Effects of Ionizing Radiation on SiGe HBTs Operated at 77 KBabcock, J. A. / Cressler, J. D. / Clark, S. D. / Bhamidipati, L. S. / Electrochemical Society et al. | 1995
- 802
-
The Cryogenic Operation of Deep Submicron MOSFETsBalestra, F. / Electrochemical Society et al. | 1995
- 804
-
Substrate Current Characteristics of Partially Depleted SOI n-MOSFETs from Room Temperature down to Liquid Helium TemperaturesClaeys, C. / Simoen, E. / Electrochemical Society et al. | 1995
- 806
-
Temperature Dependence of Gate-Induced-Drain-Leakage Current in Thin-Film SOI MOSFETsJomaah, J. / Ghibaudo, G. / Balestra, F. / Electrochemical Society et al. | 1995
- 808
-
Theoretical and Experimental Study of the Front and Back Interface Trap Density in Accumulation-Mode SOI MOSFETs at Low TemperaturesClaeys, C. / Simoen, E. / Martino, J. A. / Electrochemical Society et al. | 1995
- 810
-
Modeling Incomplete Ionization of Impurities at Low Temperatures with Generaljoint Purpose Device SimulatorsSokolic, S. / Amon, S. / Electrochemical Society et al. | 1995
- 812
-
Combined DL and Series Resistance Extraction of LDD MOSFETs at 77 KClaeys, C. / Schreutelkamp, R. / Martino, J. A. / Simoen, E. / Electrochemical Society et al. | 1995
- 814
-
Low Temperature Characteristics of Gated LPNP TransistorsDeen, J. / Yan, Z. / Electrochemical Society et al. | 1995
- 816
-
Electrothermal Coupling in CMOS Devices at Cryogenic TemperaturesGutierrez-D, E. A. / Electrochemical Society et al. | 1995
- 818
-
Achieving Very Low LF Noise in Depletion-Mode MOSFETMartin, P. / Yon, J. J. / Electrochemical Society et al. | 1995
- 820
-
A Study of Low-Noise Cryo-CMOS OpAmps on Standard Bulk Material down to 4 KSchwehr, S. / Langheinrich, W. / Electrochemical Society et al. | 1995
- 822
-
Low Temperature Performance of High Speed Neural Network CircuitsDaud, T. / Duong, T. / Tran, M. / Thakoor, A. / Electrochemical Society et al. | 1995
- 826
-
Cryogenic Readout Electronics for the Infrared Space ObservatoryWolf, J. / Grozinger, U. / Lemke, D. / Electrochemical Society et al. | 1995
- 828
-
Cryogenic CMOS Circuits for Infrared Detector ReadoutsVural, K. / Kozlowski, L. J. / Electrochemical Society et al. | 1995
- 830
-
Charge Transfer Efficiency in CCDsMurowinski, R. / Deen, M. J. / Electrochemical Society et al. | 1995
- 831
-
Recent Advances in CCDsBlouke, M. M. / Electrochemical Society et al. | 1995
- 832
-
Ion Implanted Silicon Bolometers Operating in the Temperature Range 0.1 to 4.2 KPignatel, G. U. / Zen, M. / Electrochemical Society et al. | 1995
- 834
-
Monolithic GaAs Preamplifiers for Cryogenic Particle DetectorsCamin, D. V. / Fedyakin, N. / Pessina, G. / Previtali, E. / Electrochemical Society et al. | 1995
- 835
-
Low Noise Monolithic Si JFETs for Operation in the 90-300 K Range and in High Radiation EnvironmentsRadeka, V. / Citterio, M. / Reseia, S. / Manfredi, P. F. / Electrochemical Society et al. | 1995
- 837
-
Fabrication and Characterization of Low-Noise Cryogenic Si JFETsGoldberg, R. T. / Jhabvala, M. D. / Kirschman, R. K. / Wang, S. / Electrochemical Society et al. | 1995
- 839
-
X-Ray Photoelectron Spectroscopy of Cr/COOHCH~3 Interfaces on Self-Assembled Monolayers of MercaptohexadecanoateCzanderna, A. W. / Jung, D. R. / Electrochemical Society et al. | 1995