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Correction of chromatic and spherical aberration using a Wien filter (English)
- New search for: Steffen, T.
- New search for: Tiemeijer, P. C.
- New search for: Krijn, M. P. C. M.
- New search for: Mentink, S. A. M.
- New search for: Czechoslovak Society for Electron Microscopy
- New search for: Steffen, T.
- New search for: Tiemeijer, P. C.
- New search for: Krijn, M. P. C. M.
- New search for: Mentink, S. A. M.
- New search for: Czechoslovak Society for Electron Microscopy
In:
European congress on electron microscopy
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I151-I152
;
2000
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ISBN:
- Conference paper / Print
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Title:Correction of chromatic and spherical aberration using a Wien filter
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Contributors:Steffen, T. ( author ) / Tiemeijer, P. C. ( author ) / Krijn, M. P. C. M. ( author ) / Mentink, S. A. M. ( author ) / Czechoslovak Society for Electron Microscopy
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Conference:12th, European congress on electron microscopy ; 2000 ; Brno, Czech Republic
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Published in:European congress on electron microscopy ; I151-I152PROCEEDINGS OF THE EUROPEAN CONGRESS ON ELECTRON MICRISCOPY ; 3 ; I151-I152
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Publisher:
- New search for: Czechoslovak Society for Electron Microscopy
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Publication date:2000-01-01
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Size:I151-I152
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Remarks:Also known as EUREM 2000
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ISBN:
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Type of media:Conference paper
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Type of material:Print
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Language:English
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Keywords:
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Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents conference proceedings
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1437
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SEM resolution improvement at low voltage with gun monochromatorBarth, J. E. / Nykerk, M. D. / Mook, H. W. / Kruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1439
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Construction and characterisation of a TEM specimen holder for in situ application of magnetic in-plane fieldsUhlig, T. / Heumann, M. / Schneider, M. / Hoffmann, H. / Zweck, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1441
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On the enhancement factors for electron field emittersEdgcombe, C. / Valdre, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1443
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Investigation of an EuS-coated cooled field emitter for application in state on the art electron microscopesWittel, H. / Schafer, A. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1445
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Test specimens for SEMMatejka, F. / Ryzi, Z. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1447
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Field emission SEM with a newly developed FEGUN and a conical strongly excited objective lensKazumori, H. / Yamada, A. / Mita, M. / Nokuo, T. / Saito, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1451
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On actual questions in filtering and inelastic interactionsJouffrey, B. / Schattschneider, P. / Hebert, C. / Nelhiebel, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1455
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Performance of detector elements for electron microscopesSchauer, P. / Autrata, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1459
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Design of a monochromator for electron sourcesKahl, F. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1461
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First development step and test of the SESAM/SATEMKujawa, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1463
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Software for the analysis and design of imaging energy filters with homogeneous and inhomogeneous bending magnetsMunro, E. / Rouse, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1465
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Performance data of a new 2048 x 2048 pixel slow-scan CCD camera for TEMHiller, S. A. / Kabius, B. / Probst, W. / Troster, H. / Trendelenburg, M. / Crucifix, C. / Trondle, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1467
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Geometric distortion correction for imaging plates using reflected light signal improves gain normalization and DQEBele, P. / Ochs, R. / Schroder, R. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1469
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Cryodetectors for high resolution X-Ray spectroscopyHohne, J. / Buhler, M. / Hertrich, T. / Hess, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1471
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Scanning electron microscopy of semiconductor multilayers using a converter of backscattered electrons into secondary electronsAscarelli, P. / Capelli, E. / Corticelli, F. / Franchi, S. / Merli, P. G. / Migliori, A. / Morandi, V. / Rossi, C. / Salvatori, S. / Valdre, A. et al. | 2000
- 1473
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Simulation of electron trajectories in the 3D field of two coupled hemispherical electrostatic deflectorsHuber, A. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1475
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New possibilities of SEBIV mode in SEMDegel, B. / Kienle, M. / Plies, E. / Rau, E. I. / Zhu, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1477
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Detection of the angular distribution of the signal electrons in VLESEMHoracek, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1479
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Direct electron exposed silicon detectors in EELSOrsholm, C. / Scillag, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1481
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Auger microscopy with a parallel acquisition spectrometerJacka, M. / Kale, A. / Tyndall, M. / Prutton, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1483
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Elemental mapping using omega filter and imaging plateShindo, D. / Ikematsu, Y. / Lee, C.-W. / Murakami, Y. / Sugiyama, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1485
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New frame-transfer wide-angle slow-scan CCD camera allows recording of distortion-free images for digital montagesHiller, S. A. / Probst, W. / Seybold, V. / Zellmann, E. / Kabius, B. / Trondle, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1487
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Combined TEM and CL of self-assembled CdSe quantum dotsPreis, H. / Muller, P. / Fuchs, K. / Kaiser, S. / Gebhardt, W. / Zweck, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1491
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Recent achievements in multi-keV X-ray microscopySusini, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1495
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Amplitude and phase contrast soft X-ray cryo-microscopy of biological samplesSchneider, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1499
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New aspects of coherent hard X-ray imagingCloetens, P. / Ludwig, W. / Guigay, J. P. / Schlenker, M. / Baruchel, J. / Van Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1503
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Synchrotron radiation scanning photoemission microscopy: advances and applicationsBarinov, A. / Casalis, L. / Gregoratti, L. / Gunther, S. / Marsi, M. / Kiskinova, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1507
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Quantitative, chemical state mapping of wood composites via scanning X-ray microscopyBuckley, C. / Phanopoulos, C. / Khaleque, N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1509
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Applications of high resolution microcalorimeter type X-Ray spectrometers in material analysisHohne, J. / Buhler, M. / Hertrich, T. / Hess, U. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1511
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One plasma focus device as possible soft X-ray source for microscopyAntanasijevic, R. / Joksimovic, D. / Vukovic, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1515
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Environmental scanning electron Microscopy - taking SEM into the futureDonald, A. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1519
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Imaging of electronic structure: achievements, competition and challengesHowie, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1523
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Biomedical EM under change: recent developments and trendsMaunsbach, A. B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- 1527
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EMS in the European frameworkCarrascosa, J. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I1
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On the development of electron microscopes in BrnoDelong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I7
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Electron microscopy at the milleniuHawkes, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I13
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Prospects of quantitative high resolution electron microscopyVan Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I19
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High-performance electron microscopes of the futureRose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I25
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Structural, magnetic and chemical surface electron microscopy with slow electronsBauer, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I33
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Membrane protein structure and dynamics observed at high resolution by electron and atomic force crystallographyEngel, A. / Heymann, B. J. / Muller, D. J. / Stahlberg, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I35
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Nanoscale Analysis by Energy Filtering TEMMayer, J. / Plitzko, J. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I43
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New experiments in charged particle interferometry and quantum statisticsHasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I47
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Off-axis electron holography - the way to useLichte, H. / Lehmann, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I49
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Electrons as waves - and what will come next?Tyc, T. / Lenc, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I51
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An electron antibunching experimentKiesel, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I53
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Time-resolved observation in transmission electron microscopy using electron correlation measurementOsakabe, N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I55
-
Partial coherence and HREM image simulationMuller, H. / Schorsch, P. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I57
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Assessment of the experimental constraints for phase contrast EM and complex object reconstructionMajorovits, E. / Nagayama, K. / Schroder, R. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I59
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Correction of the Fresnel diffraction caused by the biprism filament in phase-shifting electron holographyYamamoto, K. / Tanji, T. / Hirayama, T. / Hibino, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I61
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Complex electron microscopyNagayama, K. / Danev, R. / Okawara, H. / Murata, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I63
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Off-axis electron holography of focused ion beam milled transistorsDunin-Borkowski, R. E. / Newcomb, S. B. / Doyle, D. / Deignan, A. / McCartney, M. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I65
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Miniaturized biprism interferometer for wide separation of the coherent beamsProchel, H. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I67
-
Holographic studies of thin manganite filmsLehmann, M. / Walter, T. / Dorr, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I69
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Inelastic electron holographyLichte, H. / Freitag, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I71
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Comparison of accuracy of electron holography and EELS on thickness measurement of amorphous SiO~2Lee, C.-W. / Ikematsu, Y. / Shindo, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I73
-
Two-dimensional mapping of electrostatic potential in a SiC MESFET using electron holographyTwitchett, A. C. / Lloyd, S. J. / Lehmann, M. / Midgley, P. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I77
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Recent trends in electron opticsMunro, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I81
-
SMART electron opticsPreikszas, D. / Hartel, P. / Spehr, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I85
-
Design and manufacturing of magnetic electron optical systems with midsection symmetrySpehr, R. / Hartel, P. / Muller, H. / Preikszas, D. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I87
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Computations of Wien filter properties and aberrationsLencova, B. / Vlcek, I. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I89
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High resolution imaging near zero CsChang, L. Y. / Chen, F. R. / Kai, J. J. / Kirkland, A. I. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I91
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Electron holography in the diffraction planeZhou, F. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I93
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An active vibration damping systemBeierlein, R. / Hasselbach, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I95
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Quadrupole projector system with variable magnification for energy filtering transmission electron microscopesGerheim, V. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I97
-
Outline of a variable-axis lens with arbitrary shift of the axis in one directionSchmid, P. / Janzen, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I99
-
Electron ray-tracing for numerical determination of aberrationsMynar, M. / Vasina, R. / Kolarik, R. / Lencova, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I101
-
New CAD program for the design in electron opticsLencova, B. / Zlamal, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I103
-
Perturbation methods in charged particle opticsRadlicka, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I107
-
Advances in atomic structure determination using the focal-series reconstruction techniqueThust, A. / Jia, C. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I111
-
Progress in structure analysis of crystal defects by quantitative HRTEMSchweinfest, R. / Ernst, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I115
-
Image formation using incoherent scattering in a CTEMAnstis, G. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I117
-
Extension of HRTEM resolution using Gerchberg-Saxton algorithm: application to grain boundary and interfaceChen, F.-R. / Kai, J. J. / Chang, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I119
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Effect of the objective lens on the measurement of rapidly varying displacement fields from HRTEM imagesHytch, M. / Plamann, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I121
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The effect of strain on chemically sensitive imaging with the (002) reflection in sphalerite type crystalsRosenauer, A. / Van Dyck, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I123
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Parallel realization of the simulated annealing algorithm and its applications to quantitative electron microscopyLi, S.-Y. / Wu, M.-Y. / Zhu, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I125
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Quantitative measurement of intensity profiles of equal thickness fringes of Si and MgO crystals and estimation of crystal potentialNishio, K. / Isshiki, T. / Okunishi, E. / Oikawa, T. / Kawasaki, M. / Endoh, H. / Shiojiri, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I127
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A Fourier space approach for calculating the electron optical phase shift of superconducting fluxonsBeleggia, M. / Pozzi, G. / Tonomura, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I129
-
Design aspects for an optimum DF STEM probeVan Aert, S. / Dekker, A. J. d. / Van Dyck, D. / van den Bos, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I131
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A quantitative evaluation of different STEM imaging modesDekker, A. J. d. / Van Aert, S. / Van Dyck, D. / van den Bos, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I133
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Accurate measurements of atomic displacements in La~0~.~9Sr~0~.~1MnO~3 thin films grown on a SrTiO~3 substrateGeuens, P. / Lebedev, O. I. / Van Dyck, D. / Van Tendeloo, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I135
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Direct object data retrieval: an inversion of electron diffractionScheerschmidt, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I137
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Influence of experimental parameters on the accuracy of lattice-distortion measurements directly from high-resolution micrographsDu, K. / Jin-Phillipp, N. Y. / Phillipp, F. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I139
-
EELS thickness-measurement without spectrum acquisitionTanaka, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I141
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Contrast modulations in HRTEM images caused by crystal tiltWaitz, T. / Karnthaler, H. P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I145
-
Towards sub-Angstrom point resolution by correction of spherical aberrationHaider, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I149
-
Advances in Cs-corrected STEMKrivanek, O. L. / Dellby, N. / Lupini, A. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I151
-
Correction of chromatic and spherical aberration using a Wien filterSteffen, T. / Tiemeijer, P. C. / Krijn, M. P. C. M. / Mentink, S. A. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I153
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Performance of the mirror corrector for an ultrahigh-resolution spectromicroscopeHartel, P. / Preikszas, D. / Spehr, R. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I155
-
An electrostatic achromatHenstra, A. / Krijn, M. P. C. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I157
-
Electrostatic correction of the chromatic and spherical aberration of charged particle lensesWeissbaecker, C. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I159
-
Super resolution imaging of complex metal oxidesKirkland, A. I. / Sloan, J. / Meyer, R. / Dunin-Borkowski, R. E. / Hutchison, J. L. / Saxton, W. O. / Sayagues, M. J. / Tilley, R. J. D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I161
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Validity of spherical aberration free focus conditionEndoh, H. / Hashimoto, H. / Kumao, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I163
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The Triebenberg laboratory - designed for highest resolution electron microscopy and holographyLichte, H. / Schulze, D. / Lehmann, M. / Just, H. / Erabi, T. / Furst, P. / Gobel, J. / Hasenpusch, A. / Dietz, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I165
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A new method for the determination of the wave aberration functionMeyer, R. R. / Kirkland, A. I. / Saxton, W. O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I169
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Aspects of aberration correction in LVSEMZach, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I173
-
Scanning low and very low energy electron microscopyMullerova, I. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I177
-
New aspects in LEEM and spectroscopic emission microscopy instrumentationLilienkamp, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I181
-
X-ray photoemission and low energy electron microscopeKolarik, V. / Vasina, R. / Mynar, M. / Bejdak, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I183
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Low voltage electron microscope II. - ApplicationsCoufalova, E. / Delong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I185
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Low energy electron scattering - Monte Carlo simulationFitting, H. J. / Kuhr, J. C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I187
-
In-depth imaging in S.E.MLehuede, P. / Appriou-Marciano, J. / Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I189
-
Double scintillation detector with a conical retarding lens for SEMSlowko, W. / Drzazga, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I191
-
Quantitative topographic contrast in LV SEMSlowko, W. / Hejna, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I193
-
Energy filtering scanning transmission electron microscopy at low voltage with a `simulated' spherical deflection analyzerKramer, K. H. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I195
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Low voltage electron microscope III. - Present and future possibilitiesStepan, P. / Delong, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I197
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Low voltage electron microscope I. - DesignDelong, A. / Hladil, K. / Kolarik, V. / Pavelka, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I199
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Dimension measurement in a cathode lens equipped low-energy SEMHutar, O. / Oral, M. / Mullerova, I. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I201
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Application of low-energy backscattered electron detection in the inspection of semiconductor devices technologyHutar, O. / Oral, M. / Mullerova, I. / Romanovsky, V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I203
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Signal detection near the critical energy of non-charging illumination in a low-energy SEM equipped with a cathode lensKanova, J. / Frank, L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I207
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Charging mechanisms in S.E.M.: from the secondary yield to the contrast of images?Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I211
-
Scanning electron microscopy at low vacuum in specimen chamberAutrata, R. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I217
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Possibilities of evaluation of the influence of conditions in the specimen chamber on the quality of imaging in environmental SEMMichlek, M. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I219
-
ESEM as a routine tool for failure analysis in industryvan der Wal, D. / Baken, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I221
-
ESEM and TEM investigations on experimentally corroded synthetic zirconolite crystals and their replacing secondary phasesMalmstrom, J. / Reusser, E. / Guggenheim, R. / Duggelin, M. / Mathys, D. / Giere, R. / Lumpkin, G. R. / Blackford, M. G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I223
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Structure degradation of austenitic stainless steels as effect of corrosion fatiguePalka, K. / Surowska, B. / Weronski, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I225
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Absorbed electron imaging of non-conductive samples in low-vacuum SEMHellum, B. / Reme, P. / Hansen, L. U. / Johnsen, P. O. / Hjelen, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I227
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SEM analysis of corrosion degradation on tinplate substratesZumelzu, E. / Vera, A. / Cabezas, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I229
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Charging effects in S.E.M.: role of the working distanceGrillon, F. / Cazaux, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I231
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Studies of biological specimens by environmental scanning electron microscopyAutrata, R. / Horky, D. / Ilkovics, L. / Prochazka, V. / Skricka, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I233
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Microstructural and compositional changes at high temperature oxidation of stainless steel in steam environmentKhalid, F. A. / Hussain, N. / Qureshi, A. H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I235
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Conditions of study of electrode masses structures in environmental scanning electron microscopeDrnovsky, R. / Jirak, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I237
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An anomalous contrast effect in scanning electron microscopy of insulators: the pseudo-mirror effectBelhaj, M. / Jbara, O. / Odof, S. / Msellak, K. / Cazaux, J. / Rau, E. I. / Andrianov, M. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I239
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Spectral distribution of backscattered electrons of charged insulatorsJbara, O. / Belhaj, M. / Odof, S. / Rau, E. I. / Andrianov, M. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I241
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Combined scintillation and ionisation detectors for environmental scanning electron microscopesRomanovsky, V. / Autrata, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I243
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Imaging of semiconductor structures in environmental SEMRomanovsky, V. / Hutar, O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I245
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Effect of the electron beam accelerating voltage and of specimen coating on the image in the microscope operating at higher pressuresAutrata, R. / Jirak, J. / Spinka, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I249
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Near field optical microscopy: theory and applicationsTomanek, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I255
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Spectroscopy on semiconductor surfaces using photoassisted scanning tunneling microscopy and Kelvin probe force microscopyLux-Steiner, M. C. / Sommerhalter, C. / Matthes, T. W. / Boneberg, J. / Leiderer, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I259
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Electrochemical applications of SPMJanda, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I263
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An in situ STM for applications in catalysisAires, F. J. C. S. / Deranlot, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I265
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Direct imaging of AFM force interactions using TEMErts, D. / Olin, H. / Olsson, L. / Ryen, L. / Tholen, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I267
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Force microscopy experiments in ultrahigh vacuumMeyer, E. / Guggisberg, M. / Bennewitz, R. / Loppacher, C. / Barwich, V. / Pfeiffer, O. / Schar, S. / Baratoff, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I269
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AFM in the study of primary neurons isolated from rabbit olfactory mucosaMenevse, A. / Sahin, F. I. / Ergun, M. A. / Tan, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I271
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Electron transport in point contacts studied by TEM-STMErts, D. / Lohmus, A. / Lohmus, R. / Olin, H. / Olsson, E. / Ryen, L. / Tholen, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I275
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X-ray microanalysis at low kVWendt, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I279
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Standardless microanalysisWernisch, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I283
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Automated analysis of submicron particles in SEM?Poelt, P. / Schmied, M. / Brunner, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I285
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Correction of peak overlap in EDX-maps by digital image processingvon Bradke, M. / Ruckdaeschel, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I287
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Standards for analysis of submicron particles by SEM / EDXSSchmied, M. / Poelt, P. / Dahl, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I289
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Combined autoradiography and electron microscopy analysis for granulometric measurements of actinide oxide aerosolsLe Naour, H. / Fritsch, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I291
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Quantitative electron microprobe analyses of subsurface micro-inclusions in diamondsGutkin, V. / Izraeli, E. / Navon, O. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I293
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The use of energy dispersive X-ray microanalysis (EDX) in pollution impact studiesGregory, M. A. / McClurg, T. P. / Connell, A. D. / Moodley, V. E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I295
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Characterisation of industrial TiO~2 pigments with low voltage FE-SEM/EDX and FE-TEM/STEM/EDX methodsTapper, U. / Kauppinen, E. I. / Jalava, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I299
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Understanding EELS and its applications to metallic alloys and semiconductorsHumphreys, C. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I303
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Energy filtering transmission electron microscopy: fundamentals and applicationsKohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I307
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Analysis of the atomic scale oxygen vacancy ordering by EELS and Z- contrast imagingIto, Y. / Stemmer, S. / Klie, R. F. / Browning, N. D. / Mazanec, T. J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I309
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Extended image-series analysis in the energy-filtered TEMThomas, P. J. / Midgley, P. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I311
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Composition and chemical shift analysis of a multilayer using spatially-resolved EELSKimoto, K. / Matsui, Y. / Aoyama, T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I313
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Electron channeling and monopole transitions in ELNESSchattschneider, P. / Hebert, C. / Jouffrey, B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I315
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Monochromator for high brightness electron gunsMook, H. W. / Batson, P. E. / Kruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I317
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Application of EFTEM for cross-sectional on-product characterization of semiconductor devicesEngelmann, H. J. / Blum, W. / Saage, H. / Worch, M. / Zschech, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I319
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Extraction of three-body distribution in amorphous silicon by wavelet analysis of EXELFSMuto, S. / Yu, K. M. / Walukiewicz, W. / Jin, H.-C. / Abelson, J. R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I321
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Wavelet analysis of extended energy-loss fine structureMuto, S. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I323
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Energy-filtering techniques for thick samplesKabius, B. / Seybold, V. / Hiller, S. / Rilk, A. / Zellmann, E. / Probst, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I325
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EFTEM analysis of the interaction of Co with a fluorinated organic dielectricHens, S. / Van Landuyt, J. / Bender, H. / Lanckmans, F. / Maex, K. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I327
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Quantitative evaluation of short-range order diffuse scattering in Cu~7~2~.~5Pd~2~7~.~5 alloy by energy filter and imaging plateIkematsu, Y. / Shindo, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I329
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Cryo-EFTEM elemental mapping of particles in frozen solutionsBovin, J.-O. / Balmes, O. / Karlsson, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I331
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Electron energy-loss near-edge structures of silicon and silicon carbidePark, M. Y. / Kruger, P. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I333
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Effect of the excited state lifetime on the near edge structure in EELS or XANES experimentsHebert, C. / Kostner, M. / Schattschneider, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I335
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EELS study of phase transformation in Cu-Al-Ni alloyHanada, T. / Kitao, R. / Nakata, Y. / Hirotsu, Y. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I337
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Stability performance of an energy filtering TEMBenner, G. / Zellmann, E. / Harscher, A. / Harle, R. / Kabius, B. / Seybold, V. / Probst, W. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I339
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Factor analysis of TEM-EEL spectra on nanoscale Fe/Al/Fe layersThomas, J. / Bauer, H.-D. / Baunack, S. / Wetzig, K. / Mensch, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I341
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Beam brightness and STEM-EELS performanceBarth, J. E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I343
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Factors affecting the performance of EELS energy-filtersKothleitner, G. / Brink, H. A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I345
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Energy-filtered imaging of Fe and Ni nanoparticles in a field emission gun transmission electron microscopeSayagues, M. J. / Rojas, T. C. / Dunin-Borkowski, R. E. / Hutchison, J. L. / Fernandez, A. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I347
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Direct atomic scale characterization of interfaces and doping layers in field-effect transistorsTopuria, T. / James, E. / Browning, N. / Ma, Z. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I351
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Photoemission electron microscopy with high chemical and magnetic sensitivitySchonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I355
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Auger analysis of sharp topographies: quantification at high spatial resolutionEl Gomati, M. M. / Gelthorpe, A. / Dell, J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I359
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Quantitative secondary electron emissiometryTomashpolsky, Y. Y. / Sadovskaya, N. V. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I361
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Contrast studies on organic monolayers in FESEM and their correlation with SFM dataBittermann, A. G. / Reichelt, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I363
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Magneto-optical linear dichroism in threshold photoemission electron microscopy of a polycrystalline Fe-filmMarx, G. K. L. / Elmers, H.-J. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I365
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Structural and chemical surface analysis with the double-reflection emission electron microscope DREEMGrzelakowski, K. / Settemeyer, J. / Escher, M. / Merkel, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I367
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Secondary electron field emission microscopy - SEFEMFitting, H.-J. / Hingst, T. / Schreiber, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I369
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Possibilities of measurement of magnetic field distributions by photoemission electron microscopyNepijko, S. A. / Sedov, N. N. / Marx, G. K. L. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I371
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Domain imaging and determination of magnetic moments in Co-films using XMCD-PEEMMarx, G. K. L. / Klais, M. J. / Haibach, P. / Schonhense, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I375
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Towards more quantitative results from three dimensional electron microscopy of macromoleculesCarazo, J. M. / Jimenez-Lozano, N. / Sorzano, C. O. S. / Chagoyen, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I379
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ProcessDiffraction: a computer program to process electron diffraction patterns from polycrystalline or amorphous samplesLabar, J. L. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I381
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Detection of particles in elemental maps using 2D-histogramsMuller, I. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I383
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Bimodal stereo-based surface reconstruction in SEMJan, J. / Janova, D. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I385
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EMS simulations for STEM and applicationsMobus, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I387
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On the optimum energy for backscattered electron imaging of topographic details in scanning electron microscopyMerli, P. G. / Morandi, V. / Rosa, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I389
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Genetic algorithms as applied to surface morphology reconstruction in the scanning electron microscopeLi, X. / Kodama, T. / Uchikawa, Y. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I391
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Influence of the imaginary part of the atomic scattering factor on diffractograms of thin amorphous foilsKnippelmeyer, R. / Thesing, A. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I393
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Backscattered electron stereophotogrammetry based on the BSE-microtomography in the SEMRau, E. I. / Sennov, R. A. / Sokolov, V. N. / Yurkovets, D. I. / Melnik, V. N. / Boyde, A. / Howell, P. G. T. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I395
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Aliasing correction of undersampled crystal imagesKoeck, P. J. B. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I397
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Monte Carlo calculation on 3D distribution of maximum penetration depths of backscattered electrons in the SEMHoffmeister, H. / Reimer, L. / Kohl, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I399
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Image analysis of illuvial soil horizonsKyzlassov, I. / Shoba, S. A. / Sokolov, V. N. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I401
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Application of 2D-FFT for analysis of vanadium carbonitrides precipitatesKruk, A. / Osuch, W. / Ciura, F. / Michta, G. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I403
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An implementation of the coherence function multislice methodSchorsch, P. / Muller, H. / Rose, H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I407
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Microscope automation: does the computer replace the operator?Volkl, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I411
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WebXpertEze: intelligent instruments via the InternetCaldwell, N. H. M. / Breton, B. C. / Holburn, D. M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I413
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Computer-controlled transmission electron microscopyvan der Krift, T. P. / Ziese, U. / Janssen, A. H. / van Maurik, W. A. M. / Koster, A. J. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I417
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COM technology based modular software for scientific instrumentation controlVasina, J. / Vasina, R. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I419
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Computer controlled high-throughput integration system: FasTEMFukushima, K. / O Donnell, R. M. / Fujiwara, K. / Kai, H. / Okunishi, E. / Kawasaki, M. / Kersker, M. / Naruse, M. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I423
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Modern electron optics in SEM and inspectionPlies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I427
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Advances in TEM instrumentationKruit, P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I431
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A high resolution add-on lens for scanning electron microscopesKhursheed, A. / Karuppiah, N. / Koh, S. H. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I433
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Advances in high-throughput multiple electron-beam lithographyMankos, M. / Chang, T. H. P. / Czechoslovak Society for Electron Microscopy et al. | 2000
- I435
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Investigations of an electrostatic duo-hexapole-stigmatorBartle, J. / Plies, E. / Czechoslovak Society for Electron Microscopy et al. | 2000