Comparison of microwave and r.f. plasmas: fundamentals and applications (Unknown)
- New search for: Moisan, M.
- New search for: Wertheimer, M. R.
- New search for: Moisan, M.
- New search for: Wertheimer, M. R.
In:
SURFACE AND COATINGS TECHNOLOGY
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59
, 1/3
;
1
;
1993
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ISSN:
- Article (Journal) / Print
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Title:Comparison of microwave and r.f. plasmas: fundamentals and applications
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Contributors:Moisan, M. ( author ) / Wertheimer, M. R. ( author )
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Published in:SURFACE AND COATINGS TECHNOLOGY ; 59, 1/3 ; 1
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Publisher:
- New search for: ELSEVIER SEQUOIA SA
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Publication date:1993-01-01
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Size:1 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:Unknown
- New search for: 671.73
- Further information on Dewey Decimal Classification
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Classification:
DDC: 671.73 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 59, Issue 1/3
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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Comparison of microwave and r.f. plasmas: fundamentals and applicationsMoisan, M. et al. | 1993
- 14
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Process and advantage of multicomponent and multilayer PVD coatingsKnotek, O. et al. | 1993
- 21
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Deposition of graded alloy nitride films by closed field unbalanced magnetron sputteringMonaghan, D.P. et al. | 1993
- 26
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Laser induced plasma: a source of control of the properties of thin filmsKreutz, E.W. et al. | 1993
- 32
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Modelling of discharges and non-thermal plasmas--applications to plasma processingBoeuf, J.P. et al. | 1993
- 41
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Attempted modelling of thickness and chemical heterogeneity in coatings prepared by d.c. reactive magnetron sputteringBillard, A. et al. | 1993
- 48
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A practical model to enable the prediction of coating thickness variations across a flat surfaceJames, A.S. et al. | 1993
- 54
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Experimental and theoretical study of the electrical properties of a triode reactorSeeböck, R.J. et al. | 1993
- 59
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Modelling of a microwave postdischarge nitriding reactorMalvos, H. et al. | 1993
- 67
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Spectroscopy of flowing discharges and post-discharges in reactive gasesRicard, A. et al. | 1993
- 77
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In-situ monitoring of electron cyclotron resonance plasma chemical vapour deposition of hydrogenated silicon nitride filmsBoumerzoug, M. et al. | 1993
- 82
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Diagnostics of a d.c. pulsed-plasma-assisted nitriding processHugon, R. et al. | 1993
- 86
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Calculation of ion energy distributions in low frequency r.f. glow dischargesJames, A.S. et al. | 1993
- 91
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Characterization of a TiN deposition process based on structural studies, plasma diagnostics and mathematical modellingCzerwiec, T. et al. | 1993
- 97
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Determination of mass and energy distribution of ions in glow dischargesPeter, S. et al. | 1993
- 101
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Control of reactive d.c. magnetron sputtering of SnO2 by means of optical emissionKirchhoff, V. et al. | 1993
- 105
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Control of mechanical and structural properties of coatings deposited using unbalanced magnetronsArnell, R.D. et al. | 1993
- 110
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PC system for improving the control of reactive gas dosage in sputtering processes for film depositionPedersen, G.N. et al. | 1993
- 113
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Coating thickness fall-offwith source to substrate distance in PVD processesFancey, K.S. et al. | 1993
- 117
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The influence of additive rare earth on ion carburizationLi, Guoqing / Hua Jin et al. | 1993
- 117
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The influence of additive rare earths on ion carburizationLi, G. et al. | 1993
- 121
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Influence of plasma treatment conditions on growth and electrical properties of oxides on InPBouziane, A. et al. | 1993
- 126
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Behaviour of a steered cathodic arc as a function of steering magnetic fieldWalke, P.J. et al. | 1993
- 129
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Process control of plasma nitriding and plasma nitrocarburizing in industryRembges, W. et al. | 1993
- 129
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Process control plasma nitriding and plasma nitrocarburizing in industryRembges, W. / Oppel, W. et al. | 1993
- 135
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Influence of the reactive gas flow on chromium nitride sputteringJensen, H. et al. | 1993
- 140
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Sputter coating on high speed steel tube using a hybrid plasma produced by coaxial ECR and magnetron dischargesFujiyama, H. et al. | 1993
- 144
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Pulsed barrier discharges for thin film production at atmospheric pressureReitz, U. et al. | 1993
- 148
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New flexible reactor design for R&D PECVD deposition systemsArendt, R. et al. | 1993
- 152
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Arc-enhanced glow discharge in vacuum arc machinesVetter, J. et al. | 1993
- 156
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RFe~2 (R = rare earth) thin film formation by an ion beam sputtering system with a plasma filament type ion sourceMatsumura, Y. / Noguchi, T. / Kurino, T. / Kaneko, H. et al. | 1993
- 156
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RFe2 (RMatsumura, Y. et al. | 1993
- 160
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Preparation and performance of (Cr,Ti)N coatings deposited by a combined hollow cathode and cathodic arc techniqueEbersbach, G. et al. | 1993
- 160
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Preparation and performance of (Cr,Ti)N coatings deposited by a combined hollow cathode arc techniqueEbersbach, G. / Fabian, D. / Wuttke, W. / Jehn, H.A. et al. | 1993
- 166
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Reactive magneton sputtering of zirconium carbide films using Ar-CH4 gas mixturesBrückner, J. / Mäntylä, T. et al. | 1993
- 166
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Reactive magnetron sputtering of zirconium carbide films using Ar-CH4 gas mixturesBrückner, J. et al. | 1993
- 171
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High rate deposition of alumina films by reactive gas flow sputteringJung, T. et al. | 1993
- 177
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Aspects and results of long-term stable deposition of Al2O3 with high rate pulsed reactive magnetron sputteringFrach, P. et al. | 1993
- 183
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R.f. magnetron sputter deposition of Cr2O3 layers on ceramic Al2O3 substratesRothhaar, U. et al. | 1993
- 187
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Deposition and characterization of non-conducting silicon nitride, aluminum nitride and titanium-aluminum nitride thin filmsBaumvol, I.J.R. et al. | 1993
- 193
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Remote plasma-enhanced chemical vapour deposition with metal organic source gases: principles and applicationsKulisch, W. et al. | 1993
- 202
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Synthesis of thin coatings by plasma-assisted chemical vapour deposition using metallo-organic compounds as precursorsRie, K.-T. et al. | 1993
- 207
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Plasma-assisted deposition of hard material layers from organometallic precursorsTäschner, Ch et al. | 1993
- 212
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Thin copper films deposited by low temperature plasma-enhanced metal organic chemical vapour deposition using copper- acetylacetonateHamerich, A. et al. | 1993
- 217
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The formation of Ti(OCN) layers produced from metal-organic compounds using plasma-assisted chemical vapour depositionWierzchon, T. et al. | 1993
- 221
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Modification of near-surface regions in Si by low energy particlesKlose, H.A. et al. | 1993
- 226
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Some technical aspects of ion implantation as an industrial process for surface modification of metalKörber, F.-J. et al. | 1993
- 234
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Direct plasma beam deposition of TiNx layers with an r.f. plasma beam sourceWeber, F.R. et al. | 1993
- 239
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A plasma-based technique for controlled low energy ion bombardment of dielectric surfacesMartin, D. et al. | 1993
- 244
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Oxidation resistance of PVD Cr, Cr-N and Cr-N-O hard coatingsNavinsek, B. et al. | 1993
- 249
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Modification of the mechanical surface properties and tribochemistry of structural ceramics by ion beam techniquesFischer, W. et al. | 1993
- 255
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Ion-assisted modification of the condensation of thermal carbon atomsUllmann, J. et al. | 1993
- 261
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Microstructure, corrosion and tribological behavior of plasma immersion ion-implantet austenitic stainless steelSamandi, M. / Shedden, B.A. / Smith, D.I. / Collins, C.A. / Hutchings, R. / Tendys, J. et al. | 1993
- 261
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Microstructure, corrosion and tribological behaviour of plasma immersion ion-implanted austenitic stainless steelSamandi, M. et al. | 1993
- 267
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Plasma immersion ion implantation--the role of diffusionCollins, G.A. et al. | 1993
- 274
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Superimposed pulse bias voltage used in arc and sputter technologyOlbrich, W. et al. | 1993
- 281
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Synthesis of Al2O3 condensates from impulse plasmaZdunek, K. et al. | 1993
- 287
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Layers of high speed steel with microstructures characteristic of heat-treated materialsMichalski, A. et al. | 1993
- 290
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Plasma treatment for cleaning of metal partsFessmann, J. et al. | 1993
- 297
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Surface etching of three-dimensional carbon-fibre-reinforced plastics in a dual-frequency mode plasma (40 kHz and 2.45 GHz)Meyer, M. et al. | 1993
- 301
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Influence of plasma surface treatment on the adhesion of thin films on metalPetasch, W. et al. | 1993
- 301
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Influence of plasma surface treatment on the adhesion of thin films on metalsPetasch, W. / Baumgärtner, K. / Räuchle, E. / Walker, M. et al. | 1993
- 306
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Plasma-enhanced chemical vapour deposition of thin insulator films and reactor cleaningVogt, M. et al. | 1993
- 310
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Investigations concerning the role of hydrogen in the deposition of diamond filmsJoeris, P. et al. | 1993
- 316
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Topological effects regarding trench structures covered with LPCVD and PECVD thin filmsSchlote, J. et al. | 1993
- 321
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Ion nitriding of Armco iron in various glow discharge regionsMichalski, J. et al. | 1993
- 325
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Adhesion of metal coatings on ceramics deposited by different techniquesSchmidbauer, S. et al. | 1993
- 330
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A microstructural and morphological study of diamond crystals and films elaborated by microwave plasma assisted chemical vapour depositionBarrat, S. et al. | 1993
- 338
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Broad range variation in surface tension by plasma-polymerized coatings on polymethyl methacrylateMichaeli, W. et al. | 1993
- 342
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Plasma polymerization of silicon organic membranes for gas separationWeichart, J. et al. | 1993
- 345
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Deposition of Me-C:H coatings from metal organic precursors using a plasma-activated r.f. processBenndorf, C. et al. | 1993
- 350
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Surface modification of polypropylene in oxygen and nitrogen plasmaHarth, K. / Hibst, H. et al. | 1993
- 350
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Surface modification of polypropylene in oxygen and nitrogen plasmasHarth, K. et al. | 1993
- 356
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Factors influencing the hydrophobic recovery of oxygen-plasma-treated polyethyleneBehnisch, J. et al. | 1993
- 359
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Thin conductive coatings formed by plasma polymerization of 2-iodothiopheneKruse, A. et al. | 1993
- 365
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Optical properties of plasma polymer filmsPoll, H.-U. et al. | 1993
- 371
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Improvement in polymer adhesivity by low and normal pressure plasma surface modificationFriedrich, J.F. et al. | 1993
- iii
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Editorial Board| 1993
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Preface| 1993