PA-CVD of aluminium composite films (English)
- New search for: Taeschner, C.
- New search for: Klosowski, J.
- New search for: Leonhardt, A.
- New search for: Taeschner, C.
- New search for: Klosowski, J.
- New search for: Leonhardt, A.
In:
VIDE -PARIS-
;
53
, 284
;
167-170
;
1997
-
ISSN:
- Article (Journal) / Print
-
Title:PA-CVD of aluminium composite films
-
Contributors:
-
Published in:VIDE -PARIS- ; 53, 284 ; 167-170
-
Publisher:
- New search for: DIVISION DE LA SOCIETE FRANCAISE DU VIDE
-
Publication date:1997-01-01
-
Size:4 pages
-
ISSN:
-
Type of media:Article (Journal)
-
Type of material:Print
-
Language:English
- New search for: 634.8 / 663.2
- Further information on Dewey Decimal Classification
-
Classification:
-
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 53, Issue 284
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
-
Diffusion mechanisms of plasmas produced over multipolar magnetic field structures: from DC magnetrons to distributed electron cyclotron resonance (DECR) plasma sourcesLagarde, T. / Pelletier, J. et al. | 1997
- 1
-
Interaction of the elementary components of a plasma with a solid surfaceGautier-Soyer, M. et al. | 1997
- 2
-
Plasmas DiagnosticsRicard, A. et al. | 1997
- 3
-
Metal surface treatment and depositionRicard, A. et al. | 1997
- 4
-
Plasma reactor and process applicationsPeccoud, L. et al. | 1997
- 5
-
Comparison between chemical and plasma modifications of polymeric surfacesPoncin-Epaillard, F. et al. | 1997
- 8
-
Radiative species in the afterglow of A N~2 flowing barrier dischargePagnon, D. / Ricard, A. / Cantacuzene, C. / Sindzingre, T. et al. | 1997
- 12
-
Radiative species in He dielectric controlled glow discharge at atmospheric Gas pressureMassines, F. / Decomps, P. / Ricard, A. et al. | 1997
- 16
-
Use of reactive sputtering model to predict working point conditions of two different TiN sputtering devicesRoquiny, P. / Bodart, F. / Lucas, S. / Terwagne, G. et al. | 1997
- 21
-
Negative ions generated in downstream plasmas and their Si etching reactivityHoriike, Y. / Shibayama, T. / Morikawa, Y. / Takayanagi, T. / Oshio, H. / Ita, H. / Ichiki, T. / Shindo, H. et al. | 1997
- 24
-
New process and etch equipment in aluminum dry etching for SAW devicesBouyer, B. et al. | 1997
- 29
-
Experimental investigation of a Cl~2/BCl~3/N~2 chemistry based aluminium plasma etchingVignes, M. J. / Baleo, J. N. et al. | 1997
- 33
-
Silicon wall profiles generated by isotropic dry etching processesMansano, R. D. / Verdonck, P. / Maciel, H. S. et al. | 1997
- 37
-
Use of plasma processes for the fabrication of metal and silicon microtips cathodesBaptist, R. et al. | 1997
- 45
-
Characterization and optimization of CH~4 based ECR plasmas by optical emission spectroscopyRar, A. / Zimmermann, H. / Seelmann-Eggebert, M. et al. | 1997
- 49
-
Characterization of the plasma beam extracted from an ECR ion source for RIBE and CAIBE of siliconChevolleau, T. / Tessier, P. Y. / Cardinaud, C. / Turban, G. et al. | 1997
- 53
-
Reactive ion etching of alumina-doped silica thin films for integrated optics applicationsLe Luyer, Y. et al. | 1997
- 57
-
Plasma treatment of synthetic vulcanized styrene-butadiene rubberPastor-Blas, M. M. / Dillard, J. C. / Torro-Palau, A. / Martin-Martinez, J. M. et al. | 1997
- 61
-
Modification of polymeric surface by cold plasma, treatment of the surface or into the bulk?Poncin-Epaillard, F. / Brosse, J. C. / Falher, T. et al. | 1997
- 65
-
Growth of human endothelial cells on plasma-treated polyethy-leneterephthalate surfacesMirenghi, L. / Ramires, P. A. / Pentassuglia, R. E. / Rotolo, P. / Romito, A. et al. | 1997
- 69
-
A study comparing the use of plasmas and sodium complexes for the pretreatment of fluoropolymersBrewis, D. M. / Mathieson, I. et al. | 1997
- 74
-
Investigations of plasma-treated polymer surfaces by zeta potential measurementsGresser, L. / Bouriat, P. / Held, B. et al. | 1997
- 78
-
Cold plasma fluorination processes of polyethylene surfacesQuensierre, J. D. / Jama, C. / Dessaux, O. / Goudmand, P. et al. | 1997
- 82
-
Plasma treatment and biomaterialsLegeay, G. / Poncin-Epaillard, F. et al. | 1997
- 89
-
Plasma-enhanced fluorination of carbon materialsMoguet, F. / Shirasaki, T. / Tressaud, A. et al. | 1997
- 93
-
Surface properties and the stability of poly(ethyleneterephtalate)(pet) films treated in plasmas of HE-O~2 mixturesPlacinta, G. / Arefi-Khonsari, F. / Gheorghiu, M. / Amouroux, J. / Popa, G. et al. | 1997
- 97
-
Scaling-up of the diamond deposition reactor using surface-wave discharges by lowering the operating frequency from 2.45 Ghz to 915 MhzMoisan, M. / Borges, C. F. M. / Schelz, S. et al. | 1997
- 101
-
Evolution of morphological properties of coatings sputtered with heat treatmentMartin, N. / Baretti, D. / Rousselot, C. / Rondot, D. et al. | 1997
- 105
-
Low temperature nitriding of aluminium in a low pressure arc dischargeRenevier, N. / Czerwiec, T. / Collignon, P. / Michel, H. et al. | 1997
- 113
-
Decarburization during sputtering in steels in a DC glow electrical dischargeEgert, P. / Seeber, A. / Speller, C. V. / Maliska, A. M. et al. | 1997
- 117
-
Influence of sputtering parameters on the mechanical properties of chromium filmsPaturaud, C. / Farges, C. / Catherine, M. C. S. / Machet, J. et al. | 1997
- 121
-
Growth mechanisms study of TiN coatings obtained by vacuum arc depositionCledat, P. / Machet, J. et al. | 1997
- 125
-
Crystalline and amorphous phases in carbon-nitride films produced by intense high-pressure plasmaGurarie, V. N. / Orlov, A. V. / Bursill, L. A. / Julin, P. / Nugent, K. W. / Chon, J. W. / Prawer, S. et al. | 1997
- 129
-
Oxidation performance of various monolithic and superlattice PVD hard coatings in the temperature range of 400C to 1000CSmith, I. J. / Wadsworth, I. / Donohue, L. A. / Brooks, J. S. / Muenz, W.-D. et al. | 1997
- 133
-
Atmospheric non-equilibrium plasma-assisted surface technologyKoulik, P. et al. | 1997
- 142
-
Pulsed microwave plasmas for homogeneous deposition of HMDSOSoll, C. / Theirich, D. / Ningel, K. P. / Engemann, J. et al. | 1997
- 146
-
Role of oxygen atoms in the growth kinetics of PECVD SiO~2 films in Helicon reactorVallee, C. / Granier, A. / Goullet, A. / Nicolazo, F. / Turban, G. et al. | 1997
- 150
-
Deposition of thin SiO~xC~yHz films from oxygen/organosilicone mixtures in different PECVD reactorsGranier, A. / Berthomieu, D. / Deville, J. P. / Ducarroir, M. / Durand, J. / Goullet, A. / Leprince, P. / Marliere, C. / Raynaud, P. / Segui, E. et al. | 1997
- 154
-
A complete plasma physics, plasma chemistry and surface chemistry simulator used for deposition and etching of thin filmsGogolides, E. / Vauvert, P. / Turban, G. et al. | 1997
- 160
-
RF Glow discharge deposition of nanostructured silicon films: solid state versus gaz phase reactionsRoca, P. / Cabarrocas, I. / Hamma, S. et al. | 1997
- 164
-
High rate direct current reactive sputter deposition of Al~2O~3 - Required Process ParametersMacak, K. / Kharrazi, M. / Helmersson, U. et al. | 1997
- 167
-
PA-CVD of aluminium composite filmsTaeschner, C. / Klosowski, J. / Leonhardt, A. et al. | 1997
- 171
-
Deposition of semiconductive and transparent thin TiN oxide films by PACVD. Role of the bias voltageHellegouarc'h, F. / Arefi-Khonsari, F. / Amouroux, J. et al. | 1997
- 175
-
Vertically integrated circuits - A key technology for future high performance systemsEngelhardt, M. / Huebner, H. / Jacobs, H. / Kleiner, M. / Kuehn, S. / Pamier, W. / Renner, E. / Saenger, A. / Scheler, U. / Schmidt, C. et al. | 1997
- 181
-
PVD techniques applied to a neutron micro-sensor realizationCosset, F. / Celerier, A. / Barelaud, B. / N'Doye, A. / Malhouitre, S. / Vareille, J. C. et al. | 1997
- 185
-
Applications of plasma processes in integrated opticsPoulsen, M. R. et al. | 1997
- 191
-
WN~x thin films as diffusion barriers between Al and SiBoukhris, L. / Poitevin, J. M. et al. | 1997
- 195
-
High power generators for medium frequency sputtering applicationsRettich, T. / Wiedemuth, P. et al. | 1997
- 199
-
An industrial three dimensional surface treatment system and its applicationsHulak, I. / Legeay, G. et al. | 1997
- 203
-
Emission spectroscopy analysis of atmospheric pressure air plasmaChabchoub, M. / Cheron, B. G. et al. | 1997
- 207
-
Modelling of reactive magnetron sputtering used for the deposition of thin filmsRousselot, C. / Martin, N. et al. | 1997
- 208
-
Resumes en anglais des communications| 1997
- 211
-
Characterization of uniform distributed plasmas (UDP) of N~2, O~2 and H~2 for ion implantation applications: the example of nitrogen implantationLe Coeur, F. / Arnal, Y. / Brunel, M. / Burke, R. / Pelletier, J. et al. | 1997
- 213
-
Correlation between the TICN deposition and the optical emission spectroscopy in an arc plasma reactorSultan, G. / Baravian, G. / Damond, E. / Detour, H. / Hayaud, C. / Jacquot, P. et al. | 1997
- 215
-
Design and performance of new hybrid plasma source for thin films depositionMiernik, K. / Walkowicz, J. et al. | 1997
- 219
-
Cold plasma for surface treatment of titanium alloysLebrun, J. P. / Corre, Y. / Douet, M. et al. | 1997
- 223
-
Reactivity of polypropylene surface modified by nitrogen cold plasma towards N-Vinyl-2-pyrrolidonePoncin-Epaillard, F. / Brosse, J. C. / Falher, T. et al. | 1997
- 227
-
Titania coating on PET: P.V.D. elaboration, characterisation, adhesion and photoprotective properties studyBen Amor, S. / Baud, G. / Besse, J. P. / Jacquet, M. / Pichon, N. et al. | 1997
- 230
-
Detection de fuite et << volume mort >>Henriot, C. et al. | 1997
- 231
-
Surface modifications of polyethylene by cold remote nitrogen plasma effect of NF~3 additionJama, C. / Quensierre, J. D. / Dessaux, O. / Goudmand, P. et al. | 1997
- 235
-
Plasma polymerized Iso-t-pentinol and its post-polymerization propertiesSalansky, J. et al. | 1997
- 237
-
Hermetic sealing off the stainless steel pumping tubePregelj, A. / Drab, M. / Novak, J. / Mozetic, M. et al. | 1997
- 239
-
Excimer laser irradiation on carbide/polyimide layersDanev, G. / Spassova, E. / Petkov, K. / Tomov, R. I. / Atanasov, P. A. / Popova, K. et al. | 1997
- 242
-
The pratical application of plasma treatment to polymer surfaces for improved adhesionDurand, A. M. et al. | 1997
- 243
-
Study of a plasma polymerization reactor for hydrocarbon coatingsBenardais, A. / Leprince, P. / Zielinski, F. / Baclet, P. et al. | 1997
- 247
-
Overall Kinetic in remote-PECVD-reactorBayer, C. / Von Rohr, P. R. et al. | 1997
- 251
-
Oxidation of commercial steels in gliding discharges reactorChabchoub, M. / Lenglet, M. / Hannoyer, B. et al. | 1997
- 253
-
Application industrielle des plasmas froids pour les traitements anti-usureLebrun, J. P. et al. | 1997
- 255
-
Super-pure high-nitrogen stainless steels produced in plasma unitsZhadkevich, M. L. / Torkhov, G. F. et al. | 1997
- 259
-
Treatment of CdTe thin films in an oxidizing plasmaElazhari, M. Y. / Outzourhit, A. / Azizan, M. / Bennouna, A. / Ameziane, E. L. / Brunel, M. et al. | 1997
- 263
-
A study of technological properties of plasma sprayed Y~2O~3 stabilised ZrO~2 ceramic coatingsIoncea, A. / Radu, D. / Ionescu, D. / Dumitrescu, O. et al. | 1997
- 267
-
Investigation of tribological characteristics of ultra-hard diamond-like carbon coatingsAkoulich, V. V. / Tochitsky, E. I. / Chekan, N. M. / Sitnikova, E. K. / Akula, I. P. / Ladutko, E. V. / Anisimovich, V. G. et al. | 1997
- 271
-
The influence of ion etching on the structure of nitrided substrates made from hot working steelWalkowicz, J. / Smolik, J. / Miernik, K. et al. | 1997
- 277
-
Synthesis of boron nitride by remote plasma enhanced chemical vapor depositionPierson, J. F. / Belmonte, T. / Czerwiec, T. / Michel, H. et al. | 1997
- 281
-
Low-pressure plasma nitriding of constructional steelCerstvy, R. et al. | 1997
- 285
-
Corrosion behaviour of bioimplants stainless steel with thin IBAD SiN coatingsCerny, F. / Van Den Berg, S. et al. | 1997
- 288
-
Diamond-like carbon: application in wire and tube drawing; numerical simulation by FEMSchurer, C. / Semmler, U. et al. | 1997
- 292
-
Properties of pulsed plasma ion nitrided and oxinitrided steel surfacesHruby, V. / Kadlec, J. / Pospichal, M. et al. | 1997
- 299
-
Study of surface properties of steel samples treated by plasma processesMouri, L. / Fiaud, C. / Amouroux, J. et al. | 1997
- 303
-
A combined flame-field method for the deposition of hard C:H filmsZake, M. / Lubane, M. et al. | 1997
- 306
-
Microwave plasma reactor for silicon dioxide depositionBenissad, N. / Bechu, S. / Boisse-Laporte, C. / Leprince, P. et al. | 1997
- 310
-
Reactive deposition from collimated beams of sputtered materialMiernik, K. / Walkowicz, J. / Smolik, J. et al. | 1997
- 314
-
Characterization of PECVD SiO~xC~YHz films by ellipsometry and X-ray reflectometryVallee, C. / Goullet, A. / Granier, A. / Marliere, C. / Van Der Lee, A. / Durand, J. / Raynaud, P. / Deville, J. P. et al. | 1997
- 318
-
Dielectric properties of plasma deposited films obtained from organosilicion monomersDurand, J. / Granier, A. / Marlieres, C. / Nicolazo, F. / Raynaud, P. / Segui, Y. et al. | 1997
- 322
-
Characterisation of unbalenced magnetron sputtered Si-Al coatingsJacobs, M. / Terwagne, G. / Bodart, F. et al. | 1997
- 327
-
ECR plasma source for metallic clustersFarchi, A. / Delaunay, M. et al. | 1997
- 331
-
Influence of the H/C ratio in precursor gases on a-C:H films deposited by means of an expanding thermal plasma| 1997
- 335
-
Multilayered dielectric films on semiconductor: the properties of the interfaceKropman, D. / Kaerner, T. / Abru, U. et al. | 1997
- 337
-
Si-Ta thin films sputtered under constant or pulsed voltage operation of magnetronBeensh-Marchwicka, G. / Berlicki, T. / Osadnik, S. / Prociow, E. et al. | 1997
- 341
-
The role of helium in RF PECVD hard carbonNeuville, S. et al. | 1997
- 347
-
Lectro-Treat - Surface treatersSenink, N. / Antoine, A. / Hulak, I. et al. | 1997
- 351
-
Microwaves couplers for surface treatmentBoutroy / Chollet, P. / Lemortellec, J. L. / Oge, F. et al. | 1997
- 356
-
Plasma monitoring by integrated sensorsBrueckner, R. / Canteloup, J. / Titov, A. / Vassilakis, J. P. / Poulin, G. et al. | 1997
- 372
-
Modification of polyimide films by low-frequency glow dischargeGilman, A. / Drachev, A. / Kuznetsov, A. / Potapov, V. et al. | 1997