Removal of Indoor Formaldehyde by Hybrid Chemical Filters (S & M 0431) (English)
- New search for: Shiratori, S.
- New search for: Suzuki, T.
- New search for: Kushida, S.
- New search for: Inami, Y.
- New search for: Shiratori, S.
- New search for: Suzuki, T.
- New search for: Kushida, S.
- New search for: Inami, Y.
In:
SENSORS AND MATERIALS
;
13
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77-86
;
2000
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ISSN:
- Article (Journal) / Print
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Title:Removal of Indoor Formaldehyde by Hybrid Chemical Filters (S & M 0431)
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Contributors:
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Published in:SENSORS AND MATERIALS ; 13 ; 77-86
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Publisher:
- New search for: SCIENTIFIC PUBLISHING DIVISION MYU
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Publication date:2000-01-01
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Size:10 pages
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ISSN:
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Type of media:Article (Journal)
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Type of material:Print
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Language:English
- New search for: 530
- Further information on Dewey Decimal Classification
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Classification:
DDC: 530 -
Source:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
Table of contents – Volume 13
The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.
- 1
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The Diode Hall Effect and Its Sensor Applications - An Overview (S & M 0425)Roumenin, C. / Dimitrov, K. / Nikolov, D. / Ivanov, A. et al. | 2000
- 13
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Characteristics of Chromium Nitride Thin-Film Strain Gauges (S & M 0426)Chung, G.-S. / Lee, W.-J. / Song, J.-S. et al. | 2000
- 25
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Miniaturized Magnetic Field Sensors Utilizing Giant Magneto-Impedance [GMI] Effect and Surface Acoustic Wave [SAW] Technology (S & M 0427)Hauser, H. / Steindl, R. / Hausleitner, C. / Nicolics, J. / Pohl, A. et al. | 2000
- 41
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Etching Microwave Silicon [EMSi]-Microwave Enhanced Fast Deep Anisotropic Etching of Silicon for Micro-Electromechanical Systems [MEMS] (S & M 0428)Dziuban, J. A. / Walczak, R. et al. | 2000
- 41
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Etching microwave silicon (EMSi)-microwave enhanced fast deep anisotropic etching of silicon for micro-electromechanical systems (MEMS)Dziuban, J.A. / Walczak, R. et al. | 2001
- 57
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A new process technique for complementary metal-oxide-semiconductor (CMOS) compatible sensorsSheen, Chin-Shown / Sien Chi et al. | 2001
- 57
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A New Process Technique for Complementary Metal-Oxide-Semiconductor [CMOS] Compatible Sensors (S & M 0429)Sheen, C.-S. / Chi, S. et al. | 2000
- 69
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A Smart Ammonia Gas Sensor Using QCM with Plasma-Polymerized Membrane (S & M 0430)Nanto, H. / Hamaguchi, Y. / Yokoi, Y. / Kurosawa, S. / Oyabu, T. / Kusano, E. / Kinbara, A. et al. | 2000
- 77
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Removal of Indoor Formaldehyde by Hybrid Chemical Filters (S & M 0431)Shiratori, S. / Suzuki, T. / Kushida, S. / Inami, Y. et al. | 2000
- 87
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Diffusion Characteristics of Chemicals Causing Sick-Building Syndrome (S & M 0432)Oyabu, T. / Sawada, A. / Nanto, H. et al. | 2000
- 99
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Discrimination of D-amino acids from L-amino acids using electric potential changes of a membraneChibvongodze, H. / Hayashi, K. / Toko, K. et al. | 2001
- 99
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Discrimination of D-Amino Acids from L-Amino Acids Using Electric Potential Changes of a Membrane (S & M 0433)Chibvongodze, H. / Hayashi, K. / Toko, K. et al. | 2000
- 107
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Development of High-Speed Pressure Distribution Measurement System and Its Application to Food Texture Characterization (S & M 0434)Azuma, T. et al. | 2000
- 119
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Detection of interactions between lipid/polymer membranes and taste substances by quartz resonatorEzaki, S. / Iiyama, S. et al. | 2001
- 119
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Detection of Interactions between Lipid/Polymer Membranes and Taste Substances by Quartz Resonator (S & M 0435)Ezaki, S. / Iiyama, S. et al. | 2000
- 129
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Enzyme Reactor System for the Determination of the Quality of Chicken (S & M 0436)Suzuki, Y. / Usami, R. / Horikoshi, K. / Okuma, H. et al. | 2000
- 137
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Analysis of Saltiness and Bitterness of Inorganic Salts Using Taste Sensors (S & M 0437)Iiyama, S. / Ezaki, S. / Toko, K. et al. | 2000
- 145
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Fundamental Study of Various Taste Solutions by Ultrasonics (S & M 0438)Kojima, Y. / Kato, H. et al. | 2000
- 155
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Gingival Crevicular Fluid [GCF]- Collecting Device for Analyzing Microvolume Sample Solutions (S & M 0439)Yamaguchi, M. / Fukushi, Y. / Yamazaki, K. / Kobayashi, M. et al. | 2000
- 169
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Analysis of Tastes of Amino Acids Using Surface-Polarity Controlled Sensors (S & M 0440)Ju, M. J. / Hayashi, K. / Toko, K. et al. | 2000
- 169
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Analysis of tastes of amino acids using surface-polarity controlled sensorsJu, M.J. / Hayashi, K. / Toko, K. et al. | 2001
- 179
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Development of Technology for Separating and Identifying Bitter Substances (S & M 0441)Takamatsu, R. / Toko, K. / Takeguchi, H. / Kawabata, A. et al. | 2000
- 189
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Integrated high-speed, high-sensitivity photodiodes and optoelectronic integrated circuitsZimmermann, H. et al. | 2001
- 189
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Integrated High-Speed, High-Sensitivity Photodiodes and Optoelectronic Integrated Circuits (S & M 0442)Zimmermann, H. et al. | 2001
- 207
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Penicillin Detection by Means of Silicon-Based Field-Effect Structures (S & M 0443)Poghossian, A. / Thust, M. / Schroth, P. / Steffen, A. / Luth, H. / Schoning, M. J. et al. | 2001
- 225
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Fabrication of Porous Platinum Thin Films for Hydrocarbon Sensor Applications (S & M 0444)Harris, K. D. / McBride, J. R. / Nietering, K. E. / Brett, M. J. et al. | 2001
- 235
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Platinum patterning by a modified lift-off technique and its application in a silicon load cellTong, H.D. / Zwijze, R.A.F. / Berenschot, J.W. / Wiegerink, R.J. / Krijnen, G.J.M. / Elwenspoek, M.C. et al. | 2001
- 235
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Platinum Patterning by a Modified Lift-Off Technique and Its Application in a Silicon Load Cell (S & M 0445)Tong, H. D. / Zwijze, R. A. F. / Berenschot, J. W. / Wiegerink, R. J. / Krijnen, G. J. M. / Elwenspoek, M. C. et al. | 2001
- 247
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Understanding the Evolution of Silicon Surface Morphology during Aqueous Etching (S & M 0446)Hines, M. A. et al. | 2001
- 259
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The Preparation of Ideally Ordered Flat H-Si(111) Surfaces (S & M 0447)Munford, M. L. / Cortes, R. / Allongue, P. et al. | 2001
- 259
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The preparation of ideally ordered flat H-Si(111) surfacesMunford, M.L. / Cortes, R. / Allongue, P. et al. | 2001
- 271
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Anisotropic Etching of Silicon in TMAH Solutions (S & M 0448)Tabata, O. et al. | 2001
- 271
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Anisotropic etching of silicon in TMAH solutionsTabata, O. et al. | 2001
- 285
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Change in Orientation-Dependent Etching Properties of Single-Crystal Silicon Caused by a Surfactant Added to TMAH Solution (S & M 0449)Sato, K. / Uchikawa, D. / Shikida, M. et al. | 2001
- 293
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Silicon Etch Anisotropy in Tetra-Methyl Ammonium Hydroxide: Experimental and Modeling Observations (S & M 0450)Landsberger, L. M. / Pandy, A. / Kahrizi, M. et al. | 2001
- 303
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Anisotropic Etching of Silicon on {111} and Near {111} Planes (S & M 0451)Tan, S. / Boudreau, R. / Reed, M. L. et al. | 2001
- 315
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Realistic Step Flow Model for Orientation-Dependent Wet Etching Implemented in a Modular TCAD Environment (S & M 0452)Horn, A. / Wittmann, F. / Wachutka, G. et al. | 2001
- 325
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The Structure of an Underetched Convex Mask Corner Explained as the Evolution of a Saddlepoint Vertex (S & M 0453)van Suchtelen, J. / van Veenendaal, E. et al. | 2001
- 343
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Monte Carlo simulation of wet chemical etching of siliconVan Veenendaal, E. / Van Suchtelen, J. / Van Beurden, P. / Cuppen, H.M. / Van Enckevort, W.J.P. / Nijdam, A.J. / Elwenspoek, M. / Vlieg, E. et al. | 2001
- 343
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Monte Carlo Simulation of Wet Chemical Etching of Silicon (S & M 0454)van Veenendaal, E. / van Suchtelen, J. / van Beurden, P. / Cuppen, H. M. / van Enckevort, W. J. P. / Nijdam, A. J. / Elwenspoek, M. / Vlieg, E. et al. | 2001
- 351
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Application of Dual-Doped TMAH Silicon Etchant in the Fabrication of a Micromachined Aluminum Flexing Beam Actuator (S & M 0455)Garra, J. / Brida, S. / Ferrario, L. / Paranjape, M. et al. | 2001
- 359
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Optochemical Sensor for HCI Gas Based on Tetraalkoxyphenylporphyrin Dispersed in an Acrylate Polymer Matrix (S & M 0456)Supriyatno, H. / Nakagawa, K. / Sadaoka, Y. et al. | 2001
- 373
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An Analytical Model for Passive Microvalves (S & M 0457)Carmona, M. / Marco, S. / Samitier, J. / Acero, M. C. / Plaza, J. A. / Esteve, J. et al. | 2001
- 385
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Properties of Magnetorheologic Fluids (S & M 0458)Richter, L. / Zipser, L. / Lange, U. et al. | 2001
- 399
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Sensing Humidity Using Nanostructured SiO Posts: Mechanism and Optimization (S & M 0459)Wu, A. T. / Brett, M. J. et al. | 2001
- 399
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Sensing humidity using nanostructured SiO posts: mechanism and optimizationWu, A.T. / Brett, M.J. et al. | 2001
- 433
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Near-field scanning optical microscope based on fast birefringence measurementOhkubo, S. / Umeda, N. et al. | 2001
- 433
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Near-field Scanning Optical Microscope Based on Fast Birefringence Measurement (S & M 0460)Ohkubo, S. / Umeda, N. et al. | 2001
- 445
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Diagnostics of semiconductor devices beyond the diffraction limit of lightFukuda, H. / Saiki, T. / Ohtsu, M. et al. | 2001
- 445
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Diagnostics of Semiconductor Devices beyond the Diffraction Limit of Light (S & M 0461)Fukuda, H. / Saiki, T. / Ohtsu, M. et al. | 2001
- 461
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Development of microsensors for measuring electric fields by using Pockels crystalTakahashi, T. et al. | 2001
- 461
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Development of Microsensors for Measuring Electric Fields by Using Pockels Crystal (S & M 0462)Takahashi, T. et al. | 2001
- 477
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Optical Current Measurement System Using Faraday Crystal, Polarization-Maintaining Fiber and Faraday Rotator (Theory and Experiment) (S & M 0463)Hirose, T. / Takada, T. / Murooka, Y. et al. | 2001
- 477
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Optical current measurement system using Faraday crystal, polarization-maintaining fiber and Faraday rotator (theory and experiment)Hirose, T. / Takada, T. / Murooka, Y. et al. | 2001
- 487
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Technique for sensing potential distributions on insulating materials with surface discharge using Pockels deviceKumada, A. / Chiba, M. / Hidaka, K. et al. | 2001
- 487
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Technique for Sensing Potential Distributions on Insulating Materials with Surface Discharge Using Pockels Device (S & M 0464)Kumada, A. / Chiba, M. / Hidaka, K. et al. | 2001