Advances in resist technology and processing V : 29 February - 2 March 1988, Santa Clara, California (English)

1988
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Table of contents conference proceedings

The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.

2
Zero-Misalignment Lithographic Process Using A Photoresist With Wavelength-Selected Tone
Hinsberg, William D. / MacDonald, Scott A. / Pederson, Lester A. / Willson, C. Grant | 1988
13
Heat Developable Resist For Multilayer Resist Technology
Steinmann, Alfred | 1988
21
MID UV Resist Materials Containing Pyridinium Ylides
Schwalm, Reinhold / Bottcher, Andreas / Koch, Horst | 1988
27
Negative Bleaching Photoresist (BLEST) For Mid-UV Exposure
Toriumi, Minoru / Ueno, Takumi / Iwayanagi, Takao / Hashimoto, Michiaki / Moriuchi, Noboru / Shirai, Sei-ichiro | 1988
33
Aqueous Base Developable Deep UV Resist Systems Based On Novel Monomeric And Polymeric Dissolution Inhibitors
Ito, Hiroshi | 1988
42
Mid-UV Photoresists Combining Chemical Amplification And Dissolution Inhibition
O'Brien, Michael J. / Crivello, James V. | 1988
51
New 2-Diazocyclohexane-1,3-Dione Photoactive Compounds For Deep U.V. Lithography
Schwartzkopf, George | 1988
60
Novolac Based Deep-UV Resists
McKean, Dennis R. / MacDonald, Scott A. / Clecak, Nicholas J. / Willson, C. Grant | 1988
67
An Evaluation Of Nitrobenzyl Ester Chemistry For Chemical Amplification Resists
Houlihan, F. M. / Shugard, A. / Gooden, R. / Reichmanis, E. | 1988
75
Contrast Enhancement Materials For Mid-Uv Applications
West, Paul R. / Davis, Gary C. / Regh, Karen A. | 1988
82
Cel Resist Processing For Submicron CMOS And Bipolar Circuits
Petrillo, K. E. / Smyth, M. J. / Hall, D. R. | 1988
91
I-Line Lithography Using A New Water-Soluble Contrast Enhancing Material
Endo, Masayuki / Sasago, Masaru / Hirai, Yoshihiko / Ogawa, Kazufumi / Ishihara, Takeshi | 1988
100
Photobleachable Diazonium Salt-Phenolic Resin Two-Layer Resist System
Uchino, Shou-ichi / Iwayanagi, Takao / Hashimoto, Michiaki | 1988
108
Effects Of Ion Bombardment In Oxygen Plasma Etching
Hartney, M. A. / Greene, W. M. / Soane, D. S. / Hess, D. W. | 1988
120
Thermal Crosslinking By Unexposed Naphthoquinone Diazides As Diffusion Inhibition Mechanism In The DESIRE Process
Roland, B. / Vandendriessche, J. / Lombaerts, R. / Denturck, B. / Jakus, C. | 1988
128
Aqueous Developable, Negative Working Resist Made Of Chlorinated Novolac Resin
Hiraoka, H. / Patlach, A. / Chiong, Kaolin N. / Seligson, Daniel / Pianetta, Piero | 1988
134
"Masking Effect" And "Internal CEL" New Design Concepts For A Positive Working Photoresist
Miura, Konoe / Ochiai, Tameichi / Kameyama, Yasuhiro / Kashi, Chie / Uoya, Shigeo / Nakajima, Masayuki / Kawai, Akira / Kishimura, Shinji | 1988
142
Photophysical Investigations Of Spin Cast Novolac Films
Kosbar, Laura L. / Frank, Curtis W. | 1988
145
High Resolution Imaging Over Severe Metal Topography Using Dyed Image Reversal Resist
Degiorgis, Giorgio A. L. M. / Calzavara, Mauro G. G. | 1988
154
Effect Of Developer Type And Agitation On Dissolution Of Positive Photoresist
Zee, Cynthia / Bell, W. R. / Neureuther, A. R. | 1988
162
Evaluation Of An Organosilicon Photoresist For Excimer Laser Lithography
McFarland, Janet C. / Orvek, Kevin J. / Ditmer, Gary A. | 1988
168
A Novel Silicon-Containing Resist For A Bi-Layer Resist System
Noguchi, Tsutomu / Nito, Keiichi / Seto, Jun'etsu / Hata, Izumi / Sato, Hiroshi / Tsumori, Toshirou | 1988
176
Study Of The Reaction Kinetics Of The Photoresist Aging Process
Perera, Thiloma / Watts, Michael P. C. | 1988
190
Characterization And Modeling Of High Resolution Positive Photoresists
Ohfuji, Takeshi / Yamanaka, KOji / Sakamoto, Mitsuru | 1988
198
Ladder Structure Silicone Resist PVSS
Saito, Kazumasa / Shiba, Shoji / Watanabe, Keiji / Yoneda, Yasuhiro | 1988
203
Examination Of The Mechanism Of The Post Exposure Bake Effect
Trefonas, P. / Daniels, B. K. / Eller, M. J. / Zampini, A. | 1988
212
A Novel Dry Develop Method Of Photoresist - "Unzipping Development" By Flood UV Irradiation
Katsuragi, Hayato / Miyazaki, Masao / Ishikawa, Norio / Mori, Kiyoto / Yamada, Hitomi / Morita, Shinzo / Hattori, Shuzo | 1988
220
Thermal Processing Of Resist Materials: A Kinetic Approach
Ziger, David H. / Wolk, Gary L. | 1988
226
Submicron Optical Lithography Using Contrast Enhanced Material With Diazonium Salt As A Photobleachable Material
Sakurai, Ikuo / Todoko, Masaaki / Hasegawa, Masazumi | 1988
233
Preliminary Performance Characterization Of The DESIRE Process
Garza, Cesar M. | 1988
242
Chemical And Physical Aspects Of Multilayer Resist Processing
Paraszczak, J. / Babich, E. / Heidenreich, J. / McGouey, R. / Ferreiro, L. / Chou, N. / Hatzakis, M. | 1988
253
Experimental Tests Of The Steady-State Model For Oxygen Reactive Ion Etching Of Silicon-Containing Polymers
Jurgensen, Charles W. / Shugard, Ann / Dudash, Nancy / Reichmanis, Elsa / Vasile, Michael J. | 1988
260
Silicon-Added Bilayer Resist (SABRE) System
McColgin, William C. / Daly, Robert C. / Jech, Joseph / Brust, Thomas B. | 1988
268
Alkali-Developable Organosilicon Positive Photoresist(OSPR)
Sugiyama, Hisashi / Inoue, Takashi / Mizushima, Akiko / Nate, Kazuo | 1988
274
Lithographic, Photochemical And O2RIE Properties Of Three Polysilane Copolymers
Taylor, Gary N. / Hellman, Molly Y. / Wolf, Thomas M. / Zeigler, John M. | 1988
291
A New Silicone-Based Positive Photoresist (SPP) For A Two-Layer Resist System
Imamura, Saburo / Tanaka, Akinobu / Onose, Katsuhide | 1988
295
Characterization Of Conditions Required To Implement Submicron Processes Over Topography Using Dry Develop Method(S)
Spencer, Allen C. / Grunwald, John J. / Cordes, William F. / Moffatt, William / Latchford, Ian / Ma, Tso-Ping / Chen, Bomy | 1988
312
Fundamentals Of Topographic Substrate Leveling
Stillwagon, L. E. / Larson, R. G. | 1988
321
Resist Dissolution Kinetics And Submicron Process Control
Garza, Cesar M. / Szmanda, Charles R. / Fischer, Ronald L. | 1988
339
Novolacs With Alternating P-Cresol & Polyhydroxyphenyl Monomer Units: Developer Cationic Effects And Thermal Properties
Blakeney, Andrew J. / Jeffries, Alfred T. / Wehrle, John J. / Gardner, Wesley M. | 1988
349
Novolak Design For High Resolution Positive Photoresists(II): Stone Wall Model For Positive Photoresist Development
Hanabata, M. / Uetani, Y. / Furuta, A. | 1988
355
Design Of A Positive Photoresist For Submicron Imaging Assisted By SAMPLE Simulation
Kokubo, T. / Idemoto, Y. / Kawabe, Y. / Uenishi, K. | 1988
364
Thermally Induced And Base Catalyzed Reactions Of Naphthoquinone Diazides
Koshiba, Mitsunobu / Murata, Makoto / Matsui, Mariko / Harita, Yoshiyuki | 1988
372
Chemical Reactions Induced By Soft X-Ray And E-Beam Exposure Of Novolac-Based Resists
Mancini, Derrick C. / Taylor, James W. / Jayaraman, T. V. / West, Richard J. | 1988
382
Determination Of Quantitative Resist Models From Experiment
Bell, William R. / Flanner, Philip D. / Zee, Cynthia / Tam, Nelson / Neureuther, Andrew R. | 1988
390
Comparison Of Modeling And Experimental Results In Contrast Enhancement Lithography
Brown, Tom / Mack, Chris A. | 1988
404
Photoresist As It's Own Process Monitor
Watts, M. P. C. / Perrera, T. / Ozarski, B. / Meyers, D. / Tan, R. | 1988
414
Studies Of Ultrathin Polymer Films For Lithographic Applications
Kuan, S. W. J. / Fu, C. C. / Pease, R. F. W. / Frank, C. W. | 1988
419
Optical Lithography For Half-Micron And Sub-Half-Micron Resolution
Vollenbroek, F. A. / Geomini, M. J. H. J. | 1988
429
Comparison Of Several Resist Linewidth Fluctuation Reduction Methods From Production Viewpoints
Hashimoto, Takeo / Yamanaka, Hiroshi / Iino, Teruo / Takahashi, Sakari | 1988
437
Evaluation Of Multilayer Resists For Submicron Technology
Nolscher, Christoph / Czech, Gunter / Karl, Jurgen / Koller, Klaus | 1988
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