Advances in resist technology and processing III : 10 - 11 March 1986, Santa Clara, California (English)

1991
  • ISBN:
    0892526661
  • Conference Proceedings  /  Print

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Table of contents conference proceedings

The tables of contents are generated automatically and are based on the data records of the individual contributions available in the index of the TIB portal. The display of the Tables of Contents may therefore be incomplete.

2
Poly(3-Butenyltrimethylsilane Sulfone): A Sensitive Positive Electron-Beam Resist For Two-Layer Systems
Gozdz, Antoni S. / Carnazza, Carolyn / Bowden, Murrae J. | 1986
8
Resist Characterization On Reflecting Substrates
Hayes, John / Bell, William R. / Ferguson, Richard / Neureuther, Andrew R. | 1986
14
Preparation And Lithographic Properties Of Poly(Trimethylsilylmethyl Methacrylate-Co-Chloromethyl Styrene)
Novembre, Anthony E. / Reichmanis, Elsa / Davis, Myrtle | 1986
22
Nanosecond Proton And Helium Ion Pulse Radiolysis Studies On Polystyrene
Tagawa, Seiichi / Kouchi, Noriyuki / Aoki, Yasushi / Shibata, Hiromi | 1986
28
A 2-Layer Resist System Derived From Trimethylsilylstyrene
MacDonald, S. A. / Allen, R. D. / Clecak, N. J. / Willson, C. G. / Frechet, J. M. | 1986
34
Desire : A Novel Dry Developed Resist System
Coopmans, Fedor / Roland, Bruno | 1986
40
Synthesis And Lithographic Characterization Of A Novel Organosilicon Novolac Resin
Tarascon, Regine G. / Shugard, Ann / Reichmanis, Elsa | 1986
48
Microplastic Structures
Feely, Wayne E. | 1986
62
A Novel, Aqueous Surface Treatment To Thermally Stabilize High Resolution Positive Photoresist Images*
Grunwald, John J. / Spencer, Allen C. | 1986
68
A New Class Of Resins For Deep Ultraviolet Photoresists
Osuch, C. E. / Brahim, K. / Hopf, F. R. / McFarland, M. J. / Mooring, A. / Wu, C. J. | 1986
76
High Resolution Positive Photoresists
Hanabata, M. / Furuta, A. / Uemura, Y. | 1986
83
Resists For Use In 248 Nm Excimer Laser Lithography
Orvek, Kevin J. / Palmer, Shane R. / Garza, Cesar M. / Fuller, Gene E. | 1986
91
Methacrylamide Copolymer Resists For Electron Beam Lithography
Namaste, Y.M. N. / Obendorf, S. K. / Rodriguez, F. | 1986
98
Reconsideration Of Fundamental Processes And Molecular Design Principles For High Sensitivity Dry Developable X-Ray Resist
Hattori, Shuzo / Morita, Shinzo / Hori, Masaru / Yamada, Hitomi | 1986
108
A Quantitative Assessment Of Image Reversal, A Candidate For A Submicron Process With Improved Linewidth Control
Gijsen, Rupert M. / Kroon, Hennie J. / Vollenbroek, Frans A. / Vervoordeldonk, Rene | 1986
117
Resist Characterization And Optimization Using A Hevelonment Rimulation Romnuter Nrooram, Prostm.
Garza, Cesar M. / Grindle, Steven P. | 1986
124
A Membrane Model For Positive Photoresist Development
Arcus, R. A. | 1986
135
Submicron Optical Lithography: Enhanced Resolution And Depth Of Focus Using Advanced Processing Materials And Process Optimization
Nuhn, Michele / Lee, Sungmuk | 1986
149
The Application Of Cem-420 In Photoresist Imaging Over Reflective Topographical Metal Substrate
Chen, Chunshing / Cheng, Sunny | 1986
162
Contrast Enhancement Materials. Effects Of Process Variables On Critical Dimension Control With Altilith Cem-420.
Williams, Robert E. / Weaver, Stan / Balch, Ernest W. / Sardella, John C. | 1986
171
Photochemical Image Enhancement (PIE)
Sheats, James R. / O'Toole, Michael M. / Hargreaves, John S. | 1986
180
Thin Silicon Films Used As Antireflection Coatings For Metal Coated Substrates
Polasko, K. J. / Griffing, B. F. | 1986
187
New Deep Uv Dyeable Negative Resist For CCD Micro Color Filter
Sanada, Shin-ichi / Miyamura, Masataka | 1986
192
Surface Tension Effects In Microlithography - Striations
Daniels, Brian K. / Szmanda, Charles R. / Templeton, Michael K. / Trefonas, Peter | 1986
202
Photoimageable Polyimide: A Dielectric Material For High Aspect Ratio Structures
Cech, Jay M. / Oprysko, Modest M. / Young, Peter L. / Li, Kin | 1986
206
A New Two-Layer Photoresist.
Miura, Konoe / Ochiai, Tameichi / Kameyama, Yasuhiro / Uoya, Shigeo / Yamazaki, Teruhiko | 1986
214
Productivity Enhancement Through Afterglow Photoresist Removal
Spencer, John E. / Hoff, Andrew | 1986
222
Reduction Of Proximity Reflective Notching On A Double Metal Vlsi Process By High Temperature Post Exposure Baked
Nistler, John L. / Mead, Tom R. / Spak, Mark A. | 1986
231
A Positive Photoresist Optimized For Both I-Line And UV-3 Exposure
Grunwald, John T. / Cordes, William F. / San Giacomo, Keith D. / Ben-Bassat, Joseph / Shalom, Eitan / Ben-Shushan, Giora | 1986
237
High Contrast Positive Resist(S) For Use In Megabit Processing With Broad Process Latitude
Sawoska, David A. / Lauchlan, Laurie J. / Smith, Laurel J. / Turner, Edwin J. / Spencer, Allen C. / Ben-Shushan, Giora | 1986
245
EPA 914 IR - A Positive Resist With Built-In Image Reversal (IR) Capabilities For Ulsi Technology
Cordes, William F. / Sawoska, David A. / Spencer, Allen C. / Turner, Edwin J. | 1986
253
Functional Characterization Of Positive Optical Resists
Nagarajan, Rao M. | 1986
260
A New Response Surface Analysis Procedure For Evaluating Process Control In Photolithography
Watts, M. P. C. / Hannifan, M. R. / Perera, T. | 1986
268
Modeling The Dependence Of Photoresist Contrast And Linewidth On Processing Variables
Srinivasan, V. / Babu, S. V. | 1986
276
Advanced Topics In Lithography Modeling
Mack, Chris A. | 1986
288
A Method For Generating Sloped Contact Holes Using A Cantilever Resist Structure
Marriott, Vic / Jucha, Barry | 1986
295
Antireflective Coating Material For Highly Reflective Surfaces With Topography
Ishii, W. / Hashimoto, K. / Itoh, N. / Yamazaki, H. / Yokota, A. / Nakane, H. | 1986
302
Optimized Material For Bottom Layer Of Trilevel Resist System
Moriuchi, Noboru / Shirai, Seiichiro / Iwayanagi, Takao | 1986
309
To Layer Resist For Plasma Etching
Wang, H. H. / Lin, E. | 1986
312
Simultaneous Vapor Deposition Of Metal And Monomeric Compounds: Lithographic Applications
Hiraoka, H. / Duran, J. | 1986
316
Polydimethylglutarimide (PMGI) Resist - A Progress Report
McCullough, A W. / Vidusek, D. A. / Legenza, M. W. / de Grandpre, M. / Imhof, J. | 1986
321
Improved Bilayer Resist System Using Contrast-Enhanced Lithography With Water-Soluble Photopolymer
Sasago, Masaru / Endo, Masayuki / Hirai, Yoshihiko / Ogawa, Kazufurni / Ishihara, Takeshi | 1986
330
Optimization Of A Bilayer Resist Process For Polysilicon Gate Lithography
Zych, Ludwik J. / Spadini, Gianpaolo / Vidusek, David A. / Legenza, Michael W. | 1986
337
Pcm Resist Process With Rie Development Method Applied For The Aluminum Etching Process
Ohtsuka, Hiroshi / Kanamori, Jun / Itoh, Yoshio / Matsuyi, Takayuki | 1986
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