VACUUM CHUCK STAGE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE (Japanese)
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- New search for: SUGAI SHIYUNTA
- New search for: TOYODA MASATO
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- New search for: NAKADA KAZUNARI
- New search for: SUGAI SHIYUNTA
- New search for: TOYODA MASATO
- New search for: MATSUMURA TAMIO
- New search for: NAKADA KAZUNARI
2019
- Patent / Electronic Resource
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Title:VACUUM CHUCK STAGE AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
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Additional title:真空チャックステージおよび半導体装置の製造方法
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Patent number:JP2019096907
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Patent applicant:
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Patent family:
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Contributors:SUGAI SHIYUNTA ( author ) / TOYODA MASATO ( author ) / MATSUMURA TAMIO ( author ) / NAKADA KAZUNARI ( author )
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Publisher:
- New search for: Europäisches Patentamt
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Publication date:2019-06-20
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Type of media:Patent
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Type of material:Electronic Resource
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Language:Japanese
- New search for: H01L / B23Q / B24B
- Further information on International Patent Classification
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Classification:
IPC: H01L Halbleiterbauelemente, SEMICONDUCTOR DEVICES / B23Q DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING, Einzelheiten, Bestandteile oder Zubehör für Werkzeugmaschinen, z.B. Anordnungen zum Kopieren oder Steuern / B24B MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING, Maschinen, Einrichtungen oder Verfahren zum Schleifen oder Polieren -
Source: