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The stress-induced escape of migrating aluminium from silicide interconnects
National licenceIOP Institute of Physics | 2001| -
Prediction of electromigration-void formation in copper conductors based on the electron configuration of matrix and solute atoms
British Library Online Contents | 2002| -
The stress-induced escape of migrating aluminium from silicide interconnects
Online Contents | 2001| -
Magnetic field influenced growth kinetics in chemical CdS thin-film deposition
Online Contents | 2001| -
Phase inhomogeneity effect in the near radiation field of light emitting diodes
Tema Archive | 1979| -
Ion beam irradiation of thin CaF2 films: a study of lithographic properties
British Library Online Contents | 2000| -
Modification of the donor-acceptor-pair luminescence in doped multi-thin film structures
National licenceElsevier | 1988| -
Ein optoelektronisches Verfahren zur optimalen Herstellung von Drahtbondkontakten
Tema Archive | 1984| -
Magnetic field influenced growth kinetics in chemical CdS thin-film deposition
Tema Archive | 2001|
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