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In situ ion implantation for quantitative secondary ion and sputtered neutral mass spectrometry analysis
National licenceAmerican Institute of Physics | 1986| -
Secondary ion emission from transition metals during exposure to oxygen and subsequent sputtering
National licenceElsevier | 1984| -
Preferential emission of lighter isotopes in the initial stage of sputtering
National licenceElsevier | 1987| -
Application of a liquid metal ion source to secondary ion mass spectrometry
National licenceSpringer Verlag | 1984| -
The influence of polarizability on the emission of sputtered molecular ions
National licenceElsevier | 1993| -
In situ ion implantation for quantification in secondary-ion mass spectrometry
National licenceSpringer Verlag | 1989| -
Isotopic mass effects in sputtering: Dependence on fluence and emission angle
National licenceElsevier | 1990| -
Yields and composition changes in low-energy sputtering of binary alloys: Experiments and computer simulations
National licenceAmerican Physical Society | 1993| -
Emission-angle integrated yields of neutral clusters in sub-keV-energy sputtering
National licenceElsevier | 1991| -
Hydrogen analysis by secondary ion mass spectrometry using HCs+ ions
National licenceElsevier | 1992| -
Preferential sputtering of isotopes: Fluence and emission-angle dependence
National licenceAmerican Physical Society | 1989| -
Secondary‐neutral microprobe with electron‐gas post‐ionization
National licenceAmerican Institute of Physics | 1993|
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