Journal of the Electrochemical Society
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
Inhaltsverzeichnis
- 3429
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Rechargeable 3 V Li Cells Using Hydrated Lamellar Manganese OxideBach, S. et al. | 1996
- 3435
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Bismuth(III) and Copper(II) Oxides as Catalysts for the Electro-oxidation of Organic CompoundsFranklin, T.C. et al. | 1996
- 3440
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Application of Nonequilibrium Thermodynamics to the Electrode Surfaces of Aluminum Electrolysis CellsHansen, E.M. et al. | 1996
- 3448
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Electrodeposition of Cobalt and Cobalt-Aluminum Alloys from a Room Temperature Chloroaluminate Molten SaltMitchell, J.A. et al. | 1996
- 3456
-
Lithiation of Alumina in Molten Li-K CarbonatesMurai, M. et al. | 1996
- 3462
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Photoimage Formation in a TiO2 Particle-Incorporated Prussian Blue FilmNishizawa, M. et al. | 1996
- 3466
-
Structure and Lithium Intercalation Properties of Synthetic and Natural GraphiteShi, H. et al. | 1996
- 3473
-
Performance of Lithium-V2O5 Xerogel Coin CellsTipton, A.L. et al. | 1996
- 3477
-
Spectrophotometric and Electrochemical Study of Gold-Iodide in Aqueous Borate MediumWang, X. et al. | 1996
- 3482
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Correlation Between Lithium Intercalation Capacity and Microstructure in Hard CarbonsXing, W. et al. | 1996
- 3491
-
A Hydrogen-Nitric Oxide Cell for the Synthesis of HydroxylamineOtsuka, K. et al. | 1996
- 3497
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Critical Analysis of Potential Step Data for Oxygen Transport in Electronically Conducting PerovskitesSunde, S. et al. | 1996
- 3497
-
Critical Analysis of Potentiostatic Step Data for Oxygen Transport in Electronically Conducting PerovskitesSunde, S. / Nisancioglu, K. / Guer, T. M. et al. | 1996
- 3504
-
Electrochemical and Surface Spectroscopic Studies of Thin Films of Bismuth Ruthenium Oxide (Bi2Ru2O7)Widelöv, A. et al. | 1996
- 3512
-
A Novel Seed Layer Scheme to Protect Catalytic Surfaces for Electroless DepositionDeSilva, M.J. et al. | 1996
- 3517
-
Selective Electroplating Between Metal and Semiconductor ElectrodesLo, T.-C. et al. | 1996
- 3521
-
A Search for the Mechanism of Direct Copper Plating via Bridging LigandsYang, C.H. et al. | 1996
- 3525
-
The Application of Atomic Force Microscopy for the Study of Li Deposition ProcessesAurbach, D. et al. | 1996
- 3532
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p- and n-Type Silicon Electrochemical Properties in Dilute Hydrofluoric Acid SolutionsBertagna, V. et al. | 1996
- 3532
-
p- n-Type Silicon Electrochemical Properties in Dilute Hydrofluoric Acid SolutionsBertagna, V. / Plougonven, C. / Rouelle, F. et al. | 1996
- 3539
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In Situ Spectroscopy in the Presence of Convective Flow under Steady-State Conditions: A Unified Mathematical FormalismTolmachev, Y.V. et al. | 1996
- 3548
-
Room Temperature Inorganic "Quasi-Molten Salts" as Alkali-Metal ElectrolytesXu, K. et al. | 1996
- 3554
-
Electrode Kinetics of Porous Mixed-Conducting Oxygen ElectrodesAdler, S.B. et al. | 1996
- 3565
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A New Class of Electrochemically and Thermally Stable Lithium Salts for Lithium Battery Electrolytes. II. Conductivity of Lithium Organoborates in Dimethoxyethane and Propylene CarbonateBarthel, J. et al. | 1996
- 3572
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A New Class of Electrochemically and Thermally Stable Lithium Salts for Lithium Battery Electrolytes. III. Synthesis and Properties of Some Lithium OrganoboratesBarthel, J. et al. | 1996
- 3572
-
A New Class of Electrochemically Thermally Stable Lithium Salts for Lithium Battery Electrolytes. III. Synthesis and Properties of Some Lithium OrganoboratesBarthel, J. / Buestrich, R. / Carl, E. et al. | 1996
- 3576
-
Kinetics of the Hydrogen Evolution Reaction on RuO2 and IrO2 Oxide Electrodes in H2SO4 Solution: An AC Impedance StudyChen, L. et al. | 1996
- 3585
-
Dehydroxylation of LiAlCl4 . xSO2 Electrolytes Using ChlorineHill, I.R. et al. | 1996
- 3590
-
Electrochemical Characteristics of Spinel Phase LiMn2O 4)-Based Cathode Materials Prepared by the Pechini Process. Influence of Firing Temperature and DopantsLiu, W. et al. | 1996
- 3597
-
An Experimental Study of Iron Corrosion in Sulfuric Acid Solution Containing Inhibitors by Noise MeasurementMészáros, L. et al. | 1996
- 3600
-
Modulation Spectroscopy of Subbandgap Light in Reduced TiO2 ElectrodesNogami, G. et al. | 1996
- 3606
-
In Situ Fourier Transform Infrared Spectroscopic Studies on a Metal Complex-Immobilized Polyaniline-Prussian Blue-Modified Electrode and the Application to the Electroreduction of CO2Ogura, K. et al. | 1996
- 3616
-
Mechanism of the Elementary Electrochemical Processes Taking Place during Oxygen Evolution on the Lead Dioxide ElectrodePavlov, D. et al. | 1996
- 3630
-
Characterization of Sr-Doped LaMnO3 and LaCoO3 as Cathode Materials for a Doped LaGaO3 Ceramic Fuel CellHuang, K. et al. | 1996
- 3636
-
Inductive Loops in Impedance Spectroscopy Caused by Electrical ShieldingFleig, J. et al. | 1996
- 3642
-
Chromium Vapor Species over Solid Oxide Fuel Cell Interconnect Materials and Their Potential for Degradation ProcessesHilpert, K. et al. | 1996
- 3648
-
Optimized Oxygen Plasma Etching of Polyurethane-Based Electro-optic Polymer for Low Loss Optical Waveguide FabricationChen, A. et al. | 1996
- 3652
-
Wet Chemical Digital Etching of GaAs at Room TemperatureDeSalvo, G.C. et al. | 1996
- 3656
-
Comparison of ICI and IBr Plasma Chemistries for Etching of InGaAlP AlloysHong, J. et al. | 1996
- 3656
-
Comparison of ICl and IBr Plasma Chemistries for Etching of InGaAlP AlloysHong, J. / Lee, J. W. / Lambers, E. S. et al. | 1996
- 3662
-
Electrochemical Determination of Solid-State Interdiffusion in Nickel-Platinum AlloysLantelme, F. et al. | 1996
- 3670
-
Effects of Plasma Excitation and Chemical Pretreatment on Adsorption of Tungsten Hexafluoride on Silicon and Silicon Dioxide Studied by X-Ray Photoelectron SpectroscopySaito, Y. et al. | 1996
- 3674
-
Modeling of Heat Transport and Wafer Heating Effects during Plasma EtchingTretheway, D. et al. | 1996
- 3681
-
Wet Chemical Etching of AlN and InAlN in KOH SolutionsVartuli, C.B. et al. | 1996
- 3685
-
Creation and Properties of Nitrogen Dangling Bond Defects in Silicon Nitride Thin FilmsWarren, W.L. et al. | 1996
- 3692
-
Auger Electron Spectroscopy Element Profiles and Interface with Substrates of Electroless Deposited Ternary AlloysArmyanov, S. et al. | 1996
- 3699
-
Effect of Anodic Concentration Overvoltage on Power Generation Characteristics of Solid Oxide Fuel CellsEguchi, K. et al. | 1996
- 3704
-
Photoluminescence of Porous Silicon in AirMaruyama, T. et al. | 1996
- 3706
-
Electronic Conduction Mechanism in Yttria-Stabilized Zirconia-Titania under Reducing AtmospheresSwider, K.E. et al. | 1996
- 3712
-
Photoelectrochemical Doping of TiO2 Particles and the Effect of Charge Carrier Density on the Photocatalytic Activity of Microporous Semiconductor Electrode FilmsTorimoto, T. et al. | 1996
- 3718
-
Near-Global Planarization of Oxide-Filled Shallow Trenches Using Chemical Mechanical PolishingBoyd, J.M. et al. | 1996
- 3722
-
Influence of SC-1-SC-2 Cleaning on Wafer-Bonded Silicon Dioxide StructuresEricsson, P. et al. | 1996
- 3727
-
Thermodynamic Heat Transfer and Mass Transport Modeling of the Sublimation Growth of Silicon Carbide CrystalsPons, M. et al. | 1996
- 3736
-
Thickness Dependence of Oxide WearoutDumin, D.J. et al. | 1996
- 3736
-
Thickness Dependece of Oxide WearoutDumin, D. J. et al. | 1996
- 3743
-
Micropattern Formation on ZnO Films Using a Photodissolution ReactionFutsuhara, M. et al. | 1996
- 3747
-
A WSixN Diffusion Barrier Formed with Electron Cyclotron Resonance Nitrogen PlasmaHirata, A. et al. | 1996
- 3752
-
Effects of Transmitted Electrons on Inductively Coupled Plasma Etching of a Si Wafer Through an Al MaskInananmi, R. et al. | 1996
- 3754
-
Si Wafer Etching with Synchrotron Radiation in a CF4 Gas AtmosphereInananmi, R. et al. | 1996
- 3757
-
Generation of Si-SiO2 Interface States at Surface Potentials near 0.4 and 0.7 eVItsumi, M. et al. | 1996
- 3762
-
In Situ Formation of Coated and Composite Palladium Particles via Spray PyrolysisJain, S. et al. | 1996
- 3771
-
Analysis and Application of Hydrogen Supplying Process in Metal-Oxide-Semiconductor StructuresKatashiro, M. et al. | 1996
- 3771
-
Analysis and application of hydrogen supplying metal-oxide-semiconductor structuresKatashiro, M. / Matsumoto, K. / Ohta, R. et al. | 1996
- 3778
-
Cause of Aligned-Orientation Growth of Titanium Silicide in Plasma Enhanced Chemical Vapor DepositionSaito, K. et al. | 1996
- 3784
-
A Monte Carlo Binary Collision Model for BF2 Implants into (100) Single-Crystal SiliconYang, S.-H. et al. | 1996
- 3791
-
Materials for Electrochemical Capacitors. Theoretical and Experimental ConstraintsSarangapani, S. et al. | 1996
- 3800
-
Erratum: Vol 142(4), 1149-1152 (1995)| 1996
- L249
-
Methacrolein Production from iso-Butane Using a AulYttria-Stabilized ZirconialAg Electrochemical Reaction CellYork, A. P. E. / Hamakawa, S. / Hayakawa, T. et al. | 1996
-
Low Energy Electron-Enhanced Etching of GaN-Si in Hydrogen Direct Current PlasmaGillis, H.P. et al. | 1996
-
Surface and Interfacial Roughness of Polished and Oxidized Silicon Wafers Evaluated by an Infrared Differential Interference Contrast TechniqueKhong, Y.L. et al. | 1996
- L256
-
Dopant Depth Profiling by Anodic Sectioning Using 0.1 M HCI ElectrolyteBardwell, J. A. / Evans, R. J. / Draper, N. et al. | 1996
-
Dopant Depth Profiling by Anodic Sectioning Using 0.1 M HCl ElectrolyteBardwell, J.A. et al. | 1996
-
High Temperature Local Oxidation of Silicon Field Isolation Morphological CharacterizationDeleonibus, S. et al. | 1996
-
Density of States Calculations of Small Diameter Single Graphene SheetsGerouki, A. et al. | 1996
-
Barrier Effect of TaSiN Layer for Oxygen DiffusionHara, T. et al. | 1996
-
Catalytic Activities of Rare-Earth Manganites for Cathodic Reduction of Oxygen in Alkaline SolutionHyodo, T. et al. | 1996
-
Fabrication of Thin Film LiCo0.5Ni0.5O2 Cathode for Li Rechargeable MicrobatteryLee, S.-J. et al. | 1996
-
Ionic Radius of (CF3SO2)3C- and Applicability of Stokes Law to Its Propylene Carbonate SolutionUe, M. et al. | 1996
-
Methacrolein Production from iso-Butane Using a Au-Yttria-Stabilized Zirconia-Ag Electrochemical Reaction CellYork, A.P.E. et al. | 1996