Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
Inhaltsverzeichnis
- 1687
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Articles - Contact-pressing metallizationKhang, Dahl-Young et al. | 2001
- 1691
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Articles - Flat-panel structure for field-emission displays with carbon nanotube cathodeZhu, Chang-chun et al. | 2001
- 1694
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Articles - Process development of methane -- Hydrogen -- Argon-based deep dry etching of InP for high aspect-ratio structures with vertical facet-quality sidewallsGrover, Rohit et al. | 2001
- 1699
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Articles - Complex roughening of Si under oblique bombardment by low-energy oxygen ionsAlkemade, P.F.A. et al. | 2001
- 1706
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Articles - Characterization of high-K dielectric ZrO2 films annealed by rapid thermal processingHu, Yao-Zhi et al. | 2001
- 1715
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Articles - Impact of nanometer-scale roughness on contact-angle hysteresis and globulin adsorptionMüller, Bert et al. | 2001
- 1721
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Articles - Photoenhanced wet etching of gallium nitride in KOH-based solutionsSkriniarová, J. et al. | 2001
- 1728
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Articles - Electron beam writing methods of x-ray masks for eliminating thermal image placement errorsKise, Koji et al. | 2001
- 1734
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Articles - Surface analysis of (NH4)2Sx-treated InGaN using x-ray photoelectron spectroscopyLin, Yow-Jon et al. | 2001
- 1739
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Articles - Enhancement on field-emission characteristics of diamondlike coated Mo substrates by redox processLin, Chin-Maw et al. | 2001
- 1743
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Articles - Selective plasma nitridation and contrast reversed etching of siliconSharma, Shashank et al. | 2001
- 1747
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Articles - Optical properties of InGaAs-AIAsSb type I single quantum wells lattice matched to InPGeorgiev, Nikolai et al. | 2001
- 1752
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Articles - Clocking of molecular quantum-dot cellular automataHennessy, Kevin et al. | 2001
- 1756
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Articles - Atomic structure and optical anisotropy of III-V(001) surfacesEsser, N. et al. | 2001
- 1762
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Articles - Nanoscale luminescence spectroscopy of defects at buried interfaces and ultrathin filmsBrillson, L.J. et al. | 2001
- 1769
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Articles - Secondary ion mass spectrometry characterization of the diffusion properties of 17 elements implanted into siliconFrancois-Saint-Cyr, H. et al. | 2001
- 1775
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Articles - Low damage and low surface roughness GaInP etching in Cl2-Ar electron cyclotron resonance processYoon, S.F. et al. | 2001
- 1782
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Articles - Rapid thermal chemical vapor deposition of zirconium oxide for metal-oxide-semiconductor field effect transistor applicationChang, Jane P. et al. | 2001
- 1788
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Articles - Characterization of bis(tertiary-butylamino)silane-based low-pressure chemical vapor deposition silicate glass filmsPark, Byeongju et al. | 2001
- 1796
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Articles - Pattern transfer from a biomolecular nanomask to a substrate via an intermediate transfer layerWinningham, Thomas A. et al. | 2001
- 1803
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Articles - Theoretical study of GaN molecular beam epitaxy growth using electron cyclotron resonance nitrogen plasmaFu, Wenning et al. | 2001
- 1808
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Articles - Calibrated scanning capacitance microscopy investigations on p-doped Si multilayersBasnar, B. et al. | 2001
- 1813
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Articles - Periodic submicrometer structures by sputteringDick, B. et al. | 2001
- 1820
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Articles - Focusing field emission arrays constructed by self-aligned photolithographyLi, Dejie et al. | 2001
- 1824
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Articles - Highly uniform and high optical quality In 0.22Ga0.78As-GaAs quantum wires grown on (221)A GaAs substrate by molecular beam epitaxyNitta, T. et al. | 2001
- 1828
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Articles - Microstructural pressure sensor based on an enhanced resonant mode hysteresis effectBrown, K.B. et al. | 2001
- 1833
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Articles - Metalorganic chemical vapor deposition Pb(Zr,Ti)O3 and selected lower electrode structures as a pathway to integrated piezoelectric microelectromechanical systemsChen, Ing-Shin et al. | 2001
- 1841
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Articles - Effect of time-varying axial magnetic field on photoresist ashing in an inductively coupled plasmaPark, Se-Geun et al. | 2001
- 1845
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Articles - Process characterization for tapered contact etchCelii, F.G. et al. | 2001
- 1852
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Articles - SCALPEL mark detection using Si-SiO2 and 100 ke V backscattered electronsFarrow, R.C. et al. | 2001
- 1857
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Articles - Preparation and properties of dc-sputtered IrO2 and Ir thin films for oxygen barrier applications in advanced memory technologyPinnow, C.U. et al. | 2001
- 1866
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Articles - Comparative investigation of interface effect on transmission function of electrons and holes in InAs-AISb-based heterostructuresIchizli, V.M. et al. | 2001
- 1870
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Articles - Notch formation by stress enhanced spontaneous etching of polysiliconChang, Jane P. et al. | 2001
- 1874
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Articles - Development of an advanced low-energy electron diffraction technique using field-emitted electrons from scanning tunneling microscope tipsMizuno, Seigi et al. | 2001
- 1879
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Articles - Integrated multiscale three-dimensional simulation approach in local interconnect gap-fill optimizationSukharev, Valeriy et al. | 2001
- 1894
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Articles - Breakdown characteristics of ultrathin gate oxides (<4 nm) in metal -- Oxide -- Semiconductor structure subjected to substrate injectionHuang, Chia-Hong et al. | 2001
- 1898
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Articles - In situ electron spin resonance observation of Si(111) 7 X 7 surface during hydrogenation processFutako, Wataru et al. | 2001
- 1901
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Articles - Fabrication of nanohole array on Si using self-organized porous alumina maskShingubara, Shoso et al. | 2001
- 1905
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Articles - Characterization of damage in InP dry etched using nitrogen containing chemistriesCarlström, C.F. et al. | 2001
- 1911
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Articles - Emission-uniformity improvement and work-function reduction of Si emitter tips by ethylene gas exposureMatsukawa, Takashi et al. | 2001
- 1915
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Articles - Monitoring lithographic focus and tilting performance by off-line overlay measurement toolsKu, Chin-Yu et al. | 2001
- 1925
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Articles - Self-aligned process for single electron transistorsBerg, E.W. et al. | 2001
- 1931
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Articles - Run to run control in tungsten chemical vapor deposition using H2-WF6 at low pressuresSreenivasan, Ramaswamy et al. | 2001
- 1942
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Articles - Effect of ammonia plasma pretreatment on silicon -- Nitride barriers for Cu metallization systemsQin, W. et al. | 2001
- 1948
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Articles - Growth and optical properties of GaAsSb quantum wells for 1.3 mm VCSELsCunningham, J.E. et al. | 2001
- 1953
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Articles - Enhancement of electron field emission from amorphous carbon films by plasma treatmentsLee, Kuei-Yi et al. | 2001
- 1958
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Articles - Growth and characterization of rare-earth monosulfides for cold cathode applicationsModukuru, Y. et al. | 2001
- 1962
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Articles - Impurity-free intermixing of GaAs-AIGaAs quantum wells using SiOx capping: Effect of nitrous oxide flow rateDeenapanray, Prakash N.K. et al. | 2001
- 1967
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Articles - Current and future ferroelectric nonvolatile memory technologyFox, G.R. et al. | 2001
- 1972
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Articles - Atomic models of ((bent radical)3X(bent radical)3)R30(degree) reconstruction on hexagonal 6H-SiC(0001) surfaceHan, Y. et al. | 2001
- 1976
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Articles - Formation of Hf ohmic contacts by surface treatment of n-GaN in KOH solutionsChung, Ming-Shaw et al. | 2001
- 1981
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Articles - Low temperature polysilicon chemical vapor deposition system for thin film transistor liquid crystal diodeHosokawa, Akihiro et al. | 2001
- 1985
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Brief Reports and Comments - Incorporating a corner correction scheme into enhanced pattern area density proximity effect correctionEa, C.S. et al. | 2001
- 1989
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Brief Reports and Comments - High-temperature real-time observation of surface defects induced by single ion irradiation using scanning-tunneling-microscope-ion-gun combined systemShimada, Kazuyoshi et al. | 2001
- 1995
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Brief Reports and Comments - Silicon-on-insulator processes for the fabrication of novel nanostructuresBourland, S. et al. | 2001
- 1998
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Rapid Communications - New in situ measurement method for nanoparticles, formed in a radio frequency plasma-enhanced chemical vapor deposition reactorSeol, Kwang Soo et al. | 2001
- 2001
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CUMULATIVE AUTHOR INDEX| 2001