Microelectronic engineering
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
Inhaltsverzeichnis
- 1
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PrefaceKruit, Pieter et al. | 2005
- 2
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Determining the impact of statistical fluctuations on resist line edge roughnessLeunissen, L.H.A. et al. | 2005
- 11
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Focused ion beam lithography for two dimensional array structures for photonic applicationsCabrini, S. et al. | 2005
- 16
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Critical dimension adapted alignment for EBDWWeidenmueller, U. et al. | 2005
- 22
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A new and simple probe-based method for preventing charging in focused-ion-beam micro-samplingFukuda, Muneyuki et al. | 2005
- 29
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Gas-assisted etching of niobium with focused ion beamFu, X.L. et al. | 2005
- 34
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New method to correct eddy current in magnetic focusing-deflection systemLiu, Zhuming et al. | 2005
- 39
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The mechanism of the ion beam inhibited etching formation in Gallium-FIB implanted resist filmsArshak, Khalil et al. | 2005
- 47
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UVIII for combined e-beam and optical exposure hybrid lithographyYasin, Shazia et al. | 2005
- 51
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Design aspects for the fabrication of gratings for DFB-lasers by direct write electron-beam lithographySteingrüber, R. et al. | 2005
- 55
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Arrayed microcolumn operation with a wafer-scale Einzel lensKim, Ho-Seob et al. | 2005
- 62
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Manufacturable MEMS microcolumnSaini, R. et al. | 2005
- 73
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Topside release of atomic force microscopy probes with molded diamond tipsFouchier, M. et al. | 2005
- 79
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Fabrication of refractive X-ray focusing lenses by deep X-ray lithographyPérennès, F. et al. | 2005
- 88
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Dry release of all-polymer structuresHaefliger, D. et al. | 2005
- 93
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Electrocapillary force actuation of microfluidic elementsBerre, M.Le et al. | 2005
- 100
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Microfabricated textured surfaces for super-hydrophobicity investigationsCallies, Mathilde et al. | 2005
- 106
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Dry release fabrication and testing of SiC electrostatic cantilever actuatorsJiang, Liudi et al. | 2005
- 112
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Characterization of pneumatically activated microvalves by measuring electrical conductanceGalas, J.-C. et al. | 2005
- 118
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Polymeric film characterization for use in bimorph chemical sensorsChatzandroulis, S. et al. | 2005
- 125
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Laser trapping and micro-manipulation using optical vorticesCojoc, D. et al. | 2005
- 132
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Glass valveless micropump using electromagnetic actuationYamahata, Christophe et al. | 2005
- 138
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Particle filters integrated inside a silicon waferVenstra, W.J. et al. | 2005
- 142
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Fabrication error model and near field beam modulation analysis for phase step diffractive gratingsGao, Fuhua et al. | 2005
- 147
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A systematic study of dry etch process for profile control of silicon tipsTao, Jiarui et al. | 2005
- 152
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Investigation of the bond strength between the photo-sensitive polymer SU-8 and goldNordström, Maria et al. | 2005
- 158
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Development of the new thermal inkjet head on SOI waferBae, Ki Deok et al. | 2005
- 164
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Monolithically integrated micro flow sensor for lab-on-chip applicationsSchöler, L. et al. | 2005
- 171
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Design, fabrication and characterization of force sensors for nanorobotDomanski, K. et al. | 2005
- 178
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SnO2 sub-micron wires for gas sensorsCandeloro, P. et al. | 2005
- 185
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A coupled cavity micro-fluidic dye ring laserGersborg-Hansen, M. et al. | 2005
- 190
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Novel resonant cantilever mass change detection and resonant frequency tuningGrigorov, A.V. et al. | 2005
- 195
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Geometry dependence of the energy levels in silicon isolated double quantum-dotsTanner, M.G. et al. | 2005
- 201
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Magnetic nanowires patterned in the La2-3Sr1-3MnO3 half-metalArnal, T. et al. | 2005
- 206
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Electron beam lithography for nanometer-scale planar double-gate transistorsWeber, W. et al. | 2005
- 212
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Highly selective etch process for silicon-on-insulator nano-devicesWahlbrink, T. et al. | 2005
- 218
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Double-island single-electron transistor operated at radio-frequency for sensitive and fast charge detectionBrenner, R. et al. | 2005
- 224
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Fabrication of ultra-thin-film SOI transistors using the recessed channel conceptDreeskornfeld, L. et al. | 2005
- 229
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Photovoltaic In0.5Ga0.5As-GaAs quantum dot infrared photodetector with a single-sided Al0.3Ga0.7As layerHwang, S.H. et al. | 2005
- 233
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Surface mass spectrometric analysis of SiCl4-SiF4-O2 dry etch gate recessed 120nm T-gate GaAs pHEMTsLi, X. et al. | 2005
- 239
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A hybrid CMOS#8211SET co-fabrication platform using nano-grain polysilicon wiresEcoffey, S. et al. | 2005
- 244
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A Si-SiGe MOSFET utilizing low-temperature wafer bondingKoliopoulou, S. et al. | 2005
- 248
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Utilizing self-assembled multilayers in lithographic processing for nanostructure fabrication: Initial evaluation of the electrical integrity of nanogapsAnderson, M.E. et al. | 2005
- 253
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Maskless fabrication of nanoelectrode structures with nanogaps by using Ga focused ion beamsNagase, Takashi et al. | 2005
- 260
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Fabrication of patterned magnetic nanodots by laser interference lithographyMurillo, R. et al. | 2005
- 266
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Exploration of the ultimate patterning potential achievable with focused ion beamsGierak, J. et al. | 2005
- 279
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Single atom Si nanoelectronics using controlled single-ion implantationMitic, M. et al. | 2005
- 287
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Antireflection sub-wavelength gratings fabricated by spin-coating replicationKanamori, Y. et al. | 2005
- 294
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Selective deposition of gold nanoparticles on SiO2-Si nanowireSheu, J.T. et al. | 2005
- 300
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Characterization of focused electron beam induced carbon deposits from organic precursorsBret, Tristan et al. | 2005
- 307
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Influence of the beam scan direction during focused electron beam induced deposition of 3D nanostructuresBret, Tristan et al. | 2005
- 314
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Fabrication of subwavelength aluminum wire grating using nanoimprint lithography and reactive ion etchingAhn, Seh-Won et al. | 2005
- 319
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New salicidation technology PtSi for strained SiGe deviceRong, B. et al. | 2005
- 324
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Adsorbed layer etching of fused silica by excimer laser with nanometer depth precisionZimmer, K. et al. | 2005
- 331
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Micro- and nanoxerography in liquids #8211 controlling pattern definitionNaujoks, N. et al. | 2005
- 338
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Silicon nanowires fabricated by means of an underetching techniqueCiucci, S. et al. | 2005
- 343
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A single-step process for making nanofluidic channels using electron beam lithographyPearson, J.L. et al. | 2005
- 349
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Ordered quantum dots formation on engineered template by molecular beam epitaxySuraprapapich, Suwaree et al. | 2005
- 353
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A novel method for making high aspect ratio solid diamond tipsWang, Zongli et al. | 2005
- 359
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Improvement in the aspect ratio of fabricated minute dots by the volume change thermal lithography techniqueKuwahara, M. et al. | 2005
- 364
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A continuously tunable organic DFB laserWang, J. et al. | 2005
- 369
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Nanoscaled niobium trilayer technology, using temperature controlled pattern transferZijlstra, T. et al. | 2005
- 374
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Building and testing submicrometer metallic (gold) air-bridges for nanotransport applicationsBorzenko, T. et al. | 2005
- 381
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Maskless lithographyPease, R.Fabian et al. | 2005
- 393
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Line end shortening in CPL mask technologyConley, Will et al. | 2005
- 398
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Phase shifted addressing using a spatial light modulatorLjungblad, Ulric et al. | 2005
- 404
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Evaluation of intrinsic film stress distributions from induced substrate deformationEngelstad, R.L. et al. | 2005
- 410
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Space-invariant multiple-beam achromatic EUV interference lithographySolak, Harun H. et al. | 2005
- 417
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Rapid prototyping of two-dimensional photonic crystal devices by a dual beam focused ion beam systemStomeo, T. et al. | 2005
- 422
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Fabrication of photonic crystals in tantalum pentoxide filmsHuebner, Uwe et al. | 2005
- 429
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Artificially inscribed defects in opal photonic crystalsJonsson, Fredrik et al. | 2005
- 436
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Growth and characterisation of birefringent films on textured silicon substratesWalsby, E.D. et al. | 2005
- 442
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Fabrication of two-dimensional hybrid photonic crystals utilizing electron beam lithographyStodolka, J. et al. | 2005
- 448
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Optical activity in chiral gold nanogratingsJefimovs, K. et al. | 2005
- 452
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Micromachining of organic polymers by X-ray photo-etching using a 10Hz laser-plasma radiation sourceBartnik, A. et al. | 2005
- 457
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Leibniz-Institut für Oberflächenmodifizierung e.V. (IOM), Ionenstrahltechnik, Permoserstr. 15, D-04318 Leipzig, GermanyDienelt, J. et al. | 2005
- 464
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Selective dry etch process for step and flash imprint lithographyLe, Ngoc V. et al. | 2005
- 474
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Increased plasma etch resistance of thin polymeric and photoresist filmsVourdas, N. et al. | 2005
- 479
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Comparative study of calixarene and HSQ resist systems for the fabrication of sub-20nm MOSFET device demonstratorsKretz, J. et al. | 2005
- 484
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Correlation of surface roughness with edge roughness in PMMA resistYasin, Shazia et al. | 2005
- 490
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Enhanced dill exposure model for thick photoresist lithographyLiu, Shijie et al. | 2005
- 496
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Micro Resist Technology GmbH, Koepenicker Strasse 325, D-12555 Berlin, GermanyReuther, F. et al. | 2005
- 503
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A single layer negative tone lift-off photo resist for patterning a magnetron sputtered Ti-Pt-Au contact system and for solder bumpsVoigt, A. et al. | 2005
- 509
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Simplified resist models for efficient simulation of contact holes and line endsTollkühn, B. et al. | 2005
- 515
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Three-dimensional simulation of resist pattern deformation by surface tension at the drying processKotera, M. et al. | 2005
- 521
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Resist nano-modification technology for enhancing the lithography and etching performanceYou, Hsin-Chiang et al. | 2005
- 528
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Novel electron beam resist material using hydrophilic protecting groupSaito, Satoshi et al. | 2005
- 533
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Simulation of the energy absorption and the resist development at sub-150nm ion lithographyVutova, K. et al. | 2005
- 540
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Silicon-containing copolymers of MMA tested for a positive-tone high-resolution bi-layer e-beam resist systemMaessen, J. et al. | 2005
- 546
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An ultra sensitive DNA detection by using gold nanoparticle multilayer in nano-gap electrodesTsai, Chien-Ying et al. | 2005
- 556
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In situ bio-functionalization and cell adhesion in microfluidic devicesZhang, Z.L. et al. | 2005
- 563
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A disposable capillary electrophoresis microchip with an indium tin oxide decoupler-amperometric detectorKim, Ju-Ho et al. | 2005
- 571
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Towards a planar sample support for in situ experiments in structural biologyGullo, M.R. et al. | 2005
- 575
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Biological samples micro-manipulation by means of optical tweezersFerrari, E. et al. | 2005
- 582
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Nanofabrication of protein-patterned substrates for future cell adhesion experimentsKünzi, P.A. et al. | 2005
- 587
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Development of impedance biosensors with nanometer gaps for marker-free analytical measurementsMalavé, A. et al. | 2005
- 593
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Fabrication of hybrid organic#8211inorganic vertical microcavities through imprint technologyMartiradonna, L. et al. | 2005
- 598
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Temperature-reduced nanoimprint lithography for thin and uniform residual layersBogdanski, N. et al. | 2005
- 605
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Hybrid bendable stamp copies for molding fabricated by nanoimprint lithographySchift, Helmut et al. | 2005
- 612
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Nanoimprint lithography for planar chiral photonic meta-materialsChen, Yifang et al. | 2005
- 618
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Instrumented indentation testing for local characterisation of polymer properties after nanoimprintCross, G.L.W. et al. | 2005
- 625
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Choice of the molecular weight of an imprint polymer for hot embossing lithographySchulz, H. et al. | 2005
- 633
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Distortion and overlay performance of UV step and repeat imprint lithographyChoi, Jin et al. | 2005
- 641
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Fine pattern transfer by nanocasting lithographyHirai, Yoshihiko et al. | 2005
- 647
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Fabrication of PDMS stamps for the patterned growth of carbon nanotubesArgyrakis, P. et al. | 2005
- 653
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Nanoimprint lithography of sub-100 nm 3D structuresKonijn, M. et al. | 2005
- 659
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Implication of the light polarisation for UV curing of pre-patterned resistsWissen, M. et al. | 2005
- 665
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Room temperature nanoimprint lithography using a bilayer of HSQ-PMMA resist stackTao, Jiarui et al. | 2005
- 670
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A study of resist flow during nanoimprint lithographyMacintyre, D.S. et al. | 2005
- 676
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Replication of sub-40nm gap nanoelectrodes over an 8-in. substrate by nanoimprint lithographyTallal, J. et al. | 2005
- 682
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Chemical patterning of sub-50-nm half pitches via nanoimprint lithographyPark, Sunggook et al. | 2005
- 689
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Enhanced UV imprint ability with a tri-layer stamp configurationRoy, E. et al. | 2005
- 695
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Production of structures for microfluidics using polymer imprint techniquesMills, C.A. et al. | 2005
- 701
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Author Index| 2005
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Table of Contents| 2005
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Editorial board| 2005