Microstructural characterization of SiO~x surface contaminants on ashed aluminum thin films (Englisch)
- Neue Suche nach: Synowicki, R. A.
- Neue Suche nach: Hale, J. S.
- Neue Suche nach: Kubik, R. D.
- Neue Suche nach: Nafis, S.
- Neue Suche nach: Woollam, J. A.
- Neue Suche nach: Synowicki, R. A.
- Neue Suche nach: Hale, J. S.
- Neue Suche nach: Kubik, R. D.
- Neue Suche nach: Nafis, S.
- Neue Suche nach: Woollam, J. A.
In:
SURFACE AND COATINGS TECHNOLOGY
;
90
, 1/2
;
150-155
;
1997
-
ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Microstructural characterization of SiO~x surface contaminants on ashed aluminum thin films
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Beteiligte:Synowicki, R. A. ( Autor:in ) / Hale, J. S. ( Autor:in ) / Kubik, R. D. ( Autor:in ) / Nafis, S. ( Autor:in ) / Woollam, J. A. ( Autor:in )
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Erschienen in:SURFACE AND COATINGS TECHNOLOGY ; 90, 1/2 ; 150-155
-
Verlag:
- Neue Suche nach: ELSEVIER SEQUOIA SA
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Erscheinungsdatum:01.01.1997
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Format / Umfang:6 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 671.73
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 671.73 -
Datenquelle:
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