Deep InP Gratings for Opto-Electronic Devices Etched by Cl~2/CH~4/Ar Inductively Coupled Plasma (Englisch)
- Neue Suche nach: Wang, J.
- Neue Suche nach: Tian, J.-B.
- Neue Suche nach: Xiong, B.
- Neue Suche nach: Sun, C.-Z.
- Neue Suche nach: Hao, Z.-B.
- Neue Suche nach: Luo, Y.
- Neue Suche nach: Wang, J.
- Neue Suche nach: Tian, J.-B.
- Neue Suche nach: Xiong, B.
- Neue Suche nach: Sun, C.-Z.
- Neue Suche nach: Hao, Z.-B.
- Neue Suche nach: Luo, Y.
In:
CHINESE PHYSICS LETTERS
;
23
, 8
;
2158-2160
;
2006
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Deep InP Gratings for Opto-Electronic Devices Etched by Cl~2/CH~4/Ar Inductively Coupled Plasma
-
Beteiligte:Wang, J. ( Autor:in ) / Tian, J.-B. ( Autor:in ) / Xiong, B. ( Autor:in ) / Sun, C.-Z. ( Autor:in ) / Hao, Z.-B. ( Autor:in ) / Luo, Y. ( Autor:in )
-
Erschienen in:CHINESE PHYSICS LETTERS ; 23, 8 ; 2158-2160
-
Verlag:
- Neue Suche nach: CHINESE PHYSICAL SOCIETY
-
Erscheinungsdatum:01.01.2006
-
Format / Umfang:3 pages
-
ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
-
Sprache:Englisch
- Neue Suche nach: 530
- Weitere Informationen zu Dewey Decimal Classification
-
Klassifikation:
DDC: 530 -
Datenquelle:
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
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