Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °C (Englisch)
- Neue Suche nach: Muñoz, D.
- Neue Suche nach: Voz, C.
- Neue Suche nach: Martin, I.
- Neue Suche nach: Orpella, A.
- Neue Suche nach: Puigdollers, J.
- Neue Suche nach: Alcubilla, R.
- Neue Suche nach: Villar, F.
- Neue Suche nach: Bertomeu, J.
- Neue Suche nach: Andreu, J.
- Neue Suche nach: Damon-Lacoste, J.
- Neue Suche nach: Muñoz, D.
- Neue Suche nach: Voz, C.
- Neue Suche nach: Martin, I.
- Neue Suche nach: Orpella, A.
- Neue Suche nach: Puigdollers, J.
- Neue Suche nach: Alcubilla, R.
- Neue Suche nach: Villar, F.
- Neue Suche nach: Bertomeu, J.
- Neue Suche nach: Andreu, J.
- Neue Suche nach: Damon-Lacoste, J.
In:
THIN SOLID FILMS
;
516
, 5
;
761-764
;
2008
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °C
-
Beteiligte:Muñoz, D. ( Autor:in ) / Voz, C. ( Autor:in ) / Martin, I. ( Autor:in ) / Orpella, A. ( Autor:in ) / Puigdollers, J. ( Autor:in ) / Alcubilla, R. ( Autor:in ) / Villar, F. ( Autor:in ) / Bertomeu, J. ( Autor:in ) / Andreu, J. ( Autor:in ) / Damon-Lacoste, J. ( Autor:in )
-
Erschienen in:THIN SOLID FILMS ; 516, 5 ; 761-764
-
Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
-
Erscheinungsdatum:01.01.2008
-
Format / Umfang:4 pages
-
ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
-
Format:Print
-
Sprache:Englisch
- Neue Suche nach: 530.4275
- Weitere Informationen zu Dewey Decimal Classification
-
Klassifikation:
DDC: 530.4275 -
Datenquelle:
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- 487
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Fourth international conference on hot-wire CVD (Cat-CVD) processBourée, Jean-Eric / Mahan, A. Harv et al. | 2007
- 490
-
Deposition of new microcrystalline materials, μc-SiC, μc-GeC by HWCVD and solar cell applicationsKonagai, Makoto et al. | 2007
- 496
-
Hot Wire CVD for thin film triple junction cells and for ultrafast deposition of the SiN passivation layer on polycrystalline Si solar cellsSchropp, R.E.I. / Franken, R.H. / Goldbach, H.D. / Houweling, Z.S. / Li, H. / Rath, J.K. / Schüttauf, J.W.A. / Stolk, R.L. / Verlaan, V. / van der Werf, C.H.M. et al. | 2007
- 500
-
Future prospect of remote Cat-CVD on the basis of the production, transportation and detection of H atomsUmemoto, Hironobu / Matsumura, Hideki et al. | 2007
- 503
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Evaluation of hydrogen atom density generated on a tungsten mesh surfaceMiura, Hitoshi / Kuroki, Yuichiro / Yasui, Kanji / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 506
-
Mass spectrometric study of gas-phase chemistry in the hot-wire CVD processes of SiH4/NH3 mixturesShi, Y.J. / Eustergerling, B.D. / Li, X.M. et al. | 2007
- 511
-
Hot-wire deposition of a-Si:H thin films on wafer substrates studied by real-time spectroscopic ellipsometry and infrared spectroscopyvan den Oever, P.J. / Gielis, J.J.H. / van de Sanden, M.C.M. / Kessels, W.M.M. et al. | 2007
- 517
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UV–visible absorption spectra of silicon CVD intermediatesNakamura, Seigo / Matsugi, Akira / Susa, Akio / Koshi, Mistuo et al. | 2007
- 521
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Filament seasoning and its effect on the chemistry prevailing in hot filament activated gas mixtures used in diamond chemical vapour depositionComerford, Dane W. / D'Haenens-Johansson, Ulrika F.S. / Smith, James A. / Ashfold, Michael N.R. / Mankelevich, Yuri A. et al. | 2007
- 526
-
Film stoichiometry and gas dissociation kinetics in hot-wire chemical vapor deposition of a-SiGe:HDoyle, James R. / Xu, Yueqin / Reedy, Robert / Branz, Howard M. / Harv Mahan, A. et al. | 2007
- 529
-
A comparison of grain nucleation and grain growth during crystallization of HWCVD and PECVD a-Si:H filmsMahan, A.H. / Ahrenkiel, S.P. / Schropp, R.E.I. / Li, H. / Ginley, D.S. et al. | 2007
- 533
-
Deposition of device quality silicon nitride with ultra high deposition rate (>7 nm/s) using hot-wire CVDVerlaan, V. / Houweling, Z.S. / van der Werf, C.H.M. / Romijn, I.G. / Weeber, A.W. / Goldbach, H.D. / Schropp, R.E.I. et al. | 2007
- 533
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Deposition of device quality silicon nitride with ultra high deposition rate (greater-than 7 nm/s) using hot-wire CVDVerlaan, V. / Houweling, Z.S. / Werf, C.H.M. van der / Romijn, I.G. / Weeber, A.W. / Goldbach, H.D. / Schropp, R.E.I. et al. | 2008
- 537
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Recent situation of industrial implementation of Cat-CVD technology in JapanMatsumura, Hideki / Ohdaira, Keisuke et al. | 2007
- 541
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ULVAC research and development of Cat-CVD applicationsAsari, Shin / Fujinaga, Tetsushi / Takagi, Makiko / Hashimoto, Masanori / Saito, Kazuya / Harada, Masamichi / Ishikawa, Michio et al. | 2007
- 545
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AlGaN/GaN HEMTs passivated by Cat-CVD SiN FilmOku, Tomoki / Kamo, Yoshitaka / Totsuka, Masahiro et al. | 2007
- 548
-
GaN-based FETs using Cat-CVD SiN passivation for millimeter-wave applicationsHigashiwaki, Masataka / Mimura, Takashi / Matsui, Toshiaki et al. | 2007
- 553
-
Cat-CVD SiN passivation films for OLEDs and packagingHeya, Akira / Minamikawa, Toshiharu / Niki, Toshikazu / Minami, Shigehira / Masuda, Atsushi / Umemoto, Hironobu / Matsuo, Naoto / Matsumura, Hideki et al. | 2007
- 558
-
An organic catalytic CVD: Principle, apparatus and applicationsHata, Tsuyoshi / Nakayama, Hiroshi et al. | 2007
- 564
-
Comparison of growth mechanisms of silicon thin films prepared by HWCVD with PECVDZhou, Yuqin / Zhou, Bingqing / Gu, Jinhua / Zhu, Meifang / Liu, Fengzhen et al. | 2007
- 568
-
Improved transport properties of microcrystalline silicon films grown by HWCVD with a variable hydrogen dilution processNiikura, Chisato / Brenot, Romain / Guillet, Joelle / Bourée, Jean-Eric et al. | 2007
- 572
-
Photo-carrier transport in microcrystalline silicon films prepared by hot-wire CVDMurata, Kenji / Shimakawa, Koichi / Takai, Yuta / Itoh, Takashi et al. | 2007
- 576
-
Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 °C by Hot-Wire Chemical Vapor DepositionFilonovich, S.A. / Ribeiro, M. / Rolo, A.G. / Alpuim, P. et al. | 2007
- 576
-
Phosphorous and boron doping of nc-Si:H thin films deposited on plastic substrates at 150 deg C by hot-wire chemical vapor depositionFilonovich, S.A. / Ribeiro, M. / Rolo, A.G. / Rolo, P.A. et al. | 2008
- 580
-
Electrical properties/Doping efficiency of doped microcrystalline silicon layers prepared by hot-wire chemical vapor depositionKumar, P. / Schroeder, B. et al. | 2007
- 584
-
Nanocrystalline silicon thin films on PEN substratesVillar, F. / Escarré, J. / Antony, A. / Stella, M. / Rojas, F. / Asensi, J.M. / Bertomeu, J. / Andreu, J. et al. | 2007
- 588
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Localized oxidation influence from conductive atomic force microscope measurement on nano-scale I-V characterization of silicon thin film solar cellsShen, Zhenhua / Eguchi, Mototaka / Gotoh, Tamihiro / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 593
-
Wide optical bandgap p-type μc-Si:Ox:H prepared by Cat-CVD and comparisons to p-type μc-Si:HMatsumoto, Yasuhiro / Sánchez R., Victor / Avila G., Alejandro et al. | 2007
- 593
-
Wide optical bandgap p-type mu c-Si:Ox:H prepared by Cat-CVD and comparisons to p-type micro-c-Si/ -c-SiMatsumoto, Y. / Sanchez R., V. / Avila G., A. et al. | 2008
- 597
-
Electronic properties of low temperature epitaxial silicon thin film photovoltaic devices grown by HWCVDRichardson, Christine E. / Langeland, Krista / Atwater, Harry A. et al. | 2007
- 600
-
Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin filmsOhdaira, Keisuke / Abe, Yuki / Fukuda, Makoto / Nishizaki, Shogo / Usami, Noritaka / Nakajima, Kazuo / Karasawa, Takeshi / Torikai, Tetsuya / Matsumura, Hideki et al. | 2007
- 604
-
Formation of gas barrier films by Cat-CVD method using organic silicon compoundsOyaidu, Takuya / Ogawa, Yohei / Tsurumaki, Kazuhiko / Ohdaira, Keisuke / Matsumura, Hideki et al. | 2007
- 607
-
Estimation of moisture barrier ability of thin SiNx single layer on polymer substrates prepared by Cat-CVD methodSaitoh, K. / Kumar, R.S. / Chua, S. / Masuda, A. / Matsumura, H. et al. | 2007
- 611
-
Protection of organic light-emitting diodes over 50000 hours by Cat-CVD SiNx/SiOxNy stacked thin filmsOgawa, Yohei / Ohdaira, Keisuke / Oyaidu, Takuya / Matsumura, Hideki et al. | 2007
- 615
-
Effect of hydrogen on SiNx films deposited by Cat-CVD methodFujinaga, Tetsushi / Takagi, Makiko / Hashimoto, Masanori / Asari, Shin / Saito, Kazuya et al. | 2007
- 618
-
Microstructure of highly crystalline silicon carbide thin films grown by HWCVD techniqueDasgupta, A. / Klein, S. / Houben, L. / Carius, R. / Finger, F. / Luysberg, M. et al. | 2007
- 622
-
Effect of filament and substrate temperatures on the structural and electrical properties of SiC thin films grown by the HWCVD techniqueDasgupta, A. / Huang, Y. / Houben, L. / Klein, S. / Finger, F. / Carius, R. / Luysberg, M. et al. | 2007
- 626
-
Structural changes of hot-wire CVD silicon carbide thin films induced by gas flow ratesTabata, Akimori / Mori, Masahiko et al. | 2007
- 630
-
Electronic properties of low temperature microcrystalline silicon carbide prepared by Hot Wire CVDKlein, Stefan / Dasgupta, Arup / Finger, Friedhelm / Carius, Reinhard / Bronger, Torsten et al. | 2007
- 633
-
Influence of gas pressure on low-temperature preparation and film properties of nanocrystalline 3C-SiC thin films by HW-CVD using SiH4/CH4/H2 systemKomura, Yusuke / Tabata, Akimori / Narita, Tomoki / Kondo, Akihiro et al. | 2007
- 637
-
Characterization of polycrystalline SiC films grown by HW-CVD using silicon tetrafluorideAbe, Katsuya / Nagasaka, Yohei / Kida, Takahiro / Yamakami, Tomohiko / Hayashibe, Rinpei / Kamimura, Kiichi et al. | 2007
- 641
-
Properties of hetero-structured SiCX films deposited by hot-wire CVD using SiH3CH3 as carbon sourceItoh, Takashi / Kawasaki, Takahiro / Takai, Yuta / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 644
-
SiCOI structure fabricated by catalytic chemical vapor depositionYasui, Kanji / Miura, Hitoshi / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 648
-
XPS study of carbon nitride films deposited by hot filament chemical vapor deposition using carbon filamentAono, Masami / Aizawa, Shinichiro / Kitazawa, Nobuaki / Watanabe, Yoshihisa et al. | 2007
- 652
-
Effect of thermal annealing on the properties of a-SiCN:H films by hot wire chemical vapor deposition using hexamethyldisilazaneLimmanee, Amornrat / Otsubo, Michio / Sugiura, Tsutomu / Sato, Takehiko / Miyajima, Shinsuke / Yamada, Akira / Konagai, Makoto et al. | 2007
- 656
-
Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materialsNakayamada, T. / Matsuo, K. / Hayashi, Y. / Izumi, A. / Kadotani, Y. et al. | 2007
- 659
-
Growth of GaN on SiC/Si substrates using AlN buffer layer by hot-mesh CVDTamura, Kazuyuki / Kuroki, Yuichiro / Yasui, Kanji / Suemitsu, Maki / Ito, Takashi / Endou, Tetsuro / Nakazawa, Hideki / Narita, Yuzuru / Takata, Masasuke / Akahane, Tadashi et al. | 2007
- 663
-
Defect analysis of thin film Si-based alloys deposited by hot-wire CVD using junction capacitance methodsCohen, J. David / Datta, Shouvik / Palinginis, Kimon / Mahan, A.H. / Iwaniczko, Eugene / Xu, Yueqin / Branz, Howard M. et al. | 2007
- 670
-
Properties of nanocrystalline SiC:Ge:H alloy deposited by hot-wire chemical vapor deposition using Organosilane and OrganogermaneMiyajima, Shinsuke / Yashiki, Yasutoshi / Yamada, Akira / Konagai, Makoto et al. | 2007
- 674
-
Applying HWCVD to particle coatings and modeling the deposition mechanismLau, Kenneth K.S. / Gleason, Karen K. et al. | 2007
- 678
-
Initiated chemical vapor deposition (iCVD) of copolymer thin filmsLau, Kenneth K.S. / Gleason, Karen K. et al. | 2007
- 681
-
Combinatorial initiated chemical vapor deposition (iCVD) for polymer thin film discoveryMartin, Tyler P. / Chan, Kelvin / Gleason, Karen K. et al. | 2007
- 684
-
Initiated chemical vapor deposition of biopassivation coatingsO'Shaughnessy, W.S. / Edell, David J. / Gleason, Karen K. et al. | 2007
- 687
-
Fabrication of PTFE thin films by dual catalytic chemical vapor deposition methodYasuoka, Hiroaki / Yoshida, Masahiro / Sugita, Ken / Ohdaira, Keisuke / Murata, Hideyuki / Matsumura, Hideki et al. | 2007
- 691
-
HF CVD diamond nucleation and growth on polycrystalline copper: A kinetic studyConstant, L. / Le Normand, F. et al. | 2007
- 696
-
Wide area polycrystalline diamond coating and stress control by sp3 hot filament CVD reactorZimmer, Jerry W. / Chandler, Gerry / Sharda, Tarun et al. | 2007
- 700
-
Hot-filament CVD synthesis and application of carbon nanostructuresLee, Soonil / Choi, Seungho / Park, Kyung Ho / Chae, Kyo Won / Cho, Jung Bin / Ahn, Yeonghwan / Park, Ji-Yong / Koh, Ken Ha et al. | 2007
- 706
-
Growth of vertically aligned arrays of carbon nanotubes for high field emissionKim, D. / Lim, S.H. / Guilley, A.J. / Cojocaru, C.S. / Bourée, J.E. / Vila, L. / Ryu, J.H. / Park, K.C. / Jang, J. et al. | 2007
- 710
-
Effect of hydrogen dilution in preparation of carbon nanowall by hot-wire CVDShimabukuro, Seiji / Hatakeyama, Yuichi / Takeuchi, Masanori / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 714
-
Preparation of carbon microcoils by catalytic methane hot-wire CVD processChen, Xiuqin / Hasegawa, M. / Yang, Shaoming / Nitta, Y. / Katsuno, T. / Motojima, S. et al. | 2007
- 718
-
Preparation of single-helix carbon microcoils by catalytic CVD processYang, Shaoming / Ozeki, I. / Chen, Xiuqin / Katsuno, T. / Motojima, S. et al. | 2007
- 722
-
Recent contributions of the Kaiserslautern research group to thin silicon solar cell R&D applying the HW(Cat)CVDSchroeder, Bernd / Kupich, Markus / Kumar, Prabhat / Grunsky, Dmitry et al. | 2007
- 728
-
High efficiency microcrystalline silicon solar cells with Hot-Wire CVD buffer layerFinger, F. / Mai, Y. / Klein, S. / Carius, R. et al. | 2007
- 733
-
Stability of microcrystalline silicon solar cells with HWCVD buffer layerWang, Y. / Geng, X. / Stiebig, H. / Finger, F. et al. | 2007
- 736
-
Improvement of the efficiency of triple junction n–i–p solar cells with hot-wire CVD proto- and microcrystalline silicon absorber layersStolk, R.L. / Li, H. / Franken, R.H. / Schüttauf, J.W.A. / van der Werf, C.H.M. / Rath, J.K. / Schropp, R.E.I. et al. | 2007
- 740
-
Applications of microcrystalline hydrogenated cubic silicon carbide for amorphous silicon thin film solar cellsOgawa, Shunsuke / Okabe, Masaaki / Ikeda, Yuusuke / Itoh, Takashi / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 743
-
Recent advances in hot-wire CVD R&D at NREL: From 18% silicon heterojunction cells to silicon epitaxy at glass-compatible temperaturesBranz, Howard M. / Teplin, Charles W. / Young, David L. / Page, Matthew R. / Iwaniczko, Eugene / Roybal, Lorenzo / Bauer, Russell / Mahan, A. Harv / Xu, Yueqin / Stradins, Pauls et al. | 2007
- 747
-
Fabrication and characteristics of n-Si/c-Si/p-Si heterojunction solar cells using hot-wire CVDLien, Shui-Yang / Wu, Bing-Rui / Liu, Jun-Chin / Wuu, Dong-Sing et al. | 2007
- 751
-
Low temperature (less-than 100 deg C) fabrication of thin film silicon solar cells by HWCVDRath, J.K. / Jong, M. de / Schropp, R.E.I. et al. | 2008
- 751
-
Low temperature (<100 °C) fabrication of thin film silicon solar cells by HWCVDRath, J.K. / de Jong, M. / Schropp, R.E.I. et al. | 2007
- 755
-
Improvement of μc-Si:H n–i–p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profilingLi, H. / Franken, R.H. / Stolk, R.L. / van der Werf, C.H.M. / Rath, J.K. / Schropp, R.E.I. et al. | 2007
- 755
-
Improvement of micrometer c-Si:H n-i-p cell efficiency with an i-layer made by hot-wire CVD by reverse H2-profilingLi, H. / Franken, R.H. / Stolk, R.L. / Werf, C.H.M. van der / Rath, J.K. / Schropp, R.E.I. et al. | 2008
- 758
-
Amorphous Si1−xCx:H films prepared by hot-wire CVD using SiH3CH3 and SiH4 mixture gas and its application to window layer for silicon thin film solar cellsOgawa, Shunsuke / Okabe, Masaaki / Itoh, Takashi / Yoshida, Norimitsu / Nonomura, Shuichi et al. | 2007
- 761
-
Progress in a-Si:H/c-Si heterojunction emitters obtained by hot-wire CVD at 200 deg CMunoz, D. / Voz, C. / Martin, I. / Orpella, A. / Puigdollers, J. / Alcubilla, R. / Villar, F. / Bertomeu, J. / Andreu, J. / Damon-Lacoste, J. et al. | 2008
- 761
-
Progress in a-Si:H/c-Si heterojunction emitters obtained by Hot-Wire CVD at 200 °CMuñoz, D. / Voz, C. / Martin, I. / Orpella, A. / Puigdollers, J. / Alcubilla, R. / Villar, F. / Bertomeu, J. / Andreu, J. / Damon-Lacoste, J. et al. | 2007
- 765
-
Hot-wire CVD deposited n-type μc-Si films for μc-Si/c-Si heterojunction solar cell applicationsLien, Shui-Yang / Wuu, Dong-Sing / Wu, Bing-Rui / Horng, Ray-Hua / Tseng, Ming-Chun / Yu, Hsin-Her et al. | 2007
- 770
-
Organic FETs with HWCVD silicon nitride as a passivation layer and gate dielectricTiwari, S.P. / Srinivas, P. / Shriram, S. / Kale, Nitin S. / Mhaisalkar, S.G. / Ramgopal Rao, V. et al. | 2007
- 773
-
Application of Cat-CVD for ULSI technologyAkasaka, Yoichi et al. | 2007
- 779
-
Hot wire chemical vapor processing (HWCVP) — A prospective tool for VLSIDusane, Rajiv O. et al. | 2007
- 785
-
Maintaining Cu metal integrity on low-k IMDs with a nanometer thick a-SiC:H film obtained by HWCVDSingh, S.K. / Kumbhar, A.A. / Dusane, R.O. et al. | 2007
- 789
-
Developments in hot-filament metal oxide deposition (HFMOD)Durrant, Steven F. / Trasferetti, Benedito C. / Scarmínio, Jair / Davanzo, Celso U. / Rouxinol, Francisco P.M. / Gelamo, Rogério V. / Bica de Moraes, Mario A. et al. | 2007
- 794
-
Metal oxide nano-particles for improved electrochromic and lithium-ion battery technologiesDillon, A.C. / Mahan, A.H. / Deshpande, R. / Parilla, P.A. / Jones, K.M. / Lee, S-H. et al. | 2007
- 798
-
Synthesis of nanometal oxides and nanometals using hot-wire and thermal CVDMitra, S. / Sridharan, K. / Unnam, J. / Ghosh, K. et al. | 2007
- 803
-
Characterization of Si:O:C:H films fabricated using electron emission enhanced chemical vapour depositionDurrant, Steven F. / Rouxinol, Francisco P.M. / Gelamo, Rogério V. / Trasferetti, B. Cláudio / Davanzo, C.U. / Bica de Moraes, Mario A. et al. | 2007
- 807
-
TiO2 thin films using organic liquid materials prepared by Hot-Wire CVD methodIida, Tamio / Takamido, Yasuhiko / Kunii, Takao / Ogawa, Shunsuke / Mizuno, Kouichi / Narita, Tomoki / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi et al. | 2007
- 810
-
Ion beam modification of TiO2 films prepared by Cat-CVD for solar cellNarita, Tomoki / Iida, Tamio / Ogawa, Shunsuke / Mizuno, Kouichi / So, Jisung / Kondo, Akihiro / Yoshida, Norimitsu / Itoh, Takashi / Nonomura, Shuichi / Tanaka, Yasuhito et al. | 2007
- 814
-
Hot Ta filament resistance in-situ monitoring under silane containing atmosphereHrunski, D. / Schroeder, B. et al. | 2007
- 818
-
Investigation of silicon contamination of Ta filaments used for thin film silicon depositionHrunski, D. / Schroeder, B. / Scheib, M. / Merz, R.M. / Bock, W. / Wagner, C. et al. | 2007
- 822
-
Extension of the lifetime of tantalum filaments in the hot-wire (Cat) Chemical Vapor Deposition processKnoesen, Dirk / Arendse, Chris / Halindintwali, Sylvain / Muller, Theo et al. | 2007
- 826
-
A novel method for suppressing silicidation of tungsten catalyzer during silane decomposition in Cat-CVDHonda, Kazuhiro / Ohdaira, Keisuke / Matsumura, Hideki et al. | 2007
- 829
-
Catalytic CVD processes of oxidizing species and the prevention of oxidization of heated tungsten filaments by H2Umemoto, Hironobu / Ansari, S.G. / Morimoto, Takashi / Setoguchi, Shota / Uemura, Hitoshi / Matsumura, Hideki et al. | 2007
- 832
-
Composition of alumina films grown on Si at low temperature with catalytic CVDOgita, Yoh-Ichiro / Kudoh, Tugutomo / Sakamoto, Fumitaka et al. | 2007
- 836
-
Electrical properties of alumina films grown on Si at low temperature using catalytic CVDOgita, Yoh-Ichiro / Ohsone, Satoshi / Kudoh, Tsugutomo / Sakamoto, Fumitaka et al. | 2007
- 839
-
Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wireMotai, Kumi / Oizumi, Hiroaki / Miyagaki, Shinji / Nishiyama, Iwao / Izumi, Akira / Ueno, Tomoya / Namiki, Akira et al. | 2007
- 844
-
Hot-wire synthesis of Si nanoparticlesScriba, M.R. / Arendse, C. / Härting, M. / Britton, D.T. et al. | 2007
- 847
-
Photoresist removal process by hydrogen radicals generated by W catalystTakata, M. / Ogushi, K. / Yuba, Y. / Akasaka, Y. / Tomioka, K. / Soda, E. / Kobayashi, N. et al. | 2007
- 850
-
Aluminum-induced in situ crystallization of HWCVD a-Si:H filmsGupta, Sneha / Chelawat, Hitesh / Kumbhar, Alka A. / Adhikari, Subhra / Dusane, Rajiv O. et al. | 2007
- 853
-
Reduction of oxide layer on various metal surfaces by atomic hydrogen treatmentIzumi, Akira / Ueno, Tomoya / Miyazaki, Yasuo / Oizumi, Hiroaki / Nishiyama, Iwao et al. | 2007
- 856
-
Desorption process of copper chlorides from copper surfaceHibi, Atsushi / Susa, Akio / Koshi, Mitsuo et al. | 2007
- 859
-
Selective-catalyst formation for carbon nanotube growth by local indentation pressureYasui, T. / Nakai, Y. / Onozuka, Y. et al. | 2007
- 863
-
Author Index of Volume 516 Issue 5| 2007
- 865
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Subject Index of Volume 516 Issue 5| 2007