Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent (Englisch)
- Neue Suche nach: Tsvetanova, D.
- Neue Suche nach: Vos, R.
- Neue Suche nach: Vanstreels, K.
- Neue Suche nach: Radisic, D.
- Neue Suche nach: Sonnemans, R.
- Neue Suche nach: Berry, I.
- Neue Suche nach: Waldfried, C.
- Neue Suche nach: Mattson, D.
- Neue Suche nach: DeLuca, J.
- Neue Suche nach: Vereecke, G.
- Neue Suche nach: Tsvetanova, D.
- Neue Suche nach: Vos, R.
- Neue Suche nach: Vanstreels, K.
- Neue Suche nach: Radisic, D.
- Neue Suche nach: Sonnemans, R.
- Neue Suche nach: Berry, I.
- Neue Suche nach: Waldfried, C.
- Neue Suche nach: Mattson, D.
- Neue Suche nach: DeLuca, J.
- Neue Suche nach: Vereecke, G.
In:
JOURNAL- ELECTROCHEMICAL SOCIETY
;
158
, 2
;
H150
;
2011
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Removal of High-Dose Ion-Implanted 248 nm Deep UV Photoresist Using UV Irradiation and Organic Solvent
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Beteiligte:Tsvetanova, D. ( Autor:in ) / Vos, R. ( Autor:in ) / Vanstreels, K. ( Autor:in ) / Radisic, D. ( Autor:in ) / Sonnemans, R. ( Autor:in ) / Berry, I. ( Autor:in ) / Waldfried, C. ( Autor:in ) / Mattson, D. ( Autor:in ) / DeLuca, J. ( Autor:in ) / Vereecke, G. ( Autor:in )
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Erschienen in:JOURNAL- ELECTROCHEMICAL SOCIETY ; 158, 2 ; H150
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Verlag:
- Neue Suche nach: ELECTROCHEMICAL SOCIETY INC
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Erscheinungsdatum:01.01.2011
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Format / Umfang:H150
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 541.37
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 541.37 -
Datenquelle:
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