Properties of TaSiN thin films deposited by reactive radio frequency magnetron sputtering (Englisch)
- Neue Suche nach: Mesic, B.
- Neue Suche nach: Schroeder, H.
- Neue Suche nach: Mesic, B.
- Neue Suche nach: Schroeder, H.
In:
THIN SOLID FILMS
;
520
, 13
;
4497-4500
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Properties of TaSiN thin films deposited by reactive radio frequency magnetron sputtering
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Beteiligte:Mesic, B. ( Autor:in ) / Schroeder, H. ( Autor:in )
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Erschienen in:THIN SOLID FILMS ; 520, 13 ; 4497-4500
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2012
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Format / Umfang:4 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 530.4275
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 530.4275 -
Datenquelle:
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