Impact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications (Englisch)
- Neue Suche nach: Collaert, N.
- Neue Suche nach: Mannaert, G.
- Neue Suche nach: Paraschiv, V.
- Neue Suche nach: Goossens, D.
- Neue Suche nach: Demand, M.
- Neue Suche nach: Eberle, W.
- Neue Suche nach: Collaert, N.
- Neue Suche nach: Mannaert, G.
- Neue Suche nach: Paraschiv, V.
- Neue Suche nach: Goossens, D.
- Neue Suche nach: Demand, M.
- Neue Suche nach: Eberle, W.
In:
MICROELECTRONIC ENGINEERING
;
99
;
6-10
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Impact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications
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Beteiligte:Collaert, N. ( Autor:in ) / Mannaert, G. ( Autor:in ) / Paraschiv, V. ( Autor:in ) / Goossens, D. ( Autor:in ) / Demand, M. ( Autor:in ) / Eberle, W. ( Autor:in )
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Erschienen in:MICROELECTRONIC ENGINEERING ; 99 ; 6-10
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2012
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Format / Umfang:5 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 621.381
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 621.381 -
Datenquelle:
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