Skin Cancer Risks Avoided by the Montreal Protocol-Worldwide Modeling Integrating Coupled Climate-Chemistry Models with a Risk Model for UV (Englisch)
- Neue Suche nach: Dijk, A.
- Neue Suche nach: Slaper, H.
- Neue Suche nach: den Outer, P. N.
- Neue Suche nach: Morgenstern, O.
- Neue Suche nach: Braesicke, P.
- Neue Suche nach: Pyle, J. A.
- Neue Suche nach: Garny, H.
- Neue Suche nach: Stenke, A.
- Neue Suche nach: Dameris, M.
- Neue Suche nach: Kazantzidis, A.
- Neue Suche nach: Dijk, A.
- Neue Suche nach: Slaper, H.
- Neue Suche nach: den Outer, P. N.
- Neue Suche nach: Morgenstern, O.
- Neue Suche nach: Braesicke, P.
- Neue Suche nach: Pyle, J. A.
- Neue Suche nach: Garny, H.
- Neue Suche nach: Stenke, A.
- Neue Suche nach: Dameris, M.
- Neue Suche nach: Kazantzidis, A.
In:
PHOTOCHEMISTRY AND PHOTOBIOLOGY
;
89
, 1
;
234-246
;
2013
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Skin Cancer Risks Avoided by the Montreal Protocol-Worldwide Modeling Integrating Coupled Climate-Chemistry Models with a Risk Model for UV
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Beteiligte:Dijk, A. ( Autor:in ) / Slaper, H. ( Autor:in ) / den Outer, P. N. ( Autor:in ) / Morgenstern, O. ( Autor:in ) / Braesicke, P. ( Autor:in ) / Pyle, J. A. ( Autor:in ) / Garny, H. ( Autor:in ) / Stenke, A. ( Autor:in ) / Dameris, M. ( Autor:in ) / Kazantzidis, A. ( Autor:in )
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Erschienen in:PHOTOCHEMISTRY AND PHOTOBIOLOGY ; 89, 1 ; 234-246
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Verlag:
- Neue Suche nach: Blackwell Publishing Ltd
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Erscheinungsdatum:01.01.2013
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Format / Umfang:13 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 541.35
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 541.35 -
Datenquelle:
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