Monolayer graphene growth using additional etching process in atmospheric pressure chemical vapor deposition (Englisch)
- Neue Suche nach: Yao, Y.
- Neue Suche nach: Wong, C.-p.
- Neue Suche nach: Yao, Y.
- Neue Suche nach: Wong, C.-p.
In:
CARBON -AMERICAN CARBON COMMITTEE-
;
50
, 14
;
5203-5209
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Monolayer graphene growth using additional etching process in atmospheric pressure chemical vapor deposition
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Beteiligte:Yao, Y. ( Autor:in ) / Wong, C.-p. ( Autor:in )
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Erschienen in:CARBON -AMERICAN CARBON COMMITTEE- ; 50, 14 ; 5203-5209
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2012
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Format / Umfang:7 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 546.681
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 546.681 -
Datenquelle:
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