BPN a new thick negative photoresist with high aspect ratio for MEMS applications (Englisch)
- Neue Suche nach: Bourrier, D.
- Neue Suche nach: Dilhan, M.
- Neue Suche nach: Ghannam, A.
- Neue Suche nach: Ourak, L.
- Neue Suche nach: Granier, H.
- Neue Suche nach: Bourrier, D.
- Neue Suche nach: Dilhan, M.
- Neue Suche nach: Ghannam, A.
- Neue Suche nach: Ourak, L.
- Neue Suche nach: Granier, H.
In:
MICROSYSTEM TECHNOLOGIES
;
19
, 3
;
419-423
;
2013
-
ISSN:
- Aufsatz (Zeitschrift) / Print
-
Titel:BPN a new thick negative photoresist with high aspect ratio for MEMS applications
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Beteiligte:Bourrier, D. ( Autor:in ) / Dilhan, M. ( Autor:in ) / Ghannam, A. ( Autor:in ) / Ourak, L. ( Autor:in ) / Granier, H. ( Autor:in )
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Erschienen in:MICROSYSTEM TECHNOLOGIES ; 19, 3 ; 419-423
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Verlag:
- Neue Suche nach: Springer Science + Business Media
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Erscheinungsdatum:01.01.2013
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Format / Umfang:5 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 629.83
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 629.83 -
Datenquelle:
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