Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2-x thin films deposited by RF sputtering (Englisch)
- Neue Suche nach: Luciu, I.
- Neue Suche nach: Bartali, R.
- Neue Suche nach: Laidani, N.
- Neue Suche nach: Luciu, I.
- Neue Suche nach: Bartali, R.
- Neue Suche nach: Laidani, N.
In:
JOURNAL OF PHYSICS -LONDON- D APPLIED PHYSICS
;
45
, 34
;
345302
;
2012
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Influence of hydrogen addition to an Ar plasma on the structural properties of TiO2-x thin films deposited by RF sputtering
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Beteiligte:
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Erschienen in:JOURNAL OF PHYSICS -LONDON- D APPLIED PHYSICS ; 45, 34 ; 345302
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Verlag:
- Neue Suche nach: IOP PUBLISHING LTD
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Erscheinungsdatum:01.01.2012
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Format / Umfang:345302 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 530
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 530 -
Datenquelle:
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