Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition (Englisch)
- Neue Suche nach: Lee, S. h.
- Neue Suche nach: Jung, J. s.
- Neue Suche nach: Lee, S. s.
- Neue Suche nach: Lee, S. b.
- Neue Suche nach: Hwang, N. m.
- Neue Suche nach: Lee, S. h.
- Neue Suche nach: Jung, J. s.
- Neue Suche nach: Lee, S. s.
- Neue Suche nach: Lee, S. b.
- Neue Suche nach: Hwang, N. m.
In:
JOURNAL OF CRYSTAL GROWTH
;
453
;
151-157
;
2016
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Low temperature deposition of polycrystalline silicon thin films on a flexible polymer substrate by hot wire chemical vapor deposition
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Beteiligte:Lee, S. h. ( Autor:in ) / Jung, J. s. ( Autor:in ) / Lee, S. s. ( Autor:in ) / Lee, S. b. ( Autor:in ) / Hwang, N. m. ( Autor:in )
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Erschienen in:JOURNAL OF CRYSTAL GROWTH ; 453 ; 151-157
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2016
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Format / Umfang:7 pages
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ISSN:
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Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Englisch
- Neue Suche nach: 548
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 548 -
Datenquelle:
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- IFC
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Editorial Board| 2016