Influence of the nucleation layer morphology on the structural property of AlN films grown on c-plane sapphire by MOCVD (Unbekannt)
- Neue Suche nach: Luo, Weike
- Neue Suche nach: Li, Liang
- Neue Suche nach: Li, Zhonghui
- Neue Suche nach: Yang, Qiankun
- Neue Suche nach: Zhang, Dongguo
- Neue Suche nach: Dong, Xun
- Neue Suche nach: Peng, Daqing
- Neue Suche nach: Pan, Lei
- Neue Suche nach: Li, Chuanhao
- Neue Suche nach: Liu, Bin
- Neue Suche nach: Zhong, Rong
- Neue Suche nach: Luo, Weike
- Neue Suche nach: Li, Liang
- Neue Suche nach: Li, Zhonghui
- Neue Suche nach: Yang, Qiankun
- Neue Suche nach: Zhang, Dongguo
- Neue Suche nach: Dong, Xun
- Neue Suche nach: Peng, Daqing
- Neue Suche nach: Pan, Lei
- Neue Suche nach: Li, Chuanhao
- Neue Suche nach: Liu, Bin
- Neue Suche nach: Zhong, Rong
In:
Journal of alloys and compounds
;
697
;
262-267
;
2017
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ISSN:
- Aufsatz (Zeitschrift) / Print
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Titel:Influence of the nucleation layer morphology on the structural property of AlN films grown on c-plane sapphire by MOCVD
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Beteiligte:Luo, Weike ( Autor:in ) / Li, Liang ( Autor:in ) / Li, Zhonghui ( Autor:in ) / Yang, Qiankun ( Autor:in ) / Zhang, Dongguo ( Autor:in ) / Dong, Xun ( Autor:in ) / Peng, Daqing ( Autor:in ) / Pan, Lei ( Autor:in ) / Li, Chuanhao ( Autor:in ) / Liu, Bin ( Autor:in )
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Erschienen in:Journal of alloys and compounds ; 697 ; 262-267
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Verlag:
- Neue Suche nach: Elsevier Science B.V., Amsterdam.
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Erscheinungsdatum:01.01.2017
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Format / Umfang:6 pages
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ISSN:
-
Medientyp:Aufsatz (Zeitschrift)
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Format:Print
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Sprache:Unbekannt
- Neue Suche nach: 669
- Weitere Informationen zu Dewey Decimal Classification
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Klassifikation:
DDC: 669 -
Datenquelle:
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