"This book is aimed at new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get a primer on the outlook of optical lithography and the many next-generation technologies that may greatly enhance semiconductor manufacturing in the near future. This second edition has brand new material on proximity printing, as well as updated and expanded material on: exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies"--