Mask and Lithography Conference (EMLC), 2006 22nd European : date, 23-26 Jan. 2006 (Englisch)
- Neue Suche nach: European Mask and Lithography Conference
- Neue Suche nach: European Mask and Lithography Conference
2006
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ISBN:
- Konferenzband / Elektronische Ressource
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Titel:Mask and Lithography Conference (EMLC), 2006 22nd European : date, 23-26 Jan. 2006
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Weitere Titelangaben:2006 22nd European Mask and Lithography Conference (EMLC)
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Beteiligte:
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Kongress:European Mask and Lithography Conference ; 22nd
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Verlag:
- Neue Suche nach: [VDE?]
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Erscheinungsort:[Berlin?]
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Erscheinungsdatum:2006
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Format / Umfang:1 Online-Ressource
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Anmerkungen:illustrations
Includes bibliographical references -
ISBN:
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Medientyp:Konferenzband
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Iso-sciatic point: novel approach to distinguish 3-D mask effects from scanner aberrations in extreme ultraviolet lithographyLeunissen, Leonardus H. A. / Gronheid, Roel / Gao, Weimin et al. | 2006
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Printability study with polarization based AIMS fab 193i to investigate mask polarization effectsZibold, Axel / Stroessner, Ulrich / Poortinga, Eric / Schmid, Rainer / Scherübl, Thomas / Rosenkranz, Norbert / Harnisch, Wolfgang et al. | 2006
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Rigorous Mask Modeling beyond the Hopkins ApproachSchermer, J. / Evanschitzky, P. / Erdmann, A. et al. | 2006
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Calibration of test masks used for lithography lens systemsArnz, M. / Häßler-Grohne, W. / Bodermann, B. / Bosse, H. et al. | 2006
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Systematic investigation of CD metrology tool response to sidewall profile variation on a COG test maskGans, F. / Liebe, R. / Heins, Th. / Richter, J. / Häßler-Grohne, W. / Frase, C. G. / Bodermann, B. / Czerkas, S. / Dirscherl, K. / Bosse, H. et al. | 2006
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A new life for a 10-year old MueTec2010, CD measurement system: the ultimate precision upgrade, with additional film thickness measurement capabilityCassol, Gian Luca / Bianucci, Giovanni / Murai, Shiaki / Falk, Günther / Scheuring, Gerd / Döbereiner, Stefan / Brück, Hans-Jürgen et al. | 2006
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Sub-110 nm line width standards for accuracy calibration of CD-SEM and CD-AFMShirke, Sanjay / Lorusso, Gian / Blanquies, René / Vandeweyer, Tom et al. | 2006
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Patterning process development for NIL templatesSasaki, Shiho / Yoshida, Yuuichi / Amano, Tsuyoshi / Itoh, Kimio / Toyama, Nobuhito / Mohri, Hiroshi / Hayashi, Naoya et al. | 2006
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Plasma deposited and evaporated thin resists for template fabricationLavallée, Eric / Beauvais, Jacques / Mangoua, Bertrand Takam / Drouin, Dominique et al. | 2006
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A Novel Method for the Deposition of Ultra-Uniform Resist Film for Mask MakingSchneider, J. / Picard, G. / Seye, M. F. / Pérez, Maria Helena et al. | 2006
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Design for Manufacturing Validation Tool - Fast and Reliable Conversion of SEM Images to GDS ImagesRonning, D. / Ducharme, D. / Selzer, R. / Boerger, B. / Yu, M. / Xing, B. / Trybendis, M. / Grenon, B. et al. | 2006
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High resolution holographic lithography (experimental results)Bratsev, V.F. / Ochkur, V.I. / Rakhovsky, V.I. / Tolmachev, Y.A. et al. | 2006
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CD and Profile Metrology of Embedded Phase shift masks using ScatterometryLee, Kyung man / Yedur, Sanjay / Hetzer, Dave / Tavassoli, Malahat / Baik, Kiho et al. | 2006
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How Refractive Microoptics Enable Lossless Hyper-NA Illumination Systems for Immersion LithographyGanser, H. / Darscht, M. / Miklyaev, Y. / Hauschild, D. / Aschke, L. et al. | 2006
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Through-pitch and through-focus characterization of AAPSM for ArF immersion lithographyKonishi, Toshio / Kojima, Yosuke / Okuda, Yoshimitsu / Philipsen, Vicky / Leunissen, Leonardus H. A. / Look, Lieve Van et al. | 2006
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Manufacturability and printability of AAPSM with transparent etch stop layerCangemi, Michael / Philipsen, Vicky / Ruyter, Rudi De / Leunissen, Leonardus / Morgana, Nicolo / Sixt, Pierre / Cangemi, Marc / Cottle, Rand / Kasprowicz, Bryan et al. | 2006
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Analysis method to determine and characterize the mask mean-to-target and uniformity specificationLee, Sung-Woo / Leunissen, Leonardus H. A. / Kerkhove, Jeroen Van de / Philipsen, Vicky / Jonckheere, Rik / Lee, Suk-Joo / Woo, Sang-Gyun / Cho, Han-Ku / Moon, Joo-Tae et al. | 2006
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High Resolution Holographic LithographyBratsev, V. F. / Ochkur, V. I. / Rakhovsky, V. I. / Tolmachev, Yu. A. et al. | 2006
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Assist Feature Placement Analysis Using Focus Sensitivity ModelsMelvin III, Lawrence S. / Mayhew, Jeffrey P. / Painter, Benjamin D. / Barnes, Levi D. et al. | 2006
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The Magic of 4X Mask Reduction Factor?Lercel, Michael et al. | 2006
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A New Generation of Progressive Mask Defects on the Pattern Side of Advanced PhotomasksGrenon, Brian J. / Bhattacharyya, Kaustuve / Eynon, Benjamin et al. | 2006
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A Correlation for Predicting Film Pulling Velocity in Immersion LithographySchuetter, Scott / Shedd, Timothy / Doxtator, Keith / Nellis, Gregory / Peski, Chris Van et al. | 2006
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The Status of LEEPL: Can it be an alternative solution?Utsumi, Takao et al. | 2006
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Data Prep – The Bottleneck of Future Applications?Gramss, Juergen / Eichhorn, Hans / Lemke, Melchior / Jaritz, Renate / Neick, Volker / Beyer, Dirk / Buerger, Bertram / Baetz, Ulrich / Kunze, Klaus / Belic, Nikola et al. | 2006
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A technique to determine capability to detect adjacent defects during the die-to-database inspection of reticle patternsAvakaw, Syarhei / Korneliuk, Aliaksandr / Tsitko, Alena et al. | 2006
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Laser Mask Repair for Advanced TechnologiesDinsdale, Andrew / Robinson, Tod / Jeff LeClaire1 / White, Roy / Bozak, Ron / Lee, David A. et al. | 2006
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Standardisation of photomask orders: An automation perspectiveHoussos, Nikos / Parchas, Evangelos / Stavroulakis, Stelios / Voyiatzis, Emmanuel / Torsy, Andreas / Filies, Olaf et al. | 2006
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Evaluation of quartz dry etching profile for the PSM lithography performanceKomizo, Toru / Nemoto, Satoru / Kojima, Yosuke / Ohshima, Takashi / Yoshii, Takashi / Konishi, Toshio / Chiba, Kazuaki / Kikuchi, Yasutaka / Otaki, Masao / Okuda, Yoshimitsu et al. | 2006
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Using Design Intent to Qualify and Control Lithography ManufacturingVasek, Jim / Wilkinson, Bill / Smith, Dave / Reich, Al / Garza, Cesar / Wiley, Jim / Zhao, Joyce / Poyastro, Moshe / Troy, Brian / Nehmadi, Youval et al. | 2006
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ORC and LfD as First Steps towards DfMMärz, Reinhard / Peter, Kai / Maurer, Wilhelm et al. | 2006
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Mask Costs, A New LookGrenon, Brian J. / Hector, Scott et al. | 2006
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Multi-Project Reticle Design andWafer Dicing under Uncertain DemandKahng, Andrew B. / Mandoiu, Ion / Xu, Xu / Zelikovsky, Alex Z. et al. | 2006
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Mask Industry Assessment Trend AnalysisShelden, Gilbert / Hector, Scott / Marmillion, Patricia / Lercel, Michael et al. | 2006
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Printability study with polarization based AIMS(TM) fab 193i to investigate mask polarization effectsZibold, Axel / Stroessner, Ulrich / Poortinga, Eric / Schmid, Rainer / Scherübl, Thomas / Rosenkranz, Norbert / Harnisch, Wolfgang et al. | 2006
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Consequences of Plasmonic Effects in PhotomasksSchellenberg, F. M. / Adam, K. / Matteo, J. / Hesselink, L. et al. | 2006
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Mask absorber material dependence of 2D OPC in 193nm high NA lithographyCheng, Wen-Hao / Farnsworth, Jeff et al. | 2006
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Characterizing the Response of an EUV Reticle during Electrostatic ChuckingEngelstad, Roxann L. / Lovell, Edward G. / Mikkelson, Andrew R. / Nataraju, Madhura / Ramaswamy, Vasu / Sohn, Jaewoong / Dicks, Gerald A. / Abdo, Amr Y. / Tejeda, Richard O. et al. | 2006