Mask and Lithography Conference (EMLC), 2007 23rd European : date, 22-26 Jan. 2007 (Englisch)
- Neue Suche nach: European Mask and Lithography Conference
- Neue Suche nach: European Mask and Lithography Conference
2007
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ISBN:
- Konferenzband / Elektronische Ressource
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Titel:Mask and Lithography Conference (EMLC), 2007 23rd European : date, 22-26 Jan. 2007
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Weitere Titelangaben:2007 23rd European Mask and Lithography Conference (EMLC)
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Beteiligte:
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Kongress:European Mask and Lithography Conference ; 23rd
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Verlag:
- Neue Suche nach: [VDE?]
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Erscheinungsort:[Berlin?]
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Erscheinungsdatum:2007
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Format / Umfang:1 Online-Ressource
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Anmerkungen:illustrations
Includes bibliographical references -
ISBN:
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Medientyp:Konferenzband
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Format:Elektronische Ressource
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Sprache:Englisch
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Schlagwörter:
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Datenquelle:
Inhaltsverzeichnis Konferenzband
Die Inhaltsverzeichnisse werden automatisch erzeugt und basieren auf den im Index des TIB-Portals verfügbaren Einzelnachweisen der enthaltenen Beiträge. Die Anzeige der Inhaltsverzeichnisse kann daher unvollständig oder lückenhaft sein.
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Mask Industry Assessment Trend AnalysisShelden, Gilbert / Marmillion, Patrica / Hughes, Greg et al. | 2008
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Three Dimensional Mask Effects in OPC Process Model Development From First Principles SimulationMelvin III, Lawrence S. / Schmoeller, Thomas / Kalus, Christian K. / Lia, Jianliang et al. | 2008
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Theoretical Study of Mask Haze FormationWu, Banqiu / Kumar, Ajay et al. | 2008
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High-resolution and high-precision pattern placement metrology for the 45 nm node and beyondKlose, G. / Buttgereit, U. / Arnz, M. / Rosenkranz, N. et al. | 2008
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New Results from DUV Water Immersion Microscopy Using the CD Metrology System LWM500 WI with a High NA CondenserHillmann, Frank / Scheuring, Gerd / Brück, Hans-Jürgen et al. | 2008
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3-Dimensional bridged structures by thermal-UV imprint using a novel maskOkuda, Keisuke / Kawata, Hiroaki / Hirai, Yoshihiko et al. | 2008
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Introduction of new database reflected tritone algorithm for application in mask productionSchulmeyer, Thomas / Schmalfuss, Heiko / Heumann, Jan / Lang, Michael et al. | 2008
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Inspection results of advanced (sub-50nm design rule) reticles using the TeraScanHRSier, Jean-Paul / Broadbent, William / Yu, Paul et al. | 2008
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Polarization-induced astigmatism caused by topographic masksRuoff, Johannes / Neumann, Jens Timo / Schmitt-Weaver, Emil / Setten, Eelco van / Masson, Nicolas le / Progler, Chris / Geh, Bernd et al. | 2008
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Double Exposure Technology for KrF LithographyGeisler, S. / Bauer, J. / Haak, U. / Stolarek, D. / Schulz, K. / Wolf, H. / Meier, W. / Trojahn, M. / Matthus, E. / Beyer, H. et al. | 2008
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Topological and Model Based approach to Pitch decomposition for Double PatterningNikolsky, Peter / Davydova, Natalia / Goossens, Ronald et al. | 2008
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High Resolution Patterning and Simulation on Mo/Si Multilayer for EUV MasksTsikrikas, N. / Patsis, G. P. / Raptis, I. / Gerardino, A. et al. | 2008
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Design of pattern-specific mask grating for giving the effect of an off-axis illuminationKim, Young-Seok / Song, Seok Ho / Lee, Jong Ung / Oh, Sung Hyun / Choi, Yong Kyoo / Kim, Munsik / O, Beom-Hoan / Park, Se-Geun / Lee, El-Hang / Lee, Seung Gol et al. | 2008
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Progress of Nil Template MakingYusa, Satoshi / Hiraka, Takaaki / Mizuochi, Jun / Fujii, Akiko / Sakai, Yuko / Kuriyama, Koki / Sakaki, Masashi / Sasaki, Shiho / Morikawa, Yasutaka / Mohri, Hiroshi et al. | 2008
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MEDEA+ project 2T302 MUSCLE “Masks through user’s supply chain: leadership by excellence”Torsy, Andreas et al. | 2008
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Photomask cleaning process improvement to minimize ArF hazeGraham, Michael / McDonald, Andrew et al. | 2008
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Key improvement Schemes of Accuracies in EB Mask Writing for Double Patterning LithographySunaoshi, Hitoshi / Kamikubo, Takashi / Nishimura, Rieko / Tsuruta, Kaoru / Katsumata, Takehiko / Ohnishi, Takayuki / Anze, Hirohito / Takamatsu, Jun / Yoshitake, Shusuke / Tamamushi, Shuichi et al. | 2008
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Printing of sub resolution shots in electron beam direct write with variable shaped beam machinesThrum, Frank / Kretz, Johannes / Hohle, Christoph / Choi, Kang-Hoon / Keil, Katja et al. | 2008
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EUV Blank InspectionPeters, J. H. / Tonk, C. / Spriegel, D. / Han, Hak-Seung / Wurm, Stefan et al. | 2008
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Characterizing the imaging performance of Flash Memory masks using AIMS(TM)Setten, Eelco van / Wismans, Onno / Grim, Kees / Finders, Jo / Dusa, Mircea / Birkner, Robert / Richter, Rigo / Scherübl, Thomas et al. | 2008
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Comparative scatterometric CD and edge profile measurements on a MoSi mask using different scatterometersWurm, M. / Diener, A. / Bodermann, B. et al. | 2008
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New alignment marks for improved measurement maturityWeidenmueller, U. / Alves, H. / Schnabel, B. / Icard, B. / Le-Denmat, J-C. / Manakli, S. / Pradelles, J. et al. | 2008
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Overcoming Mask Etch Challenges for 45 nm & BeyondChandrachood, M. / Leung, T. Y. B. / Yu, K. / Grimbergen, M. / Panayil, S. / Ibrahim, I. / Sabharwal, A. / Kumar, A. et al. | 2008
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Desired IP Control methodology for EUV Mask in Current Mask ProcessYoshitake, S. / Tamamushi, S. / Ogasawara, M. et al. | 2008
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CDO BudgetingNesladek, Pavel / Wiswesser, Andreas / Sass, Björn / Mauermann, Sebastian et al. | 2008
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Phame(R) - high resolution off-axis phase shift measurements on 45nm node featuresButtgereit, Ute / Perlitz, Sascha / Seidel, Dirk et al. | 2008
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Status of EUVL Reticle ChuckingEngelstad, Roxann L. / Sohn, Jaewoong / Zeuske, Jacob R. / Battul, Venkata Siva / Vukkadala, Pradeep / Peski, Chris K. Van / Orvek, Kevin J. / Turner, Kevin T. / Mikkelson, Andrew R. / Nataraju, Madhura et al. | 2008
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Measuring Contact Hole Corner Rounding Uniformity Using Optical ScatterometryLam, John C. / Gray, Alexander / Chen, Stanley / Richter, Jan et al. | 2008
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Very High Sensitivity Mask DUV Transmittance Mapping and Measurements Based on Non Imaging OpticsBen-Zvi, Guy / Dmitriev, Vladimir / Graitzer, Erez / Zait, Eitan / Sharoni, Ofir / Cohen, Avi et al. | 2008
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Mask Data Rank (MDR) and its ApplicationKato, Kokoro / Endo, Masakazu / Inoue, Tadao / Yamabe, Masaki et al. | 2008
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Optical Proximity Correction for 0.13 micrometer SiGe:C BiCMOSGeisler, S. / Bauer, J. / Haak, U. / Jagdhold, U. / Pliquett, R. / Matthus, E. / Schrader, R. / Wolf, H. / Baetz, U. / Beyer, H. et al. | 2008
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Assessment and application of focus drilling for DRAM contact hole fabricationNoelscher, Christoph / Jauzion-Graverolle, Franck / Henkel, Thomas et al. | 2008
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Use of EUV scatterometry for the characterization of line profiles and line roughness on photomasksScholze, Frank / Laubis, Christian et al. | 2008
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45nm Node Registration Metrology on LTEM EUV ReticlesLaske, Frank / Kinoshita, Hiroshi / Nishida, Naoki / Kenmochi, Daisuke / Ota, Hitoshi / Tanioka, Yukitake / Czerkas, Slawomir / Schmidt, Karl-Heinrich / Adam, Dieter / Roeth, Klaus-Dieter et al. | 2008
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Wafer Based Mask Characterization for Double Patterning LithographyKruif, Robert de / Bubke, Karsten / Janssen, Gert-Jan / Heijden, Eddy van der / Fochler, Jörg / Dusa, Mircea / Peters, Jan Hendrik / Haas, Paul de / Connolly, Brid et al. | 2008
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Alternative Approach to Transparent Stamps for UV-based Nanoimprint Lithography – Techniques and MaterialsKlukowska, Anna / Vogler, Marko / Kolander, Anett / Reuther, Freimut / Gruetzner, Gabi / Muehlberger, Michael / Bergmair, Iris / Schoeftner, Rainer et al. | 2008
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Strategies for hybrid techniques of UV lithography and thermal nanoimprintWissen, M. / Bogdanski, N. / Moellenbeck, S. / Scheer, H.-C. et al. | 2008
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Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition techniqueShao, Feng / Evanschitzky, Peter / Reibold, David / Erdmann, Andreas et al. | 2008
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Assessment of molecular contamination in mask podForay, Jean Marie / Dejaune, Patrice / Sergent, Pierre / Gough, Stuart / Davene, Magali / Favre, Arnaud / Rude, C. / Trautmann, T. / Tissier, Michel / Cheung, D. et al. | 2008
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Mask CD measurement approach by diffraction intensity for lithography equivalentNagai, Takaharu / Mesuda, Kei / Sutou, Takanori / Inazuki, Yuichi / Hashimoto, Hiroyuki / Yokoyama, Toshifumi / Toyama, Nobuhito / Morikawa, Yasutaka / Mohri, Hiroshi / Hayashi, Naoya et al. | 2008
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Advances in Fabrication of X-ray Masks based on Vitreous Carbon using a new UV sensitive positive ResistVoigt, Anja / Kouba, Josef / Heinrich, Marina / Gruetzner, Gabi / Scheunemann, Heinz-Ulrich / Rudolph, I. / Waberski, Christoph et al. | 2008
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Controlling Linewidth Roughness in Step and Flash Imprint LithographySchmid, Gerard M. / Khusnatdinov, Niyaz / Brooks, Cynthia B. / LaBrake, Dwayne / Thompson, Ecron / Resnick, Douglas J. / Owens, Jordan / Ford, Arnie / Sasaki, Shiho / Toyama, Nobuhito et al. | 2008
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Practical use of hard mask process to fabricate fine photomasks for 45nm node and beyondKushida, Yasuyuki / Handa, Hitoshi / Maruyama, Hiroshi / Abe, Yuuki / Fujimura, Yukihiro / Yokoyama, Toshifumi et al. | 2008
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Phase-shifting photomask repair and repair validation procedure for transparent & opaque defects relevant for the 45nm node and beyondEhrlich, Christian / Buttgereit, Ute / Boehm, Klaus / Scheruebl, Thomas / Edinger, Klaus / Bret, Tristan et al. | 2008
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Influences on accuracy of SEM based CD mask metrology with a view to the 32 nm nodeHäßler-Grohne, W. / Frase, C. G. / Gnieser, D. / Bosse, H. / Richter, J. / Wiswesser, A. et al. | 2008
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Top surface imaging study by selective chemisorptions of poly(dimethyl siloxane) on diazoketo-functionalized polymeric surfaceGanesan, Ramakrishnan / Youn, Seul Ki / Yun, Jei-Moon / Kim, Jin-Baek et al. | 2008